Kurt C Rowan
Examiner (ID: 13691)
Most Active Art Unit | 3205 |
Art Unit(s) | 3643, 3616, 2899, 3205, 2761 |
Total Applications | 2630 |
Issued Applications | 1958 |
Pending Applications | 87 |
Abandoned Applications | 584 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 7039230
[patent_doc_number] => 20050158664
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-21
[patent_title] => 'Method of integrating post-etching cleaning process with deposition for semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 10/760927
[patent_app_country] => US
[patent_app_date] => 2004-01-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 2713
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0158/20050158664.pdf
[firstpage_image] =>[orig_patent_app_number] => 10760927
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/760927 | Method of integrating post-etching cleaning process with deposition for semiconductor device | Jan 19, 2004 | Abandoned |
Array
(
[id] => 492802
[patent_doc_number] => 07211370
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-05-01
[patent_title] => 'Method for dicing wafer'
[patent_app_type] => utility
[patent_app_number] => 10/757498
[patent_app_country] => US
[patent_app_date] => 2004-01-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 3814
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[patent_words_short_claim] => 115
[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/211/07211370.pdf
[firstpage_image] =>[orig_patent_app_number] => 10757498
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/757498 | Method for dicing wafer | Jan 14, 2004 | Issued |
Array
(
[id] => 439113
[patent_doc_number] => 07258966
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-08-21
[patent_title] => 'Method for manufacturing a diffuser for a backlight module'
[patent_app_type] => utility
[patent_app_number] => 10/754725
[patent_app_country] => US
[patent_app_date] => 2004-01-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 8
[patent_no_of_words] => 1775
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[pdf_file] => patents/07/258/07258966.pdf
[firstpage_image] =>[orig_patent_app_number] => 10754725
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/754725 | Method for manufacturing a diffuser for a backlight module | Jan 11, 2004 | Issued |
Array
(
[id] => 7074658
[patent_doc_number] => 20050147926
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-07
[patent_title] => 'Method for processing photoresist'
[patent_app_type] => utility
[patent_app_number] => 10/749590
[patent_app_country] => US
[patent_app_date] => 2004-01-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 937
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[pdf_file] => publications/A1/0147/20050147926.pdf
[firstpage_image] =>[orig_patent_app_number] => 10749590
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/749590 | Method for processing photoresist | Jan 1, 2004 | Abandoned |
Array
(
[id] => 439112
[patent_doc_number] => 07258965
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-08-21
[patent_title] => 'Pre-exposure of patterned photoresist films to achieve critical dimension reduction during temperature reflow'
[patent_app_type] => utility
[patent_app_number] => 10/750053
[patent_app_country] => US
[patent_app_date] => 2003-12-30
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/258/07258965.pdf
[firstpage_image] =>[orig_patent_app_number] => 10750053
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/750053 | Pre-exposure of patterned photoresist films to achieve critical dimension reduction during temperature reflow | Dec 29, 2003 | Issued |
Array
(
[id] => 7074652
[patent_doc_number] => 20050147920
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-07
[patent_title] => 'Method and system for immersion lithography'
[patent_app_type] => utility
[patent_app_number] => 10/748076
[patent_app_country] => US
[patent_app_date] => 2003-12-30
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/748076 | Method and system for immersion lithography | Dec 29, 2003 | Abandoned |
Array
(
[id] => 7303852
[patent_doc_number] => 20040115564
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-06-17
[patent_title] => 'Photolithographic methods of using a single reticle to form overlapping patterns'
[patent_app_type] => new
[patent_app_number] => 10/728532
[patent_app_country] => US
[patent_app_date] => 2003-12-05
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[patent_drawing_sheets_cnt] => 10
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[patent_no_of_words] => 4591
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[pdf_file] => publications/A1/0115/20040115564.pdf
[firstpage_image] =>[orig_patent_app_number] => 10728532
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/728532 | Photolithographic methods of using a single reticle to form overlapping patterns | Dec 4, 2003 | Issued |
Array
(
[id] => 637568
[patent_doc_number] => 07125652
