Search

Kiersten V. Summers

Examiner (ID: 9001, Phone: (571)272-6542 , Office: P/3688 )

Most Active Art Unit
3688
Art Unit(s)
3626, 3682, 3621, 3688, 3687
Total Applications
366
Issued Applications
42
Pending Applications
63
Abandoned Applications
270

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 2490372 [patent_doc_number] => 04842984 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-06-27 [patent_title] => 'Water soluble photosensitive resin compositions with bisazide compound' [patent_app_type] => 1 [patent_app_number] => 7/067942 [patent_app_country] => US [patent_app_date] => 1987-06-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3618 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 94 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/842/04842984.pdf [firstpage_image] =>[orig_patent_app_number] => 067942 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/067942
Water soluble photosensitive resin compositions with bisazide compound Jun 28, 1987 Issued
07/064477 PHOTOSENSITIVE MATERIAL Jun 21, 1987 Abandoned
07/064429 IMAGE FORMING MATERIAL Jun 21, 1987 Abandoned
07/063877 METHOD FOR PRODUCING FINE PATTERNS Jun 18, 1987 Abandoned
07/065680 PRE-EXPOSURE METHOD FOR INCREASED SENSITIVITY IN HIGH CONTRAST RESIST DEVELOPMENT Jun 17, 1987 Abandoned
Array ( [id] => 2509516 [patent_doc_number] => 04840867 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-06-20 [patent_title] => 'Positive-working radiation-sensitive recording material with radiation-sensitive 1,2-quinone diazide underlayer and thicker positive-working radiation-sensitive overlayer' [patent_app_type] => 1 [patent_app_number] => 7/063070 [patent_app_country] => US [patent_app_date] => 1987-06-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4666 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 190 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/840/04840867.pdf [firstpage_image] =>[orig_patent_app_number] => 063070 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/063070
Positive-working radiation-sensitive recording material with radiation-sensitive 1,2-quinone diazide underlayer and thicker positive-working radiation-sensitive overlayer Jun 16, 1987 Issued
Array ( [id] => 2545683 [patent_doc_number] => 04804612 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-02-14 [patent_title] => 'Highly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturation' [patent_app_type] => 1 [patent_app_number] => 7/062954 [patent_app_country] => US [patent_app_date] => 1987-06-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3061 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 49 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/804/04804612.pdf [firstpage_image] =>[orig_patent_app_number] => 062954 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/062954
Highly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturation Jun 15, 1987 Issued
Array ( [id] => 2560138 [patent_doc_number] => 04835089 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-05-30 [patent_title] => 'Resist pattern forming process with dry etching' [patent_app_type] => 1 [patent_app_number] => 7/060323 [patent_app_country] => US [patent_app_date] => 1987-06-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 4667 [patent_no_of_claims] => 34 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 366 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/835/04835089.pdf [firstpage_image] =>[orig_patent_app_number] => 060323 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/060323
Resist pattern forming process with dry etching Jun 9, 1987 Issued
Array ( [id] => 2490311 [patent_doc_number] => 04842982 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-06-27 [patent_title] => 'Radiation-sensitive recording material having radiation-sensitive recording layer and discontinuous radiation-sensitive covering layer of the same composition' [patent_app_type] => 1 [patent_app_number] => 7/062340 [patent_app_country] => US [patent_app_date] => 1987-06-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6605 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 129 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/842/04842982.pdf [firstpage_image] =>[orig_patent_app_number] => 062340 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/062340
Radiation-sensitive recording material having radiation-sensitive recording layer and discontinuous radiation-sensitive covering layer of the same composition Jun 8, 1987 Issued
07/062339 PATTERN FORMING METHOD AND COMPOSITION FOR PATTERN FORMATION TO BE USED THEREFOR Jun 8, 1987 Abandoned
Array ( [id] => 2478795 [patent_doc_number] => 04882260 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-11-21 [patent_title] => 'Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye' [patent_app_type] => 1 [patent_app_number] => 7/059556 [patent_app_country] => US [patent_app_date] => 1987-06-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4020 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 150 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/882/04882260.pdf [firstpage_image] =>[orig_patent_app_number] => 059556 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/059556
Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye Jun 4, 1987 Issued
Array ( [id] => 2443969 [patent_doc_number] => 04740451 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1988-04-26 [patent_title] => 'Photosensitive compositions and a method of patterning using the same' [patent_app_type] => 1 [patent_app_number] => 7/056257 [patent_app_country] => US [patent_app_date] => 1987-05-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4060 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 241 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/740/04740451.pdf [firstpage_image] =>[orig_patent_app_number] => 056257 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/056257
Photosensitive compositions and a method of patterning using the same May 25, 1987 Issued
