
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 891381
[patent_doc_number] => 07344808
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-03-18
[patent_title] => 'Method of making photomask blank substrates'
[patent_app_type] => utility
[patent_app_number] => 10/896946
[patent_app_country] => US
[patent_app_date] => 2004-07-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 25
[patent_no_of_words] => 10085
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 214
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/344/07344808.pdf
[firstpage_image] =>[orig_patent_app_number] => 10896946
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/896946 | Method of making photomask blank substrates | Jul 22, 2004 | Issued |
Array
(
[id] => 830006
[patent_doc_number] => 07399558
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-07-15
[patent_title] => 'Mask and manufacturing method thereof and exposure method'
[patent_app_type] => utility
[patent_app_number] => 10/896538
[patent_app_country] => US
[patent_app_date] => 2004-07-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
[patent_figures_cnt] => 35
[patent_no_of_words] => 9435
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 185
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/399/07399558.pdf
[firstpage_image] =>[orig_patent_app_number] => 10896538
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/896538 | Mask and manufacturing method thereof and exposure method | Jul 21, 2004 | Issued |
Array
(
[id] => 587941
[patent_doc_number] => 07435512
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-10-14
[patent_title] => 'Photolithography process and photomask structure implemented in a photolithography process'
[patent_app_type] => utility
[patent_app_number] => 10/894924
[patent_app_country] => US
[patent_app_date] => 2004-07-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 2661
[patent_no_of_claims] => 15
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[patent_words_short_claim] => 85
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/435/07435512.pdf
[firstpage_image] =>[orig_patent_app_number] => 10894924
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/894924 | Photolithography process and photomask structure implemented in a photolithography process | Jul 19, 2004 | Issued |
Array
(
[id] => 602258
[patent_doc_number] => 07432021
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-10-07
[patent_title] => 'Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle'
[patent_app_type] => utility
[patent_app_number] => 10/890299
[patent_app_country] => US
[patent_app_date] => 2004-07-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 24
[patent_figures_cnt] => 43
[patent_no_of_words] => 12215
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/432/07432021.pdf
[firstpage_image] =>[orig_patent_app_number] => 10890299
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/890299 | Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle | Jul 13, 2004 | Issued |
Array
(
[id] => 5738359
[patent_doc_number] => 20060008749
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-01-12
[patent_title] => 'Method for manufacturing of a mask blank for EUV photolithography and mask blank'
[patent_app_type] => utility
[patent_app_number] => 10/885898
[patent_app_country] => US
[patent_app_date] => 2004-07-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 5937
[patent_no_of_claims] => 27
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0008/20060008749.pdf
[firstpage_image] =>[orig_patent_app_number] => 10885898
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/885898 | Method for manufacturing of a mask blank for EUV photolithography and mask blank | Jul 7, 2004 | Abandoned |
Array
(
[id] => 887472
[patent_doc_number] => 07348107
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-03-25
[patent_title] => 'Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 10/886767
[patent_app_country] => US
[patent_app_date] => 2004-07-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 3861
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/348/07348107.pdf
[firstpage_image] =>[orig_patent_app_number] => 10886767
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/886767 | Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method | Jul 7, 2004 | Issued |
Array
(
[id] => 7088836
[patent_doc_number] => 20050008948
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-01-13
[patent_title] => 'Complementary division mask, method of producing mask, and program'
[patent_app_type] => utility
[patent_app_number] => 10/885822
[patent_app_country] => US
[patent_app_date] => 2004-07-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 4983
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0008/20050008948.pdf
[firstpage_image] =>[orig_patent_app_number] => 10885822
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/885822 | Complementary division mask, method of producing mask, and program | Jul 6, 2004 | Issued |
Array
(
[id] => 7275826
[patent_doc_number] => 20040235277
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-11-25
[patent_title] => '2N mask design for sequential lateral solidification'
[patent_app_type] => new
[patent_app_number] => 10/883230
[patent_app_country] => US
[patent_app_date] => 2004-07-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 2489
[patent_no_of_claims] => 20
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0235/20040235277.pdf
[firstpage_image] =>[orig_patent_app_number] => 10883230
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/883230 | 2N mask design for sequential lateral solidification | Jun 30, 2004 | Issued |
Array
(
[id] => 852814
[patent_doc_number] => 07378195
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-05-27
[patent_title] => 'System for coloring a partially colored design in an alternating phase shift mask'
[patent_app_type] => utility
[patent_app_number] => 10/710224
[patent_app_country] => US
[patent_app_date] => 2004-06-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
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[patent_no_of_words] => 6161
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[pdf_file] => patents/07/378/07378195.pdf
[firstpage_image] =>[orig_patent_app_number] => 10710224
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/710224 | System for coloring a partially colored design in an alternating phase shift mask | Jun 27, 2004 | Issued |
Array
(
[id] => 411294
[patent_doc_number] => 07282307
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-10-16
[patent_title] => 'Reflective mask useful for transferring a pattern using extreme ultra violet (EUV) radiation and method of making the same'
