Kurt C Rowan
Examiner (ID: 13691)
Most Active Art Unit | 3205 |
Art Unit(s) | 3643, 3616, 2899, 3205, 2761 |
Total Applications | 2630 |
Issued Applications | 1958 |
Pending Applications | 87 |
Abandoned Applications | 584 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 8571439
[patent_doc_number] => 08338082
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-12-25
[patent_title] => 'DI water rinse of photoresists with insoluble dye content'
[patent_app_type] => utility
[patent_app_number] => 12/058056
[patent_app_country] => US
[patent_app_date] => 2008-03-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 2181
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[patent_words_short_claim] => 184
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12058056
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/058056 | DI water rinse of photoresists with insoluble dye content | Mar 27, 2008 | Issued |
Array
(
[id] => 4807714
[patent_doc_number] => 20080171292
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-07-17
[patent_title] => 'Methods for Providing a Confined Liquid for Immersion Lithography'
[patent_app_type] => utility
[patent_app_number] => 12/055219
[patent_app_country] => US
[patent_app_date] => 2008-03-25
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0171/20080171292.pdf
[firstpage_image] =>[orig_patent_app_number] => 12055219
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/055219 | Methods for providing a confined liquid for immersion lithography | Mar 24, 2008 | Issued |
Array
(
[id] => 4698196
[patent_doc_number] => 20080220380
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-09-11
[patent_title] => 'Enhancing photoresist performance using electric fields'
[patent_app_type] => utility
[patent_app_number] => 12/075703
[patent_app_country] => US
[patent_app_date] => 2008-03-13
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0220/20080220380.pdf
[firstpage_image] =>[orig_patent_app_number] => 12075703
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/075703 | Enhancing photoresist performance using electric fields | Mar 12, 2008 | Abandoned |
Array
(
[id] => 5533450
[patent_doc_number] => 20090233238
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-09-17
[patent_title] => 'Double Patterning Strategy For Contact Hole and Trench in Photolithography'
[patent_app_type] => utility
[patent_app_number] => 12/047086
[patent_app_country] => US
[patent_app_date] => 2008-03-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 4721
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[pdf_file] => publications/A1/0233/20090233238.pdf
[firstpage_image] =>[orig_patent_app_number] => 12047086
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/047086 | Double patterning strategy for contact hole and trench in photolithography | Mar 11, 2008 | Issued |
Array
(
[id] => 184851
[patent_doc_number] => 07648819
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-01-19
[patent_title] => 'Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system'
[patent_app_type] => utility
[patent_app_number] => 12/045290
[patent_app_country] => US
[patent_app_date] => 2008-03-10
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/648/07648819.pdf
[firstpage_image] =>[orig_patent_app_number] => 12045290
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/045290 | Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system | Mar 9, 2008 | Issued |
Array
(
[id] => 5385602
[patent_doc_number] => 20090226847
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-09-10
[patent_title] => 'METHOD OF REDUCING PHOTORESIST DEFECTS DURING FABRICATION OF A SEMICONDUCTOR DEVICE'
[patent_app_type] => utility
[patent_app_number] => 12/045373
[patent_app_country] => US
[patent_app_date] => 2008-03-10
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0226/20090226847.pdf
[firstpage_image] =>[orig_patent_app_number] => 12045373
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/045373 | Method of reducing photoresist defects during fabrication of a semiconductor device | Mar 9, 2008 | Issued |
Array
(
[id] => 4698195
[patent_doc_number] => 20080220379
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-09-11
[patent_title] => 'PATTERN FORMING METHOD AND PATTERN FORMATION APPARATUS'
[patent_app_type] => utility
[patent_app_number] => 12/042374
[patent_app_country] => US
[patent_app_date] => 2008-03-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 5454
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[pdf_file] => publications/A1/0220/20080220379.pdf
[firstpage_image] =>[orig_patent_app_number] => 12042374
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/042374 | PATTERN FORMING METHOD AND PATTERN FORMATION APPARATUS | Mar 4, 2008 | Abandoned |
Array
(
[id] => 4698191
[patent_doc_number] => 20080220375
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-09-11
[patent_title] => 'Methods of reworking a semiconductor substrate and methods of forming a pattern in a semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 12/074430
[patent_app_country] => US
[patent_app_date] => 2008-03-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 5674
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[pdf_file] => publications/A1/0220/20080220375.pdf
[firstpage_image] =>[orig_patent_app_number] => 12074430
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/074430 | Methods of reworking a semiconductor substrate and methods of forming a pattern in a semiconductor device | Mar 3, 2008 | Abandoned |
Array
(
[id] => 7761621
[patent_doc_number] => 08114576
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-02-14
[patent_title] => 'Method for fabricating electrical circuitry on ultra-thin plastic films'
[patent_app_type] => utility
[patent_app_number] => 12/040406
[patent_app_country] => US
[patent_app_date] => 2008-02-29
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[pdf_file] => patents/08/114/08114576.pdf
[firstpage_image] =>[orig_patent_app_number] => 12040406
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/040406 | Method for fabricating electrical circuitry on ultra-thin plastic films | Feb 28, 2008 | Issued |
