Search

Kurt C Rowan

Examiner (ID: 13691)

Most Active Art Unit
3205
Art Unit(s)
3643, 3616, 2899, 3205, 2761
Total Applications
2630
Issued Applications
1958
Pending Applications
87
Abandoned Applications
584

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 6444559 [patent_doc_number] => 20020177075 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-11-28 [patent_title] => 'Method of enhancing photoresist anti-etching ability' [patent_app_type] => new [patent_app_number] => 09/861623 [patent_app_country] => US [patent_app_date] => 2001-05-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 2323 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 55 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0177/20020177075.pdf [firstpage_image] =>[orig_patent_app_number] => 09861623 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/861623
Method of enhancing photoresist anti-etching ability May 21, 2001 Issued
Array ( [id] => 442401 [patent_doc_number] => 07255978 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-08-14 [patent_title] => 'Multi-level optical structure and method of manufacture' [patent_app_type] => utility [patent_app_number] => 09/858999 [patent_app_country] => US [patent_app_date] => 2001-05-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 21 [patent_no_of_words] => 4549 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 76 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/255/07255978.pdf [firstpage_image] =>[orig_patent_app_number] => 09858999 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/858999
Multi-level optical structure and method of manufacture May 15, 2001 Issued
Array ( [id] => 442401 [patent_doc_number] => 07255978 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-08-14 [patent_title] => 'Multi-level optical structure and method of manufacture' [patent_app_type] => utility [patent_app_number] => 09/858999 [patent_app_country] => US [patent_app_date] => 2001-05-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 21 [patent_no_of_words] => 4549 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 76 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/255/07255978.pdf [firstpage_image] =>[orig_patent_app_number] => 09858999 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/858999
Multi-level optical structure and method of manufacture May 15, 2001 Issued
Array ( [id] => 1261023 [patent_doc_number] => 06664031 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-12-16 [patent_title] => 'Process for forming photoresist pattern by using gas phase amine treatment' [patent_app_type] => B2 [patent_app_number] => 09/852377 [patent_app_country] => US [patent_app_date] => 2001-05-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 2164 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 36 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/664/06664031.pdf [firstpage_image] =>[orig_patent_app_number] => 09852377 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/852377
Process for forming photoresist pattern by using gas phase amine treatment May 9, 2001 Issued
Array ( [id] => 7064792 [patent_doc_number] => 20010044078 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-11-22 [patent_title] => 'Preparation of optical disk master' [patent_app_type] => new [patent_app_number] => 09/832893 [patent_app_country] => US [patent_app_date] => 2001-04-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 4612 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 70 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0044/20010044078.pdf [firstpage_image] =>[orig_patent_app_number] => 09832893 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/832893
Preparation of optical disk master Apr 11, 2001 Issued
Array ( [id] => 6465355 [patent_doc_number] => 20020150842 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-10-17 [patent_title] => 'Lithographically patterning of UV cure elastomer thin films' [patent_app_type] => new [patent_app_number] => 09/829974 [patent_app_country] => US [patent_app_date] => 2001-04-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 2432 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 45 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0150/20020150842.pdf [firstpage_image] =>[orig_patent_app_number] => 09829974 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/829974
Lithographically patterning of UV cure elastomer thin films Apr 10, 2001 Abandoned
Array ( [id] => 6787803 [patent_doc_number] => 20030139042 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-07-24 [patent_title] => 'Method in connection with the production of a template and the template thus produced' [patent_app_type] => new [patent_app_number] => 10/296326 [patent_app_country] => US [patent_app_date] => 2003-01-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 3200 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 24 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0139/20030139042.pdf [firstpage_image] =>[orig_patent_app_number] => 10296326 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/296326
Method in connection with the production of a template and the template thus produced Apr 9, 2001 Issued
Array ( [id] => 5905558 [patent_doc_number] => 20020142252 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-10-03 [patent_title] => 'Method for polysilicon conductor (PC) Trimming for shrinking critical dimension and isolated-nested offset correction' [patent_app_type] => new [patent_app_number] => 09/821478 [patent_app_country] => US [patent_app_date] => 2001-03-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 3164 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 46 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0142/20020142252.pdf [firstpage_image] =>[orig_patent_app_number] => 09821478 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/821478
Method for polysilicon conductor (PC) Trimming for shrinking critical dimension and isolated-nested offset correction Mar 28, 2001 Abandoned
Array ( [id] => 1338206 [patent_doc_number] => 06589709 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-07-08 [patent_title] => 'Process for preventing deformation of patterned photoresist features' [patent_app_type] => B1 [patent_app_number] => 09/819692 [patent_app_country] => US [patent_app_date] => 2001-03-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 21 [patent_no_of_words] => 5708 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 69 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/589/06589709.pdf [firstpage_image] =>[orig_patent_app_number] => 09819692 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/819692
Process for preventing deformation of patterned photoresist features Mar 27, 2001 Issued
Array ( [id] => 5968445 [patent_doc_number] => 20020090745 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-07-11 [patent_title] => 'Rule to determine CMP polish time' [patent_app_type] => new [patent_app_number] => 09/818962 [patent_app_country] => US [patent_app_date] => 2001-03-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 1740 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 125 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0090/20020090745.pdf [firstpage_image] =>[orig_patent_app_number] => 09818962 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/818962
Rule to determine CMP polish time Mar 27, 2001 Issued
