
Kin Chan Chen
Examiner (ID: 3806)
| Most Active Art Unit | 1765 |
| Art Unit(s) | 1765, 1792 |
| Total Applications | 758 |
| Issued Applications | 583 |
| Pending Applications | 32 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 7296571
[patent_doc_number] => 20040214432
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-10-28
[patent_title] => 'Thinning of semiconductor wafers'
[patent_app_type] => new
[patent_app_number] => 10/422290
[patent_app_country] => US
[patent_app_date] => 2003-04-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 3091
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 73
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0214/20040214432.pdf
[firstpage_image] =>[orig_patent_app_number] => 10422290
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/422290 | Thinning of semiconductor wafers | Apr 23, 2003 | Abandoned |
Array
(
[id] => 7296602
[patent_doc_number] => 20040214447
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-10-28
[patent_title] => 'Sensor produced using imprint lithography'
[patent_app_type] => new
[patent_app_number] => 10/423063
[patent_app_country] => US
[patent_app_date] => 2003-04-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 9355
[patent_no_of_claims] => 91
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 44
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0214/20040214447.pdf
[firstpage_image] =>[orig_patent_app_number] => 10423063
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/423063 | Sensor produced using imprint lithography | Apr 23, 2003 | Issued |
Array
(
[id] => 7395446
[patent_doc_number] => 20040038547
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-02-26
[patent_title] => 'Method of etching a metal layer using a mask, a metallization method for a semiconductor device, a method of etching a metal layer, and an etching gas'
[patent_app_type] => new
[patent_app_number] => 10/419075
[patent_app_country] => US
[patent_app_date] => 2003-04-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 4419
[patent_no_of_claims] => 40
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 28
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0038/20040038547.pdf
[firstpage_image] =>[orig_patent_app_number] => 10419075
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/419075 | Method of etching a metal layer using a mask, a metallization method for a semiconductor device, a method of etching a metal layer, and an etching gas | Apr 20, 2003 | Issued |
Array
(
[id] => 744809
[patent_doc_number] => 07026245
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-04-11
[patent_title] => 'Polishing agent and polishing method'
[patent_app_type] => utility
[patent_app_number] => 10/407214
[patent_app_country] => US
[patent_app_date] => 2003-04-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 8
[patent_no_of_words] => 5112
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 9
[patent_words_short_claim] => 28
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/026/07026245.pdf
[firstpage_image] =>[orig_patent_app_number] => 10407214
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/407214 | Polishing agent and polishing method | Apr 6, 2003 | Issued |
Array
(
[id] => 7353013
[patent_doc_number] => 20040048472
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-03-11
[patent_title] => 'Semiconductor device having T-shaped gate structure comprising in situ sidewall spacers and method of forming the semiconductor device'
[patent_app_type] => new
[patent_app_number] => 10/400598
[patent_app_country] => US
[patent_app_date] => 2003-03-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 4212
[patent_no_of_claims] => 40
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 57
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0048/20040048472.pdf
[firstpage_image] =>[orig_patent_app_number] => 10400598
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/400598 | Semiconductor device having T-shaped gate structure comprising in situ sidewall spacers and method of forming the semiconductor device | Mar 26, 2003 | Issued |
Array
(
[id] => 923103
[patent_doc_number] => 07319075
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-01-15
[patent_title] => 'Etchant with selectivity for doped silicon dioxide over undoped silicon dioxide and silicon nitride, processes which employ the etchant, and structures formed thereby'
[patent_app_type] => utility
[patent_app_number] => 10/396164
[patent_app_country] => US
[patent_app_date] => 2003-03-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 4431
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 61
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/319/07319075.pdf
[firstpage_image] =>[orig_patent_app_number] => 10396164
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/396164 | Etchant with selectivity for doped silicon dioxide over undoped silicon dioxide and silicon nitride, processes which employ the etchant, and structures formed thereby | Mar 24, 2003 | Issued |
Array
(
[id] => 7136949
[patent_doc_number] => 20050181608
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-08-18
[patent_title] => 'Method and apparatus for etching photomasks'
[patent_app_type] => utility
[patent_app_number] => 10/391071
[patent_app_country] => US
[patent_app_date] => 2003-03-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 7499
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0181/20050181608.pdf
[firstpage_image] =>[orig_patent_app_number] => 10391071
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/391071 | Method and apparatus for etching photomasks | Mar 17, 2003 | Issued |
Array
(
[id] => 7150194
[patent_doc_number] => 20040171252
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-09-02
[patent_title] => 'REDUCED CONTAMINATION OF TOOLS IN SEMICONDUCTOR PROCESSING'
[patent_app_type] => new
[patent_app_number] => 10/248898
[patent_app_country] => US
[patent_app_date] => 2003-02-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 2261
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 51
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0171/20040171252.pdf
[firstpage_image] =>[orig_patent_app_number] => 10248898
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/248898 | REDUCED CONTAMINATION OF TOOLS IN SEMICONDUCTOR PROCESSING | Feb 27, 2003 | Abandoned |
Array
(
[id] => 951330
[patent_doc_number] => 06960532
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-11-01
[patent_title] => 'Suppressing lithography at a wafer edge'
[patent_app_type] => utility
[patent_app_number] => 10/248911
[patent_app_country] => US
[patent_app_date] => 2003-02-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 10
[patent_no_of_words] => 3185
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 132
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/960/06960532.pdf
[firstpage_image] =>[orig_patent_app_number] => 10248911
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/248911 | Suppressing lithography at a wafer edge | Feb 27, 2003 | Issued |
