
Kimberly Ann House
Examiner (ID: 7013)
| Most Active Art Unit | 3974 |
| Art Unit(s) | 3974, OPESS |
| Total Applications | 1850 |
| Issued Applications | 2 |
| Pending Applications | 13 |
| Abandoned Applications | 1807 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5271405
[patent_doc_number] => 20090075181
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-03-19
[patent_title] => 'Method for Fabricating Photomask'
[patent_app_type] => utility
[patent_app_number] => 12/164841
[patent_app_country] => US
[patent_app_date] => 2008-06-30
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0075/20090075181.pdf
[firstpage_image] =>[orig_patent_app_number] => 12164841
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/164841 | Method with correction of hard mask pattern critical dimension for fabricating photomask | Jun 29, 2008 | Issued |
Array
(
[id] => 5569673
[patent_doc_number] => 20090253051
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-10-08
[patent_title] => 'PHASE SHIFT MASK AND METHOD OF FABRICATING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 12/163692
[patent_app_country] => US
[patent_app_date] => 2008-06-27
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[pdf_file] => publications/A1/0253/20090253051.pdf
[firstpage_image] =>[orig_patent_app_number] => 12163692
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/163692 | PHASE SHIFT MASK AND METHOD OF FABRICATING THE SAME | Jun 26, 2008 | Abandoned |
Array
(
[id] => 5441266
[patent_doc_number] => 20090092905
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-04-09
[patent_title] => 'PHOTOMASK DEFECT CORRECTION DEVICE AND PHOTOMASK DEFECT CORRECTION METHOD'
[patent_app_type] => utility
[patent_app_number] => 12/145985
[patent_app_country] => US
[patent_app_date] => 2008-06-25
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0092/20090092905.pdf
[firstpage_image] =>[orig_patent_app_number] => 12145985
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/145985 | PHOTOMASK DEFECT CORRECTION DEVICE AND PHOTOMASK DEFECT CORRECTION METHOD | Jun 24, 2008 | Abandoned |
Array
(
[id] => 4727115
[patent_doc_number] => 20080206657
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-08-28
[patent_title] => 'EXPOSURE MASK SUBSTRATE MANUFACTURING METHOD, EXPOSURE MASK MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD'
[patent_app_type] => utility
[patent_app_number] => 12/109541
[patent_app_country] => US
[patent_app_date] => 2008-04-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_words] => 7272
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[pdf_file] => publications/A1/0206/20080206657.pdf
[firstpage_image] =>[orig_patent_app_number] => 12109541
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/109541 | Semiconductor device manufacturing method | Apr 24, 2008 | Issued |
Array
(
[id] => 4505742
[patent_doc_number] => 07914951
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-03-29
[patent_title] => 'Method of correcting pattern critical dimension of photomask'
[patent_app_type] => utility
[patent_app_number] => 12/108189
[patent_app_country] => US
[patent_app_date] => 2008-04-23
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/914/07914951.pdf
[firstpage_image] =>[orig_patent_app_number] => 12108189
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/108189 | Method of correcting pattern critical dimension of photomask | Apr 22, 2008 | Issued |
Array
(
[id] => 5585340
[patent_doc_number] => 20090104542
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-04-23
[patent_title] => 'USE OF CHROMELESS PHASE SHIFT MASKS TO PATTERN CONTACTS'
[patent_app_type] => utility
[patent_app_number] => 12/106211
[patent_app_country] => US
[patent_app_date] => 2008-04-18
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0104/20090104542.pdf
[firstpage_image] =>[orig_patent_app_number] => 12106211
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/106211 | USE OF CHROMELESS PHASE SHIFT MASKS TO PATTERN CONTACTS | Apr 17, 2008 | Abandoned |
Array
(
[id] => 5275591
[patent_doc_number] => 20090127723
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-05-21
[patent_title] => 'AIM-Compatible Targets for Use with Methods of Inspecting and Optionally Reworking Summed Photolithography Patterns Resulting from Plurally-Overlaid Patterning Steps During Mass Production of Semiconductor Devices'
[patent_app_type] => utility
[patent_app_number] => 12/102616
[patent_app_country] => US
[patent_app_date] => 2008-04-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
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[pdf_file] => publications/A1/0127/20090127723.pdf
