Search

Ket D. Dang

Examiner (ID: 1288, Phone: (571)270-7827 , Office: P/3742 )

Most Active Art Unit
3742
Art Unit(s)
3742, 3761
Total Applications
700
Issued Applications
410
Pending Applications
39
Abandoned Applications
261

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 3836990 [patent_doc_number] => 05846888 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-12-08 [patent_title] => 'Method for in-situ incorporation of desirable impurities into high pressure oxides' [patent_app_type] => 1 [patent_app_number] => 8/721838 [patent_app_country] => US [patent_app_date] => 1996-09-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 2257 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 72 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/846/05846888.pdf [firstpage_image] =>[orig_patent_app_number] => 721838 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/721838
Method for in-situ incorporation of desirable impurities into high pressure oxides Sep 26, 1996 Issued
08/721080 DEPOSITION OF DEVICE QUALITY, LOW HYDROGEN CONTENT, HYDROGENATED AMORPHOUS SILICON AT HIGH DEPOSITION RATES WITH INCREASED STABILITY USING THE HOT WIRE FILAMENT TECHNIQUE Sep 25, 1996 Abandoned
Array ( [id] => 4116976 [patent_doc_number] => 06071797 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-06-06 [patent_title] => 'Method for forming amorphous carbon thin film by plasma chemical vapor deposition' [patent_app_type] => 1 [patent_app_number] => 8/719958 [patent_app_country] => US [patent_app_date] => 1996-09-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 4809 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 85 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/071/06071797.pdf [firstpage_image] =>[orig_patent_app_number] => 719958 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/719958
Method for forming amorphous carbon thin film by plasma chemical vapor deposition Sep 23, 1996 Issued
Array ( [id] => 3875427 [patent_doc_number] => 05747382 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-05-05 [patent_title] => 'Two-step planarization process using chemical-mechanical polishing and reactive-ion-etching' [patent_app_type] => 1 [patent_app_number] => 8/719232 [patent_app_country] => US [patent_app_date] => 1996-09-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 2592 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 154 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/747/05747382.pdf [firstpage_image] =>[orig_patent_app_number] => 719232 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/719232
Two-step planarization process using chemical-mechanical polishing and reactive-ion-etching Sep 23, 1996 Issued
Array ( [id] => 3694996 [patent_doc_number] => 05661093 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-08-26 [patent_title] => 'Method for the stabilization of halogen-doped films through the use of multiple sealing layers' [patent_app_type] => 1 [patent_app_number] => 8/716490 [patent_app_country] => US [patent_app_date] => 1996-09-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 19 [patent_no_of_words] => 11525 [patent_no_of_claims] => 34 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 29 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/661/05661093.pdf [firstpage_image] =>[orig_patent_app_number] => 716490 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/716490
Method for the stabilization of halogen-doped films through the use of multiple sealing layers Sep 11, 1996 Issued
Array ( [id] => 3950844 [patent_doc_number] => 05899746 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-05-04 [patent_title] => 'Method of forming pattern' [patent_app_type] => 1 [patent_app_number] => 8/697732 [patent_app_country] => US [patent_app_date] => 1996-08-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 13 [patent_no_of_words] => 1625 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 228 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/899/05899746.pdf [firstpage_image] =>[orig_patent_app_number] => 697732 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/697732
Method of forming pattern Aug 28, 1996 Issued
Array ( [id] => 3774345 [patent_doc_number] => 05817581 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-10-06 [patent_title] => 'Process for the creation of a thermal SiO.sub.2 layer with extremely uniform layer thickness' [patent_app_type] => 1 [patent_app_number] => 8/702608 [patent_app_country] => US [patent_app_date] => 1996-08-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 1715 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 239 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/817/05817581.pdf [firstpage_image] =>[orig_patent_app_number] => 702608 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/702608
Process for the creation of a thermal SiO.sub.2 layer with extremely uniform layer thickness Aug 25, 1996 Issued
Array ( [id] => 3769193 [patent_doc_number] => 05849644 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-12-15 [patent_title] => 'Semiconductor processing methods of chemical vapor depositing SiO.sub.2 on a substrate' [patent_app_type] => 1 [patent_app_number] => 8/696243 [patent_app_country] => US [patent_app_date] => 1996-08-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 2820 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 123 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/849/05849644.pdf [firstpage_image] =>[orig_patent_app_number] => 696243 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/696243
Semiconductor processing methods of chemical vapor depositing SiO.sub.2 on a substrate Aug 12, 1996 Issued
