Kurt C Rowan
Examiner (ID: 13691)
Most Active Art Unit | 3205 |
Art Unit(s) | 3643, 3616, 2899, 3205, 2761 |
Total Applications | 2630 |
Issued Applications | 1958 |
Pending Applications | 87 |
Abandoned Applications | 584 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 5435180
[patent_doc_number] => 20090169767
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-07-02
[patent_title] => 'METHOD FOR INCREASING THE REMOVAL RATE OF PHOTORESIST LAYER'
[patent_app_type] => utility
[patent_app_number] => 12/399019
[patent_app_country] => US
[patent_app_date] => 2009-03-06
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[pdf_file] => publications/A1/0169/20090169767.pdf
[firstpage_image] =>[orig_patent_app_number] => 12399019
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/399019 | Method for increasing the removal rate of photoresist layer | Mar 5, 2009 | Issued |
Array
(
[id] => 6498146
[patent_doc_number] => 20100209843
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-08-19
[patent_title] => 'PROCESS FOR THICK FILM CIRCUIT PATTERNING'
[patent_app_type] => utility
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[patent_app_date] => 2009-02-16
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/371676 | PROCESS FOR THICK FILM CIRCUIT PATTERNING | Feb 15, 2009 | Abandoned |
Array
(
[id] => 5391539
[patent_doc_number] => 20090208852
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-08-20
[patent_title] => 'PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS'
[patent_app_type] => utility
[patent_app_number] => 12/370728
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[patent_app_date] => 2009-02-13
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Array
(
[id] => 5564023
[patent_doc_number] => 20090136876
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[patent_kind] => A1
[patent_issue_date] => 2009-05-28
[patent_title] => 'SYSTEM AND METHOD FOR PHOTOLITHOGRAPHY IN SEMICONDUCTOR MANUFACTURING'
[patent_app_type] => utility
[patent_app_number] => 12/362316
[patent_app_country] => US
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Array
(
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[patent_issue_date] => 2009-07-16
[patent_title] => 'METHOD FOR FORMING FILM PATTERN'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/351127 | Method for forming film pattern | Jan 8, 2009 | Issued |
Array
(
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[patent_title] => 'METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/268735 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Nov 10, 2008 | Abandoned |
Array
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[patent_kind] => A1
[patent_issue_date] => 2009-05-21
[patent_title] => 'METHOD FOR FABRICATING SEMICONDUCTOR DEVICE'
[patent_app_type] => utility
[patent_app_number] => 12/267567
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/267567 | METHOD FOR FABRICATING SEMICONDUCTOR DEVICE | Nov 7, 2008 | Abandoned |
Array
(
[id] => 91644
[patent_doc_number] => 07736841
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-06-15
[patent_title] => 'Reflective film interface to restore transverse magnetic wave contrast in lithographic processing'
[patent_app_type] => utility
[patent_app_number] => 12/233245
[patent_app_country] => US
[patent_app_date] => 2008-09-18
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/233245 | Reflective film interface to restore transverse magnetic wave contrast in lithographic processing | Sep 17, 2008 | Issued |
Array
(
[id] => 5296448
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[patent_issue_date] => 2009-01-08
[patent_title] => 'METHOD AND MATERIAL FOR FORMING HIGH ETCH RESISTANT DOUBLE EXPOSURE PATTERNS'
[patent_app_type] => utility
[patent_app_number] => 12/205509
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[pdf_file] => publications/A1/0011/20090011374.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/205509 | Method and material for forming high etch resistant double exposure patterns | Sep 4, 2008 | Issued |
Array
(
[id] => 9454906
[patent_doc_number] => 08715910
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-05-06
[patent_title] => 'Method for exposing an area on a substrate to a beam and photolithographic system'
[patent_app_type] => utility
[patent_app_number] => 12/191957
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[patent_app_date] => 2008-08-14
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Array
(
[id] => 9523823
[patent_doc_number] => 08748085
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[patent_title] => 'Use of photosensitized Epon epoxy resin 1002F for MEMS and bioMEMS applications'
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Array
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Array
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Array
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/142138 | Method for a multiple exposure, microlithography projection exposure installation and a projection system | Jun 18, 2008 | Issued |
Array
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[id] => 4759303
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Array
(
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Array
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Array
(
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