
Kin Chan Chen
Examiner (ID: 4953)
| Most Active Art Unit | 1765 |
| Art Unit(s) | 1792, 1765 |
| Total Applications | 758 |
| Issued Applications | 583 |
| Pending Applications | 32 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1220576
[patent_doc_number] => 06703312
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-03-09
[patent_title] => 'Method of forming active devices of different gatelengths using lithographic printed gate images of same length'
[patent_app_type] => B2
[patent_app_number] => 10/151074
[patent_app_country] => US
[patent_app_date] => 2002-05-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 8
[patent_no_of_words] => 2020
[patent_no_of_claims] => 20
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[patent_words_short_claim] => 171
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/703/06703312.pdf
[firstpage_image] =>[orig_patent_app_number] => 10151074
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/151074 | Method of forming active devices of different gatelengths using lithographic printed gate images of same length | May 16, 2002 | Issued |
Array
(
[id] => 6435350
[patent_doc_number] => 20020127859
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-09-12
[patent_title] => 'Compositions and methods for the selective etching of polysilicon for wafer reclamation'
[patent_app_type] => new
[patent_app_number] => 10/139950
[patent_app_country] => US
[patent_app_date] => 2002-05-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 6537
[patent_no_of_claims] => 33
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[pdf_file] => publications/A1/0127/20020127859.pdf
[firstpage_image] =>[orig_patent_app_number] => 10139950
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/139950 | Compositions and methods for the selective etching of polysilicon for wafer reclamation | May 5, 2002 | Abandoned |
Array
(
[id] => 5859369
[patent_doc_number] => 20020123229
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-09-05
[patent_title] => 'Plasma processing method'
[patent_app_type] => new
[patent_app_number] => 10/135516
[patent_app_country] => US
[patent_app_date] => 2002-05-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
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[patent_no_of_words] => 10259
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[pdf_file] => publications/A1/0123/20020123229.pdf
[firstpage_image] =>[orig_patent_app_number] => 10135516
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/135516 | Specimen surface processing method | Apr 30, 2002 | Issued |
Array
(
[id] => 6939315
[patent_doc_number] => 20050112878
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-05-26
[patent_title] => 'Method for dry etching a semiconductor wafer'
[patent_app_type] => utility
[patent_app_number] => 10/506478
[patent_app_country] => US
[patent_app_date] => 2002-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 2502
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[pdf_file] => publications/A1/0112/20050112878.pdf
[firstpage_image] =>[orig_patent_app_number] => 10506478
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/506478 | Method for dry etching a semiconductor wafer | Apr 18, 2002 | Issued |
Array
(
[id] => 6176878
[patent_doc_number] => 20020155724
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-10-24
[patent_title] => 'Dry etching method and apparatus'
[patent_app_type] => new
[patent_app_number] => 10/124247
[patent_app_country] => US
[patent_app_date] => 2002-04-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[pdf_file] => publications/A1/0155/20020155724.pdf
[firstpage_image] =>[orig_patent_app_number] => 10124247
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/124247 | Dry etching method and apparatus | Apr 17, 2002 | Abandoned |
Array
(
[id] => 6874580
[patent_doc_number] => 20030194877
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-10-16
[patent_title] => 'Integrated etch, rinse and dry, and anneal method and system'
[patent_app_type] => new
[patent_app_number] => 10/124437
[patent_app_country] => US
[patent_app_date] => 2002-04-16
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[pdf_file] => publications/A1/0194/20030194877.pdf
[firstpage_image] =>[orig_patent_app_number] => 10124437
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/124437 | Integrated etch, rinse and dry, and anneal method and system | Apr 15, 2002 | Abandoned |
Array
(
[id] => 6874575
[patent_doc_number] => 20030194872
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-10-16
[patent_title] => 'Copper interconnect with sidewall copper-copper contact between metal and via'
[patent_app_type] => new
[patent_app_number] => 10/124588
[patent_app_country] => US
[patent_app_date] => 2002-04-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[pdf_file] => publications/A1/0194/20030194872.pdf
[firstpage_image] =>[orig_patent_app_number] => 10124588
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/124588 | Copper interconnect with sidewall copper-copper contact between metal and via | Apr 15, 2002 | Abandoned |
Array
(
[id] => 938436
[patent_doc_number] => 06972265
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-12-06
[patent_title] => 'Metal etch process selective to metallic insulating materials'
[patent_app_type] => utility
[patent_app_number] => 10/122737
[patent_app_country] => US
[patent_app_date] => 2002-04-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 12313
[patent_no_of_claims] => 11
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[pdf_file] => patents/06/972/06972265.pdf
[firstpage_image] =>[orig_patent_app_number] => 10122737
