Search

Lan Vinh

Examiner (ID: 2362, Phone: (571)272-1471 , Office: P/1713 )

Most Active Art Unit
1713
Art Unit(s)
1765, 1792, 1713
Total Applications
1662
Issued Applications
1401
Pending Applications
46
Abandoned Applications
218

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1071896 [patent_doc_number] => 06841480 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-01-11 [patent_title] => 'Polyelectrolyte dispensing polishing pad, production thereof and method of polishing a substrate' [patent_app_type] => utility [patent_app_number] => 10/067587 [patent_app_country] => US [patent_app_date] => 2002-02-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 6 [patent_no_of_words] => 12913 [patent_no_of_claims] => 75 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 138 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/841/06841480.pdf [firstpage_image] =>[orig_patent_app_number] => 10067587 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/067587
Polyelectrolyte dispensing polishing pad, production thereof and method of polishing a substrate Feb 3, 2002 Issued
Array ( [id] => 5859357 [patent_doc_number] => 20020123225 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-09-05 [patent_title] => 'Control of Vmin transient voltage drift by using a PECVD silicon oxynitride film at the protective overcoat level' [patent_app_type] => new [patent_app_number] => 10/061560 [patent_app_country] => US [patent_app_date] => 2002-02-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 1564 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 31 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0123/20020123225.pdf [firstpage_image] =>[orig_patent_app_number] => 10061560 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/061560
Control of Vmin transient voltage drift by using a PECVD silicon oxynitride film at the protective overcoat level Jan 31, 2002 Abandoned
Array ( [id] => 6792182 [patent_doc_number] => 20030087526 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-05-08 [patent_title] => 'Method of etching a mask layer and a protecting layer for metal contact windows' [patent_app_type] => new [patent_app_number] => 10/053160 [patent_app_country] => US [patent_app_date] => 2002-01-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 1192 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 94 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0087/20030087526.pdf [firstpage_image] =>[orig_patent_app_number] => 10053160 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/053160
Method of etching a mask layer and a protecting layer for metal contact windows Jan 14, 2002 Issued
Array ( [id] => 6412561 [patent_doc_number] => 20020125206 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-09-12 [patent_title] => 'Method for manufacturing a semiconductor device' [patent_app_type] => new [patent_app_number] => 10/043180 [patent_app_country] => US [patent_app_date] => 2002-01-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 4104 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 43 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0125/20020125206.pdf [firstpage_image] =>[orig_patent_app_number] => 10043180 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/043180
Method for manufacturing a semiconductor device Jan 13, 2002 Abandoned
Array ( [id] => 6414587 [patent_doc_number] => 20020125461 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-09-12 [patent_title] => 'Ammonium oxalate-containing polishing system and method' [patent_app_type] => new [patent_app_number] => 10/043534 [patent_app_country] => US [patent_app_date] => 2002-01-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3146 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 29 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0125/20020125461.pdf [firstpage_image] =>[orig_patent_app_number] => 10043534 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/043534
Ammonium oxalate-containing polishing system and method Jan 9, 2002 Abandoned
Array ( [id] => 6783156 [patent_doc_number] => 20030064603 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-04-03 [patent_title] => 'Manufacture method for semiconductor device having silicon-containing insulating film' [patent_app_type] => new [patent_app_number] => 10/040378 [patent_app_country] => US [patent_app_date] => 2002-01-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 5850 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0064/20030064603.pdf [firstpage_image] =>[orig_patent_app_number] => 10040378 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/040378
Manufacture method for semiconductor device having silicon-containing insulating film Jan 8, 2002 Issued
Array ( [id] => 1089206 [patent_doc_number] => 06828241 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-12-07 [patent_title] => 'Efficient cleaning by secondary in-situ activation of etch precursor from remote plasma source' [patent_app_type] => B2 [patent_app_number] => 10/041838 [patent_app_country] => US [patent_app_date] => 2002-01-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 5232 [patent_no_of_claims] => 56 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/828/06828241.pdf [firstpage_image] =>[orig_patent_app_number] => 10041838 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/041838
Efficient cleaning by secondary in-situ activation of etch precursor from remote plasma source Jan 6, 2002 Issued
Array ( [id] => 1216550 [patent_doc_number] => 06706639 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-03-16 [patent_title] => 'Method for interconnecting magnetoresistive memory bits' [patent_app_type] => B2 [patent_app_number] => 10/034483 [patent_app_country] => US [patent_app_date] => 2001-12-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 10 [patent_no_of_words] => 2928 [patent_no_of_claims] => 58 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 166 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/706/06706639.pdf [firstpage_image] =>[orig_patent_app_number] => 10034483 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/034483
Method for interconnecting magnetoresistive memory bits Dec 27, 2001 Issued
Array ( [id] => 6081252 [patent_doc_number] => 20020081849 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-06-27 [patent_title] => 'Chemical mechanical polishing compositions for CMP removal of iridium thin films' [patent_app_type] => new [patent_app_number] => 10/034764 [patent_app_country] => US [patent_app_date] => 2001-12-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 5012 [patent_no_of_claims] => 43 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 11 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0081/20020081849.pdf [firstpage_image] =>[orig_patent_app_number] => 10034764 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/034764
Chemical mechanical polishing compositions for CMP removal of iridium thin films Dec 27, 2001 Issued
Array ( [id] => 1138466 [patent_doc_number] => 06780776 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-08-24 [patent_title] => 'Nitride offset spacer to minimize silicon recess by using poly reoxidation layer as etch stop layer' [patent_app_type] => B1 [patent_app_number] => 10/023328 [patent_app_country] => US [patent_app_date] => 2001-12-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 9 [patent_no_of_words] => 2662 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 90 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/780/06780776.pdf [firstpage_image] =>[orig_patent_app_number] => 10023328 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/023328
