Kurt C Rowan
Examiner (ID: 13691)
Most Active Art Unit | 3205 |
Art Unit(s) | 3643, 3616, 2899, 3205, 2761 |
Total Applications | 2630 |
Issued Applications | 1958 |
Pending Applications | 87 |
Abandoned Applications | 584 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 3864876
[patent_doc_number] => 05837426
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-11-17
[patent_title] => 'Photolithographic process for mask programming of read-only memory devices'
[patent_app_type] => 1
[patent_app_number] => 8/712406
[patent_app_country] => US
[patent_app_date] => 1996-09-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 6
[patent_no_of_words] => 3163
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/837/05837426.pdf
[firstpage_image] =>[orig_patent_app_number] => 712406
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/712406 | Photolithographic process for mask programming of read-only memory devices | Sep 10, 1996 | Issued |
Array
(
[id] => 3766085
[patent_doc_number] => 05773199
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-30
[patent_title] => 'Method for controlling linewidth by etching bottom anti-reflective coating'
[patent_app_type] => 1
[patent_app_number] => 8/711142
[patent_app_country] => US
[patent_app_date] => 1996-09-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 7827
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[patent_maintenance] => 1
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[pdf_file] => patents/05/773/05773199.pdf
[firstpage_image] =>[orig_patent_app_number] => 711142
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/711142 | Method for controlling linewidth by etching bottom anti-reflective coating | Sep 8, 1996 | Issued |
Array
(
[id] => 4026875
[patent_doc_number] => 05902716
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-05-11
[patent_title] => 'Exposure method and apparatus'
[patent_app_type] => 1
[patent_app_number] => 8/708580
[patent_app_country] => US
[patent_app_date] => 1996-09-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
[patent_figures_cnt] => 38
[patent_no_of_words] => 8431
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[pdf_file] => patents/05/902/05902716.pdf
[firstpage_image] =>[orig_patent_app_number] => 708580
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/708580 | Exposure method and apparatus | Sep 4, 1996 | Issued |
Array
(
[id] => 3737291
[patent_doc_number] => 05753418
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-05-19
[patent_title] => '0.3 Micron aperture width patterning process'
[patent_app_type] => 1
[patent_app_number] => 8/706876
[patent_app_country] => US
[patent_app_date] => 1996-09-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 6178
[patent_no_of_claims] => 19
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[pdf_file] => patents/05/753/05753418.pdf
[firstpage_image] =>[orig_patent_app_number] => 706876
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/706876 | 0.3 Micron aperture width patterning process | Sep 2, 1996 | Issued |
Array
(
[id] => 3935765
[patent_doc_number] => 05871885
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-02-16
[patent_title] => 'Method for forming a magnetic pole by patterning a mask layer and a metal layer'
[patent_app_type] => 1
[patent_app_number] => 8/700891
[patent_app_country] => US
[patent_app_date] => 1996-08-21
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 2017
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[pdf_file] => patents/05/871/05871885.pdf
[firstpage_image] =>[orig_patent_app_number] => 700891
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/700891 | Method for forming a magnetic pole by patterning a mask layer and a metal layer | Aug 20, 1996 | Issued |
Array
(
[id] => 3946402
[patent_doc_number] => 05955244
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-09-21
[patent_title] => 'Method for forming photoresist features having reentrant profiles using a basic agent'
[patent_app_type] => 1
[patent_app_number] => 8/704471
[patent_app_country] => US
[patent_app_date] => 1996-08-20
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/955/05955244.pdf
[firstpage_image] =>[orig_patent_app_number] => 704471
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/704471 | Method for forming photoresist features having reentrant profiles using a basic agent | Aug 19, 1996 | Issued |
Array
(
[id] => 3997358
[patent_doc_number] => 05858622
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-01-12
[patent_title] => 'Thick metal integrated transmission line fabrication'
[patent_app_type] => 1
[patent_app_number] => 8/685149
[patent_app_country] => US
[patent_app_date] => 1996-07-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[pdf_file] => patents/05/858/05858622.pdf
[firstpage_image] =>[orig_patent_app_number] => 685149
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/685149 | Thick metal integrated transmission line fabrication | Jul 22, 1996 | Issued |
Array
(
[id] => 3756550
[patent_doc_number] => 05843625
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-12-01
[patent_title] => 'Method of reducing via and contact dimensions beyond photolithography equipment limits'
[patent_app_type] => 1
[patent_app_number] => 8/685144
[patent_app_country] => US
[patent_app_date] => 1996-07-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 4565
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[pdf_file] => patents/05/843/05843625.pdf
[firstpage_image] =>[orig_patent_app_number] => 685144
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/685144 | Method of reducing via and contact dimensions beyond photolithography equipment limits | Jul 22, 1996 | Issued |
Array
(
[id] => 3766049
[patent_doc_number] => 05773196
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-30
[patent_title] => 'Prevention of anti-reflection coating damage'
[patent_app_type] => 1
[patent_app_number] => 8/684806
[patent_app_country] => US
