Search

Kiersten V. Summers

Examiner (ID: 9001, Phone: (571)272-6542 , Office: P/3688 )

Most Active Art Unit
3688
Art Unit(s)
3626, 3682, 3621, 3688, 3687
Total Applications
366
Issued Applications
42
Pending Applications
63
Abandoned Applications
270

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 2456103 [patent_doc_number] => 04784936 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1988-11-15 [patent_title] => 'Process of forming a resist structure on substrate having topographical features using positive photoresist layer and poly(vinyl pyrrolidone) overlayer' [patent_app_type] => 1 [patent_app_number] => 6/905077 [patent_app_country] => US [patent_app_date] => 1986-09-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 4 [patent_no_of_words] => 2212 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 105 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/784/04784936.pdf [firstpage_image] =>[orig_patent_app_number] => 905077 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/905077
Process of forming a resist structure on substrate having topographical features using positive photoresist layer and poly(vinyl pyrrolidone) overlayer Sep 8, 1986 Issued
Array ( [id] => 2414894 [patent_doc_number] => 04746591 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1988-05-24 [patent_title] => 'Process for producing presensitized lithographic printing plate with liquid honed aluminum support surface' [patent_app_type] => 1 [patent_app_number] => 6/903907 [patent_app_country] => US [patent_app_date] => 1986-09-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4119 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 128 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/746/04746591.pdf [firstpage_image] =>[orig_patent_app_number] => 903907 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/903907
Process for producing presensitized lithographic printing plate with liquid honed aluminum support surface Sep 3, 1986 Issued
06/898792 RADIATION-SENSITIVE COATING AGENT Aug 17, 1986 Abandoned
06/895622 POSITIVE-AND NEGATIVE-WORKING RESIST COMPOSITIONS WITH ACID GENERATING PHOTOINITIATOR AND POLYMER WITH ACID LABILE GROUPS PENDANT FROM POLYMER BACKBONE Aug 10, 1986 Abandoned
Array ( [id] => 2336083 [patent_doc_number] => 04711836 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1987-12-08 [patent_title] => 'Development of positive-working photoresist compositions' [patent_app_type] => 1 [patent_app_number] => 6/895628 [patent_app_country] => US [patent_app_date] => 1986-08-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3010 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 136 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/711/04711836.pdf [firstpage_image] =>[orig_patent_app_number] => 895628 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/895628
Development of positive-working photoresist compositions Aug 10, 1986 Issued
06/895609 IMAGE REVERSAL NEGATIVE WORKING PHOTORESIST Aug 10, 1986 Abandoned
Array ( [id] => 2449757 [patent_doc_number] => 04722883 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1988-02-02 [patent_title] => 'Process for producing fine patterns' [patent_app_type] => 1 [patent_app_number] => 6/894122 [patent_app_country] => US [patent_app_date] => 1986-08-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 4569 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 248 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/722/04722883.pdf [firstpage_image] =>[orig_patent_app_number] => 894122 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/894122
Process for producing fine patterns Aug 6, 1986 Issued
06/892116 NOVEL POSITIVE-WORKING PHOTORESIST COMPOSITION Aug 3, 1986 Abandoned
Array ( [id] => 2296710 [patent_doc_number] => 04696891 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1987-09-29 [patent_title] => 'Process for the production of negative relief copies using photosensitive composition having 1,2-quinone diazide and quaternary ammonium compound' [patent_app_type] => 1 [patent_app_number] => 6/892893 [patent_app_country] => US [patent_app_date] => 1986-08-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3895 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 187 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/696/04696891.pdf [firstpage_image] =>[orig_patent_app_number] => 892893 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/892893
Process for the production of negative relief copies using photosensitive composition having 1,2-quinone diazide and quaternary ammonium compound Jul 31, 1986 Issued
06/891888 LIGHT-SENSITIVE MIXTURE AND LIGHT-SENSITIVE RECORDING MATERIAL PREPARED THEREWITH Jul 31, 1986 Abandoned
06/889032 IMAGE REVERSAL NEGATIVE WORKING PHOTORESIST Jul 22, 1986 Abandoned
06/886670 RADIATION-SENSITIVE RESIN COMPOSITION Jul 17, 1986 Abandoned
