Kurt C Rowan
Examiner (ID: 13691)
Most Active Art Unit | 3205 |
Art Unit(s) | 3643, 3616, 2899, 3205, 2761 |
Total Applications | 2630 |
Issued Applications | 1958 |
Pending Applications | 87 |
Abandoned Applications | 584 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 4180944
[patent_doc_number] => 06159663
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-12
[patent_title] => 'Method of creating a solderable metal layer on glass or ceramic'
[patent_app_type] => 1
[patent_app_number] => 9/107475
[patent_app_country] => US
[patent_app_date] => 1998-06-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 1635
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 118
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/159/06159663.pdf
[firstpage_image] =>[orig_patent_app_number] => 107475
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/107475 | Method of creating a solderable metal layer on glass or ceramic | Jun 29, 1998 | Issued |
Array
(
[id] => 4418580
[patent_doc_number] => 06177237
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-01-23
[patent_title] => 'High resolution anti-scatter x-ray grid and laser fabrication method'
[patent_app_type] => 1
[patent_app_number] => 9/105788
[patent_app_country] => US
[patent_app_date] => 1998-06-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 6
[patent_no_of_words] => 2840
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 111
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/177/06177237.pdf
[firstpage_image] =>[orig_patent_app_number] => 105788
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/105788 | High resolution anti-scatter x-ray grid and laser fabrication method | Jun 25, 1998 | Issued |
Array
(
[id] => 4352620
[patent_doc_number] => 06200734
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-03-13
[patent_title] => 'Method for fabricating semiconductor devices'
[patent_app_type] => 1
[patent_app_number] => 9/094920
[patent_app_country] => US
[patent_app_date] => 1998-06-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 2086
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 170
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/200/06200734.pdf
[firstpage_image] =>[orig_patent_app_number] => 094920
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/094920 | Method for fabricating semiconductor devices | Jun 14, 1998 | Issued |
Array
(
[id] => 4143718
[patent_doc_number] => 06063547
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-05-16
[patent_title] => 'Physical vapor deposition poly-p-phenylene sulfide film as a bottom anti-reflective coating on polysilicon'
[patent_app_type] => 1
[patent_app_number] => 9/094464
[patent_app_country] => US
[patent_app_date] => 1998-06-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 5
[patent_no_of_words] => 3201
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 100
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/063/06063547.pdf
[firstpage_image] =>[orig_patent_app_number] => 094464
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/094464 | Physical vapor deposition poly-p-phenylene sulfide film as a bottom anti-reflective coating on polysilicon | Jun 10, 1998 | Issued |
Array
(
[id] => 4152338
[patent_doc_number] => 06103457
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-08-15
[patent_title] => 'Method for reducing faceting on a photoresist layer during an etch process'
[patent_app_type] => 1
[patent_app_number] => 9/086700
[patent_app_country] => US
[patent_app_date] => 1998-05-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 11
[patent_no_of_words] => 4128
[patent_no_of_claims] => 42
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 113
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/103/06103457.pdf
[firstpage_image] =>[orig_patent_app_number] => 086700
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/086700 | Method for reducing faceting on a photoresist layer during an etch process | May 27, 1998 | Issued |
Array
(
[id] => 4363834
[patent_doc_number] => 06274293
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-08-14
[patent_title] => 'Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom'
[patent_app_type] => 1
[patent_app_number] => 9/086790
[patent_app_country] => US
[patent_app_date] => 1998-05-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 25
[patent_figures_cnt] => 53
[patent_no_of_words] => 13907
[patent_no_of_claims] => 38
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 80
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/274/06274293.pdf
[firstpage_image] =>[orig_patent_app_number] => 086790
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/086790 | Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom | May 27, 1998 | Issued |
Array
(
[id] => 4264429
[patent_doc_number] => 06306564
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-23
[patent_title] => 'Removal of resist or residue from semiconductors using supercritical carbon dioxide'
[patent_app_type] => 1
[patent_app_number] => 9/085391
[patent_app_country] => US
[patent_app_date] => 1998-05-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 5
[patent_no_of_words] => 2835
