
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 571630
[patent_doc_number] => 07459243
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-12-02
[patent_title] => 'Method of correcting mask pattern'
[patent_app_type] => utility
[patent_app_number] => 10/942034
[patent_app_country] => US
[patent_app_date] => 2004-09-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 3788
[patent_no_of_claims] => 4
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[patent_words_short_claim] => 273
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/459/07459243.pdf
[firstpage_image] =>[orig_patent_app_number] => 10942034
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/942034 | Method of correcting mask pattern | Sep 15, 2004 | Issued |
Array
(
[id] => 7083001
[patent_doc_number] => 20050048381
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-03-03
[patent_title] => 'Semiconductor device and method of forming the same as well as a photo-mask used therein'
[patent_app_type] => utility
[patent_app_number] => 10/938504
[patent_app_country] => US
[patent_app_date] => 2004-09-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
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[patent_no_of_words] => 5572
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[pdf_file] => publications/A1/0048/20050048381.pdf
[firstpage_image] =>[orig_patent_app_number] => 10938504
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/938504 | Semiconductor device and method of forming the same as well as a photo-mask used therein | Sep 12, 2004 | Issued |
Array
(
[id] => 916791
[patent_doc_number] => 07323277
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-01-29
[patent_title] => 'Photomask'
[patent_app_type] => utility
[patent_app_number] => 10/938989
[patent_app_country] => US
[patent_app_date] => 2004-09-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 4555
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/323/07323277.pdf
[firstpage_image] =>[orig_patent_app_number] => 10938989
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/938989 | Photomask | Sep 9, 2004 | Issued |
Array
(
[id] => 7033462
[patent_doc_number] => 20050031971
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-02-10
[patent_title] => 'Design and layout of phase shifting photolithographic masks'
[patent_app_type] => utility
[patent_app_number] => 10/938653
[patent_app_country] => US
[patent_app_date] => 2004-09-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 25
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[patent_no_of_words] => 11297
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[pdf_file] => publications/A1/0031/20050031971.pdf
[firstpage_image] =>[orig_patent_app_number] => 10938653
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/938653 | Design and layout of phase shifting photolithographic masks | Sep 9, 2004 | Issued |
Array
(
[id] => 7033463
[patent_doc_number] => 20050031972
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-02-10
[patent_title] => 'Design and layout of phase shifting photolithographic masks'
[patent_app_type] => utility
[patent_app_number] => 10/939104
[patent_app_country] => US
[patent_app_date] => 2004-09-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 25
[patent_figures_cnt] => 25
[patent_no_of_words] => 11300
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[pdf_file] => publications/A1/0031/20050031972.pdf
[firstpage_image] =>[orig_patent_app_number] => 10939104
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/939104 | Design and layout of phase shifting photolithographic masks | Sep 9, 2004 | Issued |
Array
(
[id] => 5135204
[patent_doc_number] => 20070076833
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-04-05
[patent_title] => 'Attenuated phase shift mask blank and photomask'
[patent_app_type] => utility
[patent_app_number] => 10/570612
[patent_app_country] => US
[patent_app_date] => 2004-09-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 20
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[patent_no_of_words] => 13271
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[pdf_file] => publications/A1/0076/20070076833.pdf
[firstpage_image] =>[orig_patent_app_number] => 10570612
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/570612 | Attenuated phase shift mask blank and photomask | Sep 5, 2004 | Abandoned |
Array
(
[id] => 5051191
[patent_doc_number] => 20070031736
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-02-08
[patent_title] => 'Method and apparatus for compensating for the effects of gravity on pellicle used for protecting a reticle from contamination'
[patent_app_type] => utility
[patent_app_number] => 10/572469
[patent_app_country] => US
[patent_app_date] => 2004-09-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 2255
[patent_no_of_claims] => 12
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0031/20070031736.pdf
[firstpage_image] =>[orig_patent_app_number] => 10572469
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/572469 | Method and apparatus for compensating for the effects of gravity on pellicle used for protecting a reticle from contamination | Sep 1, 2004 | Abandoned |
Array
(
[id] => 401061
[patent_doc_number] => 07291425
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-11-06
[patent_title] => 'Radiation patterning tools, and methods of forming radiation patterning tools'
[patent_app_type] => utility
[patent_app_number] => 10/931883
[patent_app_country] => US
[patent_app_date] => 2004-09-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 53
[patent_figures_cnt] => 63
[patent_no_of_words] => 13006
[patent_no_of_claims] => 47
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/291/07291425.pdf
[firstpage_image] =>[orig_patent_app_number] => 10931883
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/931883 | Radiation patterning tools, and methods of forming radiation patterning tools | Aug 31, 2004 | Issued |
Array
(
[id] => 879236
[patent_doc_number] => 07354683
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-04-08
[patent_title] => 'Lithography mask for imaging of convex structures'
[patent_app_type] => utility
[patent_app_number] => 10/928759
[patent_app_country] => US
[patent_app_date] => 2004-08-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 8072
[patent_no_of_claims] => 30
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/354/07354683.pdf
[firstpage_image] =>[orig_patent_app_number] => 10928759
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/928759 | Lithography mask for imaging of convex structures | Aug 26, 2004 | Issued |
Array
(
[id] => 806516
[patent_doc_number] => 07419748
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2008-09-02
[patent_title] => 'Photomask with reduced electrostatic discharge defects'
[patent_app_type] => utility
[patent_app_number] => 10/925606
[patent_app_country] => US