Array ( [id] => 1339885 [patent_doc_number] => 06586160 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-07-01 [patent_title] => 'Method for patterning resist' [patent_app_type] => B2 [patent_app_number] => 09/817408 [patent_app_country] => US [patent_app_date] => 2001-03-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 8 [patent_no_of_words] => 5112 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/586/06586160.pdf [firstpage_image] =>[orig_patent_app_number] => 09817408 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/817408
Method for patterning resist Mar 25, 2001 Issued
Array ( [id] => 1269468 [patent_doc_number] => 06653055 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-11-25 [patent_title] => 'Method for producing etched circuits' [patent_app_type] => B1 [patent_app_number] => 09/787220 [patent_app_country] => US [patent_app_date] => 2001-03-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 5 [patent_no_of_words] => 1128 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 97 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/653/06653055.pdf [firstpage_image] =>[orig_patent_app_number] => 09787220 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/787220
Method for producing etched circuits Mar 15, 2001 Issued
Array ( [id] => 6431568 [patent_doc_number] => 20020127495 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-09-12 [patent_title] => 'Method of fabricating nanometer-scale flowchannels and trenches with self-aligned electrodes and the structures formed by the same' [patent_app_type] => new [patent_app_number] => 09/803840 [patent_app_country] => US [patent_app_date] => 2001-03-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 3011 [patent_no_of_claims] => 33 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 15 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0127/20020127495.pdf [firstpage_image] =>[orig_patent_app_number] => 09803840 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/803840
Method of fabricating nanometer-scale flowchannels and trenches with self-aligned electrodes and the structures formed by the same Mar 11, 2001 Issued
Array ( [id] => 1373621 [patent_doc_number] => 06558883 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-05-06 [patent_title] => 'Apparatus and method for patterning a semiconductor wafer' [patent_app_type] => B2 [patent_app_number] => 09/801413 [patent_app_country] => US [patent_app_date] => 2001-03-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 3335 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 117 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/558/06558883.pdf [firstpage_image] =>[orig_patent_app_number] => 09801413 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/801413
Apparatus and method for patterning a semiconductor wafer Mar 7, 2001 Issued
Array ( [id] => 6892004 [patent_doc_number] => 20010018166 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-08-30 [patent_title] => 'Developing process, process for forming pattern and process for preparing semiconductor device using same' [patent_app_type] => new [patent_app_number] => 09/793578 [patent_app_country] => US [patent_app_date] => 2001-02-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7313 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 77 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0018/20010018166.pdf [firstpage_image] =>[orig_patent_app_number] => 09793578 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/793578
Developing process, process for forming pattern and process for preparing semiconductor device using same Feb 26, 2001 Issued
Array ( [id] => 428493 [patent_doc_number] => 07267926 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-09-11 [patent_title] => 'Active energy beam curing type conductive paste, production method and device for conductor circuit substrate and non-contact ID and production method thereof' [patent_app_type] => utility [patent_app_number] => 10/204308 [patent_app_country] => US [patent_app_date] => 2001-02-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 11070 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 76 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/267/07267926.pdf [firstpage_image] =>[orig_patent_app_number] => 10204308 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/204308
Active energy beam curing type conductive paste, production method and device for conductor circuit substrate and non-contact ID and production method thereof Feb 19, 2001 Issued
Array ( [id] => 1188724 [patent_doc_number] => 06733955 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-05-11 [patent_title] => 'Methods for forming self-planarized dielectric layer for shallow trench isolation' [patent_app_type] => B1 [patent_app_number] => 09/701065 [patent_app_country] => US [patent_app_date] => 2001-02-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 30 [patent_no_of_words] => 10007 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 93 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/733/06733955.pdf [firstpage_image] =>[orig_patent_app_number] => 09701065 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/701065
Methods for forming self-planarized dielectric layer for shallow trench isolation Feb 11, 2001 Issued
Array ( [id] => 6544445 [patent_doc_number] => 20020110760 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-08-15 [patent_title] => 'Method for improving hydrophilic character of photoresist and effect of development' [patent_app_type] => new [patent_app_number] => 09/779474 [patent_app_country] => US [patent_app_date] => 2001-02-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 2268 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 82 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0110/20020110760.pdf [firstpage_image] =>[orig_patent_app_number] => 09779474 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/779474
Method for improving hydrophilic character of photoresist and effect of development Feb 8, 2001 Abandoned
Array ( [id] => 6889314 [patent_doc_number] => 20010024769 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-09-27 [patent_title] => 'Method for removing photoresist and residues from semiconductor device surfaces' [patent_app_type] => new [patent_app_number] => 09/780873 [patent_app_country] => US [patent_app_date] => 2001-02-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 3917 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 100 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0024/20010024769.pdf [firstpage_image] =>[orig_patent_app_number] => 09780873 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/780873
Method for removing photoresist and residues from semiconductor device surfaces Feb 7, 2001 Abandoned
Array ( [id] => 1477366 [patent_doc_number] => 06451504 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2002-09-17 [patent_title] => 'Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitride' [patent_app_type] => B2 [patent_app_number] => 09/773462 [patent_app_country] => US [patent_app_date] => 2001-01-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 7 [patent_no_of_words] => 2114 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 108 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/451/06451504.pdf [firstpage_image] =>[orig_patent_app_number] => 09773462 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/773462
Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitride Jan 30, 2001 Issued
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