
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 3685150
[patent_doc_number] => 05643697
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-07-01
[patent_title] => 'Process for manufacturing a shadow mask made of an iron/nickel alloy'
[patent_app_type] => 1
[patent_app_number] => 8/577768
[patent_app_country] => US
[patent_app_date] => 1995-12-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2541
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 177
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/643/05643697.pdf
[firstpage_image] =>[orig_patent_app_number] => 577768
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/577768 | Process for manufacturing a shadow mask made of an iron/nickel alloy | Dec 21, 1995 | Issued |
| 08/576615 | METHOD AND APPARATUS FOR PRECISION DETERMINATION OF PHASE-SHIFT IN A PHASE-SHIFTED RETICLE | Dec 20, 1995 | Abandoned |
Array
(
[id] => 3693145
[patent_doc_number] => 05618643
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-04-08
[patent_title] => 'Embedded phase shifting mask with improved relative attenuated film transmission'
[patent_app_type] => 1
[patent_app_number] => 8/573526
[patent_app_country] => US
[patent_app_date] => 1995-12-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 12
[patent_no_of_words] => 5588
[patent_no_of_claims] => 19
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[patent_words_short_claim] => 97
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/618/05618643.pdf
[firstpage_image] =>[orig_patent_app_number] => 573526
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/573526 | Embedded phase shifting mask with improved relative attenuated film transmission | Dec 14, 1995 | Issued |
Array
(
[id] => 3766919
[patent_doc_number] => 05733688
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-03-31
[patent_title] => 'Lithographic mask structure and method of producing the same comprising W and molybdenum alloy absorber'
[patent_app_type] => 1
[patent_app_number] => 8/570686
[patent_app_country] => US
[patent_app_date] => 1995-12-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 10
[patent_no_of_words] => 5640
[patent_no_of_claims] => 10
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/733/05733688.pdf
[firstpage_image] =>[orig_patent_app_number] => 570686
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/570686 | Lithographic mask structure and method of producing the same comprising W and molybdenum alloy absorber | Dec 10, 1995 | Issued |
Array
(
[id] => 3692613
[patent_doc_number] => 05650250
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-07-22
[patent_title] => 'Light exposure mask for semiconductor devices'
[patent_app_type] => 1
[patent_app_number] => 8/569508
[patent_app_country] => US
[patent_app_date] => 1995-12-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 8
[patent_no_of_words] => 1888
[patent_no_of_claims] => 2
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[patent_words_short_claim] => 144
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/650/05650250.pdf
[firstpage_image] =>[orig_patent_app_number] => 569508
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/569508 | Light exposure mask for semiconductor devices | Dec 7, 1995 | Issued |
Array
(
[id] => 3550939
[patent_doc_number] => 05573875
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-11-12
[patent_title] => 'Laser ablation mask and method of fabrication'
[patent_app_type] => 1
[patent_app_number] => 8/569321
[patent_app_country] => US
[patent_app_date] => 1995-12-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 3
[patent_no_of_words] => 1276
[patent_no_of_claims] => 25
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[pdf_file] => patents/05/573/05573875.pdf
[firstpage_image] =>[orig_patent_app_number] => 569321
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/569321 | Laser ablation mask and method of fabrication | Dec 7, 1995 | Issued |
Array
(
[id] => 3684827
[patent_doc_number] => 05695896
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-09
[patent_title] => 'Process for fabricating a phase shifting mask'
[patent_app_type] => 1
[patent_app_number] => 8/566857
[patent_app_country] => US
[patent_app_date] => 1995-12-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_words] => 1882
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[pdf_file] => patents/05/695/05695896.pdf
[firstpage_image] =>[orig_patent_app_number] => 566857
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/566857 | Process for fabricating a phase shifting mask | Dec 3, 1995 | Issued |
Array
(
[id] => 3625100
[patent_doc_number] => 05686208
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-11-11
[patent_title] => 'Process for generating a phase level of an alternating aperture phase shifting mask'
[patent_app_type] => 1
[patent_app_number] => 8/567007
[patent_app_country] => US
[patent_app_date] => 1995-12-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 8
[patent_no_of_words] => 2202
[patent_no_of_claims] => 8
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/686/05686208.pdf
[firstpage_image] =>[orig_patent_app_number] => 567007
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/567007 | Process for generating a phase level of an alternating aperture phase shifting mask | Dec 3, 1995 | Issued |
Array
(
[id] => 3684838
[patent_doc_number] => 05695897
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-09
[patent_title] => 'Alignment method and semiconductor exposure method'
[patent_app_type] => 1
[patent_app_number] => 8/564615
[patent_app_country] => US
[patent_app_date] => 1995-11-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 22
[patent_no_of_words] => 6606
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[pdf_file] => patents/05/695/05695897.pdf
[firstpage_image] =>[orig_patent_app_number] => 564615
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/564615 | Alignment method and semiconductor exposure method | Nov 28, 1995 | Issued |
Array
(
[id] => 3618867
[patent_doc_number] => 05641592
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-06-24
[patent_title] => 'Method for fabricating phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 8/563261