[patent_no_of_claims] => 57
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 63
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/306/06306564.pdf
[firstpage_image] =>[orig_patent_app_number] => 085391
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/085391 | Removal of resist or residue from semiconductors using supercritical carbon dioxide | May 26, 1998 | Issued |
Array
(
[id] => 4415540
[patent_doc_number] => 06194127
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-02-27
[patent_title] => 'Resistive sheet patterning process and product thereof'
[patent_app_type] => 1
[patent_app_number] => 9/085048
[patent_app_country] => US
[patent_app_date] => 1998-05-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 4744
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 175
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/194/06194127.pdf
[firstpage_image] =>[orig_patent_app_number] => 085048
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/085048 | Resistive sheet patterning process and product thereof | May 26, 1998 | Issued |
Array
(
[id] => 4267679
[patent_doc_number] => 06245489
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-06-12
[patent_title] => 'Fluorinated hard mask for micropatterning of polymers'
[patent_app_type] => 1
[patent_app_number] => 9/085691
[patent_app_country] => US
[patent_app_date] => 1998-05-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 4651
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 103
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/245/06245489.pdf
[firstpage_image] =>[orig_patent_app_number] => 085691
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/085691 | Fluorinated hard mask for micropatterning of polymers | May 26, 1998 | Issued |
Array
(
[id] => 4357481
[patent_doc_number] => 06168906
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-01-02
[patent_title] => 'Micromachined membrane with locally compliant and stiff regions and method of making same'
[patent_app_type] => 1
[patent_app_number] => 9/084508
[patent_app_country] => US
[patent_app_date] => 1998-05-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 21
[patent_no_of_words] => 2776
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 134
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/168/06168906.pdf
[firstpage_image] =>[orig_patent_app_number] => 084508
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/084508 | Micromachined membrane with locally compliant and stiff regions and method of making same | May 25, 1998 | Issued |
Array
(
[id] => 1593684
[patent_doc_number] => 06383719
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-05-07
[patent_title] => 'Process for enhanced lithographic imaging'
[patent_app_type] => B1
[patent_app_number] => 09/081456
[patent_app_country] => US
[patent_app_date] => 1998-05-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
[patent_figures_cnt] => 36
[patent_no_of_words] => 4981
[patent_no_of_claims] => 75
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 66
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/383/06383719.pdf
[firstpage_image] =>[orig_patent_app_number] => 09081456
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/081456 | Process for enhanced lithographic imaging | May 18, 1998 | Issued |
Array
(
[id] => 7118395
[patent_doc_number] => 20010001702
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-05-24
[patent_title] => 'METHOD OF FABRICATING AN OPENING WITH DEEP ULTRA-VIOLET PHOTORESIST'
[patent_app_type] => new-utility
[patent_app_number] => 09/076243
[patent_app_country] => US
[patent_app_date] => 1998-05-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 1379
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 106
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0001/20010001702.pdf
[firstpage_image] =>[orig_patent_app_number] => 09076243
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/076243 | Method of fabricating an opening with deep ultra-violet photoresist | May 10, 1998 | Issued |
Array
(
[id] => 4180917
[patent_doc_number] => 06159661
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-12
[patent_title] => 'Dual damascene process'
[patent_app_type] => 1
[patent_app_number] => 9/073997
[patent_app_country] => US
[patent_app_date] => 1998-05-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 17
[patent_no_of_words] => 3062
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 323
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/159/06159661.pdf
[firstpage_image] =>[orig_patent_app_number] => 073997
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/073997 | Dual damascene process | May 6, 1998 | Issued |
Array
(
[id] => 4189071
[patent_doc_number] => 06042999
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-03-28
[patent_title] => 'Robust dual damascene process'
[patent_app_type] => 1
[patent_app_number] => 9/073952
[patent_app_country] => US
[patent_app_date] => 1998-05-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 24
[patent_no_of_words] => 4114
[patent_no_of_claims] => 41
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 293
