
Kimberly Ann House
Examiner (ID: 7013)
| Most Active Art Unit | 3974 |
| Art Unit(s) | 3974, OPESS |
| Total Applications | 1850 |
| Issued Applications | 2 |
| Pending Applications | 13 |
| Abandoned Applications | 1807 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5958852
[patent_doc_number] => 20110183239
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-07-28
[patent_title] => 'Photolithography Mask, Blank Photomask, Reflective Photomask, and Methods of Manufacturing the Same'
[patent_app_type] => utility
[patent_app_number] => 12/963064
[patent_app_country] => US
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[pdf_file] => publications/A1/0183/20110183239.pdf
[firstpage_image] =>[orig_patent_app_number] => 12963064
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/963064 | Photolithography Mask, Blank Photomask, Reflective Photomask, and Methods of Manufacturing the Same | Dec 7, 2010 | Abandoned |
Array
(
[id] => 6142756
[patent_doc_number] => 20110129766
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-06-02
[patent_title] => 'LITHOGRAPHIC PELLICLE'
[patent_app_type] => utility
[patent_app_number] => 12/949426
[patent_app_country] => US
[patent_app_date] => 2010-11-18
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[pdf_file] => publications/A1/0129/20110129766.pdf
[firstpage_image] =>[orig_patent_app_number] => 12949426
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/949426 | Lithographic pellicle | Nov 17, 2010 | Issued |
Array
(
[id] => 6007359
[patent_doc_number] => 20110059390
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-03-10
[patent_title] => 'MASK BLANK GLASS SUBSTRATE MANUFACTURING METHOD, MASK BLANK MANUFACTURING METHOD, MASK MANUFACTURING METHOD, MASK BLANK GLASS SUBSTRATE, MASK BLANK, AND MASK'
[patent_app_type] => utility
[patent_app_number] => 12/946360
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[patent_app_date] => 2010-11-15
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0059/20110059390.pdf
[firstpage_image] =>[orig_patent_app_number] => 12946360
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/946360 | Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask | Nov 14, 2010 | Issued |
Array
(
[id] => 6001490
[patent_doc_number] => 20110117481
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-05-19
[patent_title] => 'PELLICLE FOR LITHOGRAPHY'
[patent_app_type] => utility
[patent_app_number] => 12/944188
[patent_app_country] => US
[patent_app_date] => 2010-11-11
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/944188 | PELLICLE FOR LITHOGRAPHY | Nov 10, 2010 | Abandoned |
Array
(
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[patent_kind] => A1
[patent_issue_date] => 2011-05-19
[patent_title] => 'PELLICLE FOR LITHOGRAPHY'
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[firstpage_image] =>[orig_patent_app_number] => 12944194
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/944194 | Pellicle for lithography | Nov 10, 2010 | Issued |
Array
(
[id] => 8185061
[patent_doc_number] => 20120115073
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-05-10
[patent_title] => 'SUB-RESOLUTION ROD IN THE TRANSITION REGION'
[patent_app_type] => utility
[patent_app_number] => 12/940230
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[firstpage_image] =>[orig_patent_app_number] => 12940230
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/940230 | Sub-resolution rod in the transition region | Nov 4, 2010 | Issued |
Array
(
[id] => 6001488
[patent_doc_number] => 20110117479
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-05-19
[patent_title] => 'REFLECTIVE EXPOSURE MASK, METHOD OF MANUFACTURING REFLECTIVE EXPOSURE MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE'
[patent_app_type] => utility
[patent_app_number] => 12/916804
[patent_app_country] => US
[patent_app_date] => 2010-11-01
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0117/20110117479.pdf
[firstpage_image] =>[orig_patent_app_number] => 12916804
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/916804 | REFLECTIVE EXPOSURE MASK, METHOD OF MANUFACTURING REFLECTIVE EXPOSURE MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Oct 31, 2010 | Abandoned |
Array
(
[id] => 8171955
[patent_doc_number] => 20120107729
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-05-03
[patent_title] => 'GATE CD CONTROL USING LOCAL DESIGN ON BOTH SIDES OF NEIGHBORING DUMMY GATE LEVEL FEATURES'
[patent_app_type] => utility
[patent_app_number] => 12/915974
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[pdf_file] => publications/A1/0107/20120107729.pdf
[firstpage_image] =>[orig_patent_app_number] => 12915974
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/915974 | Gate CD control using local design on both sides of neighboring dummy gate level features | Oct 28, 2010 | Issued |
Array
(
[id] => 9589029
[patent_doc_number] => 08778569
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[patent_issue_date] => 2014-07-15
[patent_title] => 'Pellicle and a method for making the same'
[patent_app_type] => utility
[patent_app_number] => 12/923765
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/923765 | Pellicle and a method for making the same | Oct 6, 2010 | Issued |
Array
(
[id] => 6031775
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[patent_issue_date] => 2011-04-07
[patent_title] => 'PELLICLE'
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[firstpage_image] =>[orig_patent_app_number] => 12894748
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/894748 | PELLICLE | Sep 29, 2010 | Abandoned |
Array
(
[id] => 4595298
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[patent_title] => 'Method and apparatus for performing dark field double dipole lithography (DDL)'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/890494 | Method and apparatus for performing dark field double dipole lithography (DDL) | Sep 23, 2010 | Issued |
Array
(
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Array
(
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Array
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[id] => 6024732
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Array
(
[id] => 6202241
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Array
(
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Array
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Array
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Array
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Array
(
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