
Kin Chan Chen
Examiner (ID: 4953)
| Most Active Art Unit | 1765 |
| Art Unit(s) | 1792, 1765 |
| Total Applications | 758 |
| Issued Applications | 583 |
| Pending Applications | 32 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 585401
[patent_doc_number] => 07442647
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2008-10-28
[patent_title] => 'Structure and method for formation of cladded interconnects for MRAMs'
[patent_app_type] => utility
[patent_app_number] => 12/043129
[patent_app_country] => US
[patent_app_date] => 2008-03-05
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 2050
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/442/07442647.pdf
[firstpage_image] =>[orig_patent_app_number] => 12043129
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/043129 | Structure and method for formation of cladded interconnects for MRAMs | Mar 4, 2008 | Issued |
Array
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[patent_doc_number] => 20080023800
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[patent_kind] => A1
[patent_issue_date] => 2008-01-31
[patent_title] => 'Process for smoothening III-N substrates'
[patent_app_type] => utility
[patent_app_number] => 11/878713
[patent_app_country] => US
[patent_app_date] => 2007-07-26
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[firstpage_image] =>[orig_patent_app_number] => 11878713
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/878713 | Process for smoothening III-N substrates | Jul 25, 2007 | Issued |
Array
(
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[patent_doc_number] => 07662646
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-02-16
[patent_title] => 'Plasma processing method and plasma processing apparatus for performing accurate end point detection'
[patent_app_type] => utility
[patent_app_number] => 11/687428
[patent_app_country] => US
[patent_app_date] => 2007-03-16
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[pdf_file] => patents/07/662/07662646.pdf
[firstpage_image] =>[orig_patent_app_number] => 11687428
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/687428 | Plasma processing method and plasma processing apparatus for performing accurate end point detection | Mar 15, 2007 | Issued |
Array
(
[id] => 4698425
[patent_doc_number] => 20080220609
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-09-11
[patent_title] => 'Methods of Forming Mask Patterns on Semiconductor Wafers that Compensate for Nonuniform Center-to-Edge Etch Rates During Photolithographic Processing'
[patent_app_type] => utility
[patent_app_number] => 11/683648
[patent_app_country] => US
[patent_app_date] => 2007-03-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[firstpage_image] =>[orig_patent_app_number] => 11683648
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/683648 | Methods of forming mask patterns on semiconductor wafers that compensate for nonuniform center-to-edge etch rates during photolithographic processing | Mar 7, 2007 | Issued |
Array
(
[id] => 5079813
[patent_doc_number] => 20070123037
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[patent_issue_date] => 2007-05-31
[patent_title] => 'Method of forming pattern using fine pitch hard mask'
[patent_app_type] => utility
[patent_app_number] => 11/699476
[patent_app_country] => US
[patent_app_date] => 2007-01-30
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Array
(
[id] => 4692834
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[patent_issue_date] => 2008-04-10
[patent_title] => 'DRY ETCHING METHOD OF INSULATING FILM'
[patent_app_type] => utility
[patent_app_number] => 11/668057
[patent_app_country] => US
[patent_app_date] => 2007-01-29
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[firstpage_image] =>[orig_patent_app_number] => 11668057
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/668057 | Dry etching method of insulating film | Jan 28, 2007 | Issued |
Array
(
[id] => 5159540
[patent_doc_number] => 20070172584
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-07-26
[patent_title] => 'Method of manufacturing patterned magnetic recording medium'
[patent_app_type] => utility
[patent_app_number] => 11/657720
[patent_app_country] => US
[patent_app_date] => 2007-01-25
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[patent_drawing_sheets_cnt] => 4
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[firstpage_image] =>[orig_patent_app_number] => 11657720
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/657720 | Method of manufacturing patterned magnetic recording medium | Jan 24, 2007 | Abandoned |
Array
(
[id] => 170609
[patent_doc_number] => 07662722
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-02-16
[patent_title] => 'Air gap under on-chip passive device'
[patent_app_type] => utility
[patent_app_number] => 11/626548
[patent_app_country] => US
[patent_app_date] => 2007-01-24
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/662/07662722.pdf
[firstpage_image] =>[orig_patent_app_number] => 11626548
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/626548 | Air gap under on-chip passive device | Jan 23, 2007 | Issued |
Array
(
[id] => 4803159
[patent_doc_number] => 20080014747
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-01-17
[patent_title] => 'PROCESS FOR REMOVING HIGH STRESSED FILM USING LF OR HF BIAS POWER AND CAPACITIVELY COUPLED VHF SOURCE POWER WITH ENHANCED RESIDUE CAPTURE'
[patent_app_type] => utility
[patent_app_number] => 11/626151
[patent_app_country] => US
[patent_app_date] => 2007-01-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[pdf_file] => publications/A1/0014/20080014747.pdf
[firstpage_image] =>[orig_patent_app_number] => 11626151
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/626151 | Process for removing high stressed film using LF or HF bias power and capacitively coupled VHF source power with enhanced residue capture | Jan 22, 2007 | Issued |
Array
(
[id] => 917100
[patent_doc_number] => 07323420
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-01-29
[patent_title] => 'Method for manufacturing multi-thickness gate dielectric layer of semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 11/652186
[patent_app_country] => US
[patent_app_date] => 2007-01-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => patents/07/323/07323420.pdf
[firstpage_image] =>[orig_patent_app_number] => 11652186
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/652186 | Method for manufacturing multi-thickness gate dielectric layer of semiconductor device | Jan 10, 2007 | Issued |
Array
(
[id] => 4929055
[patent_doc_number] => 20080168418
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-07-10
[patent_title] => 'Integrated assist features for epitaxial growth bulk/SOI hybrid tiles with compensation'
[patent_app_type] => utility
[patent_app_number] => 11/651253
[patent_app_country] => US
[patent_app_date] => 2007-01-08
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/651253 | Integrated assist features for epitaxial growth bulk/SOI hybrid tiles with compensation | Jan 7, 2007 | Issued |
Array
(
[id] => 334261
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[patent_title] => 'Method for etching an object to be processed'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/620501 | Method for etching an object to be processed | Jan 4, 2007 | Issued |
Array
(
[id] => 5023019
[patent_doc_number] => 20070148985
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[patent_issue_date] => 2007-06-28
[patent_title] => 'Method of manufacturing trench structure for device'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/648561 | Method of manufacturing trench structure for device | Jan 2, 2007 | Abandoned |
Array
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[patent_title] => 'SYSTEMS AND METHODS FOR PROCESSING MICROFEATURE WORKPIECES'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/619130 | Systems and methods for processing microfeature workpieces | Jan 1, 2007 | Issued |
Array
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[id] => 1076981
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/616300 | Two-step method for etching a fuse window on a semiconductor substrate | Dec 26, 2006 | Issued |
Array
(
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[patent_title] => 'Method for manufacturing semiconductor device or semiconductor wafer using a chucking unit'
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Array
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Array
(
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[patent_title] => 'Method of manufacturing flash memory device'
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Array
(
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[patent_title] => 'Method For The Preferential Polishing Of Silicon Nitride Versus Silicon Oxide'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/562447 | Method For The Preferential Polishing Of Silicon Nitride Versus Silicon Oxide | Nov 21, 2006 | Abandoned |