Array ( [id] => 2412538 [patent_doc_number] => 04731319 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1988-03-15 [patent_title] => 'Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins' [patent_app_type] => 1 [patent_app_number] => 6/886839 [patent_app_country] => US [patent_app_date] => 1986-07-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 3914 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 175 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/731/04731319.pdf [firstpage_image] =>[orig_patent_app_number] => 886839 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/886839
Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins Jul 17, 1986 Issued
Array ( [id] => 2325647 [patent_doc_number] => 04698291 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1987-10-06 [patent_title] => 'Photosensitive composition with 4-azido-2\'-methoxychalcone' [patent_app_type] => 1 [patent_app_number] => 6/886353 [patent_app_country] => US [patent_app_date] => 1986-07-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 2360 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 127 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/698/04698291.pdf [firstpage_image] =>[orig_patent_app_number] => 886353 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/886353
Photosensitive composition with 4-azido-2'-methoxychalcone Jul 16, 1986 Issued
06/884206 LIGHT-SENSITIVE COMPOSITION FOR POSITIVE-TYPE LIGHT-SENSITIVE LITHOGRAPHIC PRINTING PLATES Jul 9, 1986 Abandoned
Array ( [id] => 2551389 [patent_doc_number] => 04808508 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-02-28 [patent_title] => 'Negative working color proofing process comprising diazo compound and polyvinyl acetal/polyvinyl alcohol/polyvinyl acetate resin' [patent_app_type] => 1 [patent_app_number] => 6/880770 [patent_app_country] => US [patent_app_date] => 1986-07-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4368 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 407 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/808/04808508.pdf [firstpage_image] =>[orig_patent_app_number] => 880770 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/880770
Negative working color proofing process comprising diazo compound and polyvinyl acetal/polyvinyl alcohol/polyvinyl acetate resin Jun 30, 1986 Issued
Array ( [id] => 2554857 [patent_doc_number] => 04816380 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-03-28 [patent_title] => 'Water soluble contrast enhancement layer method of forming resist image on semiconductor chip' [patent_app_type] => 1 [patent_app_number] => 6/879653 [patent_app_country] => US [patent_app_date] => 1986-06-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 5 [patent_no_of_words] => 3695 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 187 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/816/04816380.pdf [firstpage_image] =>[orig_patent_app_number] => 879653 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/879653
Water soluble contrast enhancement layer method of forming resist image on semiconductor chip Jun 26, 1986 Issued
Array ( [id] => 2354645 [patent_doc_number] => 04650745 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1987-03-17 [patent_title] => 'Method of forming a resist pattern by radiation exposure of positive-working resist coating comprising a dye and a trihydroxybenzophenone compound and subsequent aqueous alkaline development' [patent_app_type] => 1 [patent_app_number] => 6/878736 [patent_app_country] => US [patent_app_date] => 1986-06-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4529 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 367 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/650/04650745.pdf [firstpage_image] =>[orig_patent_app_number] => 878736 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/878736
Method of forming a resist pattern by radiation exposure of positive-working resist coating comprising a dye and a trihydroxybenzophenone compound and subsequent aqueous alkaline development Jun 25, 1986 Issued
Array ( [id] => 2558773 [patent_doc_number] => 04837131 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-06-06 [patent_title] => 'Developing method for photosensitive material' [patent_app_type] => 1 [patent_app_number] => 6/875480 [patent_app_country] => US [patent_app_date] => 1986-06-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 4391 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 198 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/837/04837131.pdf [firstpage_image] =>[orig_patent_app_number] => 875480 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/875480
Developing method for photosensitive material Jun 17, 1986 Issued
06/873914 RESIST COMPOSITIONS AND USE Jun 12, 1986 Abandoned
Menu