| Application number | Title of the application | Filing Date | Status |
|---|
Array
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[patent_doc_number] => 04842984
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-06-27
[patent_title] => 'Water soluble photosensitive resin compositions with bisazide compound'
[patent_app_type] => 1
[patent_app_number] => 7/067942
[patent_app_country] => US
[patent_app_date] => 1987-06-29
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[rel_patent_id] =>[rel_patent_doc_number] =>) 07/067942 | Water soluble photosensitive resin compositions with bisazide compound | Jun 28, 1987 | Issued |
| 07/064477 | PHOTOSENSITIVE MATERIAL | Jun 21, 1987 | Abandoned |
| 07/064429 | IMAGE FORMING MATERIAL | Jun 21, 1987 | Abandoned |
| 07/063877 | METHOD FOR PRODUCING FINE PATTERNS | Jun 18, 1987 | Abandoned |
| 07/065680 | PRE-EXPOSURE METHOD FOR INCREASED SENSITIVITY IN HIGH CONTRAST RESIST DEVELOPMENT | Jun 17, 1987 | Abandoned |
Array
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[id] => 2509516
[patent_doc_number] => 04840867
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[patent_kind] => NA
[patent_issue_date] => 1989-06-20
[patent_title] => 'Positive-working radiation-sensitive recording material with radiation-sensitive 1,2-quinone diazide underlayer and thicker positive-working radiation-sensitive overlayer'
[patent_app_type] => 1
[patent_app_number] => 7/063070
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[firstpage_image] =>[orig_patent_app_number] => 063070
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/063070 | Positive-working radiation-sensitive recording material with radiation-sensitive 1,2-quinone diazide underlayer and thicker positive-working radiation-sensitive overlayer | Jun 16, 1987 | Issued |
Array
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[id] => 2545683
[patent_doc_number] => 04804612
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-02-14
[patent_title] => 'Highly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturation'
[patent_app_type] => 1
[patent_app_number] => 7/062954
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[firstpage_image] =>[orig_patent_app_number] => 062954
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/062954 | Highly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturation | Jun 15, 1987 | Issued |
Array
(
[id] => 2560138
[patent_doc_number] => 04835089
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-05-30
[patent_title] => 'Resist pattern forming process with dry etching'
[patent_app_type] => 1
[patent_app_number] => 7/060323
[patent_app_country] => US
[patent_app_date] => 1987-06-10
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[firstpage_image] =>[orig_patent_app_number] => 060323
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/060323 | Resist pattern forming process with dry etching | Jun 9, 1987 | Issued |
Array
(
[id] => 2490311
[patent_doc_number] => 04842982
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-06-27
[patent_title] => 'Radiation-sensitive recording material having radiation-sensitive recording layer and discontinuous radiation-sensitive covering layer of the same composition'
[patent_app_type] => 1
[patent_app_number] => 7/062340
[patent_app_country] => US
[patent_app_date] => 1987-06-09
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[rel_patent_id] =>[rel_patent_doc_number] =>) 07/062340 | Radiation-sensitive recording material having radiation-sensitive recording layer and discontinuous radiation-sensitive covering layer of the same composition | Jun 8, 1987 | Issued |
| 07/062339 | PATTERN FORMING METHOD AND COMPOSITION FOR PATTERN FORMATION TO BE USED THEREFOR | Jun 8, 1987 | Abandoned |
Array
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[id] => 2478795
[patent_doc_number] => 04882260
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[patent_issue_date] => 1989-11-21
[patent_title] => 'Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye'
[patent_app_type] => 1
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[rel_patent_id] =>[rel_patent_doc_number] =>) 07/059556 | Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye | Jun 4, 1987 | Issued |
Array
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[id] => 2443969
[patent_doc_number] => 04740451
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1988-04-26
[patent_title] => 'Photosensitive compositions and a method of patterning using the same'
[patent_app_type] => 1
[patent_app_number] => 7/056257
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[pdf_file] => patents/04/740/04740451.pdf
[firstpage_image] =>[orig_patent_app_number] => 056257
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/056257 | Photosensitive compositions and a method of patterning using the same | May 25, 1987 | Issued |
Array
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[id] => 2489162
[patent_doc_number] => 04828957
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-05-09
[patent_title] => 'Two-color heat-sensitive recording material with 2-hydroxy-3-naphthoanilide as both coupler and color developing agent'
[patent_app_type] => 1
[patent_app_number] => 7/053724
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Array
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[id] => 2489202
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[patent_issue_date] => 1989-05-09
[patent_title] => 'Light-sensitive diazonium resin mixture and light-sensitive diazonium resin containing recording material with organic peroxide compound'
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[patent_app_number] => 7/053011
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Array
(
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[patent_issue_date] => 1990-02-20
[patent_title] => 'Undercoating material for photosensitive resins'
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[firstpage_image] =>[orig_patent_app_number] => 052466
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/052466 | Undercoating material for photosensitive resins | May 19, 1987 | Issued |
Array
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[patent_issue_date] => 1989-05-09
[patent_title] => 'Method for manufacturing a phosphor pattern using phososensitive phosphor paste layer of high viscosity'
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Array
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Array
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Array
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Array
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[patent_issue_date] => 1989-10-31
[patent_title] => 'Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group'
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