Kiho Kim
Examiner (ID: 5053, Phone: (571)270-1628 , Office: P/2884 )
Most Active Art Unit | |
Art Unit(s) | |
Total Applications | |
Issued Applications | |
Pending Applications | |
Abandoned Applications |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
08/153389 | FORMATION OF IMAGES | Nov 15, 1993 | Abandoned |
08/148706 | RESIST MATERIALS AND RELATED PROCESSES | Nov 7, 1993 | Abandoned |
08/148719 | PROCESS FOR FABRICATING A DEVICE | Nov 7, 1993 | Abandoned |
08/147160 | PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE TRANSFER SHEET | Nov 2, 1993 | Abandoned |
08/145118 | Method of making developer compositions with stable triboelectric charging properties | Nov 2, 1993 | Issued |
08/144477 | RESIST PATTERN FORMATION | Nov 1, 1993 | Abandoned |
08/146710 | Method of on-press developing lithographic plates utilizing microencapsulated developers | Oct 31, 1993 | Issued |
08/140893 | Photosensitive resin composition and semiconductor apparatus using it | Oct 24, 1993 | Issued |
08/117063 | Resist formation made by applying, drying and reflowing a suspension of photocurable material | Oct 13, 1993 | Issued |
08/134707 | Method of forming polyimide patterns on substrates | Oct 11, 1993 | Issued |
08/133680 | Photoresist strippers containing reducing agents to reduce metal corrosion | Oct 6, 1993 | Issued |
08/133087 | METHOD FOR PREPARATION OF ELECTROPHOTOGRAPHIC PRINTING PLATE | Oct 6, 1993 | Abandoned |
08/132589 | Color filter arrays with optimum dye density | Oct 5, 1993 | Issued |
08/131505 | NOVOLAK/POLYHYDROXYSTYRENE COPOLYMER AND PHOTORESIST COMPOSITIONS | Oct 3, 1993 | Abandoned |
08/130835 | PHOTOSENSITIVE RESIN COMPOSITION | Oct 3, 1993 | Abandoned |
08/130610 | PROCESS FOR MAKING A FLEXOGRAPHIC PRINTING PLATE | Sep 30, 1993 | Abandoned |
08/128994 | Modified cation exhange process | Sep 29, 1993 | Issued |
08/127640 | Developer solution for photoresist composition | Sep 27, 1993 | Issued |
08/123543 | METHOD FOR MANUFACTURE OF QUANTUM SIZED PERIODIC STRUCTURES IN SI MATERIALS | Sep 19, 1993 | Abandoned |
08/121645 | METHOD OF FORMING CHEMICALLY AMPLIFIED RESIST PATTERN AND MANUFACTURING FOR SEMICONDUCTOR DEVICE BY USING THE CHEMICALLY AMPLIFIED RESIST PATTERN | Sep 15, 1993 | Abandoned |