
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5051505
[patent_doc_number] => 20070032050
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-02-08
[patent_title] => 'Mask for sequential lateral solidification and method of manufacturing the same'
[patent_app_type] => utility
[patent_app_number] => 11/499477
[patent_app_country] => US
[patent_app_date] => 2006-08-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 2495
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0032/20070032050.pdf
[firstpage_image] =>[orig_patent_app_number] => 11499477
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/499477 | Mask for sequential lateral solidification and method of manufacturing the same | Aug 3, 2006 | Issued |
Array
(
[id] => 307209
[patent_doc_number] => 07531275
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-05-12
[patent_title] => 'Photomask assembly and method for protecting the same from contaminants generated during a lithography process'
[patent_app_type] => utility
[patent_app_number] => 11/460193
[patent_app_country] => US
[patent_app_date] => 2006-07-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 6
[patent_no_of_words] => 5922
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 59
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/531/07531275.pdf
[firstpage_image] =>[orig_patent_app_number] => 11460193
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/460193 | Photomask assembly and method for protecting the same from contaminants generated during a lithography process | Jul 25, 2006 | Issued |
Array
(
[id] => 239389
[patent_doc_number] => 07592105
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-09-22
[patent_title] => 'Methods for converting reticle configurations and methods for modifying reticles'
[patent_app_type] => utility
[patent_app_number] => 11/486523
[patent_app_country] => US
[patent_app_date] => 2006-07-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 11
[patent_no_of_words] => 5227
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 83
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/592/07592105.pdf
[firstpage_image] =>[orig_patent_app_number] => 11486523
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/486523 | Methods for converting reticle configurations and methods for modifying reticles | Jul 12, 2006 | Issued |
Array
(
[id] => 352455
[patent_doc_number] => 07491475
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-02-17
[patent_title] => 'Photomask substrate made of synthetic quartz glass and photomask'
[patent_app_type] => utility
[patent_app_number] => 11/478612
[patent_app_country] => US
[patent_app_date] => 2006-07-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5621
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 95
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/491/07491475.pdf
[firstpage_image] =>[orig_patent_app_number] => 11478612
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/478612 | Photomask substrate made of synthetic quartz glass and photomask | Jul 2, 2006 | Issued |
Array
(
[id] => 5193794
[patent_doc_number] => 20070082278
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-04-12
[patent_title] => 'Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same'
[patent_app_type] => utility
[patent_app_number] => 11/478687
[patent_app_country] => US
[patent_app_date] => 2006-07-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[patent_no_of_words] => 13387
[patent_no_of_claims] => 6
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0082/20070082278.pdf
[firstpage_image] =>[orig_patent_app_number] => 11478687
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/478687 | Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same | Jul 2, 2006 | Issued |
Array
(
[id] => 4994465
[patent_doc_number] => 20070009810
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-01-11
[patent_title] => 'Phase shifter film and process for the same'
[patent_app_type] => utility
[patent_app_number] => 11/477425
[patent_app_country] => US
[patent_app_date] => 2006-06-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
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[patent_no_of_words] => 10708
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[pdf_file] => publications/A1/0009/20070009810.pdf
[firstpage_image] =>[orig_patent_app_number] => 11477425
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/477425 | Phase shifter film and process for the same | Jun 29, 2006 | Issued |
Array
(
[id] => 348637
[patent_doc_number] => 07494750
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-02-24
[patent_title] => 'Reticles'
[patent_app_type] => utility
[patent_app_number] => 11/478887
[patent_app_country] => US
[patent_app_date] => 2006-06-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 16
[patent_no_of_words] => 6091
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 5
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/494/07494750.pdf
[firstpage_image] =>[orig_patent_app_number] => 11478887
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/478887 | Reticles | Jun 29, 2006 | Issued |
Array
(
[id] => 277820
[patent_doc_number] => 07556894
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-07-07
[patent_title] => 'Mask with minimum reflectivity over absorber layer'
[patent_app_type] => utility
[patent_app_number] => 11/475474
[patent_app_country] => US
[patent_app_date] => 2006-06-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 1779
[patent_no_of_claims] => 9
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[patent_words_short_claim] => 103
[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/556/07556894.pdf
[firstpage_image] =>[orig_patent_app_number] => 11475474
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/475474 | Mask with minimum reflectivity over absorber layer | Jun 25, 2006 | Issued |
Array
(
[id] => 5922007
[patent_doc_number] => 20060240341
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-10-26
[patent_title] => 'Mask, manufacturing method for mask, and manufacturing method for semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 11/472452
[patent_app_country] => US
[patent_app_date] => 2006-06-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
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[patent_no_of_words] => 10106
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0240/20060240341.pdf
[firstpage_image] =>[orig_patent_app_number] => 11472452
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/472452 | Mask, manufacturing method for mask, and manufacturing method for semiconductor device | Jun 21, 2006 | Issued |
Array
(
[id] => 5850950
[patent_doc_number] => 20060234141
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-10-19
[patent_title] => 'SINGLE TRENCH REPAIR METHOD WITH ETCHED QUARTZ FOR ATTENUATED PHASE SHIFTING MASK'
[patent_app_type] => utility
[patent_app_number] => 11/425423
[patent_app_country] => US
[patent_app_date] => 2006-06-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 4329
