| Application number | Title of the application | Filing Date | Status |
|---|
Array
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[id] => 3100013
[patent_doc_number] => 05407487
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-04-18
[patent_title] => 'Method and apparatus for producing nickel shell molds'
[patent_app_type] => 1
[patent_app_number] => 8/238282
[patent_app_country] => US
[patent_app_date] => 1994-05-05
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Array
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[id] => 3454447
[patent_doc_number] => 05441595
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-08-15
[patent_title] => 'Dry etching apparatus and method of forming a via hole in an interlayer insulator using same'
[patent_app_type] => 1
[patent_app_number] => 8/238370
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/238370 | Dry etching apparatus and method of forming a via hole in an interlayer insulator using same | May 4, 1994 | Issued |
| 08/237890 | METHOD FOR THE PREPARATION OF FUNCTIONAL DEPOSITED FILM BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION, AND APPARATUS THEREFOR | May 3, 1994 | Abandoned |
Array
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[patent_doc_number] => 05601653
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-02-11
[patent_title] => 'Apparatus for performing plasma process on semiconductor wafers and the like and method of performing plasma process'
[patent_app_type] => 1
[patent_app_number] => 8/235656
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Array
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[id] => 3470522
[patent_doc_number] => 05431734
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-07-11
[patent_title] => 'Aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control'
[patent_app_type] => 1
[patent_app_number] => 8/234900
[patent_app_country] => US
[patent_app_date] => 1994-04-28
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| 08/225956 | RESISTANCE HEATED STEM MOUNTED ALUMINUM NITRIDE SUSCEPTOR ASSEMBLY | Apr 19, 1994 | Abandoned |
Array
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Array
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Array
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[patent_kind] => NA
[patent_issue_date] => 1995-04-18
[patent_title] => 'Apparatus for producing semiconductor device and method for producing semiconductor device'
[patent_app_type] => 1
[patent_app_number] => 8/224866
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/224866 | Apparatus for producing semiconductor device and method for producing semiconductor device | Apr 7, 1994 | Issued |
Array
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[id] => 3592799
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[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-09-24
[patent_title] => 'Pulsed source ion implantation apparatus and method'
[patent_app_type] => 1
[patent_app_number] => 8/225043
[patent_app_country] => US
[patent_app_date] => 1994-04-08
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[firstpage_image] =>[orig_patent_app_number] => 225043
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/225043 | Pulsed source ion implantation apparatus and method | Apr 7, 1994 | Issued |
Array
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[id] => 3620666
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[patent_kind] => NA
[patent_issue_date] => 1997-11-11
[patent_title] => 'Focus ring for semiconductor wafer processing in a plasma reactor'
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[firstpage_image] =>[orig_patent_app_number] => 223335
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/223335 | Focus ring for semiconductor wafer processing in a plasma reactor | Apr 4, 1994 | Issued |
Array
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[patent_kind] => NA
[patent_issue_date] => 1995-11-14
[patent_title] => 'Thin film deposition apparatus, mainly dedicated to PECVD and sputtering techniques and respective processes'
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Array
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[patent_kind] => NA
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Array
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[id] => 3538658
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[patent_kind] => NA
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| 08/220683 | PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS | Mar 30, 1994 | Abandoned |
Array
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Array
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Array
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Array
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