Kurt C Rowan
Examiner (ID: 13691)
Most Active Art Unit | 3205 |
Art Unit(s) | 3643, 3616, 2899, 3205, 2761 |
Total Applications | 2630 |
Issued Applications | 1958 |
Pending Applications | 87 |
Abandoned Applications | 584 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 542745
[patent_doc_number] => 07163780
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-01-16
[patent_title] => 'Electronic device manufacture'
[patent_app_type] => utility
[patent_app_number] => 10/394342
[patent_app_country] => US
[patent_app_date] => 2003-03-22
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[pdf_file] => patents/07/163/07163780.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/394342 | Electronic device manufacture | Mar 21, 2003 | Issued |
Array
(
[id] => 1049931
[patent_doc_number] => 06861208
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[patent_kind] => B2
[patent_issue_date] => 2005-03-01
[patent_title] => 'Fullerene addition in photoresist via incorporation in the developer'
[patent_app_type] => utility
[patent_app_number] => 10/389760
[patent_app_country] => US
[patent_app_date] => 2003-03-18
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[pdf_file] => patents/06/861/06861208.pdf
[firstpage_image] =>[orig_patent_app_number] => 10389760
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/389760 | Fullerene addition in photoresist via incorporation in the developer | Mar 17, 2003 | Issued |
Array
(
[id] => 7442904
[patent_doc_number] => 20040009436
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-01-15
[patent_title] => 'Methods for forming resist pattern and fabricating semiconductor device using Si-containing water-soluble polymer'
[patent_app_type] => new
[patent_app_number] => 10/391342
[patent_app_country] => US
[patent_app_date] => 2003-03-18
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/391342 | Methods for forming resist pattern and fabricating semiconductor device using Si-containing water-soluble polymer | Mar 17, 2003 | Abandoned |
Array
(
[id] => 7385660
[patent_doc_number] => 20040180299
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[patent_issue_date] => 2004-09-16
[patent_title] => 'Immersion lithography methods using carbon dioxide'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/386356 | Immersion lithography methods using carbon dioxide | Mar 10, 2003 | Issued |
Array
(
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[patent_issue_date] => 2003-10-23
[patent_title] => 'Method of passivating of low dielectric materials in wafer processing'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/379984 | Method of passivating of low dielectric materials in wafer processing | Mar 3, 2003 | Issued |
Array
(
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[patent_issue_date] => 2006-10-17
[patent_title] => 'Lithography pattern shrink process and articles'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/378435 | Lithography pattern shrink process and articles | Mar 2, 2003 | Issued |
Array
(
[id] => 5165518
[patent_doc_number] => 20070287104
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[patent_issue_date] => 2007-12-13
[patent_title] => 'PHOTO-DEFINABLE SELF-ASSEMBLED MATERIALS'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/373565 | Photo-definable self-assembled materials | Feb 25, 2003 | Issued |
Array
(
[id] => 7464222
[patent_doc_number] => 20040166447
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-08-26
[patent_title] => 'Method for shrinking pattern photoresist'
[patent_app_type] => new
[patent_app_number] => 10/373099
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/373099 | Method for shrinking pattern photoresist | Feb 25, 2003 | Abandoned |
Array
(
[id] => 574928
[patent_doc_number] => 07455955
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[patent_kind] => B2
[patent_issue_date] => 2008-11-25
[patent_title] => 'Planarization method for multi-layer lithography processing'
[patent_app_type] => utility
[patent_app_number] => 10/373897
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/373897 | Planarization method for multi-layer lithography processing | Feb 23, 2003 | Issued |
Array
(
[id] => 7381732
[patent_doc_number] => 20040081923
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[patent_issue_date] => 2004-04-29
[patent_title] => 'Method of preventing repeated collapse in a reworked photoresist layer'
[patent_app_type] => new
[patent_app_number] => 10/370441
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/370441 | Method of preventing repeated collapse in a reworked photoresist layer | Feb 19, 2003 | Issued |
Array
(
[id] => 6820572
[patent_doc_number] => 20030218733
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[patent_title] => 'Method and apparatus for enhancing image contrast using intensity filtration'
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Array
(
[id] => 972021
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Array
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Array
(
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Array
(
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Array
(
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Array
(
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Array
(
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Array
(
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Array
(
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[firstpage_image] =>[orig_patent_app_number] => 10335346
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/335346 | Resist removal | Dec 30, 2002 | Abandoned |