| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 3658167
[patent_doc_number] => 05591680
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-01-07
[patent_title] => 'Formation methods of opaque or translucent films'
[patent_app_type] => 1
[patent_app_number] => 8/294126
[patent_app_country] => US
[patent_app_date] => 1994-08-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 1061
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 49
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/591/05591680.pdf
[firstpage_image] =>[orig_patent_app_number] => 294126
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/294126 | Formation methods of opaque or translucent films | Aug 21, 1994 | Issued |
Array
(
[id] => 3655940
[patent_doc_number] => 05622875
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-04-22
[patent_title] => 'Method for reclaiming substrate from semiconductor wafers'
[patent_app_type] => 1
[patent_app_number] => 8/291073
[patent_app_country] => US
[patent_app_date] => 1994-08-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 10
[patent_no_of_words] => 5346
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 132
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/622/05622875.pdf
[firstpage_image] =>[orig_patent_app_number] => 291073
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/291073 | Method for reclaiming substrate from semiconductor wafers | Aug 16, 1994 | Issued |
Array
(
[id] => 3682151
[patent_doc_number] => 05633212
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-05-27
[patent_title] => 'Pyrogenic wet thermal oxidation of semiconductor wafers'
[patent_app_type] => 1
[patent_app_number] => 8/279738
[patent_app_country] => US
[patent_app_date] => 1994-07-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 9
[patent_no_of_words] => 4028
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 107
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/633/05633212.pdf
[firstpage_image] =>[orig_patent_app_number] => 279738
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/279738 | Pyrogenic wet thermal oxidation of semiconductor wafers | Jul 21, 1994 | Issued |
Array
(
[id] => 3660275
[patent_doc_number] => 05648293
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-07-15
[patent_title] => 'Method of growing an amorphous silicon film'
[patent_app_type] => 1
[patent_app_number] => 8/273156
[patent_app_country] => US
[patent_app_date] => 1994-07-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 31
[patent_no_of_words] => 11834
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 60
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/648/05648293.pdf
[firstpage_image] =>[orig_patent_app_number] => 273156
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/273156 | Method of growing an amorphous silicon film | Jul 21, 1994 | Issued |
Array
(
[id] => 3625183
[patent_doc_number] => 05620932
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-04-15
[patent_title] => 'Method of oxidizing a semiconductor wafer'
[patent_app_type] => 1
[patent_app_number] => 8/266866
[patent_app_country] => US
[patent_app_date] => 1994-07-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 2620
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 100
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/620/05620932.pdf
[firstpage_image] =>[orig_patent_app_number] => 266866
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/266866 | Method of oxidizing a semiconductor wafer | Jul 4, 1994 | Issued |
| 08/269436 | HIGH TENSILE NITRIDE LAYER | Jun 29, 1994 | Abandoned |
| 08/267189 | CHARGED PARTICLE DEPOSITION OF ELECTRICALLY INSULATING FILMS | Jun 27, 1994 | Abandoned |
Array
(
[id] => 3633067
[patent_doc_number] => 05610105
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-03-11
[patent_title] => 'Densification in an intermetal dielectric film'
[patent_app_type] => 1
[patent_app_number] => 8/258180
[patent_app_country] => US
[patent_app_date] => 1994-06-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2834
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 34
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/610/05610105.pdf
[firstpage_image] =>[orig_patent_app_number] => 258180
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/258180 | Densification in an intermetal dielectric film | Jun 9, 1994 | Issued |
Array
(
[id] => 3538241
[patent_doc_number] => 05494858
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-02-27
[patent_title] => 'Method for forming porous composites as a low dielectric constant layer with varying porosity distribution electronics applications'
[patent_app_type] => 1
[patent_app_number] => 8/255157
[patent_app_country] => US
[patent_app_date] => 1994-06-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 13
[patent_no_of_words] => 4755
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 135
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/494/05494858.pdf
[firstpage_image] =>[orig_patent_app_number] => 255157
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/255157 | Method for forming porous composites as a low dielectric constant layer with varying porosity distribution electronics applications | Jun 6, 1994 | Issued |
Array
(
[id] => 3589880
[patent_doc_number] => 05567661
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-10-22
[patent_title] => 'Formation of planarized insulating film by plasma-enhanced CVD of organic silicon compound'
[patent_app_type] => 1
[patent_app_number] => 8/253778
[patent_app_country] => US
[patent_app_date] => 1994-06-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 15
[patent_no_of_words] => 5168
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 87
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/567/05567661.pdf
[firstpage_image] =>[orig_patent_app_number] => 253778
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/253778 | Formation of planarized insulating film by plasma-enhanced CVD of organic silicon compound | Jun 2, 1994 | Issued |
Array
(
[id] => 3587918
[patent_doc_number] => 05516729
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-05-14
[patent_title] => 'Method for planarizing a semiconductor topography using a spin-on glass material with a variable chemical-mechanical polish rate'
[patent_app_type] => 1
[patent_app_number] => 8/253807
[patent_app_country] => US
[patent_app_date] => 1994-06-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 7
[patent_no_of_words] => 4107
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 147
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/516/05516729.pdf
[firstpage_image] =>[orig_patent_app_number] => 253807
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/253807 | Method for planarizing a semiconductor topography using a spin-on glass material with a variable chemical-mechanical polish rate | Jun 2, 1994 | Issued |
Array
(
