Kurt C Rowan
Examiner (ID: 13691)
Most Active Art Unit | 3205 |
Art Unit(s) | 3643, 3616, 2899, 3205, 2761 |
Total Applications | 2630 |
Issued Applications | 1958 |
Pending Applications | 87 |
Abandoned Applications | 584 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 996433
[patent_doc_number] => 06913872
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2005-07-05
[patent_title] => 'Dual-wavelength exposure for reduction of implant shadowing'
[patent_app_type] => utility
[patent_app_number] => 10/262301
[patent_app_country] => US
[patent_app_date] => 2002-09-30
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/913/06913872.pdf
[firstpage_image] =>[orig_patent_app_number] => 10262301
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/262301 | Dual-wavelength exposure for reduction of implant shadowing | Sep 29, 2002 | Issued |
Array
(
[id] => 7397776
[patent_doc_number] => 20040023124
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-02-05
[patent_title] => 'Photolithography process with hybrid chromeless phase shift mask'
[patent_app_type] => new
[patent_app_number] => 10/065145
[patent_app_country] => US
[patent_app_date] => 2002-09-20
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[pdf_file] => publications/A1/0023/20040023124.pdf
[firstpage_image] =>[orig_patent_app_number] => 10065145
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/065145 | Photolithography process with hybrid chromeless phase shift mask | Sep 19, 2002 | Abandoned |
Array
(
[id] => 7351082
[patent_doc_number] => 20040048194
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[patent_kind] => A1
[patent_issue_date] => 2004-03-11
[patent_title] => 'Mehod for forming a tunable deep-ultraviolet dielectric antireflection layer for image transfer processing'
[patent_app_type] => new
[patent_app_number] => 10/241137
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[patent_app_date] => 2002-09-11
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/241137 | Mehod for forming a tunable deep-ultraviolet dielectric antireflection layer for image transfer processing | Sep 10, 2002 | Abandoned |
Array
(
[id] => 6778489
[patent_doc_number] => 20030049570
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-03-13
[patent_title] => 'Pattern formation method'
[patent_app_type] => new
[patent_app_number] => 10/236921
[patent_app_country] => US
[patent_app_date] => 2002-09-09
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 10236921
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/236921 | Pattern formation method | Sep 8, 2002 | Abandoned |
Array
(
[id] => 6778491
[patent_doc_number] => 20030049572
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-03-13
[patent_title] => 'Method for forming patterned insulating elements and methods for making electron source and image display device'
[patent_app_type] => new
[patent_app_number] => 10/235757
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/235757 | Method for forming patterned insulating elements and methods for making electron source and image display device | Sep 5, 2002 | Issued |
Array
(
[id] => 1104360
[patent_doc_number] => 06811955
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-11-02
[patent_title] => 'Method for photoresist development with improved CD'
[patent_app_type] => B2
[patent_app_number] => 10/235185
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/235185 | Method for photoresist development with improved CD | Sep 3, 2002 | Issued |
Array
(
[id] => 6778487
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[patent_title] => 'Method for producing a structured layer on a semiconductor substrate'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/233692 | Method for producing a structured layer on a semiconductor substrate | Sep 2, 2002 | Issued |
Array
(
[id] => 963518
[patent_doc_number] => 06949330
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-09-27
[patent_title] => 'Multiple level photolithography'
[patent_app_type] => utility
[patent_app_number] => 10/231918
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[patent_app_date] => 2002-08-30
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[firstpage_image] =>[orig_patent_app_number] => 10231918
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/231918 | Multiple level photolithography | Aug 29, 2002 | Issued |
Array
(
[id] => 6755965
[patent_doc_number] => 20030003742
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-01-02
[patent_title] => 'Gas assisted method for applying resist stripper and gas-resist stripper combinations'
[patent_app_type] => new
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/230472 | Gas assisted method for applying resist stripper and gas-resist stripper combinations | Aug 28, 2002 | Abandoned |
Array
(
[id] => 7134265
[patent_doc_number] => 20040043333
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-03-04
[patent_title] => 'Method of etching materials patterned with a single layer 193nm resist'
[patent_app_type] => new
[patent_app_number] => 10/230570
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[pdf_file] => publications/A1/0043/20040043333.pdf
[firstpage_image] =>[orig_patent_app_number] => 10230570
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/230570 | Method of etching materials patterned with a single layer 193nm resist | Aug 28, 2002 | Issued |
Array
(
[id] => 1317506
[patent_doc_number] => 06605413
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-08-12
[patent_title] => 'Chemical treatment to strengthen photoresists to prevent pattern collapse'
[patent_app_type] => B1
[patent_app_number] => 10/230171
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/230171 | Chemical treatment to strengthen photoresists to prevent pattern collapse | Aug 28, 2002 | Issued |
Array
(
[id] => 768549
[patent_doc_number] => 07005221
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-02-28
[patent_title] => 'Method and apparatus to easily measure reticle blind positioning with an exposure apparatus'
[patent_app_type] => utility
[patent_app_number] => 10/064920
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/064920 | Method and apparatus to easily measure reticle blind positioning with an exposure apparatus | Aug 28, 2002 | Issued |
Array
(
[id] => 913871
[patent_doc_number] => 07326509
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[patent_title] => 'Composition for forming anti-reflective coating for use in lithography'
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Array
(
[id] => 6791852
[patent_doc_number] => 20030087196
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[patent_title] => 'Resist pattern hardening method'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/216816 | Resist pattern hardening method | Aug 12, 2002 | Abandoned |
Array
(
[id] => 6750202
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Array
(
[id] => 6715739
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Array
(
[id] => 1037361
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Array
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Array
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Array
(
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[firstpage_image] =>[orig_patent_app_number] => 10193464
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/193464 | Method of forming patterned photoresist layer | Jul 9, 2002 | Issued |