Juan M. Guillermety

Array ( [id] => 13878591 [patent_doc_number] => 20190035636 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2019-01-31 [patent_title] => PLASMA TREATMENT APPARATUS, SEMICONDUCTOR MANUFACTURING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE [patent_app_type] => utility [patent_app_number] => 16/028574 [patent_app_country] => US [patent_app_date] => 2018-07-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6543 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -20 [patent_words_short_claim] => 27 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16028574 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 18721430 [patent_doc_number] => 11798784 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2023-10-24 [patent_title] => Methods and apparatus for controlling plasma in a plasma processing system [patent_app_type] => utility [patent_app_number] => 16/024602 [patent_app_country] => US [patent_app_date] => 2018-06-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 8222 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 229 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16024602 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 14220965 [patent_doc_number] => 20190122867 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2019-04-25 [patent_title] => HOLLOW CATHODE, AN APPARATUS INCLUDING A HOLLOW CATHODE FOR MANUFACTURING A SEMICONDUCTOR DEVICE, AND A METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING A HOLLOW CATHODE [patent_app_type] => utility [patent_app_number] => 15/991500 [patent_app_country] => US [patent_app_date] => 2018-05-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6213 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -13 [patent_words_short_claim] => 2 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15991500 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 17188690 [patent_doc_number] => 20210335575 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2021-10-28 [patent_title] => CERAMIC STRUCTURE, LOWER ELECTRODE, AND DRY ETCHING MACHINE [patent_app_type] => utility [patent_app_number] => 16/320489 [patent_app_country] => US [patent_app_date] => 2018-05-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 1999 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 72 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16320489 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 14220963 [patent_doc_number] => 20190122866 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2019-04-25 [patent_title] => Plasma Processing Apparatus and Method of Manufacturing Semiconductor Device Using the Same [patent_app_type] => utility [patent_app_number] => 15/983178 [patent_app_country] => US [patent_app_date] => 2018-05-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4923 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -18 [patent_words_short_claim] => 77 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15983178 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 13419773 [patent_doc_number] => 20180261429 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-09-13 [patent_title] => ION-ION PLASMA ATOMIC LAYER ETCH PROCESS AND REACTOR [patent_app_type] => utility [patent_app_number] => 15/980621 [patent_app_country] => US [patent_app_date] => 2018-05-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8856 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -16 [patent_words_short_claim] => 127 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15980621 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 17908527 [patent_doc_number] => 11462387 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2022-10-04 [patent_title] => Substrate processing apparatus and substrate processing method [patent_app_type] => utility [patent_app_number] => 15/954903 [patent_app_country] => US [patent_app_date] => 2018-04-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 14 [patent_no_of_words] => 4218 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 85 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15954903 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 13485209 [patent_doc_number] => 20180294147 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-10-11 [patent_title] => PLASMA PROCESSING APPARATUS [patent_app_type] => utility [patent_app_number] => 15/942622 [patent_app_country] => US [patent_app_date] => 2018-04-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7010 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -3 [patent_words_short_claim] => 193 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15942622 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 14475497 [patent_doc_number] => 20190189396 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2019-06-20 [patent_title] => PLASMA PROCESSING APPARATUS [patent_app_type] => utility [patent_app_number] => 15/906983 [patent_app_country] => US [patent_app_date] => 2018-02-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10851 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -6 [patent_words_short_claim] => 215 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15906983 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 13908979 [patent_doc_number] => 20190043694 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2019-02-07 [patent_title] => PLASMA PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME [patent_app_type] => utility [patent_app_number] => 15/894152 [patent_app_country] => US [patent_app_date] => 2018-02-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6406 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 2 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15894152 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 13349411 [patent_doc_number] => 20180226245 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-08-09 [patent_title] => PLASMA PROCESSING APPARATUS [patent_app_type] => utility [patent_app_number] => 15/891501 [patent_app_country] => US [patent_app_date] => 2018-02-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12122 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -11 [patent_words_short_claim] => 88 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15891501 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 12800569 [patent_doc_number] => 20180158692 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-06-07 [patent_title] => APPARATUS FOR ACHIEVING ULTRA-HIGH SELECTIVITY WHILE ETCHING SILICON NITRIDE [patent_app_type] => utility [patent_app_number] => 15/878335 [patent_app_country] => US [patent_app_date] => 2018-01-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9133 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -18 [patent_words_short_claim] => 48 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15878335 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 13629503 [patent_doc_number] => 20180366304 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-12-20 [patent_title] => PLASMA PROCESSING APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME [patent_app_type] => utility [patent_app_number] => 15/867188 [patent_app_country] => US [patent_app_date] => 2018-01-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11355 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 2 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15867188 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 16738847 [patent_doc_number] => 10964511 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2021-03-30 [patent_title] => Semiconductor manufacturing device and method of operating the same [patent_app_type] => utility [patent_app_number] => 15/864529 [patent_app_country] => US [patent_app_date] => 2018-01-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 18 [patent_no_of_words] => 7597 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 321 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15864529 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 13306441 [patent_doc_number] => 20180204757 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-07-19 [patent_title] => PLASMA PROCESSING APPARATUS [patent_app_type] => utility [patent_app_number] => 15/862994 [patent_app_country] => US [patent_app_date] => 2018-01-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7508 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -6 [patent_words_short_claim] => 135 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15862994 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 12263664 [patent_doc_number] => 20180082861 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-03-22 [patent_title] => 'SELECTIVE ETCH USING MATERIAL MODIFICATION AND RF PULSING' [patent_app_type] => utility [patent_app_number] => 15/828112 [patent_app_country] => US [patent_app_date] => 2017-11-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 7881 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15828112 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 12872275 [patent_doc_number] => 20180182600 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-06-28 [patent_title] => PLASMA SYSTEM AND METHOD OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME [patent_app_type] => utility [patent_app_number] => 15/826665 [patent_app_country] => US [patent_app_date] => 2017-11-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8563 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 62 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15826665 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 16911312 [patent_doc_number] => 11043361 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2021-06-22 [patent_title] => Symmetric VHF source for a plasma reactor [patent_app_type] => utility [patent_app_number] => 15/793802 [patent_app_country] => US [patent_app_date] => 2017-10-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 10 [patent_no_of_words] => 3708 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 192 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15793802 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 18593276 [patent_doc_number] => 11742187 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2023-08-29 [patent_title] => RF capacitive coupled etch reactor [patent_app_type] => utility [patent_app_number] => 16/473775 [patent_app_country] => US [patent_app_date] => 2017-10-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 19 [patent_no_of_words] => 9976 [patent_no_of_claims] => 34 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 39 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16473775 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 15092845 [patent_doc_number] => 20190341234 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2019-11-07 [patent_title] => VACUUM PLASMA WORKPIECE TREATMENT APPARATUS [patent_app_type] => utility [patent_app_number] => 16/473810 [patent_app_country] => US [patent_app_date] => 2017-10-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9530 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -31 [patent_words_short_claim] => 159 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16473810 [rel_patent_id] =>[rel_patent_doc_number] =>)