
Kimberly Ann House
Examiner (ID: 7013)
| Most Active Art Unit | 3974 |
| Art Unit(s) | 3974, OPESS |
| Total Applications | 1850 |
| Issued Applications | 2 |
| Pending Applications | 13 |
| Abandoned Applications | 1807 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5106856
[patent_doc_number] => 20070065734
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-03-22
[patent_title] => 'Exposure method, exposure mask, and exposure apparatus'
[patent_app_type] => utility
[patent_app_number] => 11/548756
[patent_app_country] => US
[patent_app_date] => 2006-10-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 6481
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0065/20070065734.pdf
[firstpage_image] =>[orig_patent_app_number] => 11548756
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/548756 | Exposure method, exposure mask, and exposure apparatus | Oct 11, 2006 | Abandoned |
Array
(
[id] => 202237
[patent_doc_number] => 07632609
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-12-15
[patent_title] => 'Fabrication method of photomask-blank'
[patent_app_type] => utility
[patent_app_number] => 11/545451
[patent_app_country] => US
[patent_app_date] => 2006-10-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 25
[patent_no_of_words] => 9991
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 102
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/632/07632609.pdf
[firstpage_image] =>[orig_patent_app_number] => 11545451
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/545451 | Fabrication method of photomask-blank | Oct 10, 2006 | Issued |
Array
(
[id] => 4669680
[patent_doc_number] => 20080044740
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-02-21
[patent_title] => 'PHOTOMASK HAVING HAZE REDUCTION LAYER'
[patent_app_type] => utility
[patent_app_number] => 11/466002
[patent_app_country] => US
[patent_app_date] => 2006-08-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 2120
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0044/20080044740.pdf
[firstpage_image] =>[orig_patent_app_number] => 11466002
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/466002 | PHOTOMASK HAVING HAZE REDUCTION LAYER | Aug 20, 2006 | Abandoned |
Array
(
[id] => 5022593
[patent_doc_number] => 20070148559
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-06-28
[patent_title] => 'Phase shift mask and method for fabricating the same'
[patent_app_type] => utility
[patent_app_number] => 11/478180
[patent_app_country] => US
[patent_app_date] => 2006-06-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 1745
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0148/20070148559.pdf
[firstpage_image] =>[orig_patent_app_number] => 11478180
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/478180 | Phase shift mask and method for fabricating the same | Jun 27, 2006 | Abandoned |
Array
(
[id] => 81081
[patent_doc_number] => 07745068
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-06-29
[patent_title] => 'Binary photomask having a compensation layer'
[patent_app_type] => utility
[patent_app_number] => 11/446980
[patent_app_country] => US
[patent_app_date] => 2006-06-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 17
[patent_no_of_words] => 4037
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 77
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/745/07745068.pdf
[firstpage_image] =>[orig_patent_app_number] => 11446980
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/446980 | Binary photomask having a compensation layer | Jun 5, 2006 | Issued |
Array
(
[id] => 141542
[patent_doc_number] => 07691543
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-04-06
[patent_title] => 'Mask data creation method'
[patent_app_type] => utility
[patent_app_number] => 11/414290
[patent_app_country] => US
[patent_app_date] => 2006-05-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 20
[patent_no_of_words] => 8307
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 129
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/691/07691543.pdf
[firstpage_image] =>[orig_patent_app_number] => 11414290
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/414290 | Mask data creation method | Apr 30, 2006 | Issued |
Array
(
[id] => 5834404
[patent_doc_number] => 20060246234
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-11-02
[patent_title] => 'Photomask assembly incorporating a metal/scavenger pellicle frame'
[patent_app_type] => utility
[patent_app_number] => 11/407691
[patent_app_country] => US
[patent_app_date] => 2006-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 12262
[patent_no_of_claims] => 38
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0246/20060246234.pdf
[firstpage_image] =>[orig_patent_app_number] => 11407691
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/407691 | Photomask assembly incorporating a metal/scavenger pellicle frame | Apr 18, 2006 | Abandoned |
Array
(
[id] => 5873808
[patent_doc_number] => 20060166112
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-07-27
[patent_title] => 'Photomask for nearfield exposure, method for making pattern using the photomask, and apparatus for making pattern including the photomask'
[patent_app_type] => utility
[patent_app_number] => 11/393988
[patent_app_country] => US
[patent_app_date] => 2006-03-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 6401
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0166/20060166112.pdf
[firstpage_image] =>[orig_patent_app_number] => 11393988
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/393988 | Method for making a pattern using near-field light exposure through a photomask | Mar 30, 2006 | Issued |
Array
(
[id] => 4581172
[patent_doc_number] => 07851108
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-12-14
[patent_title] => 'Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask'
[patent_app_type] => utility
[patent_app_number] => 11/391332
[patent_app_country] => US
[patent_app_date] => 2006-03-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 5
[patent_no_of_words] => 10412
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 114
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/851/07851108.pdf
[firstpage_image] =>[orig_patent_app_number] => 11391332
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/391332 | Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask | Mar 28, 2006 | Issued |
Array
(
[id] => 167665
[patent_doc_number] => 07666553
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-02-23
[patent_title] => 'Fabrication method for photomask, fabrication method for device and monitoring method for photomask'
[patent_app_type] => utility
[patent_app_number] => 11/384240
[patent_app_country] => US
[patent_app_date] => 2006-03-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 36
[patent_no_of_words] => 7651
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 84
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/666/07666553.pdf
[firstpage_image] =>[orig_patent_app_number] => 11384240
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/384240 | Fabrication method for photomask, fabrication method for device and monitoring method for photomask | Mar 20, 2006 | Issued |
Array
(
[id] => 274036
[patent_doc_number] => 07560200
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-07-14
[patent_title] => 'Mask data generation method'
[patent_app_type] => utility
[patent_app_number] => 11/376191
[patent_app_country] => US
