Search

Joshua Joo

Examiner (ID: 15497, Phone: (571)272-3966 , Office: P/2445 )

Most Active Art Unit
2445
Art Unit(s)
2445, 2454, 2154
Total Applications
1189
Issued Applications
852
Pending Applications
95
Abandoned Applications
264

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 5759971 [patent_doc_number] => 20060210916 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-09-21 [patent_title] => 'Positive photoresist composition and method of forming resist pattern' [patent_app_type] => utility [patent_app_number] => 10/566425 [patent_app_country] => US [patent_app_date] => 2004-09-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11309 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0210/20060210916.pdf [firstpage_image] =>[orig_patent_app_number] => 10566425 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/566425
Positive photoresist composition and method of forming resist pattern Sep 16, 2004 Issued
Array ( [id] => 7210240 [patent_doc_number] => 20050053859 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-03-10 [patent_title] => 'Photoresist, photolithography method using the same, and method for producing photoresist' [patent_app_type] => utility [patent_app_number] => 10/938586 [patent_app_country] => US [patent_app_date] => 2004-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 9207 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0053/20050053859.pdf [firstpage_image] =>[orig_patent_app_number] => 10938586 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/938586
Photoresist, photolithography method using the same, and method for producing photoresist Sep 12, 2004 Abandoned
Array ( [id] => 6917971 [patent_doc_number] => 20050095532 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-05-05 [patent_title] => 'Photosensitive composition and pattern forming method using the same' [patent_app_type] => utility [patent_app_number] => 10/937270 [patent_app_country] => US [patent_app_date] => 2004-09-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 36486 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0095/20050095532.pdf [firstpage_image] =>[orig_patent_app_number] => 10937270 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/937270
Photosensitive composition and pattern forming method using the same Sep 9, 2004 Issued
Array ( [id] => 645618 [patent_doc_number] => 07119156 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-10-10 [patent_title] => 'Resist resin' [patent_app_type] => utility [patent_app_number] => 10/937313 [patent_app_country] => US [patent_app_date] => 2004-09-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 27146 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 27 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/119/07119156.pdf [firstpage_image] =>[orig_patent_app_number] => 10937313 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/937313
Resist resin Sep 9, 2004 Issued
Array ( [id] => 7127193 [patent_doc_number] => 20050058937 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-03-17 [patent_title] => 'Positive resist composition and patterning process' [patent_app_type] => utility [patent_app_number] => 10/936621 [patent_app_country] => US [patent_app_date] => 2004-09-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4737 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0058/20050058937.pdf [firstpage_image] =>[orig_patent_app_number] => 10936621 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/936621
Positive resist composition and patterning process Sep 8, 2004 Issued
Array ( [id] => 7127191 [patent_doc_number] => 20050058935 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-03-17 [patent_title] => 'Sulfonamide compound, polymer compound, resist material and pattern formation method' [patent_app_type] => utility [patent_app_number] => 10/932316 [patent_app_country] => US [patent_app_date] => 2004-09-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 10183 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0058/20050058935.pdf [firstpage_image] =>[orig_patent_app_number] => 10932316 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/932316
Sulfonamide compound, polymer compound, resist material and pattern formation method Sep 1, 2004 Issued
Array ( [id] => 6990753 [patent_doc_number] => 20050089790 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-04-28 [patent_title] => 'Photoresist composition for a spinless coater and method of forming a photoresist pattern using the same' [patent_app_type] => utility [patent_app_number] => 10/931387 [patent_app_country] => US [patent_app_date] => 2004-09-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 5630 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0089/20050089790.pdf [firstpage_image] =>[orig_patent_app_number] => 10931387 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/931387
Photoresist composition for a spinless coater and method of forming a photoresist pattern using the same Aug 31, 2004 Abandoned
Array ( [id] => 468395 [patent_doc_number] => 07232637 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-06-19 [patent_title] => 'Light sensitive media for optical devices using organic mesophasic materials' [patent_app_type] => utility [patent_app_number] => 10/931257 [patent_app_country] => US [patent_app_date] => 2004-09-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6535 [patent_no_of_claims] => 39 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 18 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/232/07232637.pdf [firstpage_image] =>[orig_patent_app_number] => 10931257 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/931257
Light sensitive media for optical devices using organic mesophasic materials Aug 31, 2004 Issued
Array ( [id] => 411309 [patent_doc_number] => 07282316 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-10-16 [patent_title] => 'Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same' [patent_app_type] => utility [patent_app_number] => 10/929059 [patent_app_country] => US [patent_app_date] => 2004-08-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 21118 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 8 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/282/07282316.pdf [firstpage_image] =>[orig_patent_app_number] => 10929059 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/929059
Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same Aug 26, 2004 Issued
Array ( [id] => 710024 [patent_doc_number] => 07056639 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-06-06 [patent_title] => 'Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid' [patent_app_type] => utility [patent_app_number] => 10/922377 [patent_app_country] => US [patent_app_date] => 2004-08-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 8921 [patent_no_of_claims] => 67 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 37 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/056/07056639.pdf [firstpage_image] =>[orig_patent_app_number] => 10922377 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/922377
Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid Aug 19, 2004 Issued
Array ( [id] => 5677692 [patent_doc_number] => 20060183048 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-08-17 [patent_title] => 'Positive photoresist composition and resist pattern formation' [patent_app_type] => utility [patent_app_number] => 10/568126 [patent_app_country] => US [patent_app_date] => 2004-08-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 8357 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0183/20060183048.pdf [firstpage_image] =>[orig_patent_app_number] => 10568126 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/568126
Positive photoresist composition and resist pattern formation Aug 18, 2004 Abandoned
Array ( [id] => 749187 [patent_doc_number] => 07022463 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-04-04 [patent_title] => 'Near-field exposure photoresist and fine pattern forming method using the same' [patent_app_type] => utility [patent_app_number] => 10/921184 [patent_app_country] => US [patent_app_date] => 2004-08-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 3789 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 149 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/022/07022463.pdf [firstpage_image] =>[orig_patent_app_number] => 10921184 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/921184
Near-field exposure photoresist and fine pattern forming method using the same Aug 18, 2004 Issued
Array ( [id] => 7033485 [patent_doc_number] => 20050031994 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-02-10 [patent_title] => 'Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device' [patent_app_type] => utility [patent_app_number] => 10/912841 [patent_app_country] => US [patent_app_date] => 2004-08-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 8237 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0031/20050031994.pdf [firstpage_image] =>[orig_patent_app_number] => 10912841 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/912841
Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device Aug 5, 2004 Issued
Array ( [id] => 122360 [patent_doc_number] => 07704669 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-04-27 [patent_title] => 'Acrylic polymer and radiation-sensitive resin composition' [patent_app_type] => utility [patent_app_number] => 10/567117 [patent_app_country] => US [patent_app_date] => 2004-08-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9561 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/704/07704669.pdf [firstpage_image] =>[orig_patent_app_number] => 10567117 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/567117
Acrylic polymer and radiation-sensitive resin composition Aug 3, 2004 Issued
Array ( [id] => 7060939 [patent_doc_number] => 20050003300 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-01-06 [patent_title] => 'Negative photosensitive resin composition and display device using the same' [patent_app_type] => utility [patent_app_number] => 10/909718 [patent_app_country] => US [patent_app_date] => 2004-08-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3957 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0003/20050003300.pdf [firstpage_image] =>[orig_patent_app_number] => 10909718 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/909718
Negative photosensitive resin composition and display device using the same Aug 1, 2004 Abandoned
Array ( [id] => 7025297 [patent_doc_number] => 20050019691 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-01-27 [patent_title] => 'Positive photoresist composition and patterning process using the same' [patent_app_type] => utility [patent_app_number] => 10/896536 [patent_app_country] => US [patent_app_date] => 2004-07-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 3937 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0019/20050019691.pdf [firstpage_image] =>[orig_patent_app_number] => 10896536 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/896536
Positive photoresist composition and patterning process using the same Jul 21, 2004 Issued
Array ( [id] => 162002 [patent_doc_number] => 07670746 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-03-02 [patent_title] => 'Positive photosensitive composition and method of forming resist pattern' [patent_app_type] => utility [patent_app_number] => 10/895824 [patent_app_country] => US [patent_app_date] => 2004-07-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 14237 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 176 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/670/07670746.pdf [firstpage_image] =>[orig_patent_app_number] => 10895824 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/895824
Positive photosensitive composition and method of forming resist pattern Jul 21, 2004 Issued
Array ( [id] => 162002 [patent_doc_number] => 07670746 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-03-02 [patent_title] => 'Positive photosensitive composition and method of forming resist pattern' [patent_app_type] => utility [patent_app_number] => 10/895824 [patent_app_country] => US [patent_app_date] => 2004-07-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 14237 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 176 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/670/07670746.pdf [firstpage_image] =>[orig_patent_app_number] => 10895824 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/895824
Positive photosensitive composition and method of forming resist pattern Jul 21, 2004 Issued
Array ( [id] => 162002 [patent_doc_number] => 07670746 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-03-02 [patent_title] => 'Positive photosensitive composition and method of forming resist pattern' [patent_app_type] => utility [patent_app_number] => 10/895824 [patent_app_country] => US [patent_app_date] => 2004-07-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 14237 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 176 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/670/07670746.pdf [firstpage_image] =>[orig_patent_app_number] => 10895824 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/895824
Positive photosensitive composition and method of forming resist pattern Jul 21, 2004 Issued
Array ( [id] => 162002 [patent_doc_number] => 07670746 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-03-02 [patent_title] => 'Positive photosensitive composition and method of forming resist pattern' [patent_app_type] => utility [patent_app_number] => 10/895824 [patent_app_country] => US [patent_app_date] => 2004-07-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 14237 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 176 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/670/07670746.pdf [firstpage_image] =>[orig_patent_app_number] => 10895824 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/895824
Positive photosensitive composition and method of forming resist pattern Jul 21, 2004 Issued
Menu