[patent_app_type] => utility
[patent_app_number] => 10/872057
[patent_app_country] => US
[patent_app_date] => 2004-06-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 8696
[patent_no_of_claims] => 24
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[pdf_file] => patents/07/282/07282307.pdf
[firstpage_image] =>[orig_patent_app_number] => 10872057
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/872057 | Reflective mask useful for transferring a pattern using extreme ultra violet (EUV) radiation and method of making the same | Jun 17, 2004 | Issued |
Array
(
[id] => 7060923
[patent_doc_number] => 20050003284
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-01-06
[patent_title] => 'Method of correcting optical proximity effect of contact holes'
[patent_app_type] => utility
[patent_app_number] => 10/871755
[patent_app_country] => US
[patent_app_date] => 2004-06-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 2712
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[pdf_file] => publications/A1/0003/20050003284.pdf
[firstpage_image] =>[orig_patent_app_number] => 10871755
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/871755 | Method of correcting optical proximity effect of contact holes | Jun 17, 2004 | Issued |
Array
(
[id] => 785059
[patent_doc_number] => 06989219
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-01-24
[patent_title] => 'Hardmask/barrier layer for dry etching chrome films and improving post develop resist profiles on photomasks'
[patent_app_type] => utility
[patent_app_number] => 10/871941
[patent_app_country] => US
[patent_app_date] => 2004-06-17
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/989/06989219.pdf
[firstpage_image] =>[orig_patent_app_number] => 10871941
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/871941 | Hardmask/barrier layer for dry etching chrome films and improving post develop resist profiles on photomasks | Jun 16, 2004 | Issued |
Array
(
[id] => 833328
[patent_doc_number] => 07396617
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-07-08
[patent_title] => 'Photomask reticle having multiple versions of the same mask pattern with different biases'
[patent_app_type] => utility
[patent_app_number] => 10/866976
[patent_app_country] => US
[patent_app_date] => 2004-06-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => patents/07/396/07396617.pdf
[firstpage_image] =>[orig_patent_app_number] => 10866976
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/866976 | Photomask reticle having multiple versions of the same mask pattern with different biases | Jun 13, 2004 | Issued |
Array
(
[id] => 577257
[patent_doc_number] => 07452637
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-11-18
[patent_title] => 'Method and apparatus for clean photomask handling'
[patent_app_type] => utility
[patent_app_number] => 10/865145
[patent_app_country] => US
[patent_app_date] => 2004-06-09
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[pdf_file] => patents/07/452/07452637.pdf
[firstpage_image] =>[orig_patent_app_number] => 10865145
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/865145 | Method and apparatus for clean photomask handling | Jun 8, 2004 | Issued |
Array
(
[id] => 390129
[patent_doc_number] => 07300724
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-11-27
[patent_title] => 'Interference multilayer capping design for multilayer reflective mask blanks'
[patent_app_type] => utility
[patent_app_number] => 10/864945
[patent_app_country] => US
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[pdf_file] => patents/07/300/07300724.pdf
[firstpage_image] =>[orig_patent_app_number] => 10864945
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/864945 | Interference multilayer capping design for multilayer reflective mask blanks | Jun 8, 2004 | Issued |
Array
(
[id] => 5182850
[patent_doc_number] => 20070054196
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-03-08
[patent_title] => 'Fabrication method of extreme ultraviolet radiation mask mirror using atomic force microscope lithography'
[patent_app_type] => utility
[patent_app_number] => 10/578683
[patent_app_country] => US
[patent_app_date] => 2004-06-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[pdf_file] => publications/A1/0054/20070054196.pdf
[firstpage_image] =>[orig_patent_app_number] => 10578683
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/578683 | Fabrication method of extreme ultraviolet radiation mask mirror using atomic force microscope lithography | Jun 7, 2004 | Issued |
Array
(
[id] => 830005
[patent_doc_number] => 07399557
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-07-15
[patent_title] => 'Photomask correcting method and manufacturing method of semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 10/860138
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[firstpage_image] =>[orig_patent_app_number] => 10860138
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/860138 | Photomask correcting method and manufacturing method of semiconductor device | Jun 3, 2004 | Issued |
Array
(
[id] => 803126
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[patent_issue_date] => 2008-09-09
[patent_title] => 'Optical proximity correction (OPC) technique to compensate for flare'
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[patent_app_number] => 10/859276
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[firstpage_image] =>[orig_patent_app_number] => 10859276
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/859276 | Optical proximity correction (OPC) technique to compensate for flare | Jun 1, 2004 | Issued |
Array
(
[id] => 7251452
[patent_doc_number] => 20040259042
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[patent_issue_date] => 2004-12-23
[patent_title] => 'Method and system of lithography using masks having gray-tone features'
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[firstpage_image] =>[orig_patent_app_number] => 10855546
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/855546 | Method and system of lithography using masks having gray-tone features | May 26, 2004 | Issued |
Array
(
[id] => 507645
[patent_doc_number] => 07198872
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[patent_kind] => B2
[patent_issue_date] => 2007-04-03
[patent_title] => 'Light scattering EUVL mask'
[patent_app_type] => utility
[patent_app_number] => 10/709733
[patent_app_country] => US
[patent_app_date] => 2004-05-25
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/198/07198872.pdf
[firstpage_image] =>[orig_patent_app_number] => 10709733
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/709733 | Light scattering EUVL mask | May 24, 2004 | Issued |