Kurt C Rowan
Examiner (ID: 13691)
Most Active Art Unit | 3205 |
Art Unit(s) | 3643, 3616, 2899, 3205, 2761 |
Total Applications | 2630 |
Issued Applications | 1958 |
Pending Applications | 87 |
Abandoned Applications | 584 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 7027976
[patent_doc_number] => 20010014431
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-08-16
[patent_title] => 'Method for decreasing surface defects of patterned resist layer'
[patent_app_type] => new
[patent_app_number] => 09/771563
[patent_app_country] => US
[patent_app_date] => 2001-01-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5129
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 116
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0014/20010014431.pdf
[firstpage_image] =>[orig_patent_app_number] => 09771563
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/771563 | Method for decreasing surface defects of patterned resist layer | Jan 29, 2001 | Issued |
Array
(
[id] => 1364659
[patent_doc_number] => 06566041
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-05-20
[patent_title] => 'Photomask and pattern forming method used in a thermal flow process and semiconductor integrated circuit fabricated using the thermal flow process'
[patent_app_type] => B2
[patent_app_number] => 09/757841
[patent_app_country] => US
[patent_app_date] => 2001-01-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 20
[patent_no_of_words] => 5204
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 119
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/566/06566041.pdf
[firstpage_image] =>[orig_patent_app_number] => 09757841
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/757841 | Photomask and pattern forming method used in a thermal flow process and semiconductor integrated circuit fabricated using the thermal flow process | Jan 9, 2001 | Issued |
Array
(
[id] => 1534200
[patent_doc_number] => 06489085
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-12-03
[patent_title] => 'Thermal reflow photolithographic process'
[patent_app_type] => B2
[patent_app_number] => 09/742960
[patent_app_country] => US
[patent_app_date] => 2000-12-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 1369
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 86
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/489/06489085.pdf
[firstpage_image] =>[orig_patent_app_number] => 09742960
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/742960 | Thermal reflow photolithographic process | Dec 19, 2000 | Issued |
Array
(
[id] => 6838683
[patent_doc_number] => 20030036023
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-02-20
[patent_title] => 'Supercritical fluid(SCF) silylation process'
[patent_app_type] => new
[patent_app_number] => 09/735404
[patent_app_country] => US
[patent_app_date] => 2000-12-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 2938
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 33
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0036/20030036023.pdf
[firstpage_image] =>[orig_patent_app_number] => 09735404
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/735404 | Supercritical fluid(SCF) silylation process | Dec 11, 2000 | Issued |
Array
(
[id] => 6892003
[patent_doc_number] => 20010018165
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-08-30
[patent_title] => 'Simple Photo development step to form tisix gate in DRAM process'
[patent_app_type] => new
[patent_app_number] => 09/729624
[patent_app_country] => US
[patent_app_date] => 2000-12-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 2140
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 159
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0018/20010018165.pdf
[firstpage_image] =>[orig_patent_app_number] => 09729624
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/729624 | Simple photo development step to form TiSix gate in DRAM process | Nov 30, 2000 | Issued |
Array
(
[id] => 6729977
[patent_doc_number] => 20030186167
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-10-02
[patent_title] => 'Fabrication of nanometer size gaps on an electrode'
[patent_app_type] => new
[patent_app_number] => 10/148303
[patent_app_country] => US
[patent_app_date] => 2003-01-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 3554
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 120
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0186/20030186167.pdf
[firstpage_image] =>[orig_patent_app_number] => 10148303
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/148303 | Fabrication of nanometer size gaps on an electrode | Nov 28, 2000 | Issued |
Array
(
[id] => 1390914
[patent_doc_number] => 06541187
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-04-01
[patent_title] => 'Process for producing an article with a microstructure'
[patent_app_type] => B1
[patent_app_number] => 09/711258
[patent_app_country] => US
[patent_app_date] => 2000-11-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
[patent_figures_cnt] => 37
[patent_no_of_words] => 2926
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 111
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/541/06541187.pdf
[firstpage_image] =>[orig_patent_app_number] => 09711258
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/711258 | Process for producing an article with a microstructure | Nov 12, 2000 | Issued |
Array
(
[id] => 1516855
[patent_doc_number] => 06500605
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-12-31
[patent_title] => 'Removal of photoresist and residue from substrate using supercritical carbon dioxide process'
[patent_app_type] => B1
[patent_app_number] => 09/697227
[patent_app_country] => US
[patent_app_date] => 2000-10-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 16
[patent_no_of_words] => 7443
[patent_no_of_claims] => 35
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 74
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/500/06500605.pdf
[firstpage_image] =>[orig_patent_app_number] => 09697227
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/697227 | Removal of photoresist and residue from substrate using supercritical carbon dioxide process | Oct 24, 2000 | Issued |
Array
(
[id] => 1502913
[patent_doc_number] => 06465158
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-10-15
[patent_title] => 'Semiconductor wafer dividing method'
[patent_app_type] => B1
[patent_app_number] => 09/691208
[patent_app_country] => US
[patent_app_date] => 2000-10-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 2333
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 104
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/465/06465158.pdf
[firstpage_image] =>[orig_patent_app_number] => 09691208
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/691208 | Semiconductor wafer dividing method | Oct 18, 2000 | Issued |
Array
(
[id] => 7636781
[patent_doc_number] => 06379874
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-30
[patent_title] => 'Using block copolymers as supercritical fluid developable photoresists'
