Search

Kimberly Ann House

Examiner (ID: 7013)

Most Active Art Unit
3974
Art Unit(s)
3974, OPESS
Total Applications
1850
Issued Applications
2
Pending Applications
13
Abandoned Applications
1807

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 5106856 [patent_doc_number] => 20070065734 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-03-22 [patent_title] => 'Exposure method, exposure mask, and exposure apparatus' [patent_app_type] => utility [patent_app_number] => 11/548756 [patent_app_country] => US [patent_app_date] => 2006-10-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 6481 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0065/20070065734.pdf [firstpage_image] =>[orig_patent_app_number] => 11548756 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/548756
Exposure method, exposure mask, and exposure apparatus Oct 11, 2006 Abandoned
Array ( [id] => 202237 [patent_doc_number] => 07632609 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-12-15 [patent_title] => 'Fabrication method of photomask-blank' [patent_app_type] => utility [patent_app_number] => 11/545451 [patent_app_country] => US [patent_app_date] => 2006-10-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 25 [patent_no_of_words] => 9991 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 102 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/632/07632609.pdf [firstpage_image] =>[orig_patent_app_number] => 11545451 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/545451
Fabrication method of photomask-blank Oct 10, 2006 Issued
Array ( [id] => 4669680 [patent_doc_number] => 20080044740 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-02-21 [patent_title] => 'PHOTOMASK HAVING HAZE REDUCTION LAYER' [patent_app_type] => utility [patent_app_number] => 11/466002 [patent_app_country] => US [patent_app_date] => 2006-08-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 2120 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0044/20080044740.pdf [firstpage_image] =>[orig_patent_app_number] => 11466002 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/466002
PHOTOMASK HAVING HAZE REDUCTION LAYER Aug 20, 2006 Abandoned
Array ( [id] => 5022593 [patent_doc_number] => 20070148559 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-06-28 [patent_title] => 'Phase shift mask and method for fabricating the same' [patent_app_type] => utility [patent_app_number] => 11/478180 [patent_app_country] => US [patent_app_date] => 2006-06-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 1745 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0148/20070148559.pdf [firstpage_image] =>[orig_patent_app_number] => 11478180 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/478180
Phase shift mask and method for fabricating the same Jun 27, 2006 Abandoned
Array ( [id] => 81081 [patent_doc_number] => 07745068 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-06-29 [patent_title] => 'Binary photomask having a compensation layer' [patent_app_type] => utility [patent_app_number] => 11/446980 [patent_app_country] => US [patent_app_date] => 2006-06-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 17 [patent_no_of_words] => 4037 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 77 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/745/07745068.pdf [firstpage_image] =>[orig_patent_app_number] => 11446980 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/446980
Binary photomask having a compensation layer Jun 5, 2006 Issued
Array ( [id] => 141542 [patent_doc_number] => 07691543 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-04-06 [patent_title] => 'Mask data creation method' [patent_app_type] => utility [patent_app_number] => 11/414290 [patent_app_country] => US [patent_app_date] => 2006-05-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 20 [patent_no_of_words] => 8307 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 129 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/691/07691543.pdf [firstpage_image] =>[orig_patent_app_number] => 11414290 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/414290
Mask data creation method Apr 30, 2006 Issued
Array ( [id] => 5834404 [patent_doc_number] => 20060246234 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-11-02 [patent_title] => 'Photomask assembly incorporating a metal/scavenger pellicle frame' [patent_app_type] => utility [patent_app_number] => 11/407691 [patent_app_country] => US [patent_app_date] => 2006-04-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 12262 [patent_no_of_claims] => 38 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0246/20060246234.pdf [firstpage_image] =>[orig_patent_app_number] => 11407691 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/407691
Photomask assembly incorporating a metal/scavenger pellicle frame Apr 18, 2006 Abandoned
Array ( [id] => 5873808 [patent_doc_number] => 20060166112 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-07-27 [patent_title] => 'Photomask for nearfield exposure, method for making pattern using the photomask, and apparatus for making pattern including the photomask' [patent_app_type] => utility [patent_app_number] => 11/393988 [patent_app_country] => US [patent_app_date] => 2006-03-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 6401 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0166/20060166112.pdf [firstpage_image] =>[orig_patent_app_number] => 11393988 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/393988
Method for making a pattern using near-field light exposure through a photomask Mar 30, 2006 Issued
Array ( [id] => 4581172 [patent_doc_number] => 07851108 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-12-14 [patent_title] => 'Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask' [patent_app_type] => utility [patent_app_number] => 11/391332 [patent_app_country] => US [patent_app_date] => 2006-03-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 5 [patent_no_of_words] => 10412 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 114 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/851/07851108.pdf [firstpage_image] =>[orig_patent_app_number] => 11391332 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/391332
Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask Mar 28, 2006 Issued
Array ( [id] => 167665 [patent_doc_number] => 07666553 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-02-23 [patent_title] => 'Fabrication method for photomask, fabrication method for device and monitoring method for photomask' [patent_app_type] => utility [patent_app_number] => 11/384240 [patent_app_country] => US [patent_app_date] => 2006-03-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 36 [patent_no_of_words] => 7651 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 84 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/666/07666553.pdf [firstpage_image] =>[orig_patent_app_number] => 11384240 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/384240
Fabrication method for photomask, fabrication method for device and monitoring method for photomask Mar 20, 2006 Issued
