
Kin Chan Chen
Examiner (ID: 3806)
| Most Active Art Unit | 1765 |
| Art Unit(s) | 1765, 1792 |
| Total Applications | 758 |
| Issued Applications | 583 |
| Pending Applications | 32 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1107788
[patent_doc_number] => 06809036
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-10-26
[patent_title] => 'Dry silylation plasma etch process'
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[patent_app_number] => 10/259808
[patent_app_country] => US
[patent_app_date] => 2002-09-30
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[pdf_file] => patents/06/809/06809036.pdf
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Array
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[patent_issue_date] => 2007-03-20
[patent_title] => 'Method of manufacturing semiconductor device having composite buffer layer'
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Array
(
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[patent_doc_number] => 06921720
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[patent_issue_date] => 2005-07-26
[patent_title] => 'Plasma treating apparatus and plasma treating method'
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[patent_app_number] => 10/227930
[patent_app_country] => US
[patent_app_date] => 2002-08-26
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/227930 | Plasma treating apparatus and plasma treating method | Aug 25, 2002 | Issued |
Array
(
[id] => 7313675
[patent_doc_number] => 20040033694
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[patent_issue_date] => 2004-02-19
[patent_title] => 'Method of making a vertical gate semiconductor device'
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Array
(
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[patent_title] => 'Method for etching high-aspect-ratio features'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/219885 | Method for etching high-aspect-ratio features | Aug 13, 2002 | Issued |
Array
(
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[patent_doc_number] => 20030036273
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[patent_issue_date] => 2003-02-20
[patent_title] => 'Shield for capturing fluid displaced from a substrate'
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Array
(
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[patent_title] => 'Method for handling a thin silicon wafer'
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[pdf_file] => patents/06/884/06884726.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/217577 | Method for handling a thin silicon wafer | Aug 12, 2002 | Issued |
Array
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[patent_doc_number] => 20040031772
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[patent_issue_date] => 2004-02-19
[patent_title] => 'Preventing gate oxice thinning effect in a recess LOCOS process'
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[patent_app_number] => 10/219094
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[patent_app_date] => 2002-08-13
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[pdf_file] => publications/A1/0031/20040031772.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/219094 | Preventing gate oxice thinning effect in a recess LOCOS process | Aug 12, 2002 | Issued |
Array
(
[id] => 785254
[patent_doc_number] => 06989332
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2006-01-24
[patent_title] => 'Ion implantation to modulate amorphous carbon stress'
[patent_app_type] => utility
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[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/217730 | Ion implantation to modulate amorphous carbon stress | Aug 12, 2002 | Issued |
Array
(
[id] => 6829998
[patent_doc_number] => 20030181056
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[patent_issue_date] => 2003-09-25
[patent_title] => 'Method of etching a magnetic material film stack using a hard mask'
[patent_app_type] => new
[patent_app_number] => 10/218271
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Array
(
[id] => 7383815
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[patent_issue_date] => 2004-02-12
[patent_title] => 'Method for removal of residue from a magneto-resistive random access memory (MRAM) film stack using a sacrificial mask layer'
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Array
(
[id] => 6783152
[patent_doc_number] => 20030064599
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[patent_title] => 'Pattern forming method'
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Array
(
[id] => 1005379
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[patent_title] => 'Methods using a peroxide-generating compound to remove group VIII metal-containing residue'
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Array
(
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[patent_title] => 'Method of plasma etching platinum'
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Array
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Array
(
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Array
(
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Array
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