
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4582855
[patent_doc_number] => 07826033
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-11-02
[patent_title] => 'Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect'
[patent_app_type] => utility
[patent_app_number] => 11/092370
[patent_app_country] => US
[patent_app_date] => 2005-03-29
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/826/07826033.pdf
[firstpage_image] =>[orig_patent_app_number] => 11092370
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/092370 | Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect | Mar 28, 2005 | Issued |
Array
(
[id] => 5776609
[patent_doc_number] => 20060105249
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-05-18
[patent_title] => 'Exposure mask and method of manufacturing the same'
[patent_app_type] => utility
[patent_app_number] => 11/090045
[patent_app_country] => US
[patent_app_date] => 2005-03-28
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0105/20060105249.pdf
[firstpage_image] =>[orig_patent_app_number] => 11090045
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/090045 | Exposure mask and method of manufacturing the same | Mar 27, 2005 | Abandoned |
Array
(
[id] => 6958288
[patent_doc_number] => 20050214658
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-09-29
[patent_title] => 'Method for alleviating tolerance restrictions for feature sizes during fabrication of photomasks'
[patent_app_type] => utility
[patent_app_number] => 11/086668
[patent_app_country] => US
[patent_app_date] => 2005-03-23
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[patent_drawing_sheets_cnt] => 5
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[pdf_file] => publications/A1/0214/20050214658.pdf
[firstpage_image] =>[orig_patent_app_number] => 11086668
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/086668 | Method for alleviating tolerance restrictions for feature sizes during fabrication of photomasks | Mar 22, 2005 | Abandoned |
Array
(
[id] => 803127
[patent_doc_number] => 07422830
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-09-09
[patent_title] => 'Method for detecting failure of database patterns of photo mask'
[patent_app_type] => utility
[patent_app_number] => 11/084618
[patent_app_country] => US
[patent_app_date] => 2005-03-17
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/422/07422830.pdf
[firstpage_image] =>[orig_patent_app_number] => 11084618
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/084618 | Method for detecting failure of database patterns of photo mask | Mar 16, 2005 | Issued |
Array
(
[id] => 7039204
[patent_doc_number] => 20050158638
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-21
[patent_title] => 'Photomask and pattern forming method employing the same'
[patent_app_type] => utility
[patent_app_number] => 11/080511
[patent_app_country] => US
[patent_app_date] => 2005-03-16
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[firstpage_image] =>[orig_patent_app_number] => 11080511
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/080511 | Photomask and pattern forming method employing the same | Mar 15, 2005 | Abandoned |
Array
(
[id] => 7039204
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[patent_kind] => A1
[patent_issue_date] => 2005-07-21
[patent_title] => 'Photomask and pattern forming method employing the same'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/080511 | Photomask and pattern forming method employing the same | Mar 15, 2005 | Abandoned |
Array
(
[id] => 295846
[patent_doc_number] => 07541115
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2009-06-02
[patent_title] => 'Use of calcium fluoride substrate for lithography masks'
[patent_app_type] => utility
[patent_app_number] => 11/075993
[patent_app_country] => US
[patent_app_date] => 2005-03-09
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/541/07541115.pdf
[firstpage_image] =>[orig_patent_app_number] => 11075993
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/075993 | Use of calcium fluoride substrate for lithography masks | Mar 8, 2005 | Issued |
Array
(
[id] => 5613815
[patent_doc_number] => 20060115743
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-06-01
[patent_title] => 'Reticle and method of fabricating semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 11/066154
[patent_app_country] => US
[patent_app_date] => 2005-02-28
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0115/20060115743.pdf
[firstpage_image] =>[orig_patent_app_number] => 11066154
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/066154 | Reticle and method of fabricating semiconductor device | Feb 27, 2005 | Issued |
Array
(
[id] => 806517
[patent_doc_number] => 07419749
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-09-02
[patent_title] => 'Halftone phase shift mask blank, halftone phase shift mask and their preparation'
[patent_app_type] => utility
[patent_app_number] => 11/062438
[patent_app_country] => US
[patent_app_date] => 2005-02-23
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[firstpage_image] =>[orig_patent_app_number] => 11062438
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/062438 | Halftone phase shift mask blank, halftone phase shift mask and their preparation | Feb 22, 2005 | Issued |
Array
(
[id] => 800248
[patent_doc_number] => 07425390
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-09-16
[patent_title] => 'Preparation of halftone phase shift mask blank'
[patent_app_type] => utility
[patent_app_number] => 11/059529
[patent_app_country] => US
[patent_app_date] => 2005-02-17
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[pdf_file] => patents/07/425/07425390.pdf
[firstpage_image] =>[orig_patent_app_number] => 11059529
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/059529 | Preparation of halftone phase shift mask blank | Feb 16, 2005 | Issued |
Array
(
[id] => 6958286
[patent_doc_number] => 20050214656
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-09-29
[patent_title] => 'Process for producing a mask'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/059637 | Process for producing a mask | Feb 15, 2005 | Issued |
Array
(
[id] => 6944634
[patent_doc_number] => 20050196683
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-09-08
[patent_title] => 'Method for producing a phase mask'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/056402 | Method for producing a phase mask | Feb 13, 2005 | Issued |
Array
(
[id] => 902700
[patent_doc_number] => RE040084
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[patent_issue_date] => 2008-02-19
[patent_title] => 'Optical proximity correction'
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Array
(
[id] => 797870
[patent_doc_number] => 07427456
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[patent_issue_date] => 2008-09-23
[patent_title] => 'Layout of a vertical pattern used in dipole exposure apparatus'
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[firstpage_image] =>[orig_patent_app_number] => 10905607
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/905607 | Layout of a vertical pattern used in dipole exposure apparatus | Jan 11, 2005 | Issued |
Array
(
[id] => 843343
[patent_doc_number] => 07387855
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-06-17
[patent_title] => 'Anti-ESD photomask blank'
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[firstpage_image] =>[orig_patent_app_number] => 11032793
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/032793 | Anti-ESD photomask blank | Jan 9, 2005 | Issued |
Array
(
[id] => 6983148
[patent_doc_number] => 20050153218
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[patent_title] => 'Photomasks'
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[pdf_file] => publications/A1/0153/20050153218.pdf
[firstpage_image] =>[orig_patent_app_number] => 11026486
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/026486 | Photomasks | Dec 28, 2004 | Issued |
Array
(
[id] => 4555850
[patent_doc_number] => 07838208
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[patent_issue_date] => 2010-11-23
[patent_title] => 'Programmable self-aligning liquid magnetic nanoparticle masks and methods for their use'
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[firstpage_image] =>[orig_patent_app_number] => 10585161
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/585161 | Programmable self-aligning liquid magnetic nanoparticle masks and methods for their use | Dec 28, 2004 | Issued |
Array
(
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/024343 | Line photo masks and methods of forming semiconductor devices using the same | Dec 26, 2004 | Issued |
Array
(
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[firstpage_image] =>[orig_patent_app_number] => 11023307
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/023307 | Method for forming mask pattern of semiconductor device | Dec 26, 2004 | Issued |