
Lan Vinh
Examiner (ID: 2362, Phone: (571)272-1471 , Office: P/1713 )
| Most Active Art Unit | 1713 |
| Art Unit(s) | 1765, 1792, 1713 |
| Total Applications | 1662 |
| Issued Applications | 1401 |
| Pending Applications | 46 |
| Abandoned Applications | 218 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6861268
[patent_doc_number] => 20030092276
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-15
[patent_title] => 'Method for etching a silicided poly using fluorine-based reactive ion etching and sodium hydroxide based solution immersion'
[patent_app_type] => new
[patent_app_number] => 10/012297
[patent_app_country] => US
[patent_app_date] => 2001-11-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0092/20030092276.pdf
[firstpage_image] =>[orig_patent_app_number] => 10012297
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/012297 | Method for etching a silicided poly using fluorine-based reactive ion etching and sodium hydroxide based solution immersion | Nov 12, 2001 | Issued |
Array
(
[id] => 6861264
[patent_doc_number] => 20030092272
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-15
[patent_title] => 'Method of stabilizing oxide etch and chamber performance using seasoning'
[patent_app_type] => new
[patent_app_number] => 09/682978
[patent_app_country] => US
[patent_app_date] => 2001-11-05
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0092/20030092272.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/682978 | Method of stabilizing oxide etch and chamber performance using seasoning | Nov 4, 2001 | Issued |
Array
(
[id] => 5787488
[patent_doc_number] => 20020160613
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-10-31
[patent_title] => 'Method of manufacturing semiconductor device'
[patent_app_type] => new
[patent_app_number] => 09/984144
[patent_app_country] => US
[patent_app_date] => 2001-10-29
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/984144 | Method of manufacturing semiconductor device | Oct 28, 2001 | Issued |
Array
(
[id] => 6631336
[patent_doc_number] => 20020086544
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-07-04
[patent_title] => 'Laser machining of semiconductor materials'
[patent_app_type] => new
[patent_app_number] => 09/983991
[patent_app_country] => US
[patent_app_date] => 2001-10-26
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/983991 | Laser machining of semiconductor materials | Oct 25, 2001 | Issued |
Array
(
[id] => 7317979
[patent_doc_number] => 20040224523
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[patent_kind] => A1
[patent_issue_date] => 2004-11-11
[patent_title] => 'METHOD OF FABRICATING ANTI-STICTION MICROMACHINED STRUCTURES'
[patent_app_type] => new
[patent_app_number] => 09/976316
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[patent_app_date] => 2001-10-15
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0224/20040224523.pdf
[firstpage_image] =>[orig_patent_app_number] => 09976316
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/976316 | Method of fabricating anti-stiction micromachined structures | Oct 14, 2001 | Issued |
Array
(
[id] => 1261555
[patent_doc_number] => 06664195
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-12-16
[patent_title] => 'Method for forming damascene metal gate'
[patent_app_type] => B2
[patent_app_number] => 09/974811
[patent_app_country] => US
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Array
(
[id] => 6774370
[patent_doc_number] => 20030017708
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[patent_issue_date] => 2003-01-23
[patent_title] => 'Plasma etching gas'
[patent_app_type] => new
[patent_app_number] => 09/974582
[patent_app_country] => US
[patent_app_date] => 2001-10-09
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 09974582
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/974582 | Plasma etching gas | Oct 8, 2001 | Abandoned |
Array
(
[id] => 6595502
[patent_doc_number] => 20020042202
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[patent_kind] => A1
[patent_issue_date] => 2002-04-11
[patent_title] => 'Semiconductor device and method for forming contact holes in a semiconductor device'
[patent_app_type] => new
[patent_app_number] => 09/969991
[patent_app_country] => US
[patent_app_date] => 2001-10-04
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[pdf_file] => publications/A1/0042/20020042202.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/969991 | Semiconductor device and method for forming contact holes in a semiconductor device | Oct 3, 2001 | Issued |
Array
(
[id] => 6306882
[patent_doc_number] => 20020094692
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[patent_issue_date] => 2002-07-18
[patent_title] => 'Method for carrying out a plasma etching process'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/969178 | Method for carrying out a plasma etching process | Oct 1, 2001 | Abandoned |
Array
(
[id] => 6552535
[patent_doc_number] => 20020083961
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[patent_kind] => A1
[patent_issue_date] => 2002-07-04
[patent_title] => 'Method and apparatus for cleaning semiconductor wafer'
[patent_app_type] => new
[patent_app_number] => 09/969467
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/969467 | Method and apparatus for cleaning semiconductor wafer | Oct 1, 2001 | Abandoned |
Array
(
[id] => 6081268
[patent_doc_number] => 20020081855
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[patent_issue_date] => 2002-06-27
[patent_title] => 'In-situ plasma ash/treatment after via etch of low-k films for poison-free dual damascene trench patterning'
[patent_app_type] => new
[patent_app_number] => 09/966605
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Array
(
[id] => 6063560
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[patent_title] => 'Plasma etching methods'
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Array
(
[id] => 7631353
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[patent_title] => 'Operating method of a semiconductor etcher'
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Array
(
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Array
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Array
(
[id] => 1096161
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[patent_title] => 'In-situ method for producing a hydrogen terminated hydrophobic surface on a silicon wafer'
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Array
(
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Array
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Array
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Array
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