
Kin Chan Chen
Examiner (ID: 4953)
| Most Active Art Unit | 1765 |
| Art Unit(s) | 1792, 1765 |
| Total Applications | 758 |
| Issued Applications | 583 |
| Pending Applications | 32 |
| Abandoned Applications | 143 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 7144340
[patent_doc_number] => 20050118821
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[patent_title] => 'Slurry for CMP, polishing method and method of manufacturing semiconductor device'
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Array
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[patent_issue_date] => 2005-01-27
[patent_title] => 'Polishing pads for chemical mechanical planarization'
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Array
(
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[patent_issue_date] => 2007-10-09
[patent_title] => 'Process for fabricating a strained channel MOSFET device'
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Array
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[patent_issue_date] => 2007-02-27
[patent_title] => 'Chemical mechanical polishing pad and chemical mechanical polishing method'
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Array
(
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[patent_title] => 'Plasma etching method for semiconductor device'
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Array
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[patent_title] => 'Method of etching nitrides'
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Array
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Array
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Array
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[patent_title] => 'Methods and apparatus for determining endpoint in a plasma processing system'
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Array
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Array
(
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[patent_title] => 'Methods of processing a substrate with minimal scalloping'
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Array
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Array
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Array
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Array
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Array
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