
Liliana Di Nola Baron
Examiner (ID: 15438)
| Most Active Art Unit | 1615 |
| Art Unit(s) | 1615 |
| Total Applications | 361 |
| Issued Applications | 209 |
| Pending Applications | 88 |
| Abandoned Applications | 63 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 7218816
[patent_doc_number] => 20050260503
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-11-24
[patent_title] => 'Reticle film stabilizing method'
[patent_app_type] => utility
[patent_app_number] => 10/851042
[patent_app_country] => US
[patent_app_date] => 2004-05-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 2958
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0260/20050260503.pdf
[firstpage_image] =>[orig_patent_app_number] => 10851042
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/851042 | Reticle film stabilizing method | May 19, 2004 | Abandoned |
Array
(
[id] => 7218811
[patent_doc_number] => 20050260502
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-11-24
[patent_title] => 'Method and mask for forming a photo-induced pattern'
[patent_app_type] => utility
[patent_app_number] => 10/847899
[patent_app_country] => US
[patent_app_date] => 2004-05-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 2486
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0260/20050260502.pdf
[firstpage_image] =>[orig_patent_app_number] => 10847899
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/847899 | Method and mask for forming a photo-induced pattern | May 17, 2004 | Abandoned |
Array
(
[id] => 813506
[patent_doc_number] => 07413833
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-08-19
[patent_title] => 'Single exposure of mask levels having a lines and spaces array using alternating phase-shift mask'
[patent_app_type] => utility
[patent_app_number] => 10/846275
[patent_app_country] => US
[patent_app_date] => 2004-05-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 22
[patent_no_of_words] => 6607
[patent_no_of_claims] => 51
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 138
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/413/07413833.pdf
[firstpage_image] =>[orig_patent_app_number] => 10846275
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/846275 | Single exposure of mask levels having a lines and spaces array using alternating phase-shift mask | May 13, 2004 | Issued |
Array
(
[id] => 931015
[patent_doc_number] => 06979519
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-12-27
[patent_title] => 'Phase shifting circuit manufacture method and apparatus'
[patent_app_type] => utility
[patent_app_number] => 10/843974
[patent_app_country] => US
[patent_app_date] => 2004-05-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 5839
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 128
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/979/06979519.pdf
[firstpage_image] =>[orig_patent_app_number] => 10843974
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/843974 | Phase shifting circuit manufacture method and apparatus | May 11, 2004 | Issued |
Array
(
[id] => 7039201
[patent_doc_number] => 20050158635
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-21
[patent_title] => 'Gassing-free exposure mask'
[patent_app_type] => utility
[patent_app_number] => 10/843669
[patent_app_country] => US
[patent_app_date] => 2004-05-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 3140
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0158/20050158635.pdf
[firstpage_image] =>[orig_patent_app_number] => 10843669
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/843669 | Gassing-free exposure mask | May 11, 2004 | Issued |
Array
(
[id] => 887469
[patent_doc_number] => 07348106
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-03-25
[patent_title] => 'Method for repairing a phase shift mask'
[patent_app_type] => utility
[patent_app_number] => 10/841186
[patent_app_country] => US
[patent_app_date] => 2004-05-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 13
[patent_no_of_words] => 2835
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/348/07348106.pdf
[firstpage_image] =>[orig_patent_app_number] => 10841186
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/841186 | Method for repairing a phase shift mask | May 6, 2004 | Issued |
Array
(
[id] => 7045424
[patent_doc_number] => 20050250019
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-11-10
[patent_title] => 'Mask device for photolithography and application thereof'
[patent_app_type] => utility
[patent_app_number] => 10/837638
[patent_app_country] => US
[patent_app_date] => 2004-05-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 2870
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0250/20050250019.pdf
[firstpage_image] =>[orig_patent_app_number] => 10837638
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/837638 | Mask device for photolithography and application thereof | May 3, 2004 | Abandoned |
Array
(
[id] => 7420987
[patent_doc_number] => 20040229136
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-11-18
[patent_title] => 'Photo mask blank and photo mask'
[patent_app_type] => new
[patent_app_number] => 10/834919
[patent_app_country] => US
[patent_app_date] => 2004-04-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 3664
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0229/20040229136.pdf
[firstpage_image] =>[orig_patent_app_number] => 10834919
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/834919 | Photo mask blank and photo mask | Apr 29, 2004 | Issued |
Array
(
[id] => 7182577
[patent_doc_number] => 20040202944
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-10-14
[patent_title] => 'Method for quartz bump defect repair with less substrate damage'
[patent_app_type] => new
[patent_app_number] => 10/834895
[patent_app_country] => US
[patent_app_date] => 2004-04-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
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[patent_no_of_words] => 5086
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 5
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0202/20040202944.pdf
[firstpage_image] =>[orig_patent_app_number] => 10834895
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/834895 | Method for quartz bump defect repair with less substrate damage | Apr 29, 2004 | Issued |
Array
(
[id] => 847012
[patent_doc_number] => 07384712
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-06-10
[patent_title] => 'Photo mask, exposure method using the same, and method of generating data'
[patent_app_type] => utility
[patent_app_number] => 10/832995
[patent_app_country] => US
[patent_app_date] => 2004-04-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 24
[patent_figures_cnt] => 54
[patent_no_of_words] => 7118
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 196
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/384/07384712.pdf
[firstpage_image] =>[orig_patent_app_number] => 10832995