[patent_app_date] => 2006-03-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 3158
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 163
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/560/07560200.pdf
[firstpage_image] =>[orig_patent_app_number] => 11376191
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/376191 | Mask data generation method | Mar 15, 2006 | Issued |
Array
(
[id] => 5106853
[patent_doc_number] => 20070065731
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-03-22
[patent_title] => 'Photomask, method for fabricating photomask, and method for fabricating semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 11/367280
[patent_app_country] => US
[patent_app_date] => 2006-03-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 5520
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0065/20070065731.pdf
[firstpage_image] =>[orig_patent_app_number] => 11367280
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/367280 | Method for fabricating an attenuated phase shift photomask by separate patterning of negative and positive resist layers with corresponding etching steps for underlying light-shielding and phase shift layers on a transparent substrate | Mar 5, 2006 | Issued |
Array
(
[id] => 5177329
[patent_doc_number] => 20070178389
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-08-02
[patent_title] => 'Universal photomask'
[patent_app_type] => utility
[patent_app_number] => 11/344630
[patent_app_country] => US
[patent_app_date] => 2006-02-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 3629
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0178/20070178389.pdf
[firstpage_image] =>[orig_patent_app_number] => 11344630
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/344630 | Universal photomask | Jan 31, 2006 | Abandoned |
Array
(
[id] => 151134
[patent_doc_number] => 07682778
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-03-23
[patent_title] => 'Methods of forming contact plugs in semiconductor devices'
[patent_app_type] => utility
[patent_app_number] => 11/342560
[patent_app_country] => US
[patent_app_date] => 2006-01-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 19
[patent_figures_cnt] => 20
[patent_no_of_words] => 5598
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 152
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/682/07682778.pdf
[firstpage_image] =>[orig_patent_app_number] => 11342560
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/342560 | Methods of forming contact plugs in semiconductor devices | Jan 30, 2006 | Issued |
Array
(
[id] => 369701
[patent_doc_number] => 07476474
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-01-13
[patent_title] => 'Method for making a photomask assembly incorporating a porous frame'
[patent_app_type] => utility
[patent_app_number] => 11/340384
[patent_app_country] => US
[patent_app_date] => 2006-01-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 8709
[patent_no_of_claims] => 31
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 82
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/476/07476474.pdf
[firstpage_image] =>[orig_patent_app_number] => 11340384
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/340384 | Method for making a photomask assembly incorporating a porous frame | Jan 24, 2006 | Issued |
Array
(
[id] => 5842844
[patent_doc_number] => 20060121368
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-06-08
[patent_title] => 'Photomask structure and method of reducing lens aberration and pattern displacement'
[patent_app_type] => utility
[patent_app_number] => 11/338327
[patent_app_country] => US
[patent_app_date] => 2006-01-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 1593
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0121/20060121368.pdf
[firstpage_image] =>[orig_patent_app_number] => 11338327
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/338327 | Photomask structure and method of reducing lens aberration and pattern displacement | Jan 22, 2006 | Abandoned |
Array
(
[id] => 421754
[patent_doc_number] => 07273684
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-09-25
[patent_title] => 'Mask having transmissive elements and a common sidelobe inhibitor for sidelobe suppression in radiated patterning'
[patent_app_type] => utility
[patent_app_number] => 11/336229
[patent_app_country] => US
[patent_app_date] => 2006-01-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 14
[patent_no_of_words] => 4075
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 89
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/273/07273684.pdf
[firstpage_image] =>[orig_patent_app_number] => 11336229
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/336229 | Mask having transmissive elements and a common sidelobe inhibitor for sidelobe suppression in radiated patterning | Jan 19, 2006 | Issued |
Array
(
[id] => 5747736
[patent_doc_number] => 20060110667
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-05-25
[patent_title] => 'Method of fabrication of semiconductor integrated circuit device and mask fabrication method'
[patent_app_type] => utility
[patent_app_number] => 11/322232
[patent_app_country] => US
[patent_app_date] => 2006-01-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 14
[patent_no_of_words] => 11210
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0110/20060110667.pdf
[firstpage_image] =>[orig_patent_app_number] => 11322232
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/322232 | Method of fabrication of semiconductor integrated circuit device and mask fabrication method | Jan 2, 2006 | Abandoned |
Array
(
[id] => 190708
[patent_doc_number] => 07642019
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-01-05
[patent_title] => 'Methods for monitoring and adjusting focus variation in a photolithographic process using test features printed from photomask test pattern images; and machine readable program storage device having instructions therefore'
[patent_app_type] => utility
[patent_app_number] => 11/324739
[patent_app_country] => US
[patent_app_date] => 2006-01-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 19
[patent_figures_cnt] => 34
[patent_no_of_words] => 10004
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 122
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/642/07642019.pdf
[firstpage_image] =>[orig_patent_app_number] => 11324739
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/324739 | Methods for monitoring and adjusting focus variation in a photolithographic process using test features printed from photomask test pattern images; and machine readable program storage device having instructions therefore | Jan 2, 2006 | Issued |
Array
(
[id] => 5850946
[patent_doc_number] => 20060234137
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-10-19
[patent_title] => 'Photomask structures providing improved photolithographic process windows and methods of manufacturing same'
[patent_app_type] => utility
[patent_app_number] => 11/325081
[patent_app_country] => US
[patent_app_date] => 2006-01-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 9553
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0234/20060234137.pdf
[firstpage_image] =>[orig_patent_app_number] => 11325081
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/325081 | Photomask structures providing improved photolithographic process windows and methods of manufacturing same | Jan 2, 2006 | Abandoned |