| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 2999610
[patent_doc_number] => 05374328
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-12-20
[patent_title] => 'Method of fabricating group III-V compound'
[patent_app_type] => 1
[patent_app_number] => 8/037074
[patent_app_country] => US
[patent_app_date] => 1993-03-25
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[pdf_file] => patents/05/374/05374328.pdf
[firstpage_image] =>[orig_patent_app_number] => 037074
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/037074 | Method of fabricating group III-V compound | Mar 24, 1993 | Issued |
Array
(
[id] => 3582843
[patent_doc_number] => 05549780
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-08-27
[patent_title] => 'Method for plasma processing and apparatus for plasma processing'
[patent_app_type] => 1
[patent_app_number] => 8/035921
[patent_app_country] => US
[patent_app_date] => 1993-03-22
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[pdf_file] => patents/05/549/05549780.pdf
[firstpage_image] =>[orig_patent_app_number] => 035921
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/035921 | Method for plasma processing and apparatus for plasma processing | Mar 21, 1993 | Issued |
Array
(
[id] => 3584057
[patent_doc_number] => 05496410
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-03-05
[patent_title] => 'Plasma processing apparatus and method of processing substrates by using same apparatus'
[patent_app_type] => 1
[patent_app_number] => 8/029054
[patent_app_country] => US
[patent_app_date] => 1993-03-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[pdf_file] => patents/05/496/05496410.pdf
[firstpage_image] =>[orig_patent_app_number] => 029054
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/029054 | Plasma processing apparatus and method of processing substrates by using same apparatus | Mar 9, 1993 | Issued |
| 08/026802 | APPARATUS AND METHOD FOR ETCHING SEMICONDUCTOR WAFER | Mar 4, 1993 | Abandoned |
| 08/024353 | FILM FORMING METHOD AND APPARATUS | Feb 28, 1993 | Abandoned |
Array
(
[id] => 2996786
[patent_doc_number] => 05358901
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-10-25
[patent_title] => 'Process for forming an intermetallic layer'
[patent_app_type] => 1
[patent_app_number] => 8/024042
[patent_app_country] => US
[patent_app_date] => 1993-03-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => patents/05/358/05358901.pdf
[firstpage_image] =>[orig_patent_app_number] => 024042
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/024042 | Process for forming an intermetallic layer | Feb 28, 1993 | Issued |
Array
(
[id] => 3569706
[patent_doc_number] => 05522935
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-06-04
[patent_title] => 'Plasma CVD apparatus for manufacturing a semiconductor device'
[patent_app_type] => 1
[patent_app_number] => 8/024226
[patent_app_country] => US
[patent_app_date] => 1993-03-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[pdf_file] => patents/05/522/05522935.pdf
[firstpage_image] =>[orig_patent_app_number] => 024226
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/024226 | Plasma CVD apparatus for manufacturing a semiconductor device | Feb 28, 1993 | Issued |
Array
(
[id] => 3048357
[patent_doc_number] => 05356516
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-10-18
[patent_title] => 'Process for etching mixed metal oxides'
[patent_app_type] => 1
[patent_app_number] => 8/023286
[patent_app_country] => US
[patent_app_date] => 1993-02-26
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/356/05356516.pdf
[firstpage_image] =>[orig_patent_app_number] => 023286
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/023286 | Process for etching mixed metal oxides | Feb 25, 1993 | Issued |
Array
(
[id] => 2987921
[patent_doc_number] => 05362353
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-11-08
[patent_title] => 'Faraday cage for barrel-style plasma etchers'
[patent_app_type] => 1
[patent_app_number] => 8/023305
[patent_app_country] => US
[patent_app_date] => 1993-02-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 4
[patent_no_of_words] => 2631
[patent_no_of_claims] => 16
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/362/05362353.pdf
[firstpage_image] =>[orig_patent_app_number] => 023305
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/023305 | Faraday cage for barrel-style plasma etchers | Feb 25, 1993 | Issued |
| 08/021859 | MICROWAVE PLASMA PROCESSING APPARATUS | Feb 23, 1993 | Abandoned |
| 08/017752 | METHOD AND APPARATUS FOR CHEMICAL COATING ON OPPOSITE SURFACES OF WORKPIECES | Feb 15, 1993 | Abandoned |
| 07/984234 | HIGH-FREQUENCY SEMICONDUCTOR WAFER PROCESSING APPARATUS AND METHOD | Jan 31, 1993 | Abandoned |
Array
(
[id] => 3071711
[patent_doc_number] => 05364818
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-11-15
[patent_title] => 'Sog with moisture resistant protective capping layer'
[patent_app_type] => 1
[patent_app_number] => 7/962214
[patent_app_country] => US
[patent_app_date] => 1993-01-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 5415
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/364/05364818.pdf
[firstpage_image] =>[orig_patent_app_number] => 962214
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/962214 | Sog with moisture resistant protective capping layer | Jan 25, 1993 | Issued |
Array
(
[id] => 3038993
[patent_doc_number] => 05376590
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-12-27
[patent_title] => 'Semiconductor device and method of fabricating the same'
[patent_app_type] => 1
[patent_app_number] => 8/005670
[patent_app_country] => US
[patent_app_date] => 1993-01-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
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[pdf_file] => patents/05/376/05376590.pdf
[firstpage_image] =>[orig_patent_app_number] => 005670
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/005670 | Semiconductor device and method of fabricating the same | Jan 18, 1993 | Issued |
Array
(
[id] => 3451371
[patent_doc_number] => 05472508
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-12-05
[patent_title] => 'Apparatus for selective chemical vapor deposition of dielectric, semiconductor and conductive films on semiconductor and metallic substrates'
[patent_app_type] => 1
[patent_app_number] => 8/004380
[patent_app_country] => US
[patent_app_date] => 1993-01-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[pdf_file] => patents/05/472/05472508.pdf
[firstpage_image] =>[orig_patent_app_number] => 004380
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/004380 | Apparatus for selective chemical vapor deposition of dielectric, semiconductor and conductive films on semiconductor and metallic substrates | Jan 13, 1993 | Issued |
| 08/003707 | DEPOSITING POLYSILICON FILMS HAVING IMPROVED UNIFORMITY AND APPARATUS THEREFOR | Jan 12, 1993 | Abandoned |
Array
(
[id] => 3039045
[patent_doc_number] => 05376593
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-12-27
[patent_title] => 'Method for fabricating stacked layer Si.sub.3 N.sub.4 for low leakage high capacitance films using rapid thermal nitridation'
[patent_app_type] => 1
[patent_app_number] => 7/999335
[patent_app_country] => US
[patent_app_date] => 1992-12-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => patents/05/376/05376593.pdf
[firstpage_image] =>[orig_patent_app_number] => 999335
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/999335 | Method for fabricating stacked layer Si.sub.3 N.sub.4 for low leakage high capacitance films using rapid thermal nitridation | Dec 30, 1992 | Issued |
| 07/998738 | PLASMA ETCHING APPARATUS | Dec 29, 1992 | Abandoned |
Array
(
[id] => 3412910
[patent_doc_number] => 05433787
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-07-18
[patent_title] => 'Apparatus for forming deposited film including light transmissive diffusion plate'
[patent_app_type] => 1
[patent_app_number] => 7/987786
[patent_app_country] => US
[patent_app_date] => 1992-12-09
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 987786
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/987786 | Apparatus for forming deposited film including light transmissive diffusion plate | Dec 8, 1992 | Issued |
| 07/986649 | PLASMA PRESSURE CONTROL ASSEMBLY | Dec 7, 1992 | Abandoned |