Search

Kiersten V. Summers

Examiner (ID: 9001, Phone: (571)272-6542 , Office: P/3688 )

Most Active Art Unit
3688
Art Unit(s)
3626, 3682, 3621, 3688, 3687
Total Applications
366
Issued Applications
42
Pending Applications
63
Abandoned Applications
270

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 2631560 [patent_doc_number] => 04957846 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-09-18 [patent_title] => 'Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group' [patent_app_type] => 1 [patent_app_number] => 7/290009 [patent_app_country] => US [patent_app_date] => 1988-12-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9776 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/957/04957846.pdf [firstpage_image] =>[orig_patent_app_number] => 290009 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/290009
Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group Dec 26, 1988 Issued
07/289593 NEGATIVE WORKING COLOR PROOFING SYSTEM COMPRISING POLYVINYL ACETAL/ POLYVINYL ALCOHOL/POLYVINYL ACETATE RESIN Dec 21, 1988 Abandoned
Array ( [id] => 2733084 [patent_doc_number] => 04997742 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-03-05 [patent_title] => 'Water soluble contrast enhancement composition with 1-oxy-2 diazonaphthalene sulfonamide salt and polyvinyl alcohol' [patent_app_type] => 1 [patent_app_number] => 7/267151 [patent_app_country] => US [patent_app_date] => 1988-12-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 5 [patent_no_of_words] => 3690 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 72 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/997/04997742.pdf [firstpage_image] =>[orig_patent_app_number] => 267151 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/267151
Water soluble contrast enhancement composition with 1-oxy-2 diazonaphthalene sulfonamide salt and polyvinyl alcohol Dec 8, 1988 Issued
Array ( [id] => 2631577 [patent_doc_number] => 04957847 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-09-18 [patent_title] => 'Heat-sensitive cyclic diazo compound containing recording material with benzotriazine compound and coupling component' [patent_app_type] => 1 [patent_app_number] => 7/278989 [patent_app_country] => US [patent_app_date] => 1988-12-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2246 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 247 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/957/04957847.pdf [firstpage_image] =>[orig_patent_app_number] => 278989 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/278989
Heat-sensitive cyclic diazo compound containing recording material with benzotriazine compound and coupling component Dec 1, 1988 Issued
Array ( [id] => 2697299 [patent_doc_number] => 04988601 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-01-29 [patent_title] => 'Photosensitive resin composition with o-quinone diazide and novolac resins prepared from mixed phenolic reactants to include 3,5-xylenol and 2,5-xylenol' [patent_app_type] => 1 [patent_app_number] => 7/275967 [patent_app_country] => US [patent_app_date] => 1988-11-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8232 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 98 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/988/04988601.pdf [firstpage_image] =>[orig_patent_app_number] => 275967 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/275967
Photosensitive resin composition with o-quinone diazide and novolac resins prepared from mixed phenolic reactants to include 3,5-xylenol and 2,5-xylenol Nov 24, 1988 Issued
07/275699 RADIATION SENSITIVE COMPOUNDS Nov 22, 1988 Abandoned
Array ( [id] => 2733159 [patent_doc_number] => 04997746 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-03-05 [patent_title] => 'Method of forming conductive lines and studs' [patent_app_type] => 1 [patent_app_number] => 7/274895 [patent_app_country] => US [patent_app_date] => 1988-11-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 20 [patent_no_of_words] => 5177 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 217 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/997/04997746.pdf [firstpage_image] =>[orig_patent_app_number] => 274895 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/274895
Method of forming conductive lines and studs Nov 21, 1988 Issued
07/274928 POSITIVE-WORKING PHOTOSENSITIVE COMPOSITION Nov 21, 1988 Abandoned
Array ( [id] => 2600340 [patent_doc_number] => 04931380 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-06-05 [patent_title] => 'Pre-exposure method for increased sensitivity in high contrast resist development of positive working diazo ketone photoresist' [patent_app_type] => 1 [patent_app_number] => 7/274648 [patent_app_country] => US [patent_app_date] => 1988-11-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 2701 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 264 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/931/04931380.pdf [firstpage_image] =>[orig_patent_app_number] => 274648 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/274648
Pre-exposure method for increased sensitivity in high contrast resist development of positive working diazo ketone photoresist Nov 17, 1988 Issued
Array ( [id] => 2622819 [patent_doc_number] => 04956262 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-09-11 [patent_title] => 'Photosensitive printing plate for waterless offset printing with photosensitive layer of diazonium salt polycondensation product and photopolymerizable composition and overlying silicone rubber layer' [patent_app_type] => 1 [patent_app_number] => 7/270343 [patent_app_country] => US [patent_app_date] => 1988-11-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4032 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 210 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/956/04956262.pdf [firstpage_image] =>[orig_patent_app_number] => 270343 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/270343
Photosensitive printing plate for waterless offset printing with photosensitive layer of diazonium salt polycondensation product and photopolymerizable composition and overlying silicone rubber layer Nov 13, 1988 Issued
Array ( [id] => 2595293 [patent_doc_number] => 04965167 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-10-23 [patent_title] => 'Positive-working photoresist employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent' [patent_app_type] => 1 [patent_app_number] => 7/269521 [patent_app_country] => US [patent_app_date] => 1988-11-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5380 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 118 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/965/04965167.pdf [firstpage_image] =>[orig_patent_app_number] => 269521 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/269521