[patent_app_date] => 1996-07-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[pdf_file] => patents/05/773/05773196.pdf
[firstpage_image] =>[orig_patent_app_number] => 684806
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/684806 | Prevention of anti-reflection coating damage | Jul 21, 1996 | Issued |
Array
(
[id] => 3661915
[patent_doc_number] => 05667942
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-09-16
[patent_title] => 'Resist pattern forming method'
[patent_app_type] => 1
[patent_app_number] => 8/683525
[patent_app_country] => US
[patent_app_date] => 1996-07-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 1486
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[pdf_file] => patents/05/667/05667942.pdf
[firstpage_image] =>[orig_patent_app_number] => 683525
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/683525 | Resist pattern forming method | Jul 14, 1996 | Issued |
Array
(
[id] => 3941003
[patent_doc_number] => 05976769
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-02
[patent_title] => 'Intermediate layer lithography'
[patent_app_type] => 1
[patent_app_number] => 8/680340
[patent_app_country] => US
[patent_app_date] => 1996-07-12
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/976/05976769.pdf
[firstpage_image] =>[orig_patent_app_number] => 680340
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/680340 | Intermediate layer lithography | Jul 11, 1996 | Issued |
Array
(
[id] => 3935807
[patent_doc_number] => 05871888
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-02-16
[patent_title] => 'Method of forming multiple-layer microlenses and use thereof'
[patent_app_type] => 1
[patent_app_number] => 8/680201
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[patent_app_date] => 1996-07-11
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[pdf_file] => patents/05/871/05871888.pdf
[firstpage_image] =>[orig_patent_app_number] => 680201
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/680201 | Method of forming multiple-layer microlenses and use thereof | Jul 10, 1996 | Issued |
Array
(
[id] => 3883655
[patent_doc_number] => 05723262
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-03-03
[patent_title] => 'Resin composition'
[patent_app_type] => 1
[patent_app_number] => 8/680551
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[pdf_file] => patents/05/723/05723262.pdf
[firstpage_image] =>[orig_patent_app_number] => 680551
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/680551 | Resin composition | Jul 8, 1996 | Issued |
Array
(
[id] => 3723967
[patent_doc_number] => 05700626
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-23
[patent_title] => 'Method for forming multi-layer resist pattern'
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[pdf_file] => patents/05/700/05700626.pdf
[firstpage_image] =>[orig_patent_app_number] => 673476
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/673476 | Method for forming multi-layer resist pattern | Jun 30, 1996 | Issued |
Array
(
[id] => 3684851
[patent_doc_number] => 05695898
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-09
[patent_title] => 'Electrophotographic photosensitive member, electrophotographic apparatus and device unit having it'
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[patent_app_number] => 8/674197
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[firstpage_image] =>[orig_patent_app_number] => 674197
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/674197 | Electrophotographic photosensitive member, electrophotographic apparatus and device unit having it | Jun 30, 1996 | Issued |
Array
(
[id] => 3806277
[patent_doc_number] => 05811222
[patent_country] => US
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[patent_issue_date] => 1998-09-22
[patent_title] => 'Method of selectively exposing a material using a photosensitive layer and multiple image patterns'
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[pdf_file] => patents/05/811/05811222.pdf
[firstpage_image] =>[orig_patent_app_number] => 668688
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/668688 | Method of selectively exposing a material using a photosensitive layer and multiple image patterns | Jun 23, 1996 | Issued |
Array
(
[id] => 3756574
[patent_doc_number] => 05843627
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-12-01
[patent_title] => 'Method for forming fine patterns of semiconductor device'
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[patent_app_number] => 8/669618
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[firstpage_image] =>[orig_patent_app_number] => 669618
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/669618 | Method for forming fine patterns of semiconductor device | Jun 23, 1996 | Issued |
Array
(
[id] => 3892403
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[patent_title] => 'Image-forming process'
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[firstpage_image] =>[orig_patent_app_number] => 662309
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/662309 | Image-forming process | Jun 12, 1996 | Issued |
Array
(
[id] => 3994487
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[patent_issue_date] => 1999-07-13
[patent_title] => 'Method of preparing a substrate surface for conformal plating'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/662165 | Method of preparing a substrate surface for conformal plating | Jun 11, 1996 | Issued |
Array
(
[id] => 3680744
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[patent_kind] => NA
[patent_issue_date] => 1997-05-27
[patent_title] => 'Method for examining surface of copper layer in circuit board and process for producing circuit board'
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[pdf_file] => patents/05/633/05633121.pdf
[firstpage_image] =>[orig_patent_app_number] => 662299
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/662299 | Method for examining surface of copper layer in circuit board and process for producing circuit board | Jun 11, 1996 | Issued |