Array
(
[id] => 782762
[patent_doc_number] => 06992010
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-01-31
[patent_title] => 'Gate structure and method of manufacture'
[patent_app_type] => utility
[patent_app_number] => 10/248871
[patent_app_country] => US
[patent_app_date] => 2003-02-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 11
[patent_no_of_words] => 2807
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 169
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/992/06992010.pdf
[firstpage_image] =>[orig_patent_app_number] => 10248871
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/248871 | Gate structure and method of manufacture | Feb 25, 2003 | Issued |
Array
(
[id] => 732781
[patent_doc_number] => 07037843
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-05-02
[patent_title] => 'Plasma etching method'
[patent_app_type] => utility
[patent_app_number] => 10/373998
[patent_app_country] => US
[patent_app_date] => 2003-02-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 6
[patent_no_of_words] => 3968
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 122
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/037/07037843.pdf
[firstpage_image] =>[orig_patent_app_number] => 10373998
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/373998 | Plasma etching method | Feb 24, 2003 | Issued |
Array
(
[id] => 7465717
[patent_doc_number] => 20040166677
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-08-26
[patent_title] => 'Process to suppress lithography at a wafer edge'
[patent_app_type] => new
[patent_app_number] => 10/248841
[patent_app_country] => US
[patent_app_date] => 2003-02-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 2764
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 48
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0166/20040166677.pdf
[firstpage_image] =>[orig_patent_app_number] => 10248841
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/248841 | Process to suppress lithography at a wafer edge | Feb 23, 2003 | Issued |
Array
(
[id] => 6847177
[patent_doc_number] => 20030166344
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-09-04
[patent_title] => 'Method for manufacturing a semiconductor device'
[patent_app_type] => new
[patent_app_number] => 10/365756
[patent_app_country] => US
[patent_app_date] => 2003-02-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 5598
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 42
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0166/20030166344.pdf
[firstpage_image] =>[orig_patent_app_number] => 10365756
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/365756 | Method for manufacturing a semiconductor device | Feb 11, 2003 | Issued |
| 10/364426 | METHOD FOR DETECTING THE TRANSITION BETWEEN DIFFERENT MATERIALS IN SEMICONDUCTOR STRUCTURES | Feb 10, 2003 | Abandoned |
Array
(
[id] => 7395380
[patent_doc_number] => 20040038531
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-02-26
[patent_title] => 'Method of manufacturing semiconductor apparatus'
[patent_app_type] => new
[patent_app_number] => 10/360875
[patent_app_country] => US
[patent_app_date] => 2003-02-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 5753
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 48
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0038/20040038531.pdf
[firstpage_image] =>[orig_patent_app_number] => 10360875
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/360875 | Method of manufacturing a semiconductor apparatus using a substrate processing agent | Feb 9, 2003 | Issued |
Array
(
[id] => 446190
[patent_doc_number] => 07253115
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-08-07
[patent_title] => 'Dual damascene etch processes'
[patent_app_type] => utility
[patent_app_number] => 10/360236
[patent_app_country] => US
[patent_app_date] => 2003-02-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 22
[patent_no_of_words] => 5341
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 99
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/253/07253115.pdf
[firstpage_image] =>[orig_patent_app_number] => 10360236
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/360236 | Dual damascene etch processes | Feb 5, 2003 | Issued |
Array
(
[id] => 6829997
[patent_doc_number] => 20030181055
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-09-25
[patent_title] => 'Method of removing photo-resist and polymer residue'
[patent_app_type] => new
[patent_app_number] => 10/359297
[patent_app_country] => US
[patent_app_date] => 2003-02-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 2441
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 70
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0181/20030181055.pdf
[firstpage_image] =>[orig_patent_app_number] => 10359297
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/359297 | Method of removing photo-resist and polymer residue | Feb 5, 2003 | Abandoned |
Array
(
[id] => 7446268
[patent_doc_number] => 20040009667
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-01-15
[patent_title] => 'Etching method'
[patent_app_type] => new
[patent_app_number] => 10/359066
[patent_app_country] => US
[patent_app_date] => 2003-02-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 7354
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 154
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0009/20040009667.pdf
[firstpage_image] =>[orig_patent_app_number] => 10359066
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/359066 | Etching method | Feb 5, 2003 | Abandoned |
Array
(
[id] => 6851648
[patent_doc_number] => 20030143851
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-07-31
[patent_title] => 'Abrasives for chemical mechanical polishing'
[patent_app_type] => new
[patent_app_number] => 10/360254
[patent_app_country] => US
[patent_app_date] => 2003-02-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 3557
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 32
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0143/20030143851.pdf
[firstpage_image] =>[orig_patent_app_number] => 10360254
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/360254 | Abrasives for chemical mechanical polishing | Feb 4, 2003 | Issued |
Array
(
[id] => 958806
[patent_doc_number] => 06953752
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-10-11
[patent_title] => 'Reduced silicon gouging and common source line resistance in semiconductor devices'
[patent_app_type] => utility
[patent_app_number] => 10/358756
[patent_app_country] => US
[patent_app_date] => 2003-02-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 17
[patent_no_of_words] => 1847
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 76
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/953/06953752.pdf
[firstpage_image] =>[orig_patent_app_number] => 10358756
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/358756 | Reduced silicon gouging and common source line resistance in semiconductor devices | Feb 4, 2003 | Issued |