
Kin Chan Chen
Examiner (ID: 13696)
| Most Active Art Unit | 1765 |
| Art Unit(s) | 1765, 1792 |
| Total Applications | 758 |
| Issued Applications | 583 |
| Pending Applications | 32 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 879663
[patent_doc_number] => 07354778
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[patent_kind] => B2
[patent_issue_date] => 2008-04-08
[patent_title] => 'Method for determining the end point for a cleaning etching process'
[patent_app_type] => utility
[patent_app_number] => 10/656353
[patent_app_country] => US
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[pdf_file] => patents/07/354/07354778.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/656353 | Method for determining the end point for a cleaning etching process | Sep 4, 2003 | Issued |
Array
(
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[patent_issue_date] => 2005-03-03
[patent_title] => 'Method for plasma etching a dielectric layer'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/655231 | Method for plasma etching a dielectric layer | Sep 2, 2003 | Issued |
Array
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[patent_title] => 'Method of optimizing seasoning recipe for etch process'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/652403 | Method of optimizing seasoning recipe for etch process | Aug 28, 2003 | Issued |
Array
(
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[patent_title] => 'Selective etch process for making a semiconductor device having a high-k gate dielectric'
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Array
(
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[patent_title] => 'Novel chemical-mechanical polishing (CMP) process for shallow trench isolation'
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Array
(
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Array
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[patent_title] => 'Method for fabricating semiconductor device using ArF photolithography capable of protecting tapered profile of hard mask'
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Array
(
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[patent_issue_date] => 2004-02-19
[patent_title] => 'Slurry for chemical mechanical polishing process and method of manufacturing semiconductor device using the same'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/639541 | Slurry for chemical mechanical polishing process and method of manufacturing semiconductor device using the same | Aug 11, 2003 | Issued |
Array
(
[id] => 606417
[patent_doc_number] => 07153782
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[patent_title] => 'Effective solution and process to wet-etch metal-alloy films in semiconductor processing'
[patent_app_type] => utility
[patent_app_number] => 10/621879
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/621879 | Effective solution and process to wet-etch metal-alloy films in semiconductor processing | Jul 16, 2003 | Issued |
Array
(
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[patent_issue_date] => 2004-04-15
[patent_title] => 'Process for removal of photoresist mask used for making vias in low K carbon-doped silicon oxide dielectric material, and for removal of etch residues from formation of vias and removal of photoresist mask'
[patent_app_type] => new
[patent_app_number] => 10/619978
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Array
(
[id] => 6825365
[patent_doc_number] => 20030235987
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[patent_title] => 'Method for fabricating semiconductor device'
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Array
(
[id] => 7607576
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[patent_title] => 'Method of manufacturing a semiconductor device with copper wiring treated in a plasma discharge'
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Array
(
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[patent_title] => 'Vapor phase etching MEMS devices'
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Array
(
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[patent_title] => 'Film forming method'
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Array
(
[id] => 968536
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Array
(
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Array
(
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Array
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Array
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