Array ( [id] => 2489162 [patent_doc_number] => 04828957 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-05-09 [patent_title] => 'Two-color heat-sensitive recording material with 2-hydroxy-3-naphthoanilide as both coupler and color developing agent' [patent_app_type] => 1 [patent_app_number] => 7/053724 [patent_app_country] => US [patent_app_date] => 1987-05-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5160 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 330 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/828/04828957.pdf [firstpage_image] =>[orig_patent_app_number] => 053724 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/053724
Two-color heat-sensitive recording material with 2-hydroxy-3-naphthoanilide as both coupler and color developing agent May 25, 1987 Issued
Array ( [id] => 2489202 [patent_doc_number] => 04828959 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-05-09 [patent_title] => 'Light-sensitive diazonium resin mixture and light-sensitive diazonium resin containing recording material with organic peroxide compound' [patent_app_type] => 1 [patent_app_number] => 7/053011 [patent_app_country] => US [patent_app_date] => 1987-05-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6858 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 318 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/828/04828959.pdf [firstpage_image] =>[orig_patent_app_number] => 053011 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/053011
Light-sensitive diazonium resin mixture and light-sensitive diazonium resin containing recording material with organic peroxide compound May 21, 1987 Issued
Array ( [id] => 2609844 [patent_doc_number] => 04902770 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-02-20 [patent_title] => 'Undercoating material for photosensitive resins' [patent_app_type] => 1 [patent_app_number] => 7/052466 [patent_app_country] => US [patent_app_date] => 1987-05-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7919 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 97 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/902/04902770.pdf [firstpage_image] =>[orig_patent_app_number] => 052466 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/052466
Undercoating material for photosensitive resins May 19, 1987 Issued
Array ( [id] => 2488990 [patent_doc_number] => 04828949 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-05-09 [patent_title] => 'Method for manufacturing a phosphor pattern using phososensitive phosphor paste layer of high viscosity' [patent_app_type] => 1 [patent_app_number] => 7/052164 [patent_app_country] => US [patent_app_date] => 1987-05-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 7 [patent_no_of_words] => 2392 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 178 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/828/04828949.pdf [firstpage_image] =>[orig_patent_app_number] => 052164 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/052164
Method for manufacturing a phosphor pattern using phososensitive phosphor paste layer of high viscosity May 18, 1987 Issued
Array ( [id] => 2445385 [patent_doc_number] => 04791046 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1988-12-13 [patent_title] => 'Process for forming mask patterns of positive type resist material with trimethylsilynitrile' [patent_app_type] => 1 [patent_app_number] => 7/050482 [patent_app_country] => US [patent_app_date] => 1987-05-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 8 [patent_no_of_words] => 2144 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 200 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/791/04791046.pdf [firstpage_image] =>[orig_patent_app_number] => 050482 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/050482
Process for forming mask patterns of positive type resist material with trimethylsilynitrile May 17, 1987 Issued
Array ( [id] => 2903807 [patent_doc_number] => 05215867 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-06-01 [patent_title] => 'Method with gas functionalized plasma developed layer' [patent_app_type] => 1 [patent_app_number] => 7/054147 [patent_app_country] => US [patent_app_date] => 1987-05-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 9 [patent_no_of_words] => 6465 [patent_no_of_claims] => 53 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 99 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/215/05215867.pdf [firstpage_image] =>[orig_patent_app_number] => 054147 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/054147
Method with gas functionalized plasma developed layer May 14, 1987 Issued
Array ( [id] => 2525621 [patent_doc_number] => 04797346 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-01-10 [patent_title] => 'Light-sensitive composition for positive-type light-sensitive lithographic printing plates' [patent_app_type] => 1 [patent_app_number] => 7/051224 [patent_app_country] => US [patent_app_date] => 1987-05-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 9869 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 215 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/797/04797346.pdf [firstpage_image] =>[orig_patent_app_number] => 051224 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/051224
Light-sensitive composition for positive-type light-sensitive lithographic printing plates May 12, 1987 Issued
Array ( [id] => 2522273 [patent_doc_number] => 04877711 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-10-31 [patent_title] => 'Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group' [patent_app_type] => 1 [patent_app_number] => 7/048949 [patent_app_country] => US [patent_app_date] => 1987-05-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5846 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 277 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/877/04877711.pdf [firstpage_image] =>[orig_patent_app_number] => 048949 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/048949
Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group May 11, 1987 Issued
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