Search

Liliana Di Nola Baron

Examiner (ID: 15438)

Most Active Art Unit
1615
Art Unit(s)
1615
Total Applications
361
Issued Applications
209
Pending Applications
88
Abandoned Applications
63

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 3527596 [patent_doc_number] => 05582939 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1996-12-10 [patent_title] => 'Method for fabricating and using defect-free phase shifting masks' [patent_app_type] => 1 [patent_app_number] => 8/500481 [patent_app_country] => US [patent_app_date] => 1995-07-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 24 [patent_no_of_words] => 5096 [patent_no_of_claims] => 35 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 106 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/582/05582939.pdf [firstpage_image] =>[orig_patent_app_number] => 500481 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/500481
Method for fabricating and using defect-free phase shifting masks Jul 9, 1995 Issued
Array ( [id] => 3632418 [patent_doc_number] => 05631110 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-05-20 [patent_title] => 'Process of fabricating photo-mask used for modified illumination, projection aligner using the photo-mask and method of transferring pattern image from the photo-mask to photo-sensitive layer' [patent_app_type] => 1 [patent_app_number] => 8/498335 [patent_app_country] => US [patent_app_date] => 1995-07-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 26 [patent_figures_cnt] => 27 [patent_no_of_words] => 7742 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 94 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/631/05631110.pdf [firstpage_image] =>[orig_patent_app_number] => 498335 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/498335
Process of fabricating photo-mask used for modified illumination, projection aligner using the photo-mask and method of transferring pattern image from the photo-mask to photo-sensitive layer Jul 4, 1995 Issued
Array ( [id] => 3723566 [patent_doc_number] => 05700601 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-12-23 [patent_title] => 'Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system' [patent_app_type] => 1 [patent_app_number] => 8/495836 [patent_app_country] => US [patent_app_date] => 1995-06-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 29 [patent_figures_cnt] => 63 [patent_no_of_words] => 20732 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 15 [patent_words_short_claim] => 113 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/700/05700601.pdf [firstpage_image] =>[orig_patent_app_number] => 495836 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/495836
Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system Jun 27, 1995 Issued
Array ( [id] => 3728479 [patent_doc_number] => 05635315 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-06-03 [patent_title] => 'Phase shift mask and phase shift mask blank' [patent_app_type] => 1 [patent_app_number] => 8/493280 [patent_app_country] => US [patent_app_date] => 1995-06-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 5 [patent_no_of_words] => 3996 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/635/05635315.pdf [firstpage_image] =>[orig_patent_app_number] => 493280 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/493280
Phase shift mask and phase shift mask blank Jun 20, 1995 Issued
Array ( [id] => 3728466 [patent_doc_number] => 05635314 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-06-03 [patent_title] => 'Phase shift mask comprising micro spaces in peripheral opaque regions' [patent_app_type] => 1 [patent_app_number] => 8/492746 [patent_app_country] => US [patent_app_date] => 1995-06-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 1164 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 100 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/635/05635314.pdf [firstpage_image] =>[orig_patent_app_number] => 492746 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/492746
Phase shift mask comprising micro spaces in peripheral opaque regions Jun 20, 1995 Issued
Array ( [id] => 3659705 [patent_doc_number] => 05624774 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-04-29 [patent_title] => 'Method for transferring patterns with charged particle beam' [patent_app_type] => 1 [patent_app_number] => 8/490579 [patent_app_country] => US [patent_app_date] => 1995-06-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 18 [patent_figures_cnt] => 43 [patent_no_of_words] => 12041 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 103 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/624/05624774.pdf [firstpage_image] =>[orig_patent_app_number] => 490579 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/490579
Method for transferring patterns with charged particle beam Jun 14, 1995 Issued
08/473967 TRANSPARENT OPTICAL DEVICE AND FABRICATION METHOD THEREOF Jun 6, 1995 Abandoned
Array ( [id] => 3632405 [patent_doc_number] => 05631109 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-05-20 [patent_title] => 'Exposure mask comprising transparent and translucent phase shift patterns' [patent_app_type] => 1 [patent_app_number] => 8/477594 [patent_app_country] => US [patent_app_date] => 1995-06-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 24 [patent_figures_cnt] => 112 [patent_no_of_words] => 20735 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 130 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/631/05631109.pdf [firstpage_image] =>[orig_patent_app_number] => 477594 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/477594
Exposure mask comprising transparent and translucent phase shift patterns Jun 6, 1995 Issued
Array ( [id] => 3579420 [patent_doc_number] => 05580687 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1996-12-03 [patent_title] => 'Contact stepper printed lithography method' [patent_app_type] => 1 [patent_app_number] => 8/478476 [patent_app_country] => US [patent_app_date] => 1995-06-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 64 [patent_figures_cnt] => 106 [patent_no_of_words] => 26689 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 47 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/580/05580687.pdf [firstpage_image] =>[orig_patent_app_number] => 478476 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/478476
Contact stepper printed lithography method Jun 6, 1995 Issued
Array ( [id] => 3658413 [patent_doc_number] => 05656398 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-08-12 [patent_title] => 'Method of making X-ray mask structure' [patent_app_type] => 1 [patent_app_number] => 8/479358 [patent_app_country] => US [patent_app_date] => 1995-06-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 28 [patent_no_of_words] => 4814 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 100 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/656/05656398.pdf [firstpage_image] =>[orig_patent_app_number] => 479358 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/479358
Method of making X-ray mask structure Jun 6, 1995 Issued