Positive-working photoresist employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent Nov 9, 1988 Issued
Array ( [id] => 2654656 [patent_doc_number] => 04929536 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-05-29 [patent_title] => 'Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing' [patent_app_type] => 1 [patent_app_number] => 7/268639 [patent_app_country] => US [patent_app_date] => 1988-11-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9409 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 473 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/929/04929536.pdf [firstpage_image] =>[orig_patent_app_number] => 268639 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/268639
Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing Nov 7, 1988 Issued
Array ( [id] => 2600136 [patent_doc_number] => 04912013 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-03-27 [patent_title] => 'Photosensitive diazo composition and photosensitive diazo lithographic printing plate with metal complex dyes and color changing agent' [patent_app_type] => 1 [patent_app_number] => 7/268632 [patent_app_country] => US [patent_app_date] => 1988-11-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6066 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 269 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/912/04912013.pdf [firstpage_image] =>[orig_patent_app_number] => 268632 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/268632
Photosensitive diazo composition and photosensitive diazo lithographic printing plate with metal complex dyes and color changing agent Nov 7, 1988 Issued
Array ( [id] => 2600360 [patent_doc_number] => 04931381 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-06-05 [patent_title] => 'Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment' [patent_app_type] => 1 [patent_app_number] => 7/268640 [patent_app_country] => US [patent_app_date] => 1988-11-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7445 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 373 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/931/04931381.pdf [firstpage_image] =>[orig_patent_app_number] => 268640 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/268640
Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment Nov 7, 1988 Issued
Array ( [id] => 2595334 [patent_doc_number] => 04975351 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-12-04 [patent_title] => 'Positive-type photosensitive electrodeposition coating composition with o-quinone diazide sulfonyl amide polymer' [patent_app_type] => 1 [patent_app_number] => 7/268547 [patent_app_country] => US [patent_app_date] => 1988-11-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7335 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 79 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/975/04975351.pdf [firstpage_image] =>[orig_patent_app_number] => 268547 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/268547
Positive-type photosensitive electrodeposition coating composition with o-quinone diazide sulfonyl amide polymer Nov 6, 1988 Issued
Array ( [id] => 2721919 [patent_doc_number] => 05024922 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-06-18 [patent_title] => 'Positive working polyamic acid/imide and diazoquinone photoresist with high temperature pre-bake' [patent_app_type] => 1 [patent_app_number] => 7/268023 [patent_app_country] => US [patent_app_date] => 1988-11-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 5484 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 155 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/024/05024922.pdf [firstpage_image] =>[orig_patent_app_number] => 268023 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/268023
Positive working polyamic acid/imide and diazoquinone photoresist with high temperature pre-bake Nov 6, 1988 Issued
Array ( [id] => 2600313 [patent_doc_number] => 04931379 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-06-05 [patent_title] => 'High sensitivity resists having autodecomposition temperatures greater than about 160.degree. C.' [patent_app_type] => 1 [patent_app_number] => 7/267738 [patent_app_country] => US [patent_app_date] => 1988-11-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 14 [patent_no_of_words] => 4768 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 101 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/931/04931379.pdf [firstpage_image] =>[orig_patent_app_number] => 267738 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/267738
High sensitivity resists having autodecomposition temperatures greater than about 160.degree. C. Nov 2, 1988 Issued
Array ( [id] => 2588493 [patent_doc_number] => 04959293 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-09-25 [patent_title] => 'Deep UV photoresist with alkyl 2-diazo-1-ones as solubility modification agents' [patent_app_type] => 1 [patent_app_number] => 7/264335 [patent_app_country] => US [patent_app_date] => 1988-10-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 5385 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 188 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/959/04959293.pdf [firstpage_image] =>[orig_patent_app_number] => 264335 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/264335
Deep UV photoresist with alkyl 2-diazo-1-ones as solubility modification agents Oct 27, 1988 Issued
07/264407 HIGHLY SENSITIVE POSITIVE PHOTORESIST COMPOSITIONS Oct 27, 1988 Abandoned
Array ( [id] => 2668354 [patent_doc_number] => 04999274 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-03-12 [patent_title] => 'Positive type photosensitive resinous composition with 1,2 quinone diazide sulfonyl unit' [patent_app_type] => 1 [patent_app_number] => 7/255193 [patent_app_country] => US [patent_app_date] => 1988-10-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5118 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 223 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/999/04999274.pdf [firstpage_image] =>[orig_patent_app_number] => 255193 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/255193
Positive type photosensitive resinous composition with 1,2 quinone diazide sulfonyl unit Oct 26, 1988 Issued
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