Kurt C Rowan
Examiner (ID: 13691)
Most Active Art Unit | 3205 |
Art Unit(s) | 3643, 3616, 2899, 3205, 2761 |
Total Applications | 2630 |
Issued Applications | 1958 |
Pending Applications | 87 |
Abandoned Applications | 584 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 4356323
[patent_doc_number] => 06255037
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-03
[patent_title] => 'Method for producing monolithic electronic parts'
[patent_app_type] => 1
[patent_app_number] => 8/842432
[patent_app_country] => US
[patent_app_date] => 1997-04-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/255/06255037.pdf
[firstpage_image] =>[orig_patent_app_number] => 842432
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/842432 | Method for producing monolithic electronic parts | Apr 23, 1997 | Issued |
Array
(
[id] => 3837197
[patent_doc_number] => 05744284
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-04-28
[patent_title] => 'Method for fabricating resilient z-axis contacts for electrically interconnecting integrated circuits on a plurality of stacked carriers'
[patent_app_type] => 1
[patent_app_number] => 8/835627
[patent_app_country] => US
[patent_app_date] => 1997-04-09
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 835627
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/835627 | Method for fabricating resilient z-axis contacts for electrically interconnecting integrated circuits on a plurality of stacked carriers | Apr 8, 1997 | Issued |
Array
(
[id] => 3997374
[patent_doc_number] => 05858623
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-01-12
[patent_title] => 'Method for attenuating photoresist layer outgassing'
[patent_app_type] => 1
[patent_app_number] => 8/826712
[patent_app_country] => US
[patent_app_date] => 1997-04-07
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[patent_drawing_sheets_cnt] => 1
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[pdf_file] => patents/05/858/05858623.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/826712 | Method for attenuating photoresist layer outgassing | Apr 6, 1997 | Issued |
Array
(
[id] => 4020818
[patent_doc_number] => 05925502
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-07-20
[patent_title] => 'Method of metallizing a quartz resonator'
[patent_app_type] => 1
[patent_app_number] => 8/835062
[patent_app_country] => US
[patent_app_date] => 1997-04-03
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 835062
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/835062 | Method of metallizing a quartz resonator | Apr 2, 1997 | Issued |
Array
(
[id] => 4082703
[patent_doc_number] => 06025116
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-02-15
[patent_title] => 'Etching of contact holes'
[patent_app_type] => 1
[patent_app_number] => 8/829575
[patent_app_country] => US
[patent_app_date] => 1997-03-31
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[firstpage_image] =>[orig_patent_app_number] => 829575
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/829575 | Etching of contact holes | Mar 30, 1997 | Issued |
Array
(
[id] => 4018147
[patent_doc_number] => 05906911
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[patent_kind] => NA
[patent_issue_date] => 1999-05-25
[patent_title] => 'Process of forming a dual damascene structure in a single photoresist film'
[patent_app_type] => 1
[patent_app_number] => 8/828458
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[patent_app_date] => 1997-03-28
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[firstpage_image] =>[orig_patent_app_number] => 828458
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/828458 | Process of forming a dual damascene structure in a single photoresist film | Mar 27, 1997 | Issued |
Array
(
[id] => 3871200
[patent_doc_number] => 05824454
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-10-20
[patent_title] => 'Method of photolithographically metallizing at least the inside of holes arranged in accordance with a pattern in a plate of an electrically insulating material'
[patent_app_type] => 1
[patent_app_number] => 8/827335
[patent_app_country] => US
[patent_app_date] => 1997-03-26
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[pdf_file] => patents/05/824/05824454.pdf
[firstpage_image] =>[orig_patent_app_number] => 827335
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/827335 | Method of photolithographically metallizing at least the inside of holes arranged in accordance with a pattern in a plate of an electrically insulating material | Mar 25, 1997 | Issued |
Array
(
[id] => 3737010
[patent_doc_number] => 05753400
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-05-19
[patent_title] => 'Method for repeatedly using image holding member'
[patent_app_type] => 1
[patent_app_number] => 8/822702
[patent_app_country] => US
[patent_app_date] => 1997-03-21
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[pdf_file] => patents/05/753/05753400.pdf
[firstpage_image] =>[orig_patent_app_number] => 822702
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/822702 | Method for repeatedly using image holding member | Mar 20, 1997 | Issued |
Array
(
[id] => 4188963
[patent_doc_number] => 06042992
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-03-28
[patent_title] => 'Bottom antireflective coatings through refractive index modification by anomalous dispersion'
[patent_app_type] => 1
[patent_app_number] => 8/811806
[patent_app_country] => US
[patent_app_date] => 1997-03-06
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/811806 | Bottom antireflective coatings through refractive index modification by anomalous dispersion | Mar 5, 1997 | Issued |
Array
(
[id] => 3766017
[patent_doc_number] => 05849435
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-12-15
[patent_title] => 'Method for forming a thin uniform layer of resist for lithography'
[patent_app_type] => 1
[patent_app_number] => 8/811264
[patent_app_country] => US
[patent_app_date] => 1997-03-04
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/849/05849435.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/811264 | Method for forming a thin uniform layer of resist for lithography | Mar 3, 1997 | Issued |
Array
(
[id] => 3743317
[patent_doc_number] => 05716760
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-02-10
[patent_title] => 'Method for plating a substrate to eliminate the use of a solder mask'
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[patent_app_number] => 8/810272
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[patent_app_date] => 1997-03-03
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[pdf_file] => patents/05/716/05716760.pdf
[firstpage_image] =>[orig_patent_app_number] => 810272
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/810272 | Method for plating a substrate to eliminate the use of a solder mask | Mar 2, 1997 | Issued |
Array
(
[id] => 3985876
[patent_doc_number] => 05910390
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[patent_title] => 'Method for forming pattern'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/813945 | Method for forming pattern | Mar 2, 1997 | Issued |
Array
(
[id] => 4027077
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/805153 | Method of forming a resist pattern | Feb 23, 1997 | Issued |
Array
(
[id] => 4195284
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[patent_title] => 'Method for developing images in energy sensitive materials'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/799312 | Method for developing images in energy sensitive materials | Feb 13, 1997 | Issued |
Array
(
[id] => 4243628
[patent_doc_number] => 06136510
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[patent_issue_date] => 2000-10-24
[patent_title] => 'Doubled-sided wafer scrubbing for improved photolithography'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/800940 | Doubled-sided wafer scrubbing for improved photolithography | Feb 12, 1997 | Issued |
Array
(
[id] => 4026889
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[patent_issue_date] => 1999-05-11
[patent_title] => 'Method of fabricating semiconductor device using half-tone phase shift mask'
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Array
(
[id] => 3765968
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/795266 | Resist composition | Feb 9, 1997 | Issued |
Array
(
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Array
(
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Array
(
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[pdf_file] => patents/05/766/05766808.pdf
[firstpage_image] =>[orig_patent_app_number] => 792408
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/792408 | Process for forming multilayer lift-off structures | Jan 30, 1997 | Issued |