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/122737 | Metal etch process selective to metallic insulating materials | Apr 14, 2002 | Issued |
Array
(
[id] => 6874574
[patent_doc_number] => 20030194871
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-10-16
[patent_title] => 'Method of stress and damage elimination during formation of isolation device'
[patent_app_type] => new
[patent_app_number] => 10/121691
[patent_app_country] => US
[patent_app_date] => 2002-04-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[pdf_file] => publications/A1/0194/20030194871.pdf
[firstpage_image] =>[orig_patent_app_number] => 10121691
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/121691 | Method of stress and damage elimination during formation of isolation device | Apr 14, 2002 | Abandoned |
Array
(
[id] => 6874573
[patent_doc_number] => 20030194870
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-10-16
[patent_title] => 'Method for forming sidewall oxide layer of shallow trench isolation with reduced stress and encroachment'
[patent_app_type] => new
[patent_app_number] => 10/121513
[patent_app_country] => US
[patent_app_date] => 2002-04-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 1565
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[pdf_file] => publications/A1/0194/20030194870.pdf
[firstpage_image] =>[orig_patent_app_number] => 10121513
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/121513 | Method for forming sidewall oxide layer of shallow trench isolation with reduced stress and encroachment | Apr 14, 2002 | Abandoned |
Array
(
[id] => 1089203
[patent_doc_number] => 06828239
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-12-07
[patent_title] => 'Method of forming a high aspect ratio shallow trench isolation'
[patent_app_type] => B2
[patent_app_number] => 10/121504
[patent_app_country] => US
[patent_app_date] => 2002-04-11
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/828/06828239.pdf
[firstpage_image] =>[orig_patent_app_number] => 10121504
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/121504 | Method of forming a high aspect ratio shallow trench isolation | Apr 10, 2002 | Issued |
Array
(
[id] => 6469860
[patent_doc_number] => 20020151177
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-10-17
[patent_title] => 'Method of reducing in-trench smearing during polishing'
[patent_app_type] => new
[patent_app_number] => 10/119862
[patent_app_country] => US
[patent_app_date] => 2002-04-10
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[firstpage_image] =>[orig_patent_app_number] => 10119862
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/119862 | Method of reducing in-trench smearing during polishing | Apr 9, 2002 | Issued |
Array
(
[id] => 1034486
[patent_doc_number] => 06875695
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-04-05
[patent_title] => 'System and method for analog replication of microdevices having a desired surface contour'
[patent_app_type] => utility
[patent_app_number] => 10/115992
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/115992 | System and method for analog replication of microdevices having a desired surface contour | Apr 4, 2002 | Issued |
Array
(
[id] => 1134533
[patent_doc_number] => 06784112
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-08-31
[patent_title] => 'Method for surface treatment of silicon based substrate'
[patent_app_type] => B2
[patent_app_number] => 10/114320
[patent_app_country] => US
[patent_app_date] => 2002-04-03
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[firstpage_image] =>[orig_patent_app_number] => 10114320
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/114320 | Method for surface treatment of silicon based substrate | Apr 2, 2002 | Issued |
Array
(
[id] => 6865287
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[patent_issue_date] => 2003-10-09
[patent_title] => 'Method for forming barrier layer'
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[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 10115740
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/115740 | Method for forming barrier layer | Apr 2, 2002 | Issued |
Array
(
[id] => 6733115
[patent_doc_number] => 20030010750
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-01-16
[patent_title] => 'Method for determining the endpoint of etch process steps'
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[patent_app_number] => 10/113344
[patent_app_country] => US
[patent_app_date] => 2002-04-01
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[pdf_file] => publications/A1/0010/20030010750.pdf
[firstpage_image] =>[orig_patent_app_number] => 10113344
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/113344 | Method for determining the endpoint of etch process steps | Mar 31, 2002 | Abandoned |
Array
(
[id] => 6531210
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[patent_title] => 'Plasma processing'
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[firstpage_image] =>[orig_patent_app_number] => 10107435
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/107435 | Plasma processing | Mar 27, 2002 | Abandoned |
Array
(
[id] => 6718391
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[patent_title] => 'Production process of electronic component using wet etching, electronic component, and suspension for hard disk'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/107801 | Production process of electronic component using wet etching, electronic component, and suspension for hard disk | Mar 27, 2002 | Issued |
Array
(
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/106823 | Method of etching a substrate | Mar 26, 2002 | Issued |