Kurt C Rowan
Examiner (ID: 13691)
Most Active Art Unit | 3205 |
Art Unit(s) | 3643, 3616, 2899, 3205, 2761 |
Total Applications | 2630 |
Issued Applications | 1958 |
Pending Applications | 87 |
Abandoned Applications | 584 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 1296683
[patent_doc_number] => 06627392
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-09-30
[patent_title] => 'Method of transferring a pattern of high structure density by multiple exposure of less dense partial patterns'
[patent_app_type] => B2
[patent_app_number] => 10/073846
[patent_app_country] => US
[patent_app_date] => 2002-02-11
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[pdf_file] => patents/06/627/06627392.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/073846 | Method of transferring a pattern of high structure density by multiple exposure of less dense partial patterns | Feb 10, 2002 | Issued |
Array
(
[id] => 1088769
[patent_doc_number] => 06828082
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-12-07
[patent_title] => 'Method to pattern small features by using a re-flowable hard mask'
[patent_app_type] => B2
[patent_app_number] => 10/072102
[patent_app_country] => US
[patent_app_date] => 2002-02-08
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/072102 | Method to pattern small features by using a re-flowable hard mask | Feb 7, 2002 | Issued |
Array
(
[id] => 6801036
[patent_doc_number] => 20030096200
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-22
[patent_title] => 'Method of forming isolated lines using multiple exposure'
[patent_app_type] => new
[patent_app_number] => 10/071060
[patent_app_country] => US
[patent_app_date] => 2002-02-07
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/071060 | Method of forming isolated lines using multiple exposure | Feb 6, 2002 | Abandoned |
Array
(
[id] => 1137370
[patent_doc_number] => 06780569
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-08-24
[patent_title] => 'Post-development treatment of patterned photoresist to promote cross-linking of polymer chains'
[patent_app_type] => B1
[patent_app_number] => 10/068282
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[patent_app_date] => 2002-02-04
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/068282 | Post-development treatment of patterned photoresist to promote cross-linking of polymer chains | Feb 3, 2002 | Issued |
Array
(
[id] => 1122846
[patent_doc_number] => 06794098
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[patent_kind] => B1
[patent_issue_date] => 2004-09-21
[patent_title] => 'Capacitor with plasma deposited dielectric'
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[patent_app_number] => 10/054259
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/054259 | Capacitor with plasma deposited dielectric | Jan 21, 2002 | Issued |
Array
(
[id] => 6615215
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[patent_kind] => A1
[patent_issue_date] => 2002-05-30
[patent_title] => 'Method for forming cross-linking photoresist and structures forrmed thereby'
[patent_app_type] => new
[patent_app_number] => 10/053132
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[firstpage_image] =>[orig_patent_app_number] => 10053132
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/053132 | Method for forming cross-linking photoresist and structures formed thereby | Jan 16, 2002 | Issued |
Array
(
[id] => 1276953
[patent_doc_number] => 06645702
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[patent_kind] => B1
[patent_issue_date] => 2003-11-11
[patent_title] => 'Treat resist surface to prevent pattern collapse'
[patent_app_type] => B1
[patent_app_number] => 10/050438
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 10050438
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/050438 | Treat resist surface to prevent pattern collapse | Jan 15, 2002 | Issued |
Array
(
[id] => 6856037
[patent_doc_number] => 20030129538
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[patent_kind] => A1
[patent_issue_date] => 2003-07-10
[patent_title] => 'Method for eliminating corner round profile of the RELACS process'
[patent_app_type] => new
[patent_app_number] => 10/040361
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[patent_app_date] => 2002-01-09
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[firstpage_image] =>[orig_patent_app_number] => 10040361
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/040361 | Method for eliminating corner round profile of the RELACS process | Jan 8, 2002 | Abandoned |
Array
(
[id] => 1223333
[patent_doc_number] => 06699642
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-03-02
[patent_title] => 'Method of manufacturing triode carbon nanotube field emitter array'
[patent_app_type] => B2
[patent_app_number] => 10/035438
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[pdf_file] => patents/06/699/06699642.pdf
[firstpage_image] =>[orig_patent_app_number] => 10035438
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/035438 | Method of manufacturing triode carbon nanotube field emitter array | Jan 3, 2002 | Issued |
Array
(
[id] => 6856047
[patent_doc_number] => 20030129548
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[patent_kind] => A1
[patent_issue_date] => 2003-07-10
[patent_title] => 'Method for removing patterned layer from lower layer through reflow'
[patent_app_type] => new
[patent_app_number] => 10/035222
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[patent_app_date] => 2002-01-04
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/035222 | Method for removing patterned layer from lower layer through reflow | Jan 3, 2002 | Issued |
Array
(
[id] => 6761101
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[patent_kind] => A1
[patent_issue_date] => 2003-07-03
[patent_title] => 'Method of undercutting micro-mechanical device with super-critical carbon dioxide'
[patent_app_type] => new
[patent_app_number] => 10/034647
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/034647 | Method of undercutting micro-mechanical device with super-critical carbon dioxide | Dec 27, 2001 | Issued |
Array
(
[id] => 6289755
[patent_doc_number] => 20020055049
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[patent_issue_date] => 2002-05-09
[patent_title] => 'Method and apparatus for forming resist pattern'
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[firstpage_image] =>[orig_patent_app_number] => 10025783
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/025783 | Method and apparatus for forming resist pattern | Dec 25, 2001 | Issued |
Array
(
[id] => 6623706
[patent_doc_number] => 20020086222
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[patent_title] => 'Photomask and manufacturing method of an electronic device therewith'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/020904 | Photomask and manufacturing method of an electronic device therewith | Dec 18, 2001 | Issued |
Array
(
[id] => 1227742
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[patent_title] => 'Shift multi-exposure method'
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[firstpage_image] =>[orig_patent_app_number] => 10016893
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/016893 | Shift multi-exposure method | Dec 12, 2001 | Issued |
Array
(
[id] => 6701385
[patent_doc_number] => 20030224265
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[patent_title] => 'System and method for reducing photoresist photo-oxidative degradation in 193 nm photolithography'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/017871 | System and method for reducing photoresist photo-oxidative degradation in 193 nm photolithography | Dec 10, 2001 | Abandoned |
Array
(
[id] => 6668691
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[patent_title] => 'Multiple photolithographic exposures with different clear patterns'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/020452 | Multiple photolithographic exposures with different clear patterns | Dec 3, 2001 | Issued |
Array
(
[id] => 6645813
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[patent_title] => 'Contact hole printing by packing and unpacking'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/002986 | Contact hole printing by packing and unpacking | Nov 29, 2001 | Issued |
Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/006563 | Solvent free photoresist strip and residue removal processing for post etching of low-k films | Nov 29, 2001 | Issued |
Array
(
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Array
(
[id] => 5935856
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[firstpage_image] =>[orig_patent_app_number] => 09987928
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/987928 | Pattern forming method | Nov 15, 2001 | Abandoned |