
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 195683
[patent_doc_number] => 07635545
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-12-22
[patent_title] => 'Photomask features with interior nonprinting window using alternating phase shifting'
[patent_app_type] => utility
[patent_app_number] => 11/615830
[patent_app_country] => US
[patent_app_date] => 2006-12-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 20
[patent_no_of_words] => 5520
[patent_no_of_claims] => 51
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 52
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/635/07635545.pdf
[firstpage_image] =>[orig_patent_app_number] => 11615830
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/615830 | Photomask features with interior nonprinting window using alternating phase shifting | Dec 21, 2006 | Issued |
Array
(
[id] => 121069
[patent_doc_number] => 07709160
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-05-04
[patent_title] => 'Method for manufacturing attenuated phase-shift masks and devices obtained therefrom'
[patent_app_type] => utility
[patent_app_number] => 11/645156
[patent_app_country] => US
[patent_app_date] => 2006-12-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 14
[patent_no_of_words] => 8973
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 64
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/709/07709160.pdf
[firstpage_image] =>[orig_patent_app_number] => 11645156
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/645156 | Method for manufacturing attenuated phase-shift masks and devices obtained therefrom | Dec 21, 2006 | Issued |
Array
(
[id] => 5253112
[patent_doc_number] => 20070134568
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-06-14
[patent_title] => 'Halftone type phase shift mask blank and halftone type phase shift mask'
[patent_app_type] => utility
[patent_app_number] => 11/642595
[patent_app_country] => US
[patent_app_date] => 2006-12-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 15649
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0134/20070134568.pdf
[firstpage_image] =>[orig_patent_app_number] => 11642595
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/642595 | Halftone type phase shift mask blank and halftone type phase shift mask | Dec 20, 2006 | Issued |
Array
(
[id] => 5034553
[patent_doc_number] => 20070099092
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-05-03
[patent_title] => 'HALFTONE PHASE SHIFT MASK BLANK, AND METHOD OF MANUFACTURE'
[patent_app_type] => utility
[patent_app_number] => 11/613780
[patent_app_country] => US
[patent_app_date] => 2006-12-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 4497
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0099/20070099092.pdf
[firstpage_image] =>[orig_patent_app_number] => 11613780
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/613780 | Halftone phase shift mask blank, and method of manufacture | Dec 19, 2006 | Issued |
Array
(
[id] => 263555
[patent_doc_number] => 07569313
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-08-04
[patent_title] => 'White defect repairing method and apparatus of photomask, manufacturing method of photomask, and manufacturing method of semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 11/640927
[patent_app_country] => US
[patent_app_date] => 2006-12-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 26
[patent_no_of_words] => 6146
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 59
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/569/07569313.pdf
[firstpage_image] =>[orig_patent_app_number] => 11640927
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/640927 | White defect repairing method and apparatus of photomask, manufacturing method of photomask, and manufacturing method of semiconductor device | Dec 18, 2006 | Issued |
Array
(
[id] => 5034554
[patent_doc_number] => 20070099093
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-05-03
[patent_title] => 'Method for providing representative features for use in inspection of photolithography mask and for use in inspection of photo-lithographically developed and/or patterned wafer layers, and products of same'
[patent_app_type] => utility
[patent_app_number] => 11/641584
[patent_app_country] => US
[patent_app_date] => 2006-12-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 14904
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0099/20070099093.pdf
[firstpage_image] =>[orig_patent_app_number] => 11641584
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/641584 | Method for providing representative features for use in inspection of photolithography mask and for use in inspection of photo-lithographically developed and/or patterned wafer layers, and products of same | Dec 17, 2006 | Abandoned |
Array
(
[id] => 5079496
[patent_doc_number] => 20070122720
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-05-31
[patent_title] => 'Polarized reticle, photolithography system, and method of fabricating a polarized reticle'
[patent_app_type] => utility
[patent_app_number] => 11/642023
[patent_app_country] => US
[patent_app_date] => 2006-12-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 4236
[patent_no_of_claims] => 52
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0122/20070122720.pdf
[firstpage_image] =>[orig_patent_app_number] => 11642023
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/642023 | Polarized reticle, photolithography system, and method of fabricating a polarized reticle | Dec 17, 2006 | Issued |
Array
(
[id] => 4081
[patent_doc_number] => 07811721
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-10-12
[patent_title] => 'Mask for crystallizing silicon, apparatus having the mask and method of crystallizing with the mask'
[patent_app_type] => utility
[patent_app_number] => 11/639874
[patent_app_country] => US
[patent_app_date] => 2006-12-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 14
[patent_no_of_words] => 8257
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 75
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/811/07811721.pdf
[firstpage_image] =>[orig_patent_app_number] => 11639874
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/639874 | Mask for crystallizing silicon, apparatus having the mask and method of crystallizing with the mask | Dec 14, 2006 | Issued |
Array
(
[id] => 5119766
[patent_doc_number] => 20070141480
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-06-21
[patent_title] => 'Pattern formation method using Levenson-type mask and method of manufacturing Levenson-type mask'
[patent_app_type] => utility
[patent_app_number] => 11/637698
[patent_app_country] => US
[patent_app_date] => 2006-12-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 13182
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0141/20070141480.pdf
[firstpage_image] =>[orig_patent_app_number] => 11637698
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/637698 | Pattern formation method using Levenson-type mask and method of manufacturing Levenson-type mask | Dec 12, 2006 | Issued |