[patent_app_country] => US
[patent_app_date] => 1995-11-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 1669
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[pdf_file] => patents/05/641/05641592.pdf
[firstpage_image] =>[orig_patent_app_number] => 563261
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/563261 | Method for fabricating phase shift mask | Nov 27, 1995 | Issued |
Array
(
[id] => 3623410
[patent_doc_number] => 05620817
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-04-15
[patent_title] => 'Fabrication of self-aligned attenuated rim phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 8/558492
[patent_app_country] => US
[patent_app_date] => 1995-11-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 6
[patent_no_of_words] => 2152
[patent_no_of_claims] => 18
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/620/05620817.pdf
[firstpage_image] =>[orig_patent_app_number] => 558492
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/558492 | Fabrication of self-aligned attenuated rim phase shift mask | Nov 15, 1995 | Issued |
Array
(
[id] => 3692917
[patent_doc_number] => 05660955
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-08-26
[patent_title] => 'Phase shift mask and manufacturing method thereof'
[patent_app_type] => 1
[patent_app_number] => 8/558304
[patent_app_country] => US
[patent_app_date] => 1995-11-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[patent_no_of_words] => 1787
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[pdf_file] => patents/05/660/05660955.pdf
[firstpage_image] =>[orig_patent_app_number] => 558304
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/558304 | Phase shift mask and manufacturing method thereof | Nov 14, 1995 | Issued |
Array
(
[id] => 3695089
[patent_doc_number] => 05677089
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-10-14
[patent_title] => 'Photomask for forming T-gate electrode of the semiconductor device'
[patent_app_type] => 1
[patent_app_number] => 8/548302
[patent_app_country] => US
[patent_app_date] => 1995-11-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => patents/05/677/05677089.pdf
[firstpage_image] =>[orig_patent_app_number] => 548302
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/548302 | Photomask for forming T-gate electrode of the semiconductor device | Oct 31, 1995 | Issued |
Array
(
[id] => 3513568
[patent_doc_number] => 05576126
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-11-19
[patent_title] => 'Phase shifting mask'
[patent_app_type] => 1
[patent_app_number] => 8/550459
[patent_app_country] => US
[patent_app_date] => 1995-10-30
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/576/05576126.pdf
[firstpage_image] =>[orig_patent_app_number] => 550459
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/550459 | Phase shifting mask | Oct 29, 1995 | Issued |
Array
(
[id] => 3723584
[patent_doc_number] => 05700602
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-23
[patent_title] => 'Method and apparatus for precision determination of phase-shift in a phase-shifted reticle'
[patent_app_type] => 1
[patent_app_number] => 8/538354
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[patent_app_date] => 1995-10-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[patent_no_of_words] => 7660
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/700/05700602.pdf
[firstpage_image] =>[orig_patent_app_number] => 538354
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/538354 | Method and apparatus for precision determination of phase-shift in a phase-shifted reticle | Oct 29, 1995 | Issued |
Array
(
[id] => 3699313
[patent_doc_number] => 05674647
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-10-07
[patent_title] => 'Phase shift mask and manufacturing method thereof and exposure method using phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 8/547520
[patent_app_country] => US
[patent_app_date] => 1995-10-24
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[pdf_file] => patents/05/674/05674647.pdf
[firstpage_image] =>[orig_patent_app_number] => 547520
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/547520 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask | Oct 23, 1995 | Issued |
Array
(
[id] => 3685731
[patent_doc_number] => 05691115
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-11-25
[patent_title] => 'Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices'
[patent_app_type] => 1
[patent_app_number] => 8/546313
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/691/05691115.pdf
[firstpage_image] =>[orig_patent_app_number] => 546313
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/546313 | Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices | Oct 19, 1995 | Issued |
Array
(
[id] => 3694552
[patent_doc_number] => 05595857
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-01-21
[patent_title] => 'Method of forming a pattern and projection exposure apparatus'
[patent_app_type] => 1
[patent_app_number] => 8/543254
[patent_app_country] => US
[patent_app_date] => 1995-10-18
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[pdf_file] => patents/05/595/05595857.pdf
[firstpage_image] =>[orig_patent_app_number] => 543254
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/543254 | Method of forming a pattern and projection exposure apparatus | Oct 17, 1995 | Issued |
Array
(
[id] => 3623396
[patent_doc_number] => 05620816
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-04-15
[patent_title] => 'Layout methodology, mask set, and patterning method for phase-shifting lithography'
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[pdf_file] => patents/05/620/05620816.pdf
[firstpage_image] =>[orig_patent_app_number] => 543062
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/543062 | Layout methodology, mask set, and patterning method for phase-shifting lithography | Oct 12, 1995 | Issued |
Array
(
[id] => 3728490
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[firstpage_image] =>[orig_patent_app_number] => 542741
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/542741 | Layout methodology, mask set, and patterning method for phase-shifting lithography | Oct 12, 1995 | Issued |