
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5747733
[patent_doc_number] => 20060110664
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-05-25
[patent_title] => 'Large pellicle'
[patent_app_type] => utility
[patent_app_number] => 11/285304
[patent_app_country] => US
[patent_app_date] => 2005-11-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 4937
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0110/20060110664.pdf
[firstpage_image] =>[orig_patent_app_number] => 11285304
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/285304 | Large pellicle | Nov 22, 2005 | Issued |
Array
(
[id] => 263551
[patent_doc_number] => 07569309
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-08-04
[patent_title] => 'Gate critical dimension variation by use of ghost features'
[patent_app_type] => utility
[patent_app_number] => 11/269633
[patent_app_country] => US
[patent_app_date] => 2005-11-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 13
[patent_no_of_words] => 6840
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 167
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/569/07569309.pdf
[firstpage_image] =>[orig_patent_app_number] => 11269633
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/269633 | Gate critical dimension variation by use of ghost features | Nov 8, 2005 | Issued |
Array
(
[id] => 852816
[patent_doc_number] => 07378197
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-05-27
[patent_title] => 'Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC'
[patent_app_type] => utility
[patent_app_number] => 11/267983
[patent_app_country] => US
[patent_app_date] => 2005-11-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 2424
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 97
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/378/07378197.pdf
[firstpage_image] =>[orig_patent_app_number] => 11267983
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/267983 | Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC | Nov 6, 2005 | Issued |
Array
(
[id] => 4549651
[patent_doc_number] => 07820342
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-10-26
[patent_title] => 'Multiple mask and method for producing differently doped regions'
[patent_app_type] => utility
[patent_app_number] => 11/792464
[patent_app_country] => US
[patent_app_date] => 2005-11-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 9
[patent_no_of_words] => 4790
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 24
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/820/07820342.pdf
[firstpage_image] =>[orig_patent_app_number] => 11792464
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/792464 | Multiple mask and method for producing differently doped regions | Nov 2, 2005 | Issued |
Array
(
[id] => 800249
[patent_doc_number] => 07425391
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-09-16
[patent_title] => 'Highly-corrected mask'
[patent_app_type] => utility
[patent_app_number] => 11/163865
[patent_app_country] => US
[patent_app_date] => 2005-11-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 29
[patent_figures_cnt] => 275
[patent_no_of_words] => 24203
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 110
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/425/07425391.pdf
[firstpage_image] =>[orig_patent_app_number] => 11163865
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/163865 | Highly-corrected mask | Nov 1, 2005 | Issued |
Array
(
[id] => 5807572
[patent_doc_number] => 20060093926
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-05-04
[patent_title] => 'Mask pattern data generating method, photo mask manufacturing method, and semiconductor device manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 11/259069
[patent_app_country] => US
[patent_app_date] => 2005-10-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 6094
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0093/20060093926.pdf
[firstpage_image] =>[orig_patent_app_number] => 11259069
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/259069 | Mask pattern data generating method, photo mask manufacturing method, and semiconductor device manufacturing method | Oct 26, 2005 | Issued |
Array
(
[id] => 826714
[patent_doc_number] => 07402378
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-07-22
[patent_title] => 'Exposure method and apparatus'
[patent_app_type] => utility
[patent_app_number] => 11/255559
[patent_app_country] => US
[patent_app_date] => 2005-10-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 19
[patent_figures_cnt] => 30
[patent_no_of_words] => 12373
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 73
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/402/07402378.pdf
[firstpage_image] =>[orig_patent_app_number] => 11255559
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/255559 | Exposure method and apparatus | Oct 20, 2005 | Issued |
Array
(
[id] => 210164
[patent_doc_number] => 07625676
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-12-01
[patent_title] => 'Photomask blank, photomask and fabrication method thereof'
[patent_app_type] => utility
[patent_app_number] => 11/255135
[patent_app_country] => US
[patent_app_date] => 2005-10-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 35
[patent_no_of_words] => 14083
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 144
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/625/07625676.pdf
[firstpage_image] =>[orig_patent_app_number] => 11255135
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/255135 | Photomask blank, photomask and fabrication method thereof | Oct 20, 2005 | Issued |
Array
(
[id] => 295847
[patent_doc_number] => 07541116
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-06-02
[patent_title] => 'Mask at frequency domain and method for preparing the same and exposing system using the same'
[patent_app_type] => utility
[patent_app_number] => 11/254729
[patent_app_country] => US
[patent_app_date] => 2005-10-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 9
[patent_no_of_words] => 2008
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 63
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/541/07541116.pdf
[firstpage_image] =>[orig_patent_app_number] => 11254729
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/254729 | Mask at frequency domain and method for preparing the same and exposing system using the same | Oct 20, 2005 | Issued |
Array
(
[id] => 274035
[patent_doc_number] => 07560199
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-07-14
[patent_title] => 'Polarizing photolithography system'
[patent_app_type] => utility
[patent_app_number] => 11/163481
[patent_app_country] => US
[patent_app_date] => 2005-10-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 23
[patent_no_of_words] => 6430
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 33