Array ( [id] => 274036 [patent_doc_number] => 07560200 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-07-14 [patent_title] => 'Mask data generation method' [patent_app_type] => utility [patent_app_number] => 11/376191 [patent_app_country] => US [patent_app_date] => 2006-03-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 3158 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 163 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/560/07560200.pdf [firstpage_image] =>[orig_patent_app_number] => 11376191 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/376191
Mask data generation method Mar 15, 2006 Issued
Array ( [id] => 5106853 [patent_doc_number] => 20070065731 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-03-22 [patent_title] => 'Photomask, method for fabricating photomask, and method for fabricating semiconductor device' [patent_app_type] => utility [patent_app_number] => 11/367280 [patent_app_country] => US [patent_app_date] => 2006-03-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 5520 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0065/20070065731.pdf [firstpage_image] =>[orig_patent_app_number] => 11367280 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/367280
Method for fabricating an attenuated phase shift photomask by separate patterning of negative and positive resist layers with corresponding etching steps for underlying light-shielding and phase shift layers on a transparent substrate Mar 5, 2006 Issued
Array ( [id] => 5177329 [patent_doc_number] => 20070178389 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-08-02 [patent_title] => 'Universal photomask' [patent_app_type] => utility [patent_app_number] => 11/344630 [patent_app_country] => US [patent_app_date] => 2006-02-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 3629 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0178/20070178389.pdf [firstpage_image] =>[orig_patent_app_number] => 11344630 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/344630
Universal photomask Jan 31, 2006 Abandoned
Array ( [id] => 151134 [patent_doc_number] => 07682778 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-03-23 [patent_title] => 'Methods of forming contact plugs in semiconductor devices' [patent_app_type] => utility [patent_app_number] => 11/342560 [patent_app_country] => US [patent_app_date] => 2006-01-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 19 [patent_figures_cnt] => 20 [patent_no_of_words] => 5598 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 152 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/682/07682778.pdf [firstpage_image] =>[orig_patent_app_number] => 11342560 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/342560
Methods of forming contact plugs in semiconductor devices Jan 30, 2006 Issued
Array ( [id] => 369701 [patent_doc_number] => 07476474 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-01-13 [patent_title] => 'Method for making a photomask assembly incorporating a porous frame' [patent_app_type] => utility [patent_app_number] => 11/340384 [patent_app_country] => US [patent_app_date] => 2006-01-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 8709 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 82 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/476/07476474.pdf [firstpage_image] =>[orig_patent_app_number] => 11340384 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/340384
Method for making a photomask assembly incorporating a porous frame Jan 24, 2006 Issued
Array ( [id] => 5842844 [patent_doc_number] => 20060121368 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-06-08 [patent_title] => 'Photomask structure and method of reducing lens aberration and pattern displacement' [patent_app_type] => utility [patent_app_number] => 11/338327 [patent_app_country] => US [patent_app_date] => 2006-01-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 1593 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0121/20060121368.pdf [firstpage_image] =>[orig_patent_app_number] => 11338327 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/338327
Photomask structure and method of reducing lens aberration and pattern displacement Jan 22, 2006 Abandoned
Array ( [id] => 421754 [patent_doc_number] => 07273684 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-09-25 [patent_title] => 'Mask having transmissive elements and a common sidelobe inhibitor for sidelobe suppression in radiated patterning' [patent_app_type] => utility [patent_app_number] => 11/336229 [patent_app_country] => US [patent_app_date] => 2006-01-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 14 [patent_no_of_words] => 4075 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 89 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/273/07273684.pdf [firstpage_image] =>[orig_patent_app_number] => 11336229 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/336229
Mask having transmissive elements and a common sidelobe inhibitor for sidelobe suppression in radiated patterning Jan 19, 2006 Issued
Array ( [id] => 5747736 [patent_doc_number] => 20060110667 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-05-25 [patent_title] => 'Method of fabrication of semiconductor integrated circuit device and mask fabrication method' [patent_app_type] => utility [patent_app_number] => 11/322232 [patent_app_country] => US [patent_app_date] => 2006-01-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 14 [patent_no_of_words] => 11210 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0110/20060110667.pdf [firstpage_image] =>[orig_patent_app_number] => 11322232 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/322232
Method of fabrication of semiconductor integrated circuit device and mask fabrication method Jan 2, 2006 Abandoned
Array ( [id] => 190708 [patent_doc_number] => 07642019 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-01-05 [patent_title] => 'Methods for monitoring and adjusting focus variation in a photolithographic process using test features printed from photomask test pattern images; and machine readable program storage device having instructions therefore' [patent_app_type] => utility [patent_app_number] => 11/324739 [patent_app_country] => US [patent_app_date] => 2006-01-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 19 [patent_figures_cnt] => 34 [patent_no_of_words] => 10004 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 122 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/642/07642019.pdf [firstpage_image] =>[orig_patent_app_number] => 11324739 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/324739
Methods for monitoring and adjusting focus variation in a photolithographic process using test features printed from photomask test pattern images; and machine readable program storage device having instructions therefore Jan 2, 2006 Issued
Array ( [id] => 5850946 [patent_doc_number] => 20060234137 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-10-19 [patent_title] => 'Photomask structures providing improved photolithographic process windows and methods of manufacturing same' [patent_app_type] => utility [patent_app_number] => 11/325081 [patent_app_country] => US [patent_app_date] => 2006-01-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 16 [patent_no_of_words] => 9553 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0234/20060234137.pdf [firstpage_image] =>[orig_patent_app_number] => 11325081 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/325081
Photomask structures providing improved photolithographic process windows and methods of manufacturing same Jan 2, 2006 Abandoned
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