[firstpage_image] =>[orig_patent_app_number] => 12102616
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/102616 | AIM-Compatible Targets for Use with Methods of Inspecting and Optionally Reworking Summed Photolithography Patterns Resulting from Plurally-Overlaid Patterning Steps During Mass Production of Semiconductor Devices | Apr 13, 2008 | Abandoned |
Array
(
[id] => 4873083
[patent_doc_number] => 20080199817
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-08-21
[patent_title] => 'RESIST PATTERN FORMING METHOD'
[patent_app_type] => utility
[patent_app_number] => 12/102152
[patent_app_country] => US
[patent_app_date] => 2008-04-14
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0199/20080199817.pdf
[firstpage_image] =>[orig_patent_app_number] => 12102152
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/102152 | Resist pattern forming method including uniform intensity near field exposure | Apr 13, 2008 | Issued |
Array
(
[id] => 4954845
[patent_doc_number] => 20080187869
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-08-07
[patent_title] => 'Exposure control for phase shifting photolithographic masks'
[patent_app_type] => utility
[patent_app_number] => 12/080886
[patent_app_country] => US
[patent_app_date] => 2008-04-07
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[firstpage_image] =>[orig_patent_app_number] => 12080886
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/080886 | Exposure control for phase shifting photolithographic masks | Apr 6, 2008 | Issued |
Array
(
[id] => 4431504
[patent_doc_number] => 07968254
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-06-28
[patent_title] => 'Photomask reticle for use in projection exposure, and manufacturing methods therefor'
[patent_app_type] => utility
[patent_app_number] => 12/078564
[patent_app_country] => US
[patent_app_date] => 2008-04-01
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/968/07968254.pdf
[firstpage_image] =>[orig_patent_app_number] => 12078564
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/078564 | Photomask reticle for use in projection exposure, and manufacturing methods therefor | Mar 31, 2008 | Issued |
Array
(
[id] => 5539061
[patent_doc_number] => 20090220866
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-09-03
[patent_title] => 'PRE-ALIGNMENT MARKING AND INSPECTION TO IMPROVE MASK SUBSTRATE DEFECT TOLERANCE'
[patent_app_type] => utility
[patent_app_number] => 12/041076
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/041076 | Pre-alignment marking and inspection to improve mask substrate defect tolerance | Mar 2, 2008 | Issued |
Array
(
[id] => 4954819
[patent_doc_number] => 20080187843
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[patent_kind] => A1
[patent_issue_date] => 2008-08-07
[patent_title] => ' PHOTOMASK AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE USING THE PHOTOMASK'
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Array
(
[id] => 5379629
[patent_doc_number] => 20090191468
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-07-30
[patent_title] => 'Contact Level Mask Layouts By Introducing Anisotropic Sub-Resolution Assist Features'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/021527 | Contact Level Mask Layouts By Introducing Anisotropic Sub-Resolution Assist Features | Jan 28, 2008 | Abandoned |
Array
(
[id] => 4893285
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[patent_title] => 'PHASE SHIFT MASK AND METHOD OF FABRICATING THE SAME'
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Array
(
[id] => 4813230
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[patent_kind] => A1
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[patent_title] => 'METHOD FOR REPAIRING A DEFECT ON A PHOTOMASK'
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Array
(
[id] => 21842
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[patent_issue_date] => 2010-09-21
[patent_title] => 'Method for manufacturing phase shift mask using electron beam lithography'
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Array
(
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Array
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/955332 | Method for fabricating photomask | Dec 11, 2007 | Issued |
Array
(
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[patent_title] => 'Method of forming an etching mask pattern from developed negative and positive photoresist layers'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/948631 | Method of forming an etching mask pattern from developed negative and positive photoresist layers | Nov 29, 2007 | Issued |