Array ( [id] => 3645293 [patent_doc_number] => 05629114 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-05-13 [patent_title] => 'Phase shift mask and manufacturing method thereof and exposure method using phase shift mask comprising a semitransparent region' [patent_app_type] => 1 [patent_app_number] => 8/480371 [patent_app_country] => US [patent_app_date] => 1995-06-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 24 [patent_figures_cnt] => 49 [patent_no_of_words] => 10132 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 142 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/629/05629114.pdf [firstpage_image] =>[orig_patent_app_number] => 480371 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/480371
Phase shift mask and manufacturing method thereof and exposure method using phase shift mask comprising a semitransparent region Jun 6, 1995 Issued
Array ( [id] => 3658726 [patent_doc_number] => 05648188 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-07-15 [patent_title] => 'Real time alignment system for a projection electron beam lithographic system' [patent_app_type] => 1 [patent_app_number] => 8/476471 [patent_app_country] => US [patent_app_date] => 1995-06-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 5 [patent_no_of_words] => 5383 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 125 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/648/05648188.pdf [firstpage_image] =>[orig_patent_app_number] => 476471 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/476471
Real time alignment system for a projection electron beam lithographic system Jun 6, 1995 Issued
Array ( [id] => 3684554 [patent_doc_number] => 05663017 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-09-02 [patent_title] => 'Optical corrective techniques with reticle formation and reticle stitching to provide design flexibility' [patent_app_type] => 1 [patent_app_number] => 8/477827 [patent_app_country] => US [patent_app_date] => 1995-06-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 4582 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 46 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/663/05663017.pdf [firstpage_image] =>[orig_patent_app_number] => 477827 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/477827
Optical corrective techniques with reticle formation and reticle stitching to provide design flexibility Jun 6, 1995 Issued
Array ( [id] => 3524310 [patent_doc_number] => 05541026 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1996-07-30 [patent_title] => 'Exposure apparatus and photo mask' [patent_app_type] => 1 [patent_app_number] => 8/480360 [patent_app_country] => US [patent_app_date] => 1995-06-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 18 [patent_no_of_words] => 10730 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 98 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/541/05541026.pdf [firstpage_image] =>[orig_patent_app_number] => 480360 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/480360
Exposure apparatus and photo mask Jun 6, 1995 Issued
Array ( [id] => 3623383 [patent_doc_number] => 05620815 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-04-15 [patent_title] => 'Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask' [patent_app_type] => 1 [patent_app_number] => 8/471782 [patent_app_country] => US [patent_app_date] => 1995-06-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 30 [patent_figures_cnt] => 118 [patent_no_of_words] => 21795 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 106 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/620/05620815.pdf [firstpage_image] =>[orig_patent_app_number] => 471782 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/471782
Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask Jun 5, 1995 Issued
Array ( [id] => 3692599 [patent_doc_number] => 05650249 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-07-22 [patent_title] => 'Method for making precision radomes' [patent_app_type] => 1 [patent_app_number] => 8/464252 [patent_app_country] => US [patent_app_date] => 1995-06-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 21 [patent_no_of_words] => 7571 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 145 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/650/05650249.pdf [firstpage_image] =>[orig_patent_app_number] => 464252 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/464252
Method for making precision radomes Jun 4, 1995 Issued
Array ( [id] => 3659972 [patent_doc_number] => 05624791 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-04-29 [patent_title] => 'Pattern forming method using mask' [patent_app_type] => 1 [patent_app_number] => 8/463930 [patent_app_country] => US [patent_app_date] => 1995-06-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 70 [patent_figures_cnt] => 203 [patent_no_of_words] => 22143 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 163 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/624/05624791.pdf [firstpage_image] =>[orig_patent_app_number] => 463930 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/463930
Pattern forming method using mask Jun 4, 1995 Issued
Array ( [id] => 3654698 [patent_doc_number] => 05658695 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-08-19 [patent_title] => 'Method for fabricating phase shift mask comprising the use of a second photoshield layer as a sidewall' [patent_app_type] => 1 [patent_app_number] => 8/463244 [patent_app_country] => US [patent_app_date] => 1995-06-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 30 [patent_no_of_words] => 3511 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 87 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/658/05658695.pdf [firstpage_image] =>[orig_patent_app_number] => 463244 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/463244
Method for fabricating phase shift mask comprising the use of a second photoshield layer as a sidewall Jun 4, 1995 Issued
Array ( [id] => 3619573 [patent_doc_number] => 05593801 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-01-14 [patent_title] => 'Attenuating type phase shifting mask, method of manufacturing thereof and semiconductor device manufactured by using the mask' [patent_app_type] => 1 [patent_app_number] => 8/462723 [patent_app_country] => US [patent_app_date] => 1995-06-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 17 [patent_figures_cnt] => 43 [patent_no_of_words] => 8458 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 83 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/593/05593801.pdf [firstpage_image] =>[orig_patent_app_number] => 462723 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/462723
Attenuating type phase shifting mask, method of manufacturing thereof and semiconductor device manufactured by using the mask Jun 4, 1995 Issued
Array ( [id] => 3680491 [patent_doc_number] => 05633105 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-05-27 [patent_title] => 'Precision radome made using conformal photolithography to pattern curved surfaces' [patent_app_type] => 1 [patent_app_number] => 8/464232 [patent_app_country] => US [patent_app_date] => 1995-06-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 17 [patent_no_of_words] => 7551 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 72 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/633/05633105.pdf [firstpage_image] =>[orig_patent_app_number] => 464232 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/464232
Precision radome made using conformal photolithography to pattern curved surfaces Jun 4, 1995 Issued
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