Kurt C Rowan
Examiner (ID: 13691)
Most Active Art Unit | 3205 |
Art Unit(s) | 3643, 3616, 2899, 3205, 2761 |
Total Applications | 2630 |
Issued Applications | 1958 |
Pending Applications | 87 |
Abandoned Applications | 584 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 3991279
[patent_doc_number] => 05919605
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-07-06
[patent_title] => 'Semiconductor substrate exposure method'
[patent_app_type] => 1
[patent_app_number] => 8/626238
[patent_app_country] => US
[patent_app_date] => 1996-03-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 11
[patent_no_of_words] => 4424
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 131
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/919/05919605.pdf
[firstpage_image] =>[orig_patent_app_number] => 626238
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/626238 | Semiconductor substrate exposure method | Mar 28, 1996 | Issued |
Array
(
[id] => 3757755
[patent_doc_number] => 05851734
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-12-22
[patent_title] => 'Process for defining resist patterns'
[patent_app_type] => 1
[patent_app_number] => 8/626666
[patent_app_country] => US
[patent_app_date] => 1996-03-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 7
[patent_no_of_words] => 1251
[patent_no_of_claims] => 12
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[patent_words_short_claim] => 88
[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/851/05851734.pdf
[firstpage_image] =>[orig_patent_app_number] => 626666
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/626666 | Process for defining resist patterns | Mar 25, 1996 | Issued |
Array
(
[id] => 3905907
[patent_doc_number] => 05897982
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-04-27
[patent_title] => 'Resist develop process having a post develop dispense step'
[patent_app_type] => 1
[patent_app_number] => 8/610981
[patent_app_country] => US
[patent_app_date] => 1996-03-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 14
[patent_no_of_words] => 2515
[patent_no_of_claims] => 21
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[patent_words_short_claim] => 94
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[pdf_file] => patents/05/897/05897982.pdf
[firstpage_image] =>[orig_patent_app_number] => 610981
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/610981 | Resist develop process having a post develop dispense step | Mar 4, 1996 | Issued |
Array
(
[id] => 3693151
[patent_doc_number] => 05660969
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-08-26
[patent_title] => 'Chemical amplification resist and a fabrication process of a semiconductor device that uses such a chemical amplification resist'
[patent_app_type] => 1
[patent_app_number] => 8/607250
[patent_app_country] => US
[patent_app_date] => 1996-03-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 4
[patent_no_of_words] => 3588
[patent_no_of_claims] => 10
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[pdf_file] => patents/05/660/05660969.pdf
[firstpage_image] =>[orig_patent_app_number] => 607250
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/607250 | Chemical amplification resist and a fabrication process of a semiconductor device that uses such a chemical amplification resist | Mar 3, 1996 | Issued |
Array
(
[id] => 3973335
[patent_doc_number] => 05916737
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-06-29
[patent_title] => 'Method for fabricating liquid crystal display device'
[patent_app_type] => 1
[patent_app_number] => 8/607652
[patent_app_country] => US
[patent_app_date] => 1996-02-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 1889
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[pdf_file] => patents/05/916/05916737.pdf
[firstpage_image] =>[orig_patent_app_number] => 607652
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/607652 | Method for fabricating liquid crystal display device | Feb 26, 1996 | Issued |
Array
(
[id] => 3930600
[patent_doc_number] => 05928839
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-07-27
[patent_title] => 'Method of forming a multilayer printed circuit board and product thereof'
[patent_app_type] => 1
[patent_app_number] => 8/604353
[patent_app_country] => US
[patent_app_date] => 1996-02-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_words] => 8064
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[pdf_file] => patents/05/928/05928839.pdf
[firstpage_image] =>[orig_patent_app_number] => 604353
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/604353 | Method of forming a multilayer printed circuit board and product thereof | Feb 20, 1996 | Issued |
Array
(
[id] => 3703871
[patent_doc_number] => 05654128
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-08-05
[patent_title] => 'Single resist layer lift-off process for forming patterned layers on a substrate'
[patent_app_type] => 1
[patent_app_number] => 8/601826
[patent_app_country] => US
[patent_app_date] => 1996-02-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 19
[patent_figures_cnt] => 26
[patent_no_of_words] => 4064
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[patent_no_of_ind_claims] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/654/05654128.pdf
[firstpage_image] =>[orig_patent_app_number] => 601826
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/601826 | Single resist layer lift-off process for forming patterned layers on a substrate | Feb 14, 1996 | Issued |
Array
(
[id] => 3623423
[patent_doc_number] => 05620818
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-04-15
[patent_title] => 'Photolithographic dose determination by diffraction of latent image grating'
[patent_app_type] => 1
[patent_app_number] => 8/600472
[patent_app_country] => US
[patent_app_date] => 1996-02-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 2173
[patent_no_of_claims] => 17
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/620/05620818.pdf
[firstpage_image] =>[orig_patent_app_number] => 600472
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/600472 | Photolithographic dose determination by diffraction of latent image grating | Feb 12, 1996 | Issued |
