Kurt C Rowan
Examiner (ID: 13691)
Most Active Art Unit | 3205 |
Art Unit(s) | 3643, 3616, 2899, 3205, 2761 |
Total Applications | 2630 |
Issued Applications | 1958 |
Pending Applications | 87 |
Abandoned Applications | 584 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 42318
[patent_doc_number] => 07781150
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-08-24
[patent_title] => 'Method of photolithographic exposure'
[patent_app_type] => utility
[patent_app_number] => 11/613121
[patent_app_country] => US
[patent_app_date] => 2006-12-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 7
[patent_no_of_words] => 2300
[patent_no_of_claims] => 15
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[patent_words_short_claim] => 46
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/781/07781150.pdf
[firstpage_image] =>[orig_patent_app_number] => 11613121
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/613121 | Method of photolithographic exposure | Dec 18, 2006 | Issued |
Array
(
[id] => 5112857
[patent_doc_number] => 20070196772
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-08-23
[patent_title] => 'METHOD FOR FORMING FINE PATTERN OF SEMICONDUCTOR DEVICE'
[patent_app_type] => utility
[patent_app_number] => 11/567215
[patent_app_country] => US
[patent_app_date] => 2006-12-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0196/20070196772.pdf
[firstpage_image] =>[orig_patent_app_number] => 11567215
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/567215 | METHOD FOR FORMING FINE PATTERN OF SEMICONDUCTOR DEVICE | Dec 5, 2006 | Abandoned |
Array
(
[id] => 5022598
[patent_doc_number] => 20070148564
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-06-28
[patent_title] => 'PATTERNING METHOD AND METHODS FOR PRODUCING ELECTRO-OPTIC DEVICE, COLOR FILTER, ILLUMINANT, AND THIN-FILM TRANISISTOR'
[patent_app_type] => utility
[patent_app_number] => 11/566488
[patent_app_country] => US
[patent_app_date] => 2006-12-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[patent_no_of_words] => 6537
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0148/20070148564.pdf
[firstpage_image] =>[orig_patent_app_number] => 11566488
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/566488 | Patterning method and methods for producing electro-optic device, color filter, illuminant, and thin-film transistor | Dec 3, 2006 | Issued |
Array
(
[id] => 4688054
[patent_doc_number] => 20080032235
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-02-07
[patent_title] => 'FABRICATION METHOD OF ACTIVE DEVICE ARRAY SUBSTRATE'
[patent_app_type] => utility
[patent_app_number] => 11/562423
[patent_app_country] => US
[patent_app_date] => 2006-11-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 4842
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0032/20080032235.pdf
[firstpage_image] =>[orig_patent_app_number] => 11562423
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/562423 | Fabrication method of active device array substrate | Nov 21, 2006 | Issued |
Array
(
[id] => 5159723
[patent_doc_number] => 20070172767
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-07-26
[patent_title] => 'Exposure method, device manufacturing method using the same, exposure apparatus, and substrate processing method and apparatus'
[patent_app_type] => utility
[patent_app_number] => 11/601777
[patent_app_country] => US
[patent_app_date] => 2006-11-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
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[patent_no_of_words] => 18360
[patent_no_of_claims] => 70
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[pdf_file] => publications/A1/0172/20070172767.pdf
[firstpage_image] =>[orig_patent_app_number] => 11601777
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/601777 | Exposure method, device manufacturing method using the same, exposure apparatus, and substrate processing method and apparatus | Nov 19, 2006 | Issued |
Array
(
[id] => 132255
[patent_doc_number] => 07695896
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-04-13
[patent_title] => 'Method for forming photoresist pattern'
[patent_app_type] => utility
[patent_app_number] => 11/552335
[patent_app_country] => US
[patent_app_date] => 2006-10-24
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/695/07695896.pdf
[firstpage_image] =>[orig_patent_app_number] => 11552335
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/552335 | Method for forming photoresist pattern | Oct 23, 2006 | Issued |
Array
(
[id] => 121109
[patent_doc_number] => 07709187
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-05-04
[patent_title] => 'High resolution imaging process using an in-situ image modifying layer'
[patent_app_type] => utility
[patent_app_number] => 11/551824
[patent_app_country] => US
[patent_app_date] => 2006-10-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 6745
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/709/07709187.pdf
[firstpage_image] =>[orig_patent_app_number] => 11551824
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/551824 | High resolution imaging process using an in-situ image modifying layer | Oct 22, 2006 | Issued |
Array
(
[id] => 4866733
[patent_doc_number] => 20080145792
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-06-19
[patent_title] => 'REDUCTION OF LINE EDGE ROUGHNESS WITH A CONFORMAL COATING OF A SEALANT'
[patent_app_type] => utility
[patent_app_number] => 11/548580
[patent_app_country] => US
[patent_app_date] => 2006-10-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 1164
[patent_no_of_claims] => 23
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[pdf_file] => publications/A1/0145/20080145792.pdf
[firstpage_image] =>[orig_patent_app_number] => 11548580
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/548580 | REDUCTION OF LINE EDGE ROUGHNESS WITH A CONFORMAL COATING OF A SEALANT | Oct 10, 2006 | Abandoned |
Array
(
[id] => 5193812
[patent_doc_number] => 20070082296
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-04-12
[patent_title] => 'Method of forming micro-patterns using multiple photolithography process'
[patent_app_type] => utility
[patent_app_number] => 11/545417
[patent_app_country] => US
[patent_app_date] => 2006-10-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
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[patent_no_of_words] => 6250
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[pdf_file] => publications/A1/0082/20070082296.pdf