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/042/06042999.pdf
[firstpage_image] =>[orig_patent_app_number] => 073952
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/073952 | Robust dual damascene process | May 6, 1998 | Issued |
Array
(
[id] => 4082281
[patent_doc_number] => 06162584
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-19
[patent_title] => 'Method of fabricating polysilicon structures with different resistance values for gate electrodes, resistors and capacitor plates in an integrated circuit'
[patent_app_type] => 1
[patent_app_number] => 9/073948
[patent_app_country] => US
[patent_app_date] => 1998-05-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 18
[patent_no_of_words] => 2915
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 197
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/162/06162584.pdf
[firstpage_image] =>[orig_patent_app_number] => 073948
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/073948 | Method of fabricating polysilicon structures with different resistance values for gate electrodes, resistors and capacitor plates in an integrated circuit | May 6, 1998 | Issued |
Array
(
[id] => 4233388
[patent_doc_number] => 06143474
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-11-07
[patent_title] => 'Method of fabricating polysilicon structures with different resistance values for gate electrodes, resistors, and capacitor plates'
[patent_app_type] => 1
[patent_app_number] => 9/073950
[patent_app_country] => US
[patent_app_date] => 1998-05-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 27
[patent_no_of_words] => 3605
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 282
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/143/06143474.pdf
[firstpage_image] =>[orig_patent_app_number] => 073950
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/073950 | Method of fabricating polysilicon structures with different resistance values for gate electrodes, resistors, and capacitor plates | May 6, 1998 | Issued |
Array
(
[id] => 4152311
[patent_doc_number] => 06103455
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-08-15
[patent_title] => 'Method to form a recess free deep contact'
[patent_app_type] => 1
[patent_app_number] => 9/073947
[patent_app_country] => US
[patent_app_date] => 1998-05-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 12
[patent_no_of_words] => 4159
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 218
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/103/06103455.pdf
[firstpage_image] =>[orig_patent_app_number] => 073947
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/073947 | Method to form a recess free deep contact | May 6, 1998 | Issued |
Array
(
[id] => 4291655
[patent_doc_number] => 06183937
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-02-06
[patent_title] => 'Post photodevelopment isotropic radiation treatment method for forming patterned photoresist layer with attenuated linewidth'
[patent_app_type] => 1
[patent_app_number] => 9/072997
[patent_app_country] => US
[patent_app_date] => 1998-05-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 9
[patent_no_of_words] => 5865
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 109
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/183/06183937.pdf
[firstpage_image] =>[orig_patent_app_number] => 072997
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/072997 | Post photodevelopment isotropic radiation treatment method for forming patterned photoresist layer with attenuated linewidth | May 5, 1998 | Issued |
Array
(
[id] => 4283614
[patent_doc_number] => 06210866
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-04-03
[patent_title] => 'Method for forming features using self-trimming by selective etch and device formed thereby'
[patent_app_type] => 1
[patent_app_number] => 9/072031
[patent_app_country] => US
[patent_app_date] => 1998-05-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 22
[patent_figures_cnt] => 33
[patent_no_of_words] => 8291
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 137
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/210/06210866.pdf
[firstpage_image] =>[orig_patent_app_number] => 072031
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/072031 | Method for forming features using self-trimming by selective etch and device formed thereby | May 3, 1998 | Issued |
Array
(
[id] => 4099675
[patent_doc_number] => 06100013
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-08-08
[patent_title] => 'Method for forming transistors with raised source and drains and device formed thereby'
[patent_app_type] => 1
[patent_app_number] => 9/071207
[patent_app_country] => US
[patent_app_date] => 1998-05-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 31
[patent_figures_cnt] => 40
[patent_no_of_words] => 11193
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 238
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/100/06100013.pdf
[firstpage_image] =>[orig_patent_app_number] => 071207
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/071207 | Method for forming transistors with raised source and drains and device formed thereby | Apr 30, 1998 | Issued |