Search

Kurt C Rowan

Examiner (ID: 13691)

Most Active Art Unit
3205
Art Unit(s)
3643, 3616, 2899, 3205, 2761
Total Applications
2630
Issued Applications
1958
Pending Applications
87
Abandoned Applications
584

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 7027976 [patent_doc_number] => 20010014431 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-08-16 [patent_title] => 'Method for decreasing surface defects of patterned resist layer' [patent_app_type] => new [patent_app_number] => 09/771563 [patent_app_country] => US [patent_app_date] => 2001-01-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5129 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 116 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0014/20010014431.pdf [firstpage_image] =>[orig_patent_app_number] => 09771563 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/771563
Method for decreasing surface defects of patterned resist layer Jan 29, 2001 Issued
Array ( [id] => 1364659 [patent_doc_number] => 06566041 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-05-20 [patent_title] => 'Photomask and pattern forming method used in a thermal flow process and semiconductor integrated circuit fabricated using the thermal flow process' [patent_app_type] => B2 [patent_app_number] => 09/757841 [patent_app_country] => US [patent_app_date] => 2001-01-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 20 [patent_no_of_words] => 5204 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 119 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/566/06566041.pdf [firstpage_image] =>[orig_patent_app_number] => 09757841 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/757841
Photomask and pattern forming method used in a thermal flow process and semiconductor integrated circuit fabricated using the thermal flow process Jan 9, 2001 Issued
Array ( [id] => 1534200 [patent_doc_number] => 06489085 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2002-12-03 [patent_title] => 'Thermal reflow photolithographic process' [patent_app_type] => B2 [patent_app_number] => 09/742960 [patent_app_country] => US [patent_app_date] => 2000-12-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 1369 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 86 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/489/06489085.pdf [firstpage_image] =>[orig_patent_app_number] => 09742960 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/742960
Thermal reflow photolithographic process Dec 19, 2000 Issued
Array ( [id] => 6838683 [patent_doc_number] => 20030036023 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-02-20 [patent_title] => 'Supercritical fluid(SCF) silylation process' [patent_app_type] => new [patent_app_number] => 09/735404 [patent_app_country] => US [patent_app_date] => 2000-12-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 2938 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 33 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0036/20030036023.pdf [firstpage_image] =>[orig_patent_app_number] => 09735404 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/735404
Supercritical fluid(SCF) silylation process Dec 11, 2000 Issued
Array ( [id] => 6892003 [patent_doc_number] => 20010018165 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-08-30 [patent_title] => 'Simple Photo development step to form tisix gate in DRAM process' [patent_app_type] => new [patent_app_number] => 09/729624 [patent_app_country] => US [patent_app_date] => 2000-12-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 2140 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 159 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0018/20010018165.pdf [firstpage_image] =>[orig_patent_app_number] => 09729624 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/729624
Simple photo development step to form TiSix gate in DRAM process Nov 30, 2000 Issued
Array ( [id] => 6729977 [patent_doc_number] => 20030186167 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-10-02 [patent_title] => 'Fabrication of nanometer size gaps on an electrode' [patent_app_type] => new [patent_app_number] => 10/148303 [patent_app_country] => US [patent_app_date] => 2003-01-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 3554 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 120 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0186/20030186167.pdf [firstpage_image] =>[orig_patent_app_number] => 10148303 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/148303
Fabrication of nanometer size gaps on an electrode Nov 28, 2000 Issued
Array ( [id] => 1390914 [patent_doc_number] => 06541187 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-04-01 [patent_title] => 'Process for producing an article with a microstructure' [patent_app_type] => B1 [patent_app_number] => 09/711258 [patent_app_country] => US [patent_app_date] => 2000-11-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 18 [patent_figures_cnt] => 37 [patent_no_of_words] => 2926 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 111 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/541/06541187.pdf [firstpage_image] =>[orig_patent_app_number] => 09711258 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/711258
Process for producing an article with a microstructure Nov 12, 2000 Issued
Array ( [id] => 1516855 [patent_doc_number] => 06500605 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-12-31 [patent_title] => 'Removal of photoresist and residue from substrate using supercritical carbon dioxide process' [patent_app_type] => B1 [patent_app_number] => 09/697227 [patent_app_country] => US [patent_app_date] => 2000-10-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 16 [patent_no_of_words] => 7443 [patent_no_of_claims] => 35 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 74 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/500/06500605.pdf [firstpage_image] =>[orig_patent_app_number] => 09697227 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/697227
Removal of photoresist and residue from substrate using supercritical carbon dioxide process Oct 24, 2000 Issued
Array ( [id] => 1502913 [patent_doc_number] => 06465158 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-10-15 [patent_title] => 'Semiconductor wafer dividing method' [patent_app_type] => B1 [patent_app_number] => 09/691208 [patent_app_country] => US [patent_app_date] => 2000-10-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 2333 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 104 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/465/06465158.pdf [firstpage_image] =>[orig_patent_app_number] => 09691208 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/691208
Semiconductor wafer dividing method Oct 18, 2000 Issued