Array
(
[id] => 184824
[patent_doc_number] => 07648805
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-01-19
[patent_title] => 'Masks and methods of manufacture thereof'
[patent_app_type] => utility
[patent_app_number] => 11/634619
[patent_app_country] => US
[patent_app_date] => 2006-12-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 21
[patent_no_of_words] => 9329
[patent_no_of_claims] => 23
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/648/07648805.pdf
[firstpage_image] =>[orig_patent_app_number] => 11634619
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/634619 | Masks and methods of manufacture thereof | Dec 5, 2006 | Issued |
Array
(
[id] => 246847
[patent_doc_number] => 07585598
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-09-08
[patent_title] => 'Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate'
[patent_app_type] => utility
[patent_app_number] => 11/634270
[patent_app_country] => US
[patent_app_date] => 2006-12-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 7013
[patent_no_of_claims] => 13
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/585/07585598.pdf
[firstpage_image] =>[orig_patent_app_number] => 11634270
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/634270 | Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate | Dec 5, 2006 | Issued |
Array
(
[id] => 6397641
[patent_doc_number] => 20100178596
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-07-15
[patent_title] => 'EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY MASK, WITH ABSORBENT CAVITIES'
[patent_app_type] => utility
[patent_app_number] => 12/095540
[patent_app_country] => US
[patent_app_date] => 2006-11-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 6593
[patent_no_of_claims] => 18
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0178/20100178596.pdf
[firstpage_image] =>[orig_patent_app_number] => 12095540
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/095540 | Extreme ultraviolet photolithography mask, with absorbent cavities | Nov 22, 2006 | Issued |
Array
(
[id] => 5040526
[patent_doc_number] => 20070092808
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-04-26
[patent_title] => 'HALFTONE TYPE PHASE SHIFT MASK BLANK AND PHASE SHIFT MASK THEREOF'
[patent_app_type] => utility
[patent_app_number] => 11/562217
[patent_app_country] => US
[patent_app_date] => 2006-11-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
[patent_figures_cnt] => 18
[patent_no_of_words] => 17281
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0092/20070092808.pdf
[firstpage_image] =>[orig_patent_app_number] => 11562217
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/562217 | Halftone type phase shift mask blank and phase shift mask thereof | Nov 20, 2006 | Issued |
Array
(
[id] => 263554
[patent_doc_number] => 07569312
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-08-04
[patent_title] => 'Mask data creation method'
[patent_app_type] => utility
[patent_app_number] => 11/601705
[patent_app_country] => US
[patent_app_date] => 2006-11-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 34
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[patent_no_of_words] => 41683
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[pdf_file] => patents/07/569/07569312.pdf
[firstpage_image] =>[orig_patent_app_number] => 11601705
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/601705 | Mask data creation method | Nov 19, 2006 | Issued |
Array
(
[id] => 314650
[patent_doc_number] => 07524620
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-04-28
[patent_title] => 'Pattern formation method'
[patent_app_type] => utility
[patent_app_number] => 11/601766
[patent_app_country] => US
[patent_app_date] => 2006-11-20
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/524/07524620.pdf
[firstpage_image] =>[orig_patent_app_number] => 11601766
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/601766 | Pattern formation method | Nov 19, 2006 | Issued |
Array
(
[id] => 5095419
[patent_doc_number] => 20070117028
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-05-24
[patent_title] => 'Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby'
[patent_app_type] => utility
[patent_app_number] => 11/599585
[patent_app_country] => US
[patent_app_date] => 2006-11-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0117/20070117028.pdf
[firstpage_image] =>[orig_patent_app_number] => 11599585
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/599585 | Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby | Nov 14, 2006 | Abandoned |
Array
(
[id] => 5182857
[patent_doc_number] => 20070054203
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-03-08
[patent_title] => 'Mask, method of producing mask, and method of producing semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 11/594908
[patent_app_country] => US
[patent_app_date] => 2006-11-09
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 11594908
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/594908 | Mask, method of producing mask, and method of producing semiconductor device | Nov 8, 2006 | Abandoned |
Array
(
[id] => 5182856
[patent_doc_number] => 20070054202
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-03-08
[patent_title] => 'Mask, method of producing mask, and method of producing semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 11/594878
[patent_app_country] => US
[patent_app_date] => 2006-11-09
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[firstpage_image] =>[orig_patent_app_number] => 11594878
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/594878 | Mask, method of producing mask, and method of producing semiconductor device | Nov 8, 2006 | Issued |
Array
(
[id] => 252491
[patent_doc_number] => 07579123
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-08-25
[patent_title] => 'Method for crystallizing amorphous silicon into polysilicon and mask used therefor'
[patent_app_type] => utility
[patent_app_number] => 11/557947
[patent_app_country] => US
[patent_app_date] => 2006-11-08
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/579/07579123.pdf
[firstpage_image] =>[orig_patent_app_number] => 11557947
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/557947 | Method for crystallizing amorphous silicon into polysilicon and mask used therefor | Nov 7, 2006 | Issued |
Array
(
[id] => 4929053
[patent_doc_number] => 20080168416
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-07-10
[patent_title] => 'Methods and systems for determining pitch of lithographic features'
[patent_app_type] => utility
[patent_app_number] => 11/554725
[patent_app_country] => US
[patent_app_date] => 2006-10-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 4382
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0168/20080168416.pdf
[firstpage_image] =>[orig_patent_app_number] => 11554725
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/554725 | Methods and system for determining pitch of lithographic features | Oct 30, 2006 | Issued |