Search

Kimberly Ann House

Examiner (ID: 7013)

Most Active Art Unit
3974
Art Unit(s)
3974, OPESS
Total Applications
1850
Issued Applications
2
Pending Applications
13
Abandoned Applications
1807

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 5271405 [patent_doc_number] => 20090075181 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-03-19 [patent_title] => 'Method for Fabricating Photomask' [patent_app_type] => utility [patent_app_number] => 12/164841 [patent_app_country] => US [patent_app_date] => 2008-06-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 2597 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0075/20090075181.pdf [firstpage_image] =>[orig_patent_app_number] => 12164841 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/164841
Method with correction of hard mask pattern critical dimension for fabricating photomask Jun 29, 2008 Issued
Array ( [id] => 5569673 [patent_doc_number] => 20090253051 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-10-08 [patent_title] => 'PHASE SHIFT MASK AND METHOD OF FABRICATING THE SAME' [patent_app_type] => utility [patent_app_number] => 12/163692 [patent_app_country] => US [patent_app_date] => 2008-06-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 3921 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0253/20090253051.pdf [firstpage_image] =>[orig_patent_app_number] => 12163692 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/163692
PHASE SHIFT MASK AND METHOD OF FABRICATING THE SAME Jun 26, 2008 Abandoned
Array ( [id] => 5441266 [patent_doc_number] => 20090092905 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-04-09 [patent_title] => 'PHOTOMASK DEFECT CORRECTION DEVICE AND PHOTOMASK DEFECT CORRECTION METHOD' [patent_app_type] => utility [patent_app_number] => 12/145985 [patent_app_country] => US [patent_app_date] => 2008-06-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 10894 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0092/20090092905.pdf [firstpage_image] =>[orig_patent_app_number] => 12145985 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/145985
PHOTOMASK DEFECT CORRECTION DEVICE AND PHOTOMASK DEFECT CORRECTION METHOD Jun 24, 2008 Abandoned
Array ( [id] => 4727115 [patent_doc_number] => 20080206657 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-08-28 [patent_title] => 'EXPOSURE MASK SUBSTRATE MANUFACTURING METHOD, EXPOSURE MASK MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD' [patent_app_type] => utility [patent_app_number] => 12/109541 [patent_app_country] => US [patent_app_date] => 2008-04-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 7272 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0206/20080206657.pdf [firstpage_image] =>[orig_patent_app_number] => 12109541 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/109541
Semiconductor device manufacturing method Apr 24, 2008 Issued
Array ( [id] => 4505742 [patent_doc_number] => 07914951 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-03-29 [patent_title] => 'Method of correcting pattern critical dimension of photomask' [patent_app_type] => utility [patent_app_number] => 12/108189 [patent_app_country] => US [patent_app_date] => 2008-04-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 9 [patent_no_of_words] => 2189 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 129 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/914/07914951.pdf [firstpage_image] =>[orig_patent_app_number] => 12108189 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/108189
Method of correcting pattern critical dimension of photomask Apr 22, 2008 Issued
Array ( [id] => 5585340 [patent_doc_number] => 20090104542 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-04-23 [patent_title] => 'USE OF CHROMELESS PHASE SHIFT MASKS TO PATTERN CONTACTS' [patent_app_type] => utility [patent_app_number] => 12/106211 [patent_app_country] => US [patent_app_date] => 2008-04-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 4584 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0104/20090104542.pdf [firstpage_image] =>[orig_patent_app_number] => 12106211 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/106211
USE OF CHROMELESS PHASE SHIFT MASKS TO PATTERN CONTACTS Apr 17, 2008 Abandoned
Array ( [id] => 5275591 [patent_doc_number] => 20090127723 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-05-21 [patent_title] => 'AIM-Compatible Targets for Use with Methods of Inspecting and Optionally Reworking Summed Photolithography Patterns Resulting from Plurally-Overlaid Patterning Steps During Mass Production of Semiconductor Devices' [patent_app_type] => utility [patent_app_number] => 12/102616 [patent_app_country] => US [patent_app_date] => 2008-04-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 13 [patent_no_of_words] => 14940 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0127/20090127723.pdf [firstpage_image] =>[orig_patent_app_number] => 12102616 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/102616
AIM-Compatible Targets for Use with Methods of Inspecting and Optionally Reworking Summed Photolithography Patterns Resulting from Plurally-Overlaid Patterning Steps During Mass Production of Semiconductor Devices Apr 13, 2008 Abandoned
Array ( [id] => 4873083 [patent_doc_number] => 20080199817 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-08-21 [patent_title] => 'RESIST PATTERN FORMING METHOD' [patent_app_type] => utility [patent_app_number] => 12/102152 [patent_app_country] => US [patent_app_date] => 2008-04-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 5099 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0199/20080199817.pdf [firstpage_image] =>[orig_patent_app_number] => 12102152 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/102152
Resist pattern forming method including uniform intensity near field exposure Apr 13, 2008 Issued
Array ( [id] => 4954845 [patent_doc_number] => 20080187869 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-08-07 [patent_title] => 'Exposure control for phase shifting photolithographic masks' [patent_app_type] => utility [patent_app_number] => 12/080886 [patent_app_country] => US [patent_app_date] => 2008-04-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 4859 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0187/20080187869.pdf [firstpage_image] =>[orig_patent_app_number] => 12080886 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/080886
Exposure control for phase shifting photolithographic masks Apr 6, 2008 Issued
Array ( [id] => 4431504 [patent_doc_number] => 07968254 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-06-28 [patent_title] => 'Photomask reticle for use in projection exposure, and manufacturing methods therefor' [patent_app_type] => utility [patent_app_number] => 12/078564 [patent_app_country] => US [patent_app_date] => 2008-04-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 21 [patent_figures_cnt] => 45 [patent_no_of_words] => 6185 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 85 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/968/07968254.pdf [firstpage_image] =>[orig_patent_app_number] => 12078564 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/078564
