
Kin Chan Chen
Examiner (ID: 4953)
| Most Active Art Unit | 1765 |
| Art Unit(s) | 1792, 1765 |
| Total Applications | 758 |
| Issued Applications | 583 |
| Pending Applications | 32 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1462663
[patent_doc_number] => 06350697
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-02-26
[patent_title] => 'Method of cleaning and conditioning plasma reaction chamber'
[patent_app_type] => B1
[patent_app_number] => 09/469286
[patent_app_country] => US
[patent_app_date] => 1999-12-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 19
[patent_no_of_words] => 4489
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 107
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/350/06350697.pdf
[firstpage_image] =>[orig_patent_app_number] => 09469286
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/469286 | Method of cleaning and conditioning plasma reaction chamber | Dec 21, 1999 | Issued |
Array
(
[id] => 4325514
[patent_doc_number] => 06329299
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-12-11
[patent_title] => 'Compositions and methods for the selective etching of tantalum-containing films for wafer reclamation'
[patent_app_type] => 1
[patent_app_number] => 9/470153
[patent_app_country] => US
[patent_app_date] => 1999-12-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 11169
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 139
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/329/06329299.pdf
[firstpage_image] =>[orig_patent_app_number] => 470153
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/470153 | Compositions and methods for the selective etching of tantalum-containing films for wafer reclamation | Dec 21, 1999 | Issued |
Array
(
[id] => 1291192
[patent_doc_number] => 06630405
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-10-07
[patent_title] => 'Method of gate patterning for sub-0.1 m technology'
[patent_app_type] => B1
[patent_app_number] => 09/467136
[patent_app_country] => US
[patent_app_date] => 1999-12-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 3
[patent_no_of_words] => 1353
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 150
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/630/06630405.pdf
[firstpage_image] =>[orig_patent_app_number] => 09467136
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/467136 | Method of gate patterning for sub-0.1 m technology | Dec 19, 1999 | Issued |
Array
(
[id] => 1602654
[patent_doc_number] => 06432833
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-13
[patent_title] => 'Method of forming a self aligned contact opening'
[patent_app_type] => B1
[patent_app_number] => 09/468239
[patent_app_country] => US
[patent_app_date] => 1999-12-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 6
[patent_no_of_words] => 2445
[patent_no_of_claims] => 60
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 186
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/432/06432833.pdf
[firstpage_image] =>[orig_patent_app_number] => 09468239
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/468239 | Method of forming a self aligned contact opening | Dec 19, 1999 | Issued |
Array
(
[id] => 1092918
[patent_doc_number] => 06825117
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-11-30
[patent_title] => 'High PH slurry for chemical mechanical polishing of copper'
[patent_app_type] => B2
[patent_app_number] => 09/461158
[patent_app_country] => US
[patent_app_date] => 1999-12-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 3934
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 45
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/825/06825117.pdf
[firstpage_image] =>[orig_patent_app_number] => 09461158
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/461158 | High PH slurry for chemical mechanical polishing of copper | Dec 13, 1999 | Issued |
Array
(
[id] => 4409360
[patent_doc_number] => 06228776
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-08
[patent_title] => 'Ashing process by adjusting etching endpoint and orderly stepped positioning silicon wafer'
[patent_app_type] => 1
[patent_app_number] => 9/455924
[patent_app_country] => US
[patent_app_date] => 1999-12-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 2061
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 132
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/228/06228776.pdf
[firstpage_image] =>[orig_patent_app_number] => 455924
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/455924 | Ashing process by adjusting etching endpoint and orderly stepped positioning silicon wafer | Dec 6, 1999 | Issued |
Array
(
[id] => 4262261
[patent_doc_number] => 06245144
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-06-12
[patent_title] => 'Doping control in selective area growth (SAG) of InP epitaxy in the fabrication of solid state semiconductor lasers'
[patent_app_type] => 1
[patent_app_number] => 9/455136
[patent_app_country] => US
[patent_app_date] => 1999-12-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 2041
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 237
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/245/06245144.pdf
[firstpage_image] =>[orig_patent_app_number] => 455136
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/455136 | Doping control in selective area growth (SAG) of InP epitaxy in the fabrication of solid state semiconductor lasers | Dec 5, 1999 | Issued |
Array
(
[id] => 4381942
[patent_doc_number] => 06261958
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-17
[patent_title] => 'Method for performing chemical-mechanical polishing'
[patent_app_type] => 1
[patent_app_number] => 9/450485
[patent_app_country] => US
[patent_app_date] => 1999-11-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 6
[patent_no_of_words] => 2694
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 114
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/261/06261958.pdf
[firstpage_image] =>[orig_patent_app_number] => 450485
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/450485 | Method for performing chemical-mechanical polishing | Nov 28, 1999 | Issued |
Array
(
[id] => 4401155
[patent_doc_number] => 06264741
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-24
[patent_title] => 'Self-assembly of nanocomposite materials'
[patent_app_type] => 1
[patent_app_number] => 9/449036
[patent_app_country] => US
[patent_app_date] => 1999-11-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 3703
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 76
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/264/06264741.pdf
[firstpage_image] =>[orig_patent_app_number] => 449036
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/449036 | Self-assembly of nanocomposite materials | Nov 23, 1999 | Issued |
Array
(
[id] => 1523766
[patent_doc_number] => 06352927
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-03-05
[patent_title] => 'Semiconductor wafer and method for fabrication thereof'
[patent_app_type] => B2
[patent_app_number] => 09/447309
[patent_app_country] => US
[patent_app_date] => 1999-11-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 5
[patent_no_of_words] => 4342
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 107
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/352/06352927.pdf