[patent_app_type] => B1
[patent_app_number] => 09/688126
[patent_app_country] => US
[patent_app_date] => 2000-10-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4569
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 14
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/379/06379874.pdf
[firstpage_image] =>[orig_patent_app_number] => 09688126
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/688126 | Using block copolymers as supercritical fluid developable photoresists | Oct 15, 2000 | Issued |
Array
(
[id] => 1544655
[patent_doc_number] => 06444410
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-03
[patent_title] => 'Method of improving photoresist profile'
[patent_app_type] => B1
[patent_app_number] => 09/688606
[patent_app_country] => US
[patent_app_date] => 2000-10-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 5
[patent_no_of_words] => 1579
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 93
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/444/06444410.pdf
[firstpage_image] =>[orig_patent_app_number] => 09688606
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/688606 | Method of improving photoresist profile | Oct 13, 2000 | Issued |
09/680937 | Exposure method | Oct 9, 2000 | Abandoned |
Array
(
[id] => 1535727
[patent_doc_number] => 06337172
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-01-08
[patent_title] => 'Method for reducing photolithographic steps in a semiconductor interconnect process'
[patent_app_type] => B1
[patent_app_number] => 09/675830
[patent_app_country] => US
[patent_app_date] => 2000-09-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 9
[patent_no_of_words] => 3741
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 87
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/337/06337172.pdf
[firstpage_image] =>[orig_patent_app_number] => 09675830
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/675830 | Method for reducing photolithographic steps in a semiconductor interconnect process | Sep 28, 2000 | Issued |
Array
(
[id] => 1413954
[patent_doc_number] => 06511794
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-01-28
[patent_title] => 'Method of forming resist pattern, and exposure device'
[patent_app_type] => B1
[patent_app_number] => 09/664003
[patent_app_country] => US
[patent_app_date] => 2000-09-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 23
[patent_no_of_words] => 6956
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 156
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/511/06511794.pdf
[firstpage_image] =>[orig_patent_app_number] => 09664003
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/664003 | Method of forming resist pattern, and exposure device | Sep 17, 2000 | Issued |
Array
(
[id] => 1602442
[patent_doc_number] => 06432620
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-13
[patent_title] => 'Edge rinse apparatus and edge rinse method'
[patent_app_type] => B1
[patent_app_number] => 09/640303
[patent_app_country] => US
[patent_app_date] => 2000-08-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 16
[patent_no_of_words] => 12679
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 42
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/432/06432620.pdf
[firstpage_image] =>[orig_patent_app_number] => 09640303
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/640303 | Edge rinse apparatus and edge rinse method | Aug 15, 2000 | Issued |
Array
(
[id] => 1489750
[patent_doc_number] => 06416935
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-07-09
[patent_title] => 'Method for forming the air bearing surface of a slider'
[patent_app_type] => B1
[patent_app_number] => 09/632860
[patent_app_country] => US
[patent_app_date] => 2000-08-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 2714
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 115
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/416/06416935.pdf
[firstpage_image] =>[orig_patent_app_number] => 09632860
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/632860 | Method for forming the air bearing surface of a slider | Aug 6, 2000 | Issued |
Array
(
[id] => 1174383
[patent_doc_number] => 06746826
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-06-08
[patent_title] => 'Method for an improved developing process in wafer photolithography'
[patent_app_type] => B1
[patent_app_number] => 09/624712
[patent_app_country] => US
[patent_app_date] => 2000-07-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 38
[patent_no_of_words] => 9151
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 151
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/746/06746826.pdf
[firstpage_image] =>[orig_patent_app_number] => 09624712
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/624712 | Method for an improved developing process in wafer photolithography | Jul 24, 2000 | Issued |
Array
(
[id] => 1394599
[patent_doc_number] => 06531264
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-03-11
[patent_title] => 'Integrated circuit manufacture'
[patent_app_type] => B1
[patent_app_number] => 09/616342
[patent_app_country] => US
[patent_app_date] => 2000-07-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 7
[patent_no_of_words] => 2827
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 115
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/531/06531264.pdf
[firstpage_image] =>[orig_patent_app_number] => 09616342
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/616342 | Integrated circuit manufacture | Jul 13, 2000 | Issued |
Array
(
[id] => 1413769
[patent_doc_number] => 06517998
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-02-11
[patent_title] => 'Method for removing photoresist film and apparatus used therefor'
[patent_app_type] => B1
[patent_app_number] => 09/614252
[patent_app_country] => US
[patent_app_date] => 2000-07-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 9
[patent_no_of_words] => 6696
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 72
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/517/06517998.pdf
[firstpage_image] =>[orig_patent_app_number] => 09614252
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/614252 | Method for removing photoresist film and apparatus used therefor | Jul 11, 2000 | Issued |
Array
(
[id] => 1413780
[patent_doc_number] => 06517999
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-02-11
[patent_title] => 'Method of removing photoresist film'
[patent_app_type] => B1
[patent_app_number] => 09/614258
[patent_app_country] => US
[patent_app_date] => 2000-07-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 9
[patent_no_of_words] => 7244
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 203
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/517/06517999.pdf
[firstpage_image] =>[orig_patent_app_number] => 09614258
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/614258 | Method of removing photoresist film | Jul 11, 2000 | Issued |