Search

Liliana Di Nola Baron

Examiner (ID: 15438)

Most Active Art Unit
1615
Art Unit(s)
1615
Total Applications
361
Issued Applications
209
Pending Applications
88
Abandoned Applications
63

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 891381 [patent_doc_number] => 07344808 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-03-18 [patent_title] => 'Method of making photomask blank substrates' [patent_app_type] => utility [patent_app_number] => 10/896946 [patent_app_country] => US [patent_app_date] => 2004-07-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 25 [patent_no_of_words] => 10085 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 214 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/344/07344808.pdf [firstpage_image] =>[orig_patent_app_number] => 10896946 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/896946
Method of making photomask blank substrates Jul 22, 2004 Issued
Array ( [id] => 830006 [patent_doc_number] => 07399558 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-07-15 [patent_title] => 'Mask and manufacturing method thereof and exposure method' [patent_app_type] => utility [patent_app_number] => 10/896538 [patent_app_country] => US [patent_app_date] => 2004-07-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 18 [patent_figures_cnt] => 35 [patent_no_of_words] => 9435 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 185 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/399/07399558.pdf [firstpage_image] =>[orig_patent_app_number] => 10896538 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/896538
Mask and manufacturing method thereof and exposure method Jul 21, 2004 Issued
Array ( [id] => 587941 [patent_doc_number] => 07435512 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-10-14 [patent_title] => 'Photolithography process and photomask structure implemented in a photolithography process' [patent_app_type] => utility [patent_app_number] => 10/894924 [patent_app_country] => US [patent_app_date] => 2004-07-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 2661 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 85 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/435/07435512.pdf [firstpage_image] =>[orig_patent_app_number] => 10894924 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/894924
Photolithography process and photomask structure implemented in a photolithography process Jul 19, 2004 Issued
Array ( [id] => 602258 [patent_doc_number] => 07432021 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-10-07 [patent_title] => 'Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle' [patent_app_type] => utility [patent_app_number] => 10/890299 [patent_app_country] => US [patent_app_date] => 2004-07-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 24 [patent_figures_cnt] => 43 [patent_no_of_words] => 12215 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 52 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/432/07432021.pdf [firstpage_image] =>[orig_patent_app_number] => 10890299 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/890299
Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle Jul 13, 2004 Issued
Array ( [id] => 5738359 [patent_doc_number] => 20060008749 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-01-12 [patent_title] => 'Method for manufacturing of a mask blank for EUV photolithography and mask blank' [patent_app_type] => utility [patent_app_number] => 10/885898 [patent_app_country] => US [patent_app_date] => 2004-07-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 5937 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0008/20060008749.pdf [firstpage_image] =>[orig_patent_app_number] => 10885898 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/885898
Method for manufacturing of a mask blank for EUV photolithography and mask blank Jul 7, 2004 Abandoned
Array ( [id] => 887472 [patent_doc_number] => 07348107 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-03-25 [patent_title] => 'Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method' [patent_app_type] => utility [patent_app_number] => 10/886767 [patent_app_country] => US [patent_app_date] => 2004-07-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 9 [patent_no_of_words] => 3861 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 48 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/348/07348107.pdf [firstpage_image] =>[orig_patent_app_number] => 10886767 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/886767
Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method Jul 7, 2004 Issued
Array ( [id] => 7088836 [patent_doc_number] => 20050008948 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-01-13 [patent_title] => 'Complementary division mask, method of producing mask, and program' [patent_app_type] => utility [patent_app_number] => 10/885822 [patent_app_country] => US [patent_app_date] => 2004-07-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 4983 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0008/20050008948.pdf [firstpage_image] =>[orig_patent_app_number] => 10885822 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/885822
Complementary division mask, method of producing mask, and program Jul 6, 2004 Issued
Array ( [id] => 7275826 [patent_doc_number] => 20040235277 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-11-25 [patent_title] => '2N mask design for sequential lateral solidification' [patent_app_type] => new [patent_app_number] => 10/883230 [patent_app_country] => US [patent_app_date] => 2004-07-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 2489 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 10 [patent_words_short_claim] => 2 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0235/20040235277.pdf [firstpage_image] =>[orig_patent_app_number] => 10883230 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/883230
2N mask design for sequential lateral solidification Jun 30, 2004 Issued
Array ( [id] => 852814 [patent_doc_number] => 07378195 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-05-27 [patent_title] => 'System for coloring a partially colored design in an alternating phase shift mask' [patent_app_type] => utility [patent_app_number] => 10/710224 [patent_app_country] => US [patent_app_date] => 2004-06-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 17 [patent_no_of_words] => 6161 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 329 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/378/07378195.pdf [firstpage_image] =>[orig_patent_app_number] => 10710224 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/710224
System for coloring a partially colored design in an alternating phase shift mask Jun 27, 2004 Issued
Array ( [id] => 411294 [patent_doc_number] => 07282307 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-10-16 [patent_title] => 'Reflective mask useful for transferring a pattern using extreme ultra violet (EUV) radiation and method of making the same' [patent_app_type] => utility [patent_app_number] => 10/872057 [patent_app_country] => US [patent_app_date] => 2004-06-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 8696 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/282/07282307.pdf [firstpage_image] =>[orig_patent_app_number] => 10872057 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/872057
