
Lalrinfamkim Hmar Malsawma
Examiner (ID: 5479)
| Most Active Art Unit | 2892 |
| Art Unit(s) | 2825, 2892, 2823 |
| Total Applications | 2001 |
| Issued Applications | 1735 |
| Pending Applications | 112 |
| Abandoned Applications | 179 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1299686
[patent_doc_number] => 06624047
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[patent_issue_date] => 2003-09-23
[patent_title] => 'Substrate and method of manufacturing the same'
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[patent_app_number] => 09/496130
[patent_app_country] => US
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[pdf_file] => patents/06/624/06624047.pdf
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Array
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[patent_issue_date] => 2001-09-18
[patent_title] => 'Method of fabricating gate structure to reduce stress production'
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Array
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[patent_issue_date] => 2002-07-02
[patent_title] => 'Method to resolve the passivation surface roughness during formation of the AlCu pad for the copper process'
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[patent_app_number] => 09/489971
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Array
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[patent_issue_date] => 2001-08-21
[patent_title] => 'Two-level silane nucleation for blanket tungsten deposition'
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Array
(
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[patent_issue_date] => 2001-11-20
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Array
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Array
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Array
(
[id] => 4376968
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[patent_issue_date] => 2001-10-16
[patent_title] => 'Method for preparing gallium nitride phosphor'
[patent_app_type] => 1
[patent_app_number] => 9/472011
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/472011 | Method for preparing gallium nitride phosphor | Dec 26, 1999 | Issued |
Array
(
[id] => 4313184
[patent_doc_number] => 06242361
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[patent_issue_date] => 2001-06-05
[patent_title] => 'Plasma treatment to improve DUV photoresist process'
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Array
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[patent_issue_date] => 2001-04-10
[patent_title] => 'Method to fabricate a sub-quarter-micron MOSFET with lightly doped source/drain regions'
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[patent_app_number] => 9/460111
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Array
(
[id] => 4331832
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[patent_title] => 'Ultra-shallow junction dopant layer having a peak concentration within a dielectric layer'
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Array
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Array
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Array
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Array
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Array
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Array
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