Application number | Title of the application | Filing Date | Status |
---|
Array
(
[id] => 4243671
[patent_doc_number] => 06136513
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-10-24
[patent_title] => 'Method of uniformly depositing seed and a conductor and the resultant printed circuit structure'
[patent_app_type] => 1
[patent_app_number] => 9/065668
[patent_app_country] => US
[patent_app_date] => 1998-04-23
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Array
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[id] => 4418587
[patent_doc_number] => 06225029
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-01
[patent_title] => 'Plasma addressed liquid crystal display with organic-walled plasma channels'
[patent_app_type] => 1
[patent_app_number] => 9/061813
[patent_app_country] => US
[patent_app_date] => 1998-04-16
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Array
(
[id] => 4189021
[patent_doc_number] => 06042996
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-03-28
[patent_title] => 'Method of fabricating a dual damascene structure'
[patent_app_type] => 1
[patent_app_number] => 9/059071
[patent_app_country] => US
[patent_app_date] => 1998-04-13
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Array
(
[id] => 4406589
[patent_doc_number] => 06265137
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-24
[patent_title] => 'Exposure method and device producing method using the same'
[patent_app_type] => 1
[patent_app_number] => 9/055949
[patent_app_country] => US
[patent_app_date] => 1998-04-07
[patent_effective_date] => 0000-00-00
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Array
(
[id] => 4356351
[patent_doc_number] => 06255039
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-03
[patent_title] => 'Fabrication of high density multilayer interconnect printed circuit boards'
[patent_app_type] => 1
[patent_app_number] => 9/054264
[patent_app_country] => US
[patent_app_date] => 1998-04-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[firstpage_image] =>[orig_patent_app_number] => 054264
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/054264 | Fabrication of high density multilayer interconnect printed circuit boards | Apr 2, 1998 | Issued |
09/050032 | EXPOSURE METHOD | Mar 29, 1998 | Abandoned |
Array
(
[id] => 4217242
[patent_doc_number] => 06040119
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-03-21
[patent_title] => 'Elimination of proximity effect in photoresist'
[patent_app_type] => 1
[patent_app_number] => 9/049213
[patent_app_country] => US
[patent_app_date] => 1998-03-27
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[firstpage_image] =>[orig_patent_app_number] => 049213
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Array
(
[id] => 4150987
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[patent_kind] => NA
[patent_issue_date] => 2000-08-22
[patent_title] => 'Method for making a tubular stent for use in medical applications'
[patent_app_type] => 1
[patent_app_number] => 9/049244
[patent_app_country] => US
[patent_app_date] => 1998-03-27
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[pdf_file] => patents/06/107/06107004.pdf
[firstpage_image] =>[orig_patent_app_number] => 049244
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/049244 | Method for making a tubular stent for use in medical applications | Mar 26, 1998 | Issued |
Array
(
[id] => 3898832
[patent_doc_number] => RE036287
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-08-31
[patent_title] => 'Polyester film and lithographic plate'
[patent_app_type] => 2
[patent_app_number] => 9/045204
[patent_app_country] => US
[patent_app_date] => 1998-03-20
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[pdf_file] => patents/RE/036/RE036287.pdf
[firstpage_image] =>[orig_patent_app_number] => 045204
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/045204 | Polyester film and lithographic plate | Mar 19, 1998 | Issued |
Array
(
[id] => 4082267
[patent_doc_number] => 06162583
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-19
[patent_title] => 'Method for making intermetal dielectrics (IMD) on semiconductor integrated circuits using low dielectric constant spin-on polymers'
[patent_app_type] => 1
[patent_app_number] => 9/044783
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 044783
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/044783 | Method for making intermetal dielectrics (IMD) on semiconductor integrated circuits using low dielectric constant spin-on polymers | Mar 19, 1998 | Issued |
Array
(
[id] => 4236609
[patent_doc_number] => 06080533
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-06-27
[patent_title] => 'Method of patterning photoresist using precision and non-precision techniques'
[patent_app_type] => 1
[patent_app_number] => 9/038216
[patent_app_country] => US
[patent_app_date] => 1998-03-10
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[firstpage_image] =>[orig_patent_app_number] => 038216
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/038216 | Method of patterning photoresist using precision and non-precision techniques | Mar 9, 1998 | Issued |
09/035050 | SIMPLE PHOTO DEVELOPMENT STEP TO FORM TISIX GATE IN DRAM PROCESS | Mar 4, 1998 | Abandoned |
09/029299 | METHOD FOR THE MANUFACTURE OF LASERS WITH TAPERED GUIDE REGION | Mar 3, 1998 | Abandoned |
Array
(
[id] => 4179981
[patent_doc_number] => 06150074
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-11-21
[patent_title] => 'Method of forming electrically conductive wiring pattern'
[patent_app_type] => 1
[patent_app_number] => 9/033356
[patent_app_country] => US
[patent_app_date] => 1998-03-02
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/150/06150074.pdf
[firstpage_image] =>[orig_patent_app_number] => 033356
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/033356 | Method of forming electrically conductive wiring pattern | Mar 1, 1998 | Issued |
Array
(
[id] => 4363820
[patent_doc_number] => 06274292
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-08-14
[patent_title] => 'Semiconductor processing methods'
[patent_app_type] => 1
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[patent_app_country] => US
[patent_app_date] => 1998-02-25
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[firstpage_image] =>[orig_patent_app_number] => 030618
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Array
(
[id] => 4099701
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[patent_kind] => NA
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[patent_app_type] => 1
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[firstpage_image] =>[orig_patent_app_number] => 027736
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/027736 | Resist pattern forming method | Feb 22, 1998 | Issued |
Array
(
[id] => 4096302
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[patent_kind] => NA
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Array
(
[id] => 4345562
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[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-04-10
[patent_title] => 'Semiconductor processing using antireflective layer having high wet etch rate'
[patent_app_type] => 1
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[patent_app_country] => US
[patent_app_date] => 1998-02-17
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/024929 | Semiconductor processing using antireflective layer having high wet etch rate | Feb 16, 1998 | Issued |
Array
(
[id] => 4232727
[patent_doc_number] => 06165694
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-26
[patent_title] => 'Method for preventing the formation of recesses in borophosphosilicate glass'
[patent_app_type] => 1
[patent_app_number] => 9/023235
[patent_app_country] => US
[patent_app_date] => 1998-02-13
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 023235
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/023235 | Method for preventing the formation of recesses in borophosphosilicate glass | Feb 12, 1998 | Issued |
09/023484 | MANUFACTURE OF SEMICONDUCTOR DEVICE USING A-C ANTI-REFLECTION COATING | Feb 12, 1998 | Abandoned |