Reflective mask useful for transferring a pattern using extreme ultra violet (EUV) radiation and method of making the same Jun 17, 2004 Issued
Array ( [id] => 7060923 [patent_doc_number] => 20050003284 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-01-06 [patent_title] => 'Method of correcting optical proximity effect of contact holes' [patent_app_type] => utility [patent_app_number] => 10/871755 [patent_app_country] => US [patent_app_date] => 2004-06-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 2712 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0003/20050003284.pdf [firstpage_image] =>[orig_patent_app_number] => 10871755 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/871755
Method of correcting optical proximity effect of contact holes Jun 17, 2004 Issued
Array ( [id] => 785059 [patent_doc_number] => 06989219 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-01-24 [patent_title] => 'Hardmask/barrier layer for dry etching chrome films and improving post develop resist profiles on photomasks' [patent_app_type] => utility [patent_app_number] => 10/871941 [patent_app_country] => US [patent_app_date] => 2004-06-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 15 [patent_no_of_words] => 7528 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/989/06989219.pdf [firstpage_image] =>[orig_patent_app_number] => 10871941 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/871941
Hardmask/barrier layer for dry etching chrome films and improving post develop resist profiles on photomasks Jun 16, 2004 Issued
Array ( [id] => 833328 [patent_doc_number] => 07396617 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-07-08 [patent_title] => 'Photomask reticle having multiple versions of the same mask pattern with different biases' [patent_app_type] => utility [patent_app_number] => 10/866976 [patent_app_country] => US [patent_app_date] => 2004-06-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 14 [patent_no_of_words] => 5404 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 15 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/396/07396617.pdf [firstpage_image] =>[orig_patent_app_number] => 10866976 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/866976
Photomask reticle having multiple versions of the same mask pattern with different biases Jun 13, 2004 Issued
Array ( [id] => 577257 [patent_doc_number] => 07452637 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-11-18 [patent_title] => 'Method and apparatus for clean photomask handling' [patent_app_type] => utility [patent_app_number] => 10/865145 [patent_app_country] => US [patent_app_date] => 2004-06-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 3147 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/452/07452637.pdf [firstpage_image] =>[orig_patent_app_number] => 10865145 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/865145
Method and apparatus for clean photomask handling Jun 8, 2004 Issued
Array ( [id] => 390129 [patent_doc_number] => 07300724 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-11-27 [patent_title] => 'Interference multilayer capping design for multilayer reflective mask blanks' [patent_app_type] => utility [patent_app_number] => 10/864945 [patent_app_country] => US [patent_app_date] => 2004-06-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 1834 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 55 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/300/07300724.pdf [firstpage_image] =>[orig_patent_app_number] => 10864945 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/864945
Interference multilayer capping design for multilayer reflective mask blanks Jun 8, 2004 Issued
Array ( [id] => 5182850 [patent_doc_number] => 20070054196 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-03-08 [patent_title] => 'Fabrication method of extreme ultraviolet radiation mask mirror using atomic force microscope lithography' [patent_app_type] => utility [patent_app_number] => 10/578683 [patent_app_country] => US [patent_app_date] => 2004-06-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 2697 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0054/20070054196.pdf [firstpage_image] =>[orig_patent_app_number] => 10578683 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/578683
Fabrication method of extreme ultraviolet radiation mask mirror using atomic force microscope lithography Jun 7, 2004 Issued
Array ( [id] => 830005 [patent_doc_number] => 07399557 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-07-15 [patent_title] => 'Photomask correcting method and manufacturing method of semiconductor device' [patent_app_type] => utility [patent_app_number] => 10/860138 [patent_app_country] => US [patent_app_date] => 2004-06-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 17 [patent_figures_cnt] => 40 [patent_no_of_words] => 5740 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 336 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/399/07399557.pdf [firstpage_image] =>[orig_patent_app_number] => 10860138 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/860138
Photomask correcting method and manufacturing method of semiconductor device Jun 3, 2004 Issued
Array ( [id] => 803126 [patent_doc_number] => 07422829 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2008-09-09 [patent_title] => 'Optical proximity correction (OPC) technique to compensate for flare' [patent_app_type] => utility [patent_app_number] => 10/859276 [patent_app_country] => US [patent_app_date] => 2004-06-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 20 [patent_no_of_words] => 5576 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/422/07422829.pdf [firstpage_image] =>[orig_patent_app_number] => 10859276 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/859276
Optical proximity correction (OPC) technique to compensate for flare Jun 1, 2004 Issued
Array ( [id] => 7251452 [patent_doc_number] => 20040259042 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-12-23 [patent_title] => 'Method and system of lithography using masks having gray-tone features' [patent_app_type] => new [patent_app_number] => 10/855546 [patent_app_country] => US [patent_app_date] => 2004-05-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 11749 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 3 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0259/20040259042.pdf [firstpage_image] =>[orig_patent_app_number] => 10855546 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/855546
Method and system of lithography using masks having gray-tone features May 26, 2004 Issued
Array ( [id] => 507645 [patent_doc_number] => 07198872 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-04-03 [patent_title] => 'Light scattering EUVL mask' [patent_app_type] => utility [patent_app_number] => 10/709733 [patent_app_country] => US [patent_app_date] => 2004-05-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 10 [patent_no_of_words] => 3733 [patent_no_of_claims] => 48 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/198/07198872.pdf [firstpage_image] =>[orig_patent_app_number] => 10709733 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/709733
Light scattering EUVL mask May 24, 2004 Issued
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