[id] => 3472390
[patent_doc_number] => 05476819
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-12-19
[patent_title] => 'Substrate anchor for undercut silicon on insulator microstructures'
[patent_app_type] => 1
[patent_app_number] => 8/251902
[patent_app_country] => US
[patent_app_date] => 1994-06-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 29
[patent_figures_cnt] => 51
[patent_no_of_words] => 9309
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 105
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/476/05476819.pdf
[firstpage_image] =>[orig_patent_app_number] => 251902
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/251902 | Substrate anchor for undercut silicon on insulator microstructures | May 31, 1994 | Issued |
Array
(
[id] => 4012930
[patent_doc_number] => 05880041
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-03-09
[patent_title] => 'Method for forming a dielectric layer using high pressure'
[patent_app_type] => 1
[patent_app_number] => 8/249608
[patent_app_country] => US
[patent_app_date] => 1994-05-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 2200
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 128
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/880/05880041.pdf
[firstpage_image] =>[orig_patent_app_number] => 249608
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/249608 | Method for forming a dielectric layer using high pressure | May 26, 1994 | Issued |
Array
(
[id] => 3410496
[patent_doc_number] => 05461008
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-10-24
[patent_title] => 'Method of preventing aluminum bond pad corrosion during dicing of integrated circuit wafers'
[patent_app_type] => 1
[patent_app_number] => 8/249815
[patent_app_country] => US
[patent_app_date] => 1994-05-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 3503
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 116
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/461/05461008.pdf
[firstpage_image] =>[orig_patent_app_number] => 249815
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/249815 | Method of preventing aluminum bond pad corrosion during dicing of integrated circuit wafers | May 25, 1994 | Issued |
Array
(
[id] => 3884634
[patent_doc_number] => 05776819
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-07-07
[patent_title] => 'Deposition of device quality, low hydrogen content, amorphous silicon films by hot filament technique using \"safe\" silicon source gas'
[patent_app_type] => 1
[patent_app_number] => 8/222720
[patent_app_country] => US
[patent_app_date] => 1994-05-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 7108
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 143
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/776/05776819.pdf
[firstpage_image] =>[orig_patent_app_number] => 222720
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/222720 | Deposition of device quality, low hydrogen content, amorphous silicon films by hot filament technique using "safe" silicon source gas | May 24, 1994 | Issued |
Array
(
[id] => 3492933
[patent_doc_number] => 05561087
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-10-01
[patent_title] => 'Method of forming a uniform thin film by cooling wafers during CVD'
[patent_app_type] => 1
[patent_app_number] => 8/238900
[patent_app_country] => US
[patent_app_date] => 1994-05-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 13
[patent_no_of_words] => 3368
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 65
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/561/05561087.pdf
[firstpage_image] =>[orig_patent_app_number] => 238900
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/238900 | Method of forming a uniform thin film by cooling wafers during CVD | May 5, 1994 | Issued |
Array
(
[id] => 3661133
[patent_doc_number] => 05624868
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-04-29
[patent_title] => 'Techniques for improving adhesion of silicon dioxide to titanium'
[patent_app_type] => 1
[patent_app_number] => 8/228054
[patent_app_country] => US
[patent_app_date] => 1994-04-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 13
[patent_no_of_words] => 2318
[patent_no_of_claims] => 32
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 60
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/624/05624868.pdf
[firstpage_image] =>[orig_patent_app_number] => 228054
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/228054 | Techniques for improving adhesion of silicon dioxide to titanium | Apr 14, 1994 | Issued |
Array
(
[id] => 3423910
[patent_doc_number] => 05459105
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-10-17
[patent_title] => 'Method of manufacturing a semiconductor device having multilayer insulating films'
[patent_app_type] => 1
[patent_app_number] => 8/223192
[patent_app_country] => US
[patent_app_date] => 1994-04-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 16
[patent_no_of_words] => 4658
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 183
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/459/05459105.pdf
[firstpage_image] =>[orig_patent_app_number] => 223192
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/223192 | Method of manufacturing a semiconductor device having multilayer insulating films | Apr 4, 1994 | Issued |
Array
(
[id] => 3598043
[patent_doc_number] => 05559057
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-09-24
[patent_title] => 'Method for depositing and patterning thin films formed by fusing nanocrystalline precursors'
[patent_app_type] => 1
[patent_app_number] => 8/217161
[patent_app_country] => US
[patent_app_date] => 1994-03-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 7
[patent_no_of_words] => 3057
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 92
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/559/05559057.pdf
[firstpage_image] =>[orig_patent_app_number] => 217161
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/217161 | Method for depositing and patterning thin films formed by fusing nanocrystalline precursors | Mar 23, 1994 | Issued |
Array
(
[id] => 3515416
[patent_doc_number] => 05576248
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-11-19
[patent_title] => 'Group IV semiconductor thin films formed at low temperature using nanocrystal precursors'
[patent_app_type] => 1
[patent_app_number] => 8/217160
[patent_app_country] => US
[patent_app_date] => 1994-03-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 2409
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 95
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/576/05576248.pdf
[firstpage_image] =>[orig_patent_app_number] => 217160
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/217160 | Group IV semiconductor thin films formed at low temperature using nanocrystal precursors | Mar 23, 1994 | Issued |