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/560/07560199.pdf
[firstpage_image] =>[orig_patent_app_number] => 11163481
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/163481 | Polarizing photolithography system | Oct 19, 2005 | Issued |
Array
(
[id] => 81083
[patent_doc_number] => 07745070
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-06-29
[patent_title] => 'Structure of a lithography mask'
[patent_app_type] => utility
[patent_app_number] => 11/665312
[patent_app_country] => US
[patent_app_date] => 2005-10-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 12
[patent_no_of_words] => 3834
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 86
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/745/07745070.pdf
[firstpage_image] =>[orig_patent_app_number] => 11665312
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/665312 | Structure of a lithography mask | Oct 18, 2005 | Issued |
Array
(
[id] => 925574
[patent_doc_number] => 07316872
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-01-08
[patent_title] => 'Etching bias reduction'
[patent_app_type] => utility
[patent_app_number] => 11/252290
[patent_app_country] => US
[patent_app_date] => 2005-10-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 30
[patent_no_of_words] => 3543
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 92
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/316/07316872.pdf
[firstpage_image] =>[orig_patent_app_number] => 11252290
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/252290 | Etching bias reduction | Oct 16, 2005 | Issued |
Array
(
[id] => 337844
[patent_doc_number] => 07504185
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-03-17
[patent_title] => 'Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography'
[patent_app_type] => utility
[patent_app_number] => 11/240437
[patent_app_country] => US
[patent_app_date] => 2005-10-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 16
[patent_no_of_words] => 13534
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 81
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/504/07504185.pdf
[firstpage_image] =>[orig_patent_app_number] => 11240437
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/240437 | Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography | Oct 2, 2005 | Issued |
Array
(
[id] => 216896
[patent_doc_number] => 07611806
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-11-03
[patent_title] => 'Sub-wavelength diffractive elements to reduce corner rounding'
[patent_app_type] => utility
[patent_app_number] => 11/242166
[patent_app_country] => US
[patent_app_date] => 2005-09-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 6518
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 136
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/611/07611806.pdf
[firstpage_image] =>[orig_patent_app_number] => 11242166
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/242166 | Sub-wavelength diffractive elements to reduce corner rounding | Sep 29, 2005 | Issued |
Array
(
[id] => 5726714
[patent_doc_number] => 20060057474
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-03-16
[patent_title] => 'Transparent substrate for mask blank and mask blank'
[patent_app_type] => utility
[patent_app_number] => 11/224087
[patent_app_country] => US
[patent_app_date] => 2005-09-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 7598
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0057/20060057474.pdf
[firstpage_image] =>[orig_patent_app_number] => 11224087
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/224087 | Transparent substrate for mask blank and mask blank | Sep 12, 2005 | Issued |
Array
(
[id] => 4704426
[patent_doc_number] => 20080063950
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-03-13
[patent_title] => 'Photomask Blank and Photomask'
[patent_app_type] => utility
[patent_app_number] => 11/662183
[patent_app_country] => US
[patent_app_date] => 2005-09-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 8578
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0063/20080063950.pdf
[firstpage_image] =>[orig_patent_app_number] => 11662183
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/662183 | Photomask blank and photomask | Sep 7, 2005 | Issued |
Array
(
[id] => 5016067
[patent_doc_number] => 20070259276
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-11-08
[patent_title] => 'Photomask Blank, Photomask and Method for Producing Those'
[patent_app_type] => utility
[patent_app_number] => 11/662479
[patent_app_country] => US
[patent_app_date] => 2005-08-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 8388
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0259/20070259276.pdf
[firstpage_image] =>[orig_patent_app_number] => 11662479
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/662479 | Photomask blank, photomask and method for producing those | Aug 9, 2005 | Issued |
Array
(
[id] => 5242039
[patent_doc_number] => 20070020532
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-01-25
[patent_title] => 'METHOD FOR DESIGNING PHOTOMASK'
[patent_app_type] => utility
[patent_app_number] => 11/161084
[patent_app_country] => US
[patent_app_date] => 2005-07-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 2412
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0020/20070020532.pdf
[firstpage_image] =>[orig_patent_app_number] => 11161084
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/161084 | Method for designing photomask | Jul 21, 2005 | Issued |
Array
(
[id] => 5242038
[patent_doc_number] => 20070020531
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-01-25
[patent_title] => 'PHASE SHIFT MASK FOR PATTERNING ULTRA-SMALL HOLE FEATURES'
[patent_app_type] => utility
[patent_app_number] => 11/160918
[patent_app_country] => US
[patent_app_date] => 2005-07-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 1299
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0020/20070020531.pdf
[firstpage_image] =>[orig_patent_app_number] => 11160918
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/160918 | PHASE SHIFT MASK FOR PATTERNING ULTRA-SMALL HOLE FEATURES | Jul 14, 2005 | Abandoned |
Array
(
[id] => 455361
[patent_doc_number] => 07244334
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-07-17
[patent_title] => 'Apparatus used in reshaping a surface of a photoresist'
[patent_app_type] => utility
[patent_app_number] => 11/183045
[patent_app_country] => US
[patent_app_date] => 2005-07-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 8
[patent_no_of_words] => 5788
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 142
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/244/07244334.pdf
[firstpage_image] =>[orig_patent_app_number] => 11183045
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/183045 | Apparatus used in reshaping a surface of a photoresist | Jul 14, 2005 | Issued |