Kurt C Rowan
Examiner (ID: 13691)
Most Active Art Unit | 3205 |
Art Unit(s) | 3643, 3616, 2899, 3205, 2761 |
Total Applications | 2630 |
Issued Applications | 1958 |
Pending Applications | 87 |
Abandoned Applications | 584 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 6444559
[patent_doc_number] => 20020177075
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-11-28
[patent_title] => 'Method of enhancing photoresist anti-etching ability'
[patent_app_type] => new
[patent_app_number] => 09/861623
[patent_app_country] => US
[patent_app_date] => 2001-05-22
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[pdf_file] => publications/A1/0177/20020177075.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/861623 | Method of enhancing photoresist anti-etching ability | May 21, 2001 | Issued |
Array
(
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[patent_issue_date] => 2007-08-14
[patent_title] => 'Multi-level optical structure and method of manufacture'
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Array
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Array
(
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[patent_doc_number] => 06664031
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[patent_kind] => B2
[patent_issue_date] => 2003-12-16
[patent_title] => 'Process for forming photoresist pattern by using gas phase amine treatment'
[patent_app_type] => B2
[patent_app_number] => 09/852377
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[patent_app_date] => 2001-05-10
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/852377 | Process for forming photoresist pattern by using gas phase amine treatment | May 9, 2001 | Issued |
Array
(
[id] => 7064792
[patent_doc_number] => 20010044078
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[patent_issue_date] => 2001-11-22
[patent_title] => 'Preparation of optical disk master'
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[patent_app_number] => 09/832893
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[patent_app_date] => 2001-04-12
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/832893 | Preparation of optical disk master | Apr 11, 2001 | Issued |
Array
(
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[patent_issue_date] => 2002-10-17
[patent_title] => 'Lithographically patterning of UV cure elastomer thin films'
[patent_app_type] => new
[patent_app_number] => 09/829974
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[firstpage_image] =>[orig_patent_app_number] => 09829974
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/829974 | Lithographically patterning of UV cure elastomer thin films | Apr 10, 2001 | Abandoned |
Array
(
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[patent_issue_date] => 2003-07-24
[patent_title] => 'Method in connection with the production of a template and the template thus produced'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/296326 | Method in connection with the production of a template and the template thus produced | Apr 9, 2001 | Issued |
Array
(
[id] => 5905558
[patent_doc_number] => 20020142252
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[patent_issue_date] => 2002-10-03
[patent_title] => 'Method for polysilicon conductor (PC) Trimming for shrinking critical dimension and isolated-nested offset correction'
[patent_app_type] => new
[patent_app_number] => 09/821478
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Array
(
[id] => 1338206
[patent_doc_number] => 06589709
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[patent_issue_date] => 2003-07-08
[patent_title] => 'Process for preventing deformation of patterned photoresist features'
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[patent_app_number] => 09/819692
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/819692 | Process for preventing deformation of patterned photoresist features | Mar 27, 2001 | Issued |
Array
(
[id] => 5968445
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[patent_title] => 'Rule to determine CMP polish time'
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Array
(
[id] => 1339885
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[patent_issue_date] => 2003-07-01
[patent_title] => 'Method for patterning resist'
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Array
(
[id] => 1269468
[patent_doc_number] => 06653055
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[patent_issue_date] => 2003-11-25
[patent_title] => 'Method for producing etched circuits'
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Array
(
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Array
(
[id] => 1373621
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Array
(
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Array
(
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[patent_title] => 'Active energy beam curing type conductive paste, production method and device for conductor circuit substrate and non-contact ID and production method thereof'
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Array
(
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[patent_title] => 'Methods for forming self-planarized dielectric layer for shallow trench isolation'
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Array
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Array
(
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/773462 | Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitride | Jan 30, 2001 | Issued |