![](/images/general/no_picture/200_user.png)
Kurt C Rowan
Examiner (ID: 13691)
Most Active Art Unit | 3205 |
Art Unit(s) | 3643, 3616, 2899, 3205, 2761 |
Total Applications | 2630 |
Issued Applications | 1958 |
Pending Applications | 87 |
Abandoned Applications | 584 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 7195263
[patent_doc_number] => 20050164128
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-28
[patent_title] => 'Mask for manufacturing semiconductor device and method of manufacture thereof'
[patent_app_type] => utility
[patent_app_number] => 11/077008
[patent_app_country] => US
[patent_app_date] => 2005-03-11
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0164/20050164128.pdf
[firstpage_image] =>[orig_patent_app_number] => 11077008
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/077008 | Mask for manufacturing semiconductor device and method of manufacture thereof | Mar 10, 2005 | Abandoned |
Array
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[patent_doc_number] => 20050147922
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-07
[patent_title] => 'Method for exposing a photosensitive resist layer with near-field light'
[patent_app_type] => utility
[patent_app_number] => 11/070444
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[patent_app_date] => 2005-03-03
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[firstpage_image] =>[orig_patent_app_number] => 11070444
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/070444 | Method for exposing a photosensitive resist layer with near-field light | Mar 2, 2005 | Abandoned |
Array
(
[id] => 5596120
[patent_doc_number] => 20060160037
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[patent_kind] => A1
[patent_issue_date] => 2006-07-20
[patent_title] => 'AUTOMATED SUB-FIELD BLADING FOR LEVELING OPTIMIZATION IN LITHOGRAPHY EXPOSURE TOOL'
[patent_app_type] => utility
[patent_app_number] => 10/905706
[patent_app_country] => US
[patent_app_date] => 2005-01-18
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/905706 | AUTOMATED SUB-FIELD BLADING FOR LEVELING OPTIMIZATION IN LITHOGRAPHY EXPOSURE TOOL | Jan 17, 2005 | Abandoned |
Array
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[id] => 6952093
[patent_doc_number] => 20050227187
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[patent_kind] => A1
[patent_issue_date] => 2005-10-13
[patent_title] => 'Ionic fluid in supercritical fluid for semiconductor processing'
[patent_app_type] => utility
[patent_app_number] => 11/034585
[patent_app_country] => US
[patent_app_date] => 2005-01-12
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Array
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[patent_issue_date] => 2006-07-13
[patent_title] => 'METHOD FOR REDUCING FEATURE LINE EDGE ROUGHNESS'
[patent_app_type] => utility
[patent_app_number] => 10/905596
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Array
(
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[patent_doc_number] => 07390616
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[patent_kind] => B2
[patent_issue_date] => 2008-06-24
[patent_title] => 'Method for post lithographic critical dimension shrinking using post overcoat planarization'
[patent_app_type] => utility
[patent_app_number] => 10/905581
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/905581 | Method for post lithographic critical dimension shrinking using post overcoat planarization | Jan 11, 2005 | Issued |
Array
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[patent_doc_number] => 20060154185
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[patent_kind] => A1
[patent_issue_date] => 2006-07-13
[patent_title] => 'Method for forming a finely patterned resist'
[patent_app_type] => utility
[patent_app_number] => 11/033647
[patent_app_country] => US
[patent_app_date] => 2005-01-11
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[patent_drawing_sheets_cnt] => 6
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[firstpage_image] =>[orig_patent_app_number] => 11033647
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/033647 | Method for forming a finely patterned resist | Jan 10, 2005 | Issued |
Array
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[id] => 5655664
[patent_doc_number] => 20060141399
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-06-29
[patent_title] => 'Supercritical developing for a lithographic process'
[patent_app_type] => utility
[patent_app_number] => 11/025538
[patent_app_country] => US
[patent_app_date] => 2004-12-29
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[patent_drawing_sheets_cnt] => 2
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/025538 | Supercritical developing for a lithographic process | Dec 28, 2004 | Issued |
Array
(
[id] => 5912761
[patent_doc_number] => 20060127823
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[patent_kind] => A1
[patent_issue_date] => 2006-06-15
[patent_title] => 'Multi reticle exposures'
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[patent_app_number] => 11/011823
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[firstpage_image] =>[orig_patent_app_number] => 11011823
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/011823 | Multi reticle exposures | Dec 13, 2004 | Abandoned |
Array
(
[id] => 7077532
[patent_doc_number] => 20050149901
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-07
[patent_title] => 'Resolution enhancing technology using phase assignment bridges'
[patent_app_type] => utility
[patent_app_number] => 11/005329
[patent_app_country] => US
[patent_app_date] => 2004-12-06
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[firstpage_image] =>[orig_patent_app_number] => 11005329
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/005329 | Resolution enhancing technology using phase assignment bridges | Dec 5, 2004 | Abandoned |
Array
(
[id] => 7210300
[patent_doc_number] => 20050053868
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-03-10
[patent_title] => 'Process for producing wiring circuit board'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/934703 | Process for producing wiring circuit board | Sep 6, 2004 | Issued |
Array
(
[id] => 816940
[patent_doc_number] => 07410748
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[patent_kind] => B2
[patent_issue_date] => 2008-08-12
[patent_title] => 'Method of etching materials patterned with a single layer 193nm resist'
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Array
(
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Array
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Array
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Array
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Array
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Array
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Array
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