Array ( [id] => 7636781 [patent_doc_number] => 06379874 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-30 [patent_title] => 'Using block copolymers as supercritical fluid developable photoresists' [patent_app_type] => B1 [patent_app_number] => 09/688126 [patent_app_country] => US [patent_app_date] => 2000-10-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4569 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 14 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/379/06379874.pdf [firstpage_image] =>[orig_patent_app_number] => 09688126 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/688126
Using block copolymers as supercritical fluid developable photoresists Oct 15, 2000 Issued
Array ( [id] => 1544655 [patent_doc_number] => 06444410 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-03 [patent_title] => 'Method of improving photoresist profile' [patent_app_type] => B1 [patent_app_number] => 09/688606 [patent_app_country] => US [patent_app_date] => 2000-10-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 5 [patent_no_of_words] => 1579 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 93 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/444/06444410.pdf [firstpage_image] =>[orig_patent_app_number] => 09688606 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/688606
Method of improving photoresist profile Oct 13, 2000 Issued
09/680937 Exposure method Oct 9, 2000 Abandoned
Array ( [id] => 1535727 [patent_doc_number] => 06337172 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-08 [patent_title] => 'Method for reducing photolithographic steps in a semiconductor interconnect process' [patent_app_type] => B1 [patent_app_number] => 09/675830 [patent_app_country] => US [patent_app_date] => 2000-09-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 9 [patent_no_of_words] => 3741 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 87 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/337/06337172.pdf [firstpage_image] =>[orig_patent_app_number] => 09675830 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/675830
Method for reducing photolithographic steps in a semiconductor interconnect process Sep 28, 2000 Issued
Array ( [id] => 1413954 [patent_doc_number] => 06511794 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-01-28 [patent_title] => 'Method of forming resist pattern, and exposure device' [patent_app_type] => B1 [patent_app_number] => 09/664003 [patent_app_country] => US [patent_app_date] => 2000-09-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 23 [patent_no_of_words] => 6956 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 156 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/511/06511794.pdf [firstpage_image] =>[orig_patent_app_number] => 09664003 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/664003
Method of forming resist pattern, and exposure device Sep 17, 2000 Issued
Array ( [id] => 1602442 [patent_doc_number] => 06432620 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-13 [patent_title] => 'Edge rinse apparatus and edge rinse method' [patent_app_type] => B1 [patent_app_number] => 09/640303 [patent_app_country] => US [patent_app_date] => 2000-08-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 16 [patent_no_of_words] => 12679 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 42 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/432/06432620.pdf [firstpage_image] =>[orig_patent_app_number] => 09640303 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/640303
Edge rinse apparatus and edge rinse method Aug 15, 2000 Issued
Array ( [id] => 1489750 [patent_doc_number] => 06416935 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-09 [patent_title] => 'Method for forming the air bearing surface of a slider' [patent_app_type] => B1 [patent_app_number] => 09/632860 [patent_app_country] => US [patent_app_date] => 2000-08-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 2714 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 115 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/416/06416935.pdf [firstpage_image] =>[orig_patent_app_number] => 09632860 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/632860
Method for forming the air bearing surface of a slider Aug 6, 2000 Issued
Array ( [id] => 1174383 [patent_doc_number] => 06746826 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-06-08 [patent_title] => 'Method for an improved developing process in wafer photolithography' [patent_app_type] => B1 [patent_app_number] => 09/624712 [patent_app_country] => US [patent_app_date] => 2000-07-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 38 [patent_no_of_words] => 9151 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 151 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/746/06746826.pdf [firstpage_image] =>[orig_patent_app_number] => 09624712 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/624712
Method for an improved developing process in wafer photolithography Jul 24, 2000 Issued
Array ( [id] => 1394599 [patent_doc_number] => 06531264 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-03-11 [patent_title] => 'Integrated circuit manufacture' [patent_app_type] => B1 [patent_app_number] => 09/616342 [patent_app_country] => US [patent_app_date] => 2000-07-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 7 [patent_no_of_words] => 2827 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 115 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/531/06531264.pdf [firstpage_image] =>[orig_patent_app_number] => 09616342 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/616342
Integrated circuit manufacture Jul 13, 2000 Issued
Array ( [id] => 1413769 [patent_doc_number] => 06517998 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-02-11 [patent_title] => 'Method for removing photoresist film and apparatus used therefor' [patent_app_type] => B1 [patent_app_number] => 09/614252 [patent_app_country] => US [patent_app_date] => 2000-07-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 9 [patent_no_of_words] => 6696 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 72 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/517/06517998.pdf [firstpage_image] =>[orig_patent_app_number] => 09614252 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/614252
Method for removing photoresist film and apparatus used therefor Jul 11, 2000 Issued
Array ( [id] => 1413780 [patent_doc_number] => 06517999 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-02-11 [patent_title] => 'Method of removing photoresist film' [patent_app_type] => B1 [patent_app_number] => 09/614258 [patent_app_country] => US [patent_app_date] => 2000-07-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 9 [patent_no_of_words] => 7244 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 203 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/517/06517999.pdf [firstpage_image] =>[orig_patent_app_number] => 09614258 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/614258
Method of removing photoresist film Jul 11, 2000 Issued
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