Kurt C Rowan
Examiner (ID: 13691)
Most Active Art Unit | 3205 |
Art Unit(s) | 3643, 3616, 2899, 3205, 2761 |
Total Applications | 2630 |
Issued Applications | 1958 |
Pending Applications | 87 |
Abandoned Applications | 584 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 867659
[patent_doc_number] => 07364832
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-04-29
[patent_title] => 'Wet developable hard mask in conjunction with thin photoresist for micro photolithography'
[patent_app_type] => utility
[patent_app_number] => 10/864787
[patent_app_country] => US
[patent_app_date] => 2004-06-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 9
[patent_no_of_words] => 3998
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 83
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/364/07364832.pdf
[firstpage_image] =>[orig_patent_app_number] => 10864787
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/864787 | Wet developable hard mask in conjunction with thin photoresist for micro photolithography | Jun 7, 2004 | Issued |
Array
(
[id] => 480068
[patent_doc_number] => 07224030
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-05-29
[patent_title] => 'Method and apparatus for producing rectangular contact holes utilizing side lobe formation'
[patent_app_type] => utility
[patent_app_number] => 10/863786
[patent_app_country] => US
[patent_app_date] => 2004-06-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 14
[patent_no_of_words] => 2890
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 20
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/224/07224030.pdf
[firstpage_image] =>[orig_patent_app_number] => 10863786
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/863786 | Method and apparatus for producing rectangular contact holes utilizing side lobe formation | Jun 7, 2004 | Issued |
Array
(
[id] => 532846
[patent_doc_number] => 07175972
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-02-13
[patent_title] => 'Method for fabricating a thin film magnetic head'
[patent_app_type] => utility
[patent_app_number] => 10/844400
[patent_app_country] => US
[patent_app_date] => 2004-05-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 21
[patent_no_of_words] => 4560
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 208
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/175/07175972.pdf
[firstpage_image] =>[orig_patent_app_number] => 10844400
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/844400 | Method for fabricating a thin film magnetic head | May 12, 2004 | Issued |
Array
(
[id] => 5921987
[patent_doc_number] => 20060240330
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-10-26
[patent_title] => 'Exposure method, mask, semiconductor device manufacturing method, and semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 10/555461
[patent_app_country] => US
[patent_app_date] => 2004-05-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 5640
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 10
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0240/20060240330.pdf
[firstpage_image] =>[orig_patent_app_number] => 10555461
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/555461 | Exposure method, mask, semiconductor device manufacturing method, and semiconductor device | May 12, 2004 | Abandoned |
Array
(
[id] => 386493
[patent_doc_number] => 07303862
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-12-04
[patent_title] => 'Microfabrication methods and devices'
[patent_app_type] => utility
[patent_app_number] => 10/835249
[patent_app_country] => US
[patent_app_date] => 2004-04-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 11
[patent_no_of_words] => 7047
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 107
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/303/07303862.pdf
[firstpage_image] =>[orig_patent_app_number] => 10835249
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/835249 | Microfabrication methods and devices | Apr 27, 2004 | Issued |
Array
(
[id] => 7420256
[patent_doc_number] => 20040229025
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-11-18
[patent_title] => 'Voltage tunable photodefinable dielectric and method of manufacture therefore'
[patent_app_type] => new
[patent_app_number] => 10/822326
[patent_app_country] => US
[patent_app_date] => 2004-04-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 5433
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 33
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0229/20040229025.pdf
[firstpage_image] =>[orig_patent_app_number] => 10822326
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/822326 | Voltage tunable photodefinable dielectric and method of manufacture therefore | Apr 11, 2004 | Abandoned |
Array
(
[id] => 555408
[patent_doc_number] => 07157211
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-01-02
[patent_title] => 'Method of fabricating a semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 10/708983
[patent_app_country] => US
[patent_app_date] => 2004-04-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 2311
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 144
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/157/07157211.pdf
[firstpage_image] =>[orig_patent_app_number] => 10708983
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/708983 | Method of fabricating a semiconductor device | Apr 4, 2004 | Issued |
Array
(
[id] => 6958304
[patent_doc_number] => 20050214674
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-09-29
[patent_title] => 'Positive-working photoimageable bottom antireflective coating'
[patent_app_type] => utility
[patent_app_number] => 10/808884
[patent_app_country] => US
[patent_app_date] => 2004-03-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 8980
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0214/20050214674.pdf
[firstpage_image] =>[orig_patent_app_number] => 10808884
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/808884 | Positive-working photoimageable bottom antireflective coating | Mar 24, 2004 | Abandoned |
Array
(
[id] => 7116512
[patent_doc_number] => 20050069813
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-03-31
[patent_title] => 'Resist pattern forming method and semiconductor device fabrication method'
[patent_app_type] => utility
[patent_app_number] => 10/804179
[patent_app_country] => US
[patent_app_date] => 2004-03-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
[patent_figures_cnt] => 15
[patent_no_of_words] => 10970
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0069/20050069813.pdf
[firstpage_image] =>[orig_patent_app_number] => 10804179
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/804179 | Resist pattern forming method and semiconductor device fabrication method | Mar 18, 2004 | Issued |
Array
(
[id] => 7110979
[patent_doc_number] => 20050208434
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-09-22
[patent_title] => 'Method and system for treating a hard mask to improve etch characteristics'
[patent_app_type] => utility
[patent_app_number] => 10/801571
[patent_app_country] => US
[patent_app_date] => 2004-03-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 6251
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0208/20050208434.pdf
[firstpage_image] =>[orig_patent_app_number] => 10801571
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/801571 | Method and system for treating a hard mask to improve etch characteristics | Mar 16, 2004 | Issued |