[firstpage_image] =>[orig_patent_app_number] => 11545417
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/545417 | Method of forming micro-patterns using multiple photolithography process | Oct 9, 2006 | Abandoned |
Array
(
[id] => 4938757
[patent_doc_number] => 20080076076
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-03-27
[patent_title] => 'REWORK METHODOLOGY THAT PRESERVES GATE PERFORMANCE'
[patent_app_type] => utility
[patent_app_number] => 11/534342
[patent_app_country] => US
[patent_app_date] => 2006-09-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 4761
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[pdf_file] => publications/A1/0076/20080076076.pdf
[firstpage_image] =>[orig_patent_app_number] => 11534342
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/534342 | REWORK METHODOLOGY THAT PRESERVES GATE PERFORMANCE | Sep 21, 2006 | Abandoned |
Array
(
[id] => 847028
[patent_doc_number] => 07384728
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-06-10
[patent_title] => 'Method of fabricating a semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 11/465811
[patent_app_country] => US
[patent_app_date] => 2006-08-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[patent_no_of_words] => 2313
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[pdf_file] => patents/07/384/07384728.pdf
[firstpage_image] =>[orig_patent_app_number] => 11465811
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/465811 | Method of fabricating a semiconductor device | Aug 19, 2006 | Issued |
Array
(
[id] => 7692281
[patent_doc_number] => 20070231752
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-10-04
[patent_title] => 'Method for Shrinking Opening Sizes of a Photoresist Pattern'
[patent_app_type] => utility
[patent_app_number] => 11/464304
[patent_app_country] => US
[patent_app_date] => 2006-08-14
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[pdf_file] => publications/A1/0231/20070231752.pdf
[firstpage_image] =>[orig_patent_app_number] => 11464304
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/464304 | Method for Shrinking Opening Sizes of a Photoresist Pattern | Aug 13, 2006 | Abandoned |
Array
(
[id] => 5057005
[patent_doc_number] => 20070059927
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-03-15
[patent_title] => 'Method of fabricating semiconductor device including resist flow process and film coating process'
[patent_app_type] => utility
[patent_app_number] => 11/500671
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 11500671
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/500671 | Method of fabricating semiconductor device including resist flow process and film coating process | Aug 7, 2006 | Abandoned |
Array
(
[id] => 4797381
[patent_doc_number] => 20080008967
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-01-10
[patent_title] => 'UTILIZATION OF ELECTRIC FIELD WITH ISOTROPIC DEVELOPMENT IN PHOTOLITHOGRAPHY'
[patent_app_type] => utility
[patent_app_number] => 11/456152
[patent_app_country] => US
[patent_app_date] => 2006-07-07
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0008/20080008967.pdf
[firstpage_image] =>[orig_patent_app_number] => 11456152
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/456152 | Utilization of electric field with isotropic development in photolithography | Jul 6, 2006 | Issued |
Array
(
[id] => 5051215
[patent_doc_number] => 20070031760
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-02-08
[patent_title] => 'IMMERSION LITHOGRAPHY WATERMARK REDUCTION'
[patent_app_type] => utility
[patent_app_number] => 11/427017
[patent_app_country] => US
[patent_app_date] => 2006-06-28
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0031/20070031760.pdf
[firstpage_image] =>[orig_patent_app_number] => 11427017
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/427017 | Immersion lithography watermark reduction | Jun 27, 2006 | Issued |
Array
(
[id] => 5010769
[patent_doc_number] => 20070281248
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-12-06
[patent_title] => 'STABILIZATION OF DEEP ULTRAVIOLET PHOTORESIST'
[patent_app_type] => utility
[patent_app_number] => 11/421327
[patent_app_country] => US
[patent_app_date] => 2006-05-31
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0281/20070281248.pdf
[firstpage_image] =>[orig_patent_app_number] => 11421327
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/421327 | Stabilization of deep ultraviolet photoresist | May 30, 2006 | Issued |
Array
(
[id] => 23189
[patent_doc_number] => 07794922
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-09-14
[patent_title] => 'Pattern forming method and method of manufacturing semiconductor device'
[patent_app_type] => utility
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[patent_app_country] => US
[patent_app_date] => 2006-05-11
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[firstpage_image] =>[orig_patent_app_number] => 11431823
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/431823 | Pattern forming method and method of manufacturing semiconductor device | May 10, 2006 | Issued |
Array
(
[id] => 236161
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[patent_issue_date] => 2009-09-29
[patent_title] => 'Pattern formation method'
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Array
(
[id] => 5015504
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[patent_title] => 'Method and apparatus for the vaporous development of photoresist'
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[pdf_file] => publications/A1/0258/20070258712.pdf
[firstpage_image] =>[orig_patent_app_number] => 11416810
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/416810 | Method and apparatus for the vaporous development of photoresist | May 2, 2006 | Abandoned |
Array
(
[id] => 588167
[patent_doc_number] => 07435535
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-10-14
[patent_title] => 'Method for forming patterned insulating elements and methods for making electron source and image display device'
[patent_app_type] => utility
[patent_app_number] => 11/415071
[patent_app_country] => US
[patent_app_date] => 2006-05-02
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/435/07435535.pdf
[firstpage_image] =>[orig_patent_app_number] => 11415071
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/415071 | Method for forming patterned insulating elements and methods for making electron source and image display device | May 1, 2006 | Issued |