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-10-24
[patent_title] => 'Immersion lithographic process using a conforming immersion medium'
[patent_app_type] => utility
[patent_app_number] => 10/726413
[patent_app_country] => US
[patent_app_date] => 2003-12-03
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/125/07125652.pdf
[firstpage_image] =>[orig_patent_app_number] => 10726413
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/726413 | Immersion lithographic process using a conforming immersion medium | Dec 2, 2003 | Issued |
Array
(
[id] => 7251447
[patent_doc_number] => 20040259040
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-12-23
[patent_title] => 'Pattern formation method'
[patent_app_type] => new
[patent_app_number] => 10/713217
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 10713217
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/713217 | Pattern formation method | Nov 16, 2003 | Issued |
Array
(
[id] => 7469605
[patent_doc_number] => 20040121267
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-06-24
[patent_title] => 'Method of fabricating lead-free solder bumps'
[patent_app_type] => new
[patent_app_number] => 10/706033
[patent_app_country] => US
[patent_app_date] => 2003-11-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[pdf_file] => publications/A1/0121/20040121267.pdf
[firstpage_image] =>[orig_patent_app_number] => 10706033
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/706033 | Method of fabricating lead-free solder bumps | Nov 12, 2003 | Abandoned |
Array
(
[id] => 978762
[patent_doc_number] => 06929900
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-08-16
[patent_title] => 'Tamper-responding encapsulated enclosure having flexible protective mesh structure'
[patent_app_type] => utility
[patent_app_number] => 10/704021
[patent_app_country] => US
[patent_app_date] => 2003-11-07
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/929/06929900.pdf
[firstpage_image] =>[orig_patent_app_number] => 10704021
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/704021 | Tamper-responding encapsulated enclosure having flexible protective mesh structure | Nov 6, 2003 | Issued |
Array
(
[id] => 7160891
[patent_doc_number] => 20050084805
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-04-21
[patent_title] => 'Method for forming patterned ITO structure by using photosensitive ITO solution'
[patent_app_type] => utility
[patent_app_number] => 10/687612
[patent_app_country] => US
[patent_app_date] => 2003-10-20
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/687612 | Method for forming patterned ITO structure by using photosensitive ITO solution | Oct 19, 2003 | Abandoned |
Array
(
[id] => 7233054
[patent_doc_number] => 20050079451
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-04-14
[patent_title] => 'Processes for treating a substrate and removing resist from a substrate'
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[firstpage_image] =>[orig_patent_app_number] => 10683207
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/683207 | Processes for treating a substrate and removing resist from a substrate | Oct 8, 2003 | Abandoned |
Array
(
[id] => 7251567
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[patent_title] => 'Method for imaging a semiconductor wafer'
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[firstpage_image] =>[orig_patent_app_number] => 10680311
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/680311 | Method for imaging a semiconductor wafer | Oct 6, 2003 | Abandoned |
Array
(
[id] => 7251590
[patent_doc_number] => 20050074706
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[patent_kind] => A1
[patent_issue_date] => 2005-04-07
[patent_title] => 'Enhancing photoresist performance using electric fields'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/679816 | Enhancing photoresist performance using electric fields | Oct 5, 2003 | Issued |
Array
(
[id] => 710053
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[patent_kind] => B1
[patent_issue_date] => 2006-06-06
[patent_title] => 'Use of base developers as immersion lithography fluid'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/676749 | Use of base developers as immersion lithography fluid | Sep 30, 2003 | Issued |
Array
(
[id] => 1046649
[patent_doc_number] => 06864043
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-03-08
[patent_title] => 'Apodized micro-lenses for Hartmann wavefront sensing and method for fabricating desired profiles'
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/665412 | Method for the removal of an imaging layer from a semiconductor substrate stack | Sep 17, 2003 | Issued |
Array
(
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Array
(
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[firstpage_image] =>[orig_patent_app_number] => 10661542
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/661542 | Pattern formation method | Sep 14, 2003 | Issued |