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/832995 | Photo mask, exposure method using the same, and method of generating data | Apr 27, 2004 | Issued |
Array
(
[id] => 6925709
[patent_doc_number] => 20050238964
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-10-27
[patent_title] => 'PHOTOMASK'
[patent_app_type] => utility
[patent_app_number] => 10/709276
[patent_app_country] => US
[patent_app_date] => 2004-04-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 1977
[patent_no_of_claims] => 15
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0238/20050238964.pdf
[firstpage_image] =>[orig_patent_app_number] => 10709276
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/709276 | PHOTOMASK | Apr 25, 2004 | Abandoned |
Array
(
[id] => 7060917
[patent_doc_number] => 20050003278
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-01-06
[patent_title] => 'Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same'
[patent_app_type] => utility
[patent_app_number] => 10/827556
[patent_app_country] => US
[patent_app_date] => 2004-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 3182
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[pdf_file] => publications/A1/0003/20050003278.pdf
[firstpage_image] =>[orig_patent_app_number] => 10827556
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/827556 | Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same | Apr 18, 2004 | Issued |
Array
(
[id] => 322386
[patent_doc_number] => 07517617
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-04-14
[patent_title] => 'Mask blank for use in EUV lithography and method for its production'
[patent_app_type] => utility
[patent_app_number] => 10/825618
[patent_app_country] => US
[patent_app_date] => 2004-04-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/517/07517617.pdf
[firstpage_image] =>[orig_patent_app_number] => 10825618
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/825618 | Mask blank for use in EUV lithography and method for its production | Apr 15, 2004 | Issued |
Array
(
[id] => 7425841
[patent_doc_number] => 20040265708
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-12-30
[patent_title] => 'Photomask, pattern formation method using photomask and mask data creation method for photomask'
[patent_app_type] => new
[patent_app_number] => 10/824529
[patent_app_country] => US
[patent_app_date] => 2004-04-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 33
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[patent_no_of_words] => 31609
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0265/20040265708.pdf
[firstpage_image] =>[orig_patent_app_number] => 10824529
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/824529 | Photomask | Apr 14, 2004 | Issued |
Array
(
[id] => 7251233
[patent_doc_number] => 20040259005
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-12-23
[patent_title] => 'Pattern forming method and system, and method of manufacturing a semiconductor device'
[patent_app_type] => new
[patent_app_number] => 10/823539
[patent_app_country] => US
[patent_app_date] => 2004-04-14
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[pdf_file] => publications/A1/0259/20040259005.pdf
[firstpage_image] =>[orig_patent_app_number] => 10823539
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/823539 | Pattern forming method and system, and method of manufacturing a semiconductor device | Apr 13, 2004 | Issued |
Array
(
[id] => 7025280
[patent_doc_number] => 20050019674
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-01-27
[patent_title] => 'Photomask producing method and photomask blank'
[patent_app_type] => utility
[patent_app_number] => 10/820785
[patent_app_country] => US
[patent_app_date] => 2004-04-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0019/20050019674.pdf
[firstpage_image] =>[orig_patent_app_number] => 10820785
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/820785 | Photomask producing method and photomask blank | Apr 8, 2004 | Issued |
Array
(
[id] => 7327952
[patent_doc_number] => 20040253553
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-12-16
[patent_title] => 'Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure method'
[patent_app_type] => new
[patent_app_number] => 10/814303
[patent_app_country] => US
[patent_app_date] => 2004-04-01
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[pdf_file] => publications/A1/0253/20040253553.pdf
[firstpage_image] =>[orig_patent_app_number] => 10814303
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/814303 | Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure method | Mar 31, 2004 | Issued |
Array
(
[id] => 925572
[patent_doc_number] => 07316870
[patent_country] => US
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[patent_issue_date] => 2008-01-08
[patent_title] => 'Device manufacturing method, mask set for use in the method, data set for controlling a programmable patterning device, method of generating a mask pattern and a computer program'
[patent_app_type] => utility
[patent_app_number] => 10/814802
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[pdf_file] => patents/07/316/07316870.pdf
[firstpage_image] =>[orig_patent_app_number] => 10814802
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/814802 | Device manufacturing method, mask set for use in the method, data set for controlling a programmable patterning device, method of generating a mask pattern and a computer program | Mar 31, 2004 | Issued |
Array
(
[id] => 7019182
[patent_doc_number] => 20050221201
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[patent_kind] => A1
[patent_issue_date] => 2005-10-06
[patent_title] => 'Marking system for a semiconductor wafer to identify problems in mask layers'
[patent_app_type] => utility
[patent_app_number] => 10/816573
[patent_app_country] => US
[patent_app_date] => 2004-03-31
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0221/20050221201.pdf
[firstpage_image] =>[orig_patent_app_number] => 10816573
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/816573 | Marking system for a semiconductor wafer to identify problems in mask layers | Mar 30, 2004 | Issued |
Array
(
[id] => 4971488
[patent_doc_number] => 20070111490
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-05-17
[patent_title] => 'Mask blank, mask blank manufacturing method, transfer mask manufacturing method, and semiconductor device manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 10/551136
[patent_app_country] => US
[patent_app_date] => 2004-03-31
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0111/20070111490.pdf
[firstpage_image] =>[orig_patent_app_number] => 10551136
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/551136 | Mask blank, manufacturing method of mask blank, manufacturing method of transfer mask and manufacturing method of semiconductor device | Mar 30, 2004 | Issued |