Array
(
[id] => 7439776
[patent_doc_number] => 20040185383
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-09-23
[patent_title] => 'Resist pattern forming method and resist pattern forming system'
[patent_app_type] => new
[patent_app_number] => 10/801689
[patent_app_country] => US
[patent_app_date] => 2004-03-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 3761
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 57
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0185/20040185383.pdf
[firstpage_image] =>[orig_patent_app_number] => 10801689
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/801689 | Resist pattern forming method and resist pattern forming system | Mar 16, 2004 | Abandoned |
Array
(
[id] => 7385638
[patent_doc_number] => 20040180297
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-09-16
[patent_title] => 'Method for forming pattern in semiconductor device'
[patent_app_type] => new
[patent_app_number] => 10/798998
[patent_app_country] => US
[patent_app_date] => 2004-03-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 1919
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 122
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0180/20040180297.pdf
[firstpage_image] =>[orig_patent_app_number] => 10798998
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/798998 | Method for forming pattern in semiconductor device | Mar 11, 2004 | Abandoned |
Array
(
[id] => 5694041
[patent_doc_number] => 20060154188
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-07-13
[patent_title] => 'Immersion fluid for use in liquid immersion lithography and method of forming resist pattern using the immersion fluid'
[patent_app_type] => utility
[patent_app_number] => 10/547525
[patent_app_country] => US
[patent_app_date] => 2004-03-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 17038
[patent_no_of_claims] => 29
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0154/20060154188.pdf
[firstpage_image] =>[orig_patent_app_number] => 10547525
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/547525 | Immersion fluid for use in liquid immersion lithography and method of forming resist pattern using the immersion fluid | Mar 3, 2004 | Abandoned |
Array
(
[id] => 418657
[patent_doc_number] => 07276328
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2007-10-02
[patent_title] => 'Lithography mask utilizing asymmetric light source'
[patent_app_type] => utility
[patent_app_number] => 10/791259
[patent_app_country] => US
[patent_app_date] => 2004-03-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 15
[patent_no_of_words] => 3192
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 35
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/276/07276328.pdf
[firstpage_image] =>[orig_patent_app_number] => 10791259
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/791259 | Lithography mask utilizing asymmetric light source | Mar 1, 2004 | Issued |
Array
(
[id] => 6944658
[patent_doc_number] => 20050196707
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-09-08
[patent_title] => 'Patterned conductive coatings'
[patent_app_type] => utility
[patent_app_number] => 10/791116
[patent_app_country] => US
[patent_app_date] => 2004-03-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 2509
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0196/20050196707.pdf
[firstpage_image] =>[orig_patent_app_number] => 10791116
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/791116 | Patterned conductive coatings | Mar 1, 2004 | Abandoned |
Array
(
[id] => 415050
[patent_doc_number] => 07279270
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-10-09
[patent_title] => 'Manufacturing method of composite film, composite film, color filter made of composite film, display apparatus provided with color filter'
[patent_app_type] => utility
[patent_app_number] => 10/779795
[patent_app_country] => US
[patent_app_date] => 2004-02-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 22
[patent_figures_cnt] => 46
[patent_no_of_words] => 18775
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 151
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/279/07279270.pdf
[firstpage_image] =>[orig_patent_app_number] => 10779795
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/779795 | Manufacturing method of composite film, composite film, color filter made of composite film, display apparatus provided with color filter | Feb 17, 2004 | Issued |
Array
(
[id] => 7315533
[patent_doc_number] => 20040223206
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-11-11
[patent_title] => 'Optical lithography using both photomask surfaces'
[patent_app_type] => new
[patent_app_number] => 10/776685
[patent_app_country] => US
[patent_app_date] => 2004-02-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 2042
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 98
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0223/20040223206.pdf
[firstpage_image] =>[orig_patent_app_number] => 10776685
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/776685 | Optical lithography using both photomask surfaces | Feb 9, 2004 | Abandoned |
Array
(
[id] => 488710
[patent_doc_number] => 07214473
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-05-08
[patent_title] => 'Method for removing patterned layer from lower layer through reflow'
[patent_app_type] => utility
[patent_app_number] => 10/773272
[patent_app_country] => US
[patent_app_date] => 2004-02-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 3512
[patent_no_of_claims] => 31
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 41
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/214/07214473.pdf
[firstpage_image] =>[orig_patent_app_number] => 10773272
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/773272 | Method for removing patterned layer from lower layer through reflow | Feb 8, 2004 | Issued |
Array
(
[id] => 830027
[patent_doc_number] => 07399579
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-07-15
[patent_title] => 'Fabrication of metallic microstructures via exposure of photosensitive composition'
[patent_app_type] => utility
[patent_app_number] => 10/763819
[patent_app_country] => US
[patent_app_date] => 2004-01-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 20
[patent_no_of_words] => 5574
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 83
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/399/07399579.pdf
[firstpage_image] =>[orig_patent_app_number] => 10763819
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/763819 | Fabrication of metallic microstructures via exposure of photosensitive composition | Jan 22, 2004 | Issued |
Array
(
[id] => 7039233
[patent_doc_number] => 20050158667
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-21
[patent_title] => 'Solvent free photoresist strip and residue removal processing for post etching of low-k films'
[patent_app_type] => utility
[patent_app_number] => 10/761122
[patent_app_country] => US
[patent_app_date] => 2004-01-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4365
[patent_no_of_claims] => 44
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0158/20050158667.pdf
[firstpage_image] =>[orig_patent_app_number] => 10761122
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/761122 | Solvent free photoresist strip and residue removal processing for post etching of low-k films | Jan 19, 2004 | Abandoned |