
Lan Vinh
Examiner (ID: 7200)
| Most Active Art Unit | 1713 |
| Art Unit(s) | 1765, 1713, 1792 |
| Total Applications | 1662 |
| Issued Applications | 1401 |
| Pending Applications | 46 |
| Abandoned Applications | 218 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4629326
[patent_doc_number] => 08008212
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[patent_issue_date] => 2011-08-30
[patent_title] => 'Fabrication methods for integration CMOS and BJT devices'
[patent_app_type] => utility
[patent_app_number] => 12/323404
[patent_app_country] => US
[patent_app_date] => 2008-11-25
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[pdf_file] => patents/08/008/08008212.pdf
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Array
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[patent_doc_number] => 20090061562
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[patent_kind] => A1
[patent_issue_date] => 2009-03-05
[patent_title] => 'METHOD OF FABRICATING MICROELECTROMECHANICAL SYSTEMS DEVICES'
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[patent_app_date] => 2008-11-11
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Array
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[patent_issue_date] => 2010-04-22
[patent_title] => 'ETCHING HIGH-K MATERIALS'
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[patent_app_date] => 2008-10-20
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/254652 | Etching high-k materials | Oct 19, 2008 | Issued |
Array
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[patent_doc_number] => 08043515
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[patent_kind] => B2
[patent_issue_date] => 2011-10-25
[patent_title] => 'Thin film magnetic head and manufacturing method thereof'
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[patent_app_date] => 2008-10-16
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/252411 | Thin film magnetic head and manufacturing method thereof | Oct 15, 2008 | Issued |
Array
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[id] => 6488391
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[patent_issue_date] => 2010-04-15
[patent_title] => 'Chemical Mechanical Polish Process Control for Improvement in Within-Wafer Thickness Uniformity'
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[patent_app_number] => 12/250239
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[patent_app_date] => 2008-10-13
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Array
(
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[patent_doc_number] => 20090104782
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[patent_kind] => A1
[patent_issue_date] => 2009-04-23
[patent_title] => 'SELECTIVE ETCHING OF SILICON NITRIDE'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/247059 | Selective etching of silicon nitride | Oct 6, 2008 | Issued |
Array
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[patent_title] => 'PATTERNED ELECTRODES WITH REDUCED RESIDUE'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/246643 | PATTERNED ELECTRODES WITH REDUCED RESIDUE | Oct 6, 2008 | Abandoned |
Array
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[id] => 6356995
[patent_doc_number] => 20100087066
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[patent_issue_date] => 2010-04-08
[patent_title] => 'Selective Chemical Etch Method for MRAM Freelayers'
[patent_app_type] => utility
[patent_app_number] => 12/245255
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[patent_app_date] => 2008-10-03
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/245255 | Selective chemical etch method for MRAM freelayers | Oct 2, 2008 | Issued |
Array
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[id] => 9468287
[patent_doc_number] => 08721917
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[patent_issue_date] => 2014-05-13
[patent_title] => 'Polishing of sapphire with composite slurries'
[patent_app_type] => utility
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Array
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[patent_doc_number] => 08758637
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[patent_issue_date] => 2014-06-24
[patent_title] => 'Apparatus and method of removing coating of line-shaped body using plasma'
[patent_app_type] => utility
[patent_app_number] => 12/242025
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[patent_app_date] => 2008-09-30
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/242025 | Apparatus and method of removing coating of line-shaped body using plasma | Sep 29, 2008 | Issued |
Array
(
[id] => 6356624
[patent_doc_number] => 20100078407
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[patent_issue_date] => 2010-04-01
[patent_title] => 'LIQUID DROP EJECTOR HAVING SELF-ALIGNED HOLE'
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Array
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[id] => 7554992
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Array
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[id] => 5330724
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[patent_title] => 'Ridge and mesa optical waveguides'
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Array
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Array
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Array
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Array
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