[patent_app_date] => 2004-08-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 7
[patent_no_of_words] => 3792
[patent_no_of_claims] => 21
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/419/07419748.pdf
[firstpage_image] =>[orig_patent_app_number] => 10925606
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/925606 | Photomask with reduced electrostatic discharge defects | Aug 23, 2004 | Issued |
Array
(
[id] => 6990730
[patent_doc_number] => 20050089767
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-04-28
[patent_title] => 'Mask for off axis illumination and method for manufacturing the same'
[patent_app_type] => utility
[patent_app_number] => 10/922898
[patent_app_country] => US
[patent_app_date] => 2004-08-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 3753
[patent_no_of_claims] => 14
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[pdf_file] => publications/A1/0089/20050089767.pdf
[firstpage_image] =>[orig_patent_app_number] => 10922898
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/922898 | Mask for off axis illumination and method for manufacturing the same | Aug 22, 2004 | Abandoned |
Array
(
[id] => 588142
[patent_doc_number] => 07435533
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-10-14
[patent_title] => 'Method of forming a semiconductor layer using a photomask reticle having multiple versions of the same mask pattern with different biases'
[patent_app_type] => utility
[patent_app_number] => 10/920475
[patent_app_country] => US
[patent_app_date] => 2004-08-18
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 5139
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[pdf_file] => patents/07/435/07435533.pdf
[firstpage_image] =>[orig_patent_app_number] => 10920475
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/920475 | Method of forming a semiconductor layer using a photomask reticle having multiple versions of the same mask pattern with different biases | Aug 17, 2004 | Issued |
Array
(
[id] => 556107
[patent_doc_number] => 07470489
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-12-30
[patent_title] => 'Method for designing alternating phase shift masks'
[patent_app_type] => utility
[patent_app_number] => 10/920786
[patent_app_country] => US
[patent_app_date] => 2004-08-18
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 6409
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/470/07470489.pdf
[firstpage_image] =>[orig_patent_app_number] => 10920786
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/920786 | Method for designing alternating phase shift masks | Aug 17, 2004 | Issued |
Array
(
[id] => 246844
[patent_doc_number] => 07585595
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-09-08
[patent_title] => 'Phase shift mask including sub-resolution assist features for isolated spaces'
[patent_app_type] => utility
[patent_app_number] => 10/920027
[patent_app_country] => US
[patent_app_date] => 2004-08-17
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/585/07585595.pdf
[firstpage_image] =>[orig_patent_app_number] => 10920027
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/920027 | Phase shift mask including sub-resolution assist features for isolated spaces | Aug 16, 2004 | Issued |
Array
(
[id] => 472029
[patent_doc_number] => 07229724
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-06-12
[patent_title] => 'Reticles and methods of forming and using the same'
[patent_app_type] => utility
[patent_app_number] => 10/919059
[patent_app_country] => US
[patent_app_date] => 2004-08-16
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/229/07229724.pdf
[firstpage_image] =>[orig_patent_app_number] => 10919059
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/919059 | Reticles and methods of forming and using the same | Aug 15, 2004 | Issued |
Array
(
[id] => 7201857
[patent_doc_number] => 20050042526
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-02-24
[patent_title] => 'Photomask blank and method of fabricating a photomask from the same'
[patent_app_type] => utility
[patent_app_number] => 10/913529
[patent_app_country] => US
[patent_app_date] => 2004-08-09
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0042/20050042526.pdf
[firstpage_image] =>[orig_patent_app_number] => 10913529
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/913529 | Photomask blank and method of fabricating a photomask from the same | Aug 8, 2004 | Issued |
Array
(
[id] => 820400
[patent_doc_number] => 07407729
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-08-05
[patent_title] => 'EUV magnetic contrast lithography mask and manufacture thereof'
[patent_app_type] => utility
[patent_app_number] => 10/912658
[patent_app_country] => US
[patent_app_date] => 2004-08-05
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[pdf_file] => patents/07/407/07407729.pdf
[firstpage_image] =>[orig_patent_app_number] => 10912658
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/912658 | EUV magnetic contrast lithography mask and manufacture thereof | Aug 4, 2004 | Issued |
Array
(
[id] => 7060921
[patent_doc_number] => 20050003282
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-01-06
[patent_title] => 'Stencil mask and method of producing the same, semiconductor device produced using the stencil mask and method of producing the semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 10/902092
[patent_app_country] => US
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[pdf_file] => publications/A1/0003/20050003282.pdf
[firstpage_image] =>[orig_patent_app_number] => 10902092
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/902092 | Stencil mask and method of producing the same, semiconductor device produced using the stencil mask and method of producing the semiconductor device | Jul 29, 2004 | Abandoned |
Array
(
[id] => 7025282
[patent_doc_number] => 20050019676
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[patent_issue_date] => 2005-01-27
[patent_title] => 'Method of selecting photomask blank substrates'
[patent_app_type] => utility
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[firstpage_image] =>[orig_patent_app_number] => 10896968
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/896968 | Method of selecting photomask blank substrates | Jul 22, 2004 | Issued |
Array
(
[id] => 7025283
[patent_doc_number] => 20050019677
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[patent_issue_date] => 2005-01-27
[patent_title] => 'Photomask blank substrate, photomask blank and photomask'
[patent_app_type] => utility
[patent_app_number] => 10/896970
[patent_app_country] => US
[patent_app_date] => 2004-07-23
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[pdf_file] => publications/A1/0019/20050019677.pdf
[firstpage_image] =>[orig_patent_app_number] => 10896970
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/896970 | Photomask blank substrate, photomask blank and photomask | Jul 22, 2004 | Issued |