Nitride offset spacer to minimize silicon recess by using poly reoxidation layer as etch stop layer Dec 19, 2001 Issued
Array ( [id] => 1303991 [patent_doc_number] => 06616854 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-09-09 [patent_title] => 'Method of bonding and transferring a material to form a semiconductor device' [patent_app_type] => B2 [patent_app_number] => 10/022711 [patent_app_country] => US [patent_app_date] => 2001-12-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 11 [patent_no_of_words] => 3938 [patent_no_of_claims] => 29 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 93 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/616/06616854.pdf [firstpage_image] =>[orig_patent_app_number] => 10022711 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/022711
Method of bonding and transferring a material to form a semiconductor device Dec 16, 2001 Issued
Array ( [id] => 1014628 [patent_doc_number] => 06893970 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-05-17 [patent_title] => 'Plasma processing method' [patent_app_type] => utility [patent_app_number] => 10/015446 [patent_app_country] => US [patent_app_date] => 2001-12-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 8 [patent_no_of_words] => 4317 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 25 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/893/06893970.pdf [firstpage_image] =>[orig_patent_app_number] => 10015446 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/015446
Plasma processing method Dec 11, 2001 Issued
Array ( [id] => 6379252 [patent_doc_number] => 20020119667 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-08-29 [patent_title] => 'Dry etching method' [patent_app_type] => new [patent_app_number] => 10/006718 [patent_app_country] => US [patent_app_date] => 2001-12-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 6319 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0119/20020119667.pdf [firstpage_image] =>[orig_patent_app_number] => 10006718 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/006718
Dry etching method Dec 9, 2001 Issued
Array ( [id] => 6874567 [patent_doc_number] => 20030194864 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-10-16 [patent_title] => 'Use of a U-groove as an alternative to using a V-groove for protecting silicon against dicing induced damage' [patent_app_type] => new [patent_app_number] => 09/996681 [patent_app_country] => US [patent_app_date] => 2001-11-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 2667 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 71 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0194/20030194864.pdf [firstpage_image] =>[orig_patent_app_number] => 09996681 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/996681
Use of a U-groove as an alternative to using a V-groove for protection against dicing induced damage in silicon Nov 29, 2001 Issued
Array ( [id] => 5986507 [patent_doc_number] => 20020098701 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-07-25 [patent_title] => 'Polishing method' [patent_app_type] => new [patent_app_number] => 09/995613 [patent_app_country] => US [patent_app_date] => 2001-11-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 9638 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0098/20020098701.pdf [firstpage_image] =>[orig_patent_app_number] => 09995613 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/995613
Polishing method Nov 28, 2001 Issued
Array ( [id] => 6081270 [patent_doc_number] => 20020081857 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-06-27 [patent_title] => 'Etching method for ZnSe polycrystalline substrate' [patent_app_type] => new [patent_app_number] => 09/993223 [patent_app_country] => US [patent_app_date] => 2001-11-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 2168 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 25 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0081/20020081857.pdf [firstpage_image] =>[orig_patent_app_number] => 09993223 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/993223
Etching method for ZnSe polycrystalline substrate Nov 25, 2001 Issued
Array ( [id] => 6122607 [patent_doc_number] => 20020074314 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-06-20 [patent_title] => 'Metal-assisted chemical etch to produce porous group III-V materials' [patent_app_type] => new [patent_app_number] => 09/989050 [patent_app_country] => US [patent_app_date] => 2001-11-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3485 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 50 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0074/20020074314.pdf [firstpage_image] =>[orig_patent_app_number] => 09989050 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/989050
Metal-assisted chemical etch to produce porous group III-V materials Nov 19, 2001 Issued
Array ( [id] => 1278014 [patent_doc_number] => 06645862 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-11-11 [patent_title] => 'Double-side polishing process with reduced scratch rate and device for carrying out the process' [patent_app_type] => B2 [patent_app_number] => 09/989550 [patent_app_country] => US [patent_app_date] => 2001-11-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 5014 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 155 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/645/06645862.pdf [firstpage_image] =>[orig_patent_app_number] => 09989550 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/989550
Double-side polishing process with reduced scratch rate and device for carrying out the process Nov 19, 2001 Issued
Array ( [id] => 1111083 [patent_doc_number] => 06806199 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-10-19 [patent_title] => 'Method for manufacturing silicon mirror wafer, silicon mirror wafer, and heat treatment furnace' [patent_app_type] => B2 [patent_app_number] => 09/979084 [patent_app_country] => US [patent_app_date] => 2001-11-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 5672 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 105 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/806/06806199.pdf [firstpage_image] =>[orig_patent_app_number] => 09979084 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/979084
Method for manufacturing silicon mirror wafer, silicon mirror wafer, and heat treatment furnace Nov 15, 2001 Issued
Array ( [id] => 6735679 [patent_doc_number] => 20030013314 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-01-16 [patent_title] => 'Method of reducing particulates in a plasma etch chamber during a metal etch process' [patent_app_type] => new [patent_app_number] => 09/991166 [patent_app_country] => US [patent_app_date] => 2001-11-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 8281 [patent_no_of_claims] => 60 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 69 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0013/20030013314.pdf [firstpage_image] =>[orig_patent_app_number] => 09991166 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/991166
Method of reducing particulates in a plasma etch chamber during a metal etch process Nov 15, 2001 Abandoned
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