Array
(
[id] => 3758792
[patent_doc_number] => 05741624
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-04-21
[patent_title] => 'Method for reducing photolithographic steps in a semiconductor interconnect process'
[patent_app_type] => 1
[patent_app_number] => 8/600587
[patent_app_country] => US
[patent_app_date] => 1996-02-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[pdf_file] => patents/05/741/05741624.pdf
[firstpage_image] =>[orig_patent_app_number] => 600587
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/600587 | Method for reducing photolithographic steps in a semiconductor interconnect process | Feb 12, 1996 | Issued |
Array
(
[id] => 3827009
[patent_doc_number] => 05738977
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-04-14
[patent_title] => 'Method of photolithographically producing a copper pattern on a plate of an electrically insulating material'
[patent_app_type] => 1
[patent_app_number] => 8/796357
[patent_app_country] => US
[patent_app_date] => 1996-02-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[patent_no_of_words] => 4217
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/738/05738977.pdf
[firstpage_image] =>[orig_patent_app_number] => 796357
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/796357 | Method of photolithographically producing a copper pattern on a plate of an electrically insulating material | Feb 6, 1996 | Issued |
Array
(
[id] => 3882043
[patent_doc_number] => 05776663
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-07-07
[patent_title] => 'Method for electroplating a conductive layer on a substrate'
[patent_app_type] => 1
[patent_app_number] => 8/596026
[patent_app_country] => US
[patent_app_date] => 1996-02-06
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/776/05776663.pdf
[firstpage_image] =>[orig_patent_app_number] => 596026
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/596026 | Method for electroplating a conductive layer on a substrate | Feb 5, 1996 | Issued |
Array
(
[id] => 3857265
[patent_doc_number] => 05792596
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-08-11
[patent_title] => 'Pattern forming method'
[patent_app_type] => 1
[patent_app_number] => 8/595916
[patent_app_country] => US
[patent_app_date] => 1996-02-06
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[pdf_file] => patents/05/792/05792596.pdf
[firstpage_image] =>[orig_patent_app_number] => 595916
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/595916 | Pattern forming method | Feb 5, 1996 | Issued |
Array
(
[id] => 3691664
[patent_doc_number] => 05679499
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-10-21
[patent_title] => 'Method for forming photo mask for use in fabricating semiconductor device'
[patent_app_type] => 1
[patent_app_number] => 8/596747
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[firstpage_image] =>[orig_patent_app_number] => 596747
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/596747 | Method for forming photo mask for use in fabricating semiconductor device | Feb 4, 1996 | Issued |
Array
(
[id] => 3880400
[patent_doc_number] => 05798203
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-08-25
[patent_title] => 'Method of making a negative photoresist image'
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[patent_app_number] => 8/595846
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[pdf_file] => patents/05/798/05798203.pdf
[firstpage_image] =>[orig_patent_app_number] => 595846
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/595846 | Method of making a negative photoresist image | Feb 1, 1996 | Issued |
Array
(
[id] => 3923591
[patent_doc_number] => 05876901
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-03-02
[patent_title] => 'Method for fabricating semiconductor device'
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[patent_app_number] => 8/592966
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[pdf_file] => patents/05/876/05876901.pdf
[firstpage_image] =>[orig_patent_app_number] => 592966
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/592966 | Method for fabricating semiconductor device | Jan 28, 1996 | Issued |
Array
(
[id] => 3728507
[patent_doc_number] => 05693454
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-02
[patent_title] => 'Two-sided photoetching process for needle fabrication'
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[pdf_file] => patents/05/693/05693454.pdf
[firstpage_image] =>[orig_patent_app_number] => 590657
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/590657 | Two-sided photoetching process for needle fabrication | Jan 23, 1996 | Issued |
Array
(
[id] => 3725297
[patent_doc_number] => 05670298
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-09-23
[patent_title] => 'Method of forming a metal pattern in manufacturing a semiconductor device'
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[pdf_file] => patents/05/670/05670298.pdf
[firstpage_image] =>[orig_patent_app_number] => 583766
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/583766 | Method of forming a metal pattern in manufacturing a semiconductor device | Jan 10, 1996 | Issued |
Array
(
[id] => 3823751
[patent_doc_number] => 05783342
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[patent_kind] => NA
[patent_issue_date] => 1998-07-21
[patent_title] => 'Method and system for measurement of resist pattern'
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[firstpage_image] =>[orig_patent_app_number] => 579355
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/579355 | Method and system for measurement of resist pattern | Dec 26, 1995 | Issued |
Array
(
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[firstpage_image] =>[orig_patent_app_number] => 575446
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Array
(
[id] => 3823948
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[pdf_file] => patents/05/759/05759745.pdf
[firstpage_image] =>[orig_patent_app_number] => 567758
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/567758 | Method of using amorphous silicon as a photoresist | Dec 4, 1995 | Issued |