
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 13065
[patent_doc_number] => 07807319
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-10-05
[patent_title] => 'Photomask including contrast enhancement layer and method of making same'
[patent_app_type] => utility
[patent_app_number] => 11/729580
[patent_app_country] => US
[patent_app_date] => 2007-03-29
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/807/07807319.pdf
[firstpage_image] =>[orig_patent_app_number] => 11729580
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/729580 | Photomask including contrast enhancement layer and method of making same | Mar 28, 2007 | Issued |
Array
(
[id] => 190706
[patent_doc_number] => 07642017
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-01-05
[patent_title] => 'Reflective photomask, method of fabricating the same, and reflective blank photomask'
[patent_app_type] => utility
[patent_app_number] => 11/723472
[patent_app_country] => US
[patent_app_date] => 2007-03-20
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/642/07642017.pdf
[firstpage_image] =>[orig_patent_app_number] => 11723472
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/723472 | Reflective photomask, method of fabricating the same, and reflective blank photomask | Mar 19, 2007 | Issued |
Array
(
[id] => 141548
[patent_doc_number] => 07691547
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-04-06
[patent_title] => 'Reticle containing structures for sensing electric field exposure and a method for its use'
[patent_app_type] => utility
[patent_app_number] => 11/724715
[patent_app_country] => US
[patent_app_date] => 2007-03-16
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/691/07691547.pdf
[firstpage_image] =>[orig_patent_app_number] => 11724715
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/724715 | Reticle containing structures for sensing electric field exposure and a method for its use | Mar 15, 2007 | Issued |
Array
(
[id] => 5062903
[patent_doc_number] => 20070224542
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-09-27
[patent_title] => 'Patterning method using photomask'
[patent_app_type] => utility
[patent_app_number] => 11/716637
[patent_app_country] => US
[patent_app_date] => 2007-03-12
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 11716637
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/716637 | Patterning method using photomask | Mar 11, 2007 | Issued |
Array
(
[id] => 5259176
[patent_doc_number] => 20070212808
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-09-13
[patent_title] => 'Method of selective removal of organophosphonic acid molecules from their self-assembled monolayer on Si substrates'
[patent_app_type] => utility
[patent_app_number] => 11/716013
[patent_app_country] => US
[patent_app_date] => 2007-03-09
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 11716013
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/716013 | Method of selective removal of organophosphonic acid molecules from their self-assembled monolayer on Si substrates | Mar 8, 2007 | Abandoned |
Array
(
[id] => 141422
[patent_doc_number] => 07687206
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-03-30
[patent_title] => 'Mask pattern and method for forming the same'
[patent_app_type] => utility
[patent_app_number] => 11/683778
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[firstpage_image] =>[orig_patent_app_number] => 11683778
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/683778 | Mask pattern and method for forming the same | Mar 7, 2007 | Issued |
Array
(
[id] => 5258985
[patent_doc_number] => 20070212617
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[patent_issue_date] => 2007-09-13
[patent_title] => 'Photomask and exposure method'
[patent_app_type] => utility
[patent_app_number] => 11/714819
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[firstpage_image] =>[orig_patent_app_number] => 11714819
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/714819 | Photomask and exposure method | Mar 6, 2007 | Issued |
Array
(
[id] => 4725153
[patent_doc_number] => 20080204694
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[patent_kind] => A1
[patent_issue_date] => 2008-08-28
[patent_title] => 'Controlling shape of a reticle with low friction film coating at backside'
[patent_app_type] => utility
[patent_app_number] => 11/712192
[patent_app_country] => US
[patent_app_date] => 2007-02-28
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[firstpage_image] =>[orig_patent_app_number] => 11712192
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/712192 | Controlling shape of a reticle with low friction film coating at backside | Feb 27, 2007 | Issued |
Array
(
[id] => 4813228
[patent_doc_number] => 20080193859
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[patent_issue_date] => 2008-08-14
[patent_title] => 'DUAL METRIC OPC'
[patent_app_type] => utility
[patent_app_number] => 11/673511
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[firstpage_image] =>[orig_patent_app_number] => 11673511
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/673511 | Dual metric OPC | Feb 8, 2007 | Issued |
Array
(
[id] => 4954817
[patent_doc_number] => 20080187841
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-08-07
[patent_title] => 'PHASE SHIFT MASK WITH TWO-PHASE CLEAR FEATURE'
[patent_app_type] => utility
[patent_app_number] => 11/670887
[patent_app_country] => US
[patent_app_date] => 2007-02-02
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 11670887
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/670887 | Phase shift mask with two-phase clear feature | Feb 1, 2007 | Issued |
Array
(
[id] => 224744
[patent_doc_number] => 07604927
[patent_country] => US
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[patent_issue_date] => 2009-10-20
[patent_title] => 'Methods of patterning using photomasks including shadowing elements therein and related systems'
[patent_app_type] => utility
[patent_app_number] => 11/668081
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[pdf_file] => patents/07/604/07604927.pdf
[firstpage_image] =>[orig_patent_app_number] => 11668081
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/668081 | Methods of patterning using photomasks including shadowing elements therein and related systems | Jan 28, 2007 | Issued |
Array
(
[id] => 5159701
[patent_doc_number] => 20070172745
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[patent_title] => 'Evanescent wave assist features for microlithography'
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[firstpage_image] =>[orig_patent_app_number] => 11627750
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/627750 | Evanescent wave assist features for microlithography | Jan 25, 2007 | Abandoned |
Array
(
[id] => 4764936
[patent_doc_number] => 20080176147
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-07-24
[patent_title] => 'SYSTEM AND METHOD FOR ELIMINATING THE STRUCTURE AND EDGE ROUGHNESS PRODUCED DURING LASER ABLATION OF A MATERIAL'
[patent_app_type] => utility
[patent_app_number] => 11/624257
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/624257 | System and method for eliminating the structure and edge roughness produced during laser ablation of a material | Jan 17, 2007 | Issued |
Array
(
[id] => 202242
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[patent_issue_date] => 2009-12-15
[patent_title] => 'Circuit pattern exposure method and mask'
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Array
(
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Array
(
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[patent_title] => 'Pellicle, methods of fabrication and methods of use for extreme ultraviolet lithography'
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Array
(
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Array
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/645066 | Method for quartz bump defect repair with less substrate damage | Dec 25, 2006 | Issued |
Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/643953 | Patterning device, method of providing a patterning device, photolithographic apparatus and device manufacturing method | Dec 21, 2006 | Issued |