Array
(
[id] => 5514678
[patent_doc_number] => 20090214985
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-08-27
[patent_title] => 'METHOD FOR REDUCING SURFACE DEFECTS ON PATTERNED RESIST FEATURES'
[patent_app_type] => utility
[patent_app_number] => 12/038031
[patent_app_country] => US
[patent_app_date] => 2008-02-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[pdf_file] => publications/A1/0214/20090214985.pdf
[firstpage_image] =>[orig_patent_app_number] => 12038031
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/038031 | METHOD FOR REDUCING SURFACE DEFECTS ON PATTERNED RESIST FEATURES | Feb 26, 2008 | Abandoned |
Array
(
[id] => 5330581
[patent_doc_number] => 20090111058
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-04-30
[patent_title] => 'Method of Forming Micro Pattern of Semiconductor Device'
[patent_app_type] => utility
[patent_app_number] => 12/037144
[patent_app_country] => US
[patent_app_date] => 2008-02-26
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[pdf_file] => publications/A1/0111/20090111058.pdf
[firstpage_image] =>[orig_patent_app_number] => 12037144
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/037144 | Method of forming micro pattern of semiconductor device | Feb 25, 2008 | Issued |
Array
(
[id] => 4644223
[patent_doc_number] => 08021828
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-09-20
[patent_title] => 'Photoresist compositions and methods related to near field masks'
[patent_app_type] => utility
[patent_app_number] => 12/034971
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[pdf_file] => patents/08/021/08021828.pdf
[firstpage_image] =>[orig_patent_app_number] => 12034971
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/034971 | Photoresist compositions and methods related to near field masks | Feb 20, 2008 | Issued |
Array
(
[id] => 5391567
[patent_doc_number] => 20090208880
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[patent_kind] => A1
[patent_issue_date] => 2009-08-20
[patent_title] => 'PROCESS SEQUENCE FOR FORMATION OF PATTERNED HARD MASK FILM (RFP) WITHOUT NEED FOR PHOTORESIST OR DRY ETCH'
[patent_app_type] => utility
[patent_app_number] => 12/034000
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[firstpage_image] =>[orig_patent_app_number] => 12034000
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/034000 | Process sequence for formation of patterned hard mask film (RFP) without need for photoresist or dry etch | Feb 19, 2008 | Issued |
Array
(
[id] => 4866480
[patent_doc_number] => 20080145539
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-06-19
[patent_title] => 'Method of forming fine patterns'
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[firstpage_image] =>[orig_patent_app_number] => 12068710
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/068710 | Method of forming fine patterns | Feb 10, 2008 | Abandoned |
Array
(
[id] => 4899252
[patent_doc_number] => 20080118866
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[patent_kind] => A1
[patent_issue_date] => 2008-05-22
[patent_title] => 'METHOD FOR FORMING A TUNABLE DEEP-ULTRVIOLET DIELECTRIC ANTIREFLECTION LAYER FOR IMAGE TRANSFER PROCESSING'
[patent_app_type] => utility
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[firstpage_image] =>[orig_patent_app_number] => 12024829
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/024829 | METHOD FOR FORMING A TUNABLE DEEP-ULTRVIOLET DIELECTRIC ANTIREFLECTION LAYER FOR IMAGE TRANSFER PROCESSING | Jan 31, 2008 | Abandoned |
Array
(
[id] => 4845801
[patent_doc_number] => 20080182209
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-07-31
[patent_title] => 'Method of Fabricating Semiconductor Device, and Developing Apparatus Using the Method'
[patent_app_type] => utility
[patent_app_number] => 12/016244
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[pdf_file] => publications/A1/0182/20080182209.pdf
[firstpage_image] =>[orig_patent_app_number] => 12016244
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/016244 | Method of fabricating semiconductor device, and developing apparatus using the method | Jan 17, 2008 | Issued |
Array
(
[id] => 5342901
[patent_doc_number] => 20090181551
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-07-16
[patent_title] => 'INTEGRATED CIRCUIT SYSTEM EMPLOYING MULTIPLE EXPOSURE DUMMY PATTERNING TECHNOLOGY'
[patent_app_type] => utility
[patent_app_number] => 11/972809
[patent_app_country] => US
[patent_app_date] => 2008-01-11
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/972809 | Integrated circuit system employing multiple exposure dummy patterning technology | Jan 10, 2008 | Issued |
Array
(
[id] => 4927301
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[patent_kind] => A1
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[patent_title] => 'METHOD FOR FORMING A RESIST PATTERN USING A SHRINKING TECHNOLOGY'
[patent_app_type] => utility
[patent_app_number] => 11/971922
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Array
(
[id] => 4739869
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[patent_issue_date] => 2008-09-25
[patent_title] => 'Method of forming 3D micro structures with high aspect ratios'
[patent_app_type] => utility
[patent_app_number] => 12/007018
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[firstpage_image] =>[orig_patent_app_number] => 12007018
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/007018 | Method of forming 3D micro structures with high aspect ratios | Jan 3, 2008 | Issued |
Array
(
[id] => 4839746
[patent_doc_number] => 20080280232
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-11-13
[patent_title] => 'METHOD OF FORMING PATTERN OF SEMICONDUCTOR DEVICE'
[patent_app_type] => utility
[patent_app_number] => 11/965277
[patent_app_country] => US
[patent_app_date] => 2007-12-27
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[firstpage_image] =>[orig_patent_app_number] => 11965277
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/965277 | Method of forming pattern of semiconductor device | Dec 26, 2007 | Issued |