Array ( [id] => 3771833 [patent_doc_number] => 05807785 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-09-15 [patent_title] => 'Low dielectric constant silicon dioxide sandwich layer' [patent_app_type] => 1 [patent_app_number] => 8/691990 [patent_app_country] => US [patent_app_date] => 1996-08-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 5 [patent_no_of_words] => 5357 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 199 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/807/05807785.pdf [firstpage_image] =>[orig_patent_app_number] => 691990 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/691990
Low dielectric constant silicon dioxide sandwich layer Aug 1, 1996 Issued
Array ( [id] => 1336616 [patent_doc_number] => 06593245 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-07-15 [patent_title] => 'Silicon nitride etch process with critical dimension gain' [patent_app_type] => B1 [patent_app_number] => 08/690848 [patent_app_country] => US [patent_app_date] => 1996-08-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 5 [patent_no_of_words] => 1812 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 173 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/593/06593245.pdf [firstpage_image] =>[orig_patent_app_number] => 08690848 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/690848
Silicon nitride etch process with critical dimension gain Jul 31, 1996 Issued
Array ( [id] => 3660794 [patent_doc_number] => 05656556 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-08-12 [patent_title] => 'Method for fabricating planarized borophosphosilicate glass films having low anneal temperatures' [patent_app_type] => 1 [patent_app_number] => 8/684663 [patent_app_country] => US [patent_app_date] => 1996-07-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 3513 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 208 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/656/05656556.pdf [firstpage_image] =>[orig_patent_app_number] => 684663 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/684663
Method for fabricating planarized borophosphosilicate glass films having low anneal temperatures Jul 21, 1996 Issued
08/677218 IN-SITU CONSTRUCTION OF AN OXIDIZED FILM ON A SEMICONDUCTOR WAFFER Jul 8, 1996 Abandoned
08/673279 SOLID POROUS INSULATED CONDUCTIVE LINES Jun 27, 1996 Abandoned
Array ( [id] => 3682013 [patent_doc_number] => 05633202 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-05-27 [patent_title] => 'High tensile nitride layer' [patent_app_type] => 1 [patent_app_number] => 8/660734 [patent_app_country] => US [patent_app_date] => 1996-06-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 15 [patent_no_of_words] => 6012 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/633/05633202.pdf [firstpage_image] =>[orig_patent_app_number] => 660734 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/660734
High tensile nitride layer Jun 5, 1996 Issued
Array ( [id] => 3832444 [patent_doc_number] => 05814555 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-09-29 [patent_title] => 'Interlevel dielectric with air gaps to lessen capacitive coupling' [patent_app_type] => 1 [patent_app_number] => 8/658456 [patent_app_country] => US [patent_app_date] => 1996-06-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 10 [patent_no_of_words] => 3988 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 61 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/814/05814555.pdf [firstpage_image] =>[orig_patent_app_number] => 658456 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/658456
Interlevel dielectric with air gaps to lessen capacitive coupling Jun 4, 1996 Issued
08/655409 METHOD FOR PRODUCING SEMICONDUCTOR DEVICE May 29, 1996 Abandoned
Array ( [id] => 3812632 [patent_doc_number] => 05710079 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-01-20 [patent_title] => 'Method and apparatus for forming dielectric films' [patent_app_type] => 1 [patent_app_number] => 8/653264 [patent_app_country] => US [patent_app_date] => 1996-05-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 4420 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 91 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/710/05710079.pdf [firstpage_image] =>[orig_patent_app_number] => 653264 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/653264
Method and apparatus for forming dielectric films May 23, 1996 Issued
Array ( [id] => 3722753 [patent_doc_number] => 05672525 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-09-30 [patent_title] => 'Polysilicon gate reoxidation in a gas mixture of oxygen and nitrogen trifluoride gas by rapid thermal processing to improve hot carrier immunity' [patent_app_type] => 1 [patent_app_number] => 8/652882 [patent_app_country] => US [patent_app_date] => 1996-05-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 14 [patent_no_of_words] => 3603 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 130 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/672/05672525.pdf [firstpage_image] =>[orig_patent_app_number] => 652882 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/652882
Polysilicon gate reoxidation in a gas mixture of oxygen and nitrogen trifluoride gas by rapid thermal processing to improve hot carrier immunity May 22, 1996 Issued
08/646719 SEMICONDUCTOR PROCESSING METHOD OF REDUCING THICKNESS DEPLETION OF A NITRIDE LAYER AT A JUNCTION OF DIFFERENT UNDERLYING LAYERS May 8, 1996 Abandoned
08/583130 METHOD FOR MANUFACTURING SEMICONDUCTOR Apr 23, 1996 Abandoned
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