[firstpage_image] =>[orig_patent_app_number] => 09447309
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/447309 | Semiconductor wafer and method for fabrication thereof | Nov 21, 1999 | Issued |
Array
(
[id] => 1578320
[patent_doc_number] => 06448182
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-10
[patent_title] => 'Stabilization of peroxygen-containing slurries used in a chemical mechanical planarization'
[patent_app_type] => B1
[patent_app_number] => 09/447172
[patent_app_country] => US
[patent_app_date] => 1999-11-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 5
[patent_no_of_words] => 2230
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 96
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/448/06448182.pdf
[firstpage_image] =>[orig_patent_app_number] => 09447172
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/447172 | Stabilization of peroxygen-containing slurries used in a chemical mechanical planarization | Nov 21, 1999 | Issued |
Array
(
[id] => 5828838
[patent_doc_number] => 20020068460
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-06-06
[patent_title] => 'METHOD OF PLANARIZING POLYSILLICON PLUG'
[patent_app_type] => new
[patent_app_number] => 09/440904
[patent_app_country] => US
[patent_app_date] => 1999-11-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 1398
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 88
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0068/20020068460.pdf
[firstpage_image] =>[orig_patent_app_number] => 09440904
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/440904 | Method of planarizing polysillicon plug | Nov 15, 1999 | Issued |
Array
(
[id] => 1123473
[patent_doc_number] => 06794294
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-09-21
[patent_title] => 'Etch process that resists notching at electrode bottom'
[patent_app_type] => B1
[patent_app_number] => 09/437006
[patent_app_country] => US
[patent_app_date] => 1999-11-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 3096
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 177
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/794/06794294.pdf
[firstpage_image] =>[orig_patent_app_number] => 09437006
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/437006 | Etch process that resists notching at electrode bottom | Nov 8, 1999 | Issued |
Array
(
[id] => 1595280
[patent_doc_number] => 06492186
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-12-10
[patent_title] => 'Method for detecting an endpoint for an oxygen free plasma process'
[patent_app_type] => B1
[patent_app_number] => 09/434617
[patent_app_country] => US
[patent_app_date] => 1999-11-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 10
[patent_no_of_words] => 7513
[patent_no_of_claims] => 32
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 101
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/492/06492186.pdf
[firstpage_image] =>[orig_patent_app_number] => 09434617
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/434617 | Method for detecting an endpoint for an oxygen free plasma process | Nov 4, 1999 | Issued |
Array
(
[id] => 1528164
[patent_doc_number] => 06479395
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-11-12
[patent_title] => 'Methods for forming openings in a substrate and apparatuses with these openings and methods for creating assemblies with openings'
[patent_app_type] => B1
[patent_app_number] => 09/432512
[patent_app_country] => US
[patent_app_date] => 1999-11-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
[patent_figures_cnt] => 60
[patent_no_of_words] => 12873
[patent_no_of_claims] => 29
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 63
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/479/06479395.pdf
[firstpage_image] =>[orig_patent_app_number] => 09432512
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/432512 | Methods for forming openings in a substrate and apparatuses with these openings and methods for creating assemblies with openings | Nov 1, 1999 | Issued |
Array
(
[id] => 4348670
[patent_doc_number] => 06214732
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-04-10
[patent_title] => 'Chemical mechanical polishing endpoint detection by monitoring component activity in effluent slurry'
[patent_app_type] => 1
[patent_app_number] => 9/431198
[patent_app_country] => US
[patent_app_date] => 1999-11-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 7
[patent_no_of_words] => 7119
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 136
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/214/06214732.pdf
[firstpage_image] =>[orig_patent_app_number] => 431198
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/431198 | Chemical mechanical polishing endpoint detection by monitoring component activity in effluent slurry | Oct 31, 1999 | Issued |
| 09/428342 | COMPOSITIONS AND METHODS FOR THE SELECTIVE ETCHING OF POLYSILICON FOR WAFER RECLAMATION | Oct 26, 1999 | Abandoned |
Array
(
[id] => 5824864
[patent_doc_number] => 20020066408
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-06-06
[patent_title] => 'DOMED WAFER REACTOR VESSEL WINDOW WITH REDUCED STRESS AT ATMOSPHERIC AND ABOVE ATMOSPHERIC PRESSURES'
[patent_app_type] => new
[patent_app_number] => 09/426218
[patent_app_country] => US
[patent_app_date] => 1999-10-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 3039
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 25
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0066/20020066408.pdf
[firstpage_image] =>[orig_patent_app_number] => 09426218
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/426218 | Domed wafer reactor vessel window with reduced stress at atmospheric and above atmospheric pressures | Oct 21, 1999 | Issued |
Array
(
[id] => 4376042
[patent_doc_number] => 06294106
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-09-25
[patent_title] => 'Slurries of abrasive inorganic oxide particles and method for adjusting the abrasiveness of the particles'
[patent_app_type] => 1
[patent_app_number] => 9/422384
[patent_app_country] => US
[patent_app_date] => 1999-10-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 5224
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 62
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/294/06294106.pdf
[firstpage_image] =>[orig_patent_app_number] => 422384
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/422384 | Slurries of abrasive inorganic oxide particles and method for adjusting the abrasiveness of the particles | Oct 20, 1999 | Issued |
Array
(
[id] => 1231455
[patent_doc_number] => 06693035
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-02-17
[patent_title] => 'Methods to control film removal rates for improved polishing in metal CMP'
[patent_app_type] => B1
[patent_app_number] => 09/420682
[patent_app_country] => US
[patent_app_date] => 1999-10-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4287
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 180
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/693/06693035.pdf
[firstpage_image] =>[orig_patent_app_number] => 09420682
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/420682 | Methods to control film removal rates for improved polishing in metal CMP | Oct 18, 1999 | Issued |