Photomask reticle for use in projection exposure, and manufacturing methods therefor Mar 31, 2008 Issued
Array ( [id] => 5539061 [patent_doc_number] => 20090220866 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-09-03 [patent_title] => 'PRE-ALIGNMENT MARKING AND INSPECTION TO IMPROVE MASK SUBSTRATE DEFECT TOLERANCE' [patent_app_type] => utility [patent_app_number] => 12/041076 [patent_app_country] => US [patent_app_date] => 2008-03-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 3410 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0220/20090220866.pdf [firstpage_image] =>[orig_patent_app_number] => 12041076 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/041076
Pre-alignment marking and inspection to improve mask substrate defect tolerance Mar 2, 2008 Issued
Array ( [id] => 4954819 [patent_doc_number] => 20080187843 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-08-07 [patent_title] => ' PHOTOMASK AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE USING THE PHOTOMASK' [patent_app_type] => utility [patent_app_number] => 12/025250 [patent_app_country] => US [patent_app_date] => 2008-02-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 13 [patent_no_of_words] => 4095 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0187/20080187843.pdf [firstpage_image] =>[orig_patent_app_number] => 12025250 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/025250
Photomask and method for manufacturing a semiconductor device using the photomask Feb 3, 2008 Issued
Array ( [id] => 5379629 [patent_doc_number] => 20090191468 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-07-30 [patent_title] => 'Contact Level Mask Layouts By Introducing Anisotropic Sub-Resolution Assist Features' [patent_app_type] => utility [patent_app_number] => 12/021527 [patent_app_country] => US [patent_app_date] => 2008-01-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 3888 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0191/20090191468.pdf [firstpage_image] =>[orig_patent_app_number] => 12021527 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/021527
Contact Level Mask Layouts By Introducing Anisotropic Sub-Resolution Assist Features Jan 28, 2008 Abandoned
Array ( [id] => 4893285 [patent_doc_number] => 20080102383 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-05-01 [patent_title] => 'PHASE SHIFT MASK AND METHOD OF FABRICATING THE SAME' [patent_app_type] => utility [patent_app_number] => 11/969979 [patent_app_country] => US [patent_app_date] => 2008-01-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 3514 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0102/20080102383.pdf [firstpage_image] =>[orig_patent_app_number] => 11969979 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/969979
Phase shift mask Jan 6, 2008 Issued
Array ( [id] => 4813230 [patent_doc_number] => 20080193861 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-08-14 [patent_title] => 'METHOD FOR REPAIRING A DEFECT ON A PHOTOMASK' [patent_app_type] => utility [patent_app_number] => 11/966442 [patent_app_country] => US [patent_app_date] => 2007-12-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 1188 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0193/20080193861.pdf [firstpage_image] =>[orig_patent_app_number] => 11966442 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/966442
METHOD FOR REPAIRING A DEFECT ON A PHOTOMASK Dec 27, 2007 Abandoned
Array ( [id] => 21842 [patent_doc_number] => 07799488 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-09-21 [patent_title] => 'Method for manufacturing phase shift mask using electron beam lithography' [patent_app_type] => utility [patent_app_number] => 11/965371 [patent_app_country] => US [patent_app_date] => 2007-12-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 1533 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 83 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/799/07799488.pdf [firstpage_image] =>[orig_patent_app_number] => 11965371 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/965371
Method for manufacturing phase shift mask using electron beam lithography Dec 26, 2007 Issued
Array ( [id] => 4839729 [patent_doc_number] => 20080280215 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-11-13 [patent_title] => 'METHOD OF FORMING PHOTOMASK OF SEMICONDUCTOR DEVICE' [patent_app_type] => utility [patent_app_number] => 11/962421 [patent_app_country] => US [patent_app_date] => 2007-12-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 2498 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0280/20080280215.pdf [firstpage_image] =>[orig_patent_app_number] => 11962421 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/962421
METHOD OF FORMING PHOTOMASK OF SEMICONDUCTOR DEVICE Dec 20, 2007 Abandoned
Array ( [id] => 4866711 [patent_doc_number] => 20080145770 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-06-19 [patent_title] => 'Recycling of large-size photomask substrate' [patent_app_type] => utility [patent_app_number] => 12/000542 [patent_app_country] => US [patent_app_date] => 2007-12-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 10356 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0145/20080145770.pdf [firstpage_image] =>[orig_patent_app_number] => 12000542 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/000542
Recycling of large-size photomask substrate Dec 12, 2007 Issued
Array ( [id] => 8994726 [patent_doc_number] => 08518610 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-08-27 [patent_title] => 'Method for fabricating photomask' [patent_app_type] => utility [patent_app_number] => 11/955332 [patent_app_country] => US [patent_app_date] => 2007-12-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 1594 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 107 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 11955332 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/955332
Method for fabricating photomask Dec 11, 2007 Issued
Array ( [id] => 4581380 [patent_doc_number] => 07851135 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-12-14 [patent_title] => 'Method of forming an etching mask pattern from developed negative and positive photoresist layers' [patent_app_type] => utility [patent_app_number] => 11/948631 [patent_app_country] => US [patent_app_date] => 2007-11-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 6 [patent_no_of_words] => 2078 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 119 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/851/07851135.pdf [firstpage_image] =>[orig_patent_app_number] => 11948631 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/948631
Method of forming an etching mask pattern from developed negative and positive photoresist layers Nov 29, 2007 Issued
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