[patent_no_of_claims] => 19
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0234/20060234141.pdf
[firstpage_image] =>[orig_patent_app_number] => 11425423
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/425423 | Single trench repair method with etched quartz for attenuated phase shifting mask | Jun 20, 2006 | Issued |
Array
(
[id] => 5602114
[patent_doc_number] => 20060292459
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-12-28
[patent_title] => 'EUV reflection mask and method for producing it'
[patent_app_type] => utility
[patent_app_number] => 11/453947
[patent_app_country] => US
[patent_app_date] => 2006-06-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 3511
[patent_no_of_claims] => 34
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0292/20060292459.pdf
[firstpage_image] =>[orig_patent_app_number] => 11453947
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/453947 | EUV reflection mask and method for producing it | Jun 14, 2006 | Abandoned |
Array
(
[id] => 5753819
[patent_doc_number] => 20060222968
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-10-05
[patent_title] => 'LITHOGRAPHIC TEMPLATE AND METHOD OF FORMATION AND USE'
[patent_app_type] => utility
[patent_app_number] => 11/423621
[patent_app_country] => US
[patent_app_date] => 2006-06-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0222/20060222968.pdf
[firstpage_image] =>[orig_patent_app_number] => 11423621
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/423621 | Lithographic template and method of formation and use | Jun 11, 2006 | Issued |
Array
(
[id] => 5922005
[patent_doc_number] => 20060240339
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-10-26
[patent_title] => 'Forming an EUV mask with a phase-shifter layer and an intensity balancer layer'
[patent_app_type] => utility
[patent_app_number] => 11/450098
[patent_app_country] => US
[patent_app_date] => 2006-06-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => publications/A1/0240/20060240339.pdf
[firstpage_image] =>[orig_patent_app_number] => 11450098
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/450098 | Forming an EUV mask with a phase-shifter layer and an intensity balancer layer | Jun 8, 2006 | Issued |
Array
(
[id] => 173660
[patent_doc_number] => 07659039
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-02-09
[patent_title] => 'Near-field exposure mask, method of producing that mask, near-field exposure apparatus having that mask, and resist pattern forming method'
[patent_app_type] => utility
[patent_app_number] => 10/585644
[patent_app_country] => US
[patent_app_date] => 2006-06-07
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 6844
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[pdf_file] => patents/07/659/07659039.pdf
[firstpage_image] =>[orig_patent_app_number] => 10585644
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/585644 | Near-field exposure mask, method of producing that mask, near-field exposure apparatus having that mask, and resist pattern forming method | Jun 6, 2006 | Issued |
Array
(
[id] => 373197
[patent_doc_number] => 07473500
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-01-06
[patent_title] => 'Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same'
[patent_app_type] => utility
[patent_app_number] => 11/439757
[patent_app_country] => US
[patent_app_date] => 2006-05-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
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[pdf_file] => patents/07/473/07473500.pdf
[firstpage_image] =>[orig_patent_app_number] => 11439757
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/439757 | Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same | May 23, 2006 | Issued |
Array
(
[id] => 800251
[patent_doc_number] => 07425393
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-09-16
[patent_title] => 'Phase shift photomask and method for improving printability of a structure on a wafer'
[patent_app_type] => utility
[patent_app_number] => 11/383378
[patent_app_country] => US
[patent_app_date] => 2006-05-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/425/07425393.pdf
[firstpage_image] =>[orig_patent_app_number] => 11383378
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/383378 | Phase shift photomask and method for improving printability of a structure on a wafer | May 14, 2006 | Issued |
Array
(
[id] => 5619260
[patent_doc_number] => 20060188793
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-08-24
[patent_title] => 'Adjustable Transmission Phase Shift Mask'
[patent_app_type] => utility
[patent_app_number] => 11/381409
[patent_app_country] => US
[patent_app_date] => 2006-05-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => publications/A1/0188/20060188793.pdf
[firstpage_image] =>[orig_patent_app_number] => 11381409
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/381409 | Adjustable Transmission Phase Shift Mask | May 2, 2006 | Abandoned |
Array
(
[id] => 5085257
[patent_doc_number] => 20070275308
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-11-29
[patent_title] => 'Reflective mask blank, reflective mask, and method of manufacturing semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 11/416208
[patent_app_country] => US
[patent_app_date] => 2006-05-03
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[pdf_file] => publications/A1/0275/20070275308.pdf
[firstpage_image] =>[orig_patent_app_number] => 11416208
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/416208 | Reflective mask blank, reflective mask, and method of manufacturing semiconductor device | May 2, 2006 | Issued |
Array
(
[id] => 5056688
[patent_doc_number] => 20070059610
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-03-15
[patent_title] => 'Method of making and designing dummy patterns for semiconductor devices and semiconductor devices having dummy patterns'
[patent_app_type] => utility
[patent_app_number] => 11/414700
[patent_app_country] => US
[patent_app_date] => 2006-04-28
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0059/20070059610.pdf
[firstpage_image] =>[orig_patent_app_number] => 11414700
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/414700 | Method of making and designing dummy patterns for semiconductor devices and semiconductor devices having dummy patterns | Apr 27, 2006 | Abandoned |
Array
(
[id] => 5703255
[patent_doc_number] => 20060192302
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-08-31
[patent_title] => 'Self-compensating mark design for stepper alignment'
[patent_app_type] => utility
[patent_app_number] => 11/412596
[patent_app_country] => US
[patent_app_date] => 2006-04-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
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[pdf_file] => publications/A1/0192/20060192302.pdf
[firstpage_image] =>[orig_patent_app_number] => 11412596
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/412596 | Self-compensating mark design for